• Title/Summary/Keyword: thermal breakdown

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Characteristics of EHV Bushing and a New Design for the Improved Performance (특고압 부싱의 특성분석 및 성능향상을 위한 새로운 설계)

  • Kim, Chan-Young;Song, Il-Keun;Kim, Ju-Yong;Lee, Byung-Sung;Park, Keun-Hyung
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2002.07b
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    • pp.886-889
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    • 2002
  • This paper describes the characteristic analyses and a new design of the bushing for the pole transformers. The mechanical breakdown of the upper part of the bushing was frequently occurred. This caused the leakage of mineral oil, resulted in the interruption of electric power. Therefore, the bushings were investigated by the material analytical method and Finite Element Method. The analyses were performed by the Induced Coupled Plasma(ICP), X-ray diffraction(XRD), Scanning Electron Microscopy(SEM), and Dielectric Thermal Analyzer(DETA). Also, the Von-Mises stress of the top part of bushing was determined by using ANSYS program. The Von-Mises stress of the newly designed bushing was reduced about 50%. Therefore, if we apply the newly designed bushing, the number of mechanical breakdown may be decreased.

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The factors involved in the wear-out of the thin oxide film (얇은 산화막의 Wear-out 현상과 제인자)

  • Kim, Jae-Ho;Yi, Seung-Hwan;Kim, Chun-Sub;Sung, Yung-Kwon
    • Proceedings of the KIEE Conference
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    • 1989.07a
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    • pp.359-363
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    • 1989
  • Recently, it is reported that the behavior of thermal $SiO_2$ under high electric field and current condition has a major effect on MOS device degration. Furthermore, when thin oxide films are applied in practical device, the presence of oxide defects will be a serious problem. In this paper, because TDDB is the useful method to measure the effective density of defects, we stressed MOS structure that is 150 A of thermally grown $SiO_2$as a function of electric field (9-19 MV/cm), temperature ($22^{\circ}C$ - $150^{\circ}C$) and current. By examing TDDB under positive voltage, long-term oxide breakdown reliabiliy is described. From these data, breakdown wearout limitation for the oxide films can be characterized.

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The effect of irradiation on the wear out of thin oxide film (얇은 산화막의 wear out에 관한 광 조사 효과)

  • Kim, Jae-Ho;Choi, Bok-Kil;Sung, Yung-Kwon
    • Proceedings of the KIEE Conference
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    • 1989.11a
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    • pp.114-118
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    • 1989
  • Due to the increased integration density of VLSI circuits a highly reliable thin oxide film is required to fabricate a small geometry MOS device. The behavior of thermal $SiO_2$ under high electric field and current condition has a major effect on MOS device degration and also the practical use of MOS device under irradiation has cause the degration of thin oxide films. In this paper, in order to evaluate the reliability of thin oxides with no stress applied and stressed by the irradiation under low electric field, the tests of TDDB (Time-dependent-dielectric breakdown) are used. Failure times against electric field are examined and acceleration factor is obtained for each case. Based on the experimental data, breakdown wear out limitation for thin oxide films is characterised.

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STUDY ON NUMERICAL ANALYSIS AND TURBULENCE MODELS FOR ARC DISCHARGES IN HIGH-VOLTAGE INTERRUPTERS (초고압 차단부 아크방전 수치해석 및 난류모델에 관한 연구)

  • Kim, W.Y.;Lee, J.C.
    • 한국전산유체공학회:학술대회논문집
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    • 2010.05a
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    • pp.201-207
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    • 2010
  • In this study, we calculated arc discharges happened in high-voltage circuit breakers for understanding the complex physics and the probability of thermal breakdown. The four main parts of arc model for this virtual-reality are radiation, PTFE abaltion, Cu evaporation and turbulence. Among these important parts the turbulence model can be critical to the reliability of computation results during high-current period because the plasma flow is affected by high eat energy and mass momentum. Two kinds of turbulence model, zero-equation model and two-equation model, are applied for these calculations and are compared with the measured pressure data inside a chamber.

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The Optimal Design of Super High Voltage Planar Gate NPT IGBT (대용량 전력변환용 초고전압 NPT IGBT 최적화 설계에 관한 연구)

  • Kang, Ey Goo
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.28 no.8
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    • pp.490-495
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    • 2015
  • This paper was proposed the theoretical research and optimal design 3,000 V IGBT for using electrical automotive, high speed train and first power conversion. To obtaining 3,000 V breakdown voltage, the design parameters was showed $160{\Omega}{\cdot}cm$ resistivity and $430{\mu}m$ drift length. And to maintain 5 V threshold voltage, we obtained $6.5{\times}10^{13}cm^{-2}$ p-base dose. We confirmed $24{\mu}m$ cell pitch for maintain optimal on state voltage drop and thermal characteristics. This 3,000 V IGBT was replaced to thyristor devices using first power conversion and high speed train, presently.

Electric conduction properties of low density Polyethylene film for Power cable (전력케이블용 저밀도폴리에틸렌박막의 전기전도특성)

  • 황종국;홍능표;이용우;소병문;홍진웅
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 1994.11a
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    • pp.143-146
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    • 1994
  • In older to investigate the properties of electric conduction in low density polyethylene(LDPE) for power cable, the thickness of specimen was the 30, 100($\mu\textrm{m}$) of LDPE. The experimental condition for conductive properties was measured until the breakdown occurs at temperature ranges from 30 to 110[$^{\circ}C$] and in the electric field of 1 to 5 ${\times}$10$^2$[Mv/m]. As for increase of temperature, the current density of LDPE was increased with constant ratio in low field, but changes with exponential function in high field. The tunnel current of pre-breakdown region is shifted toward low field as much as thermal excitation energy.

Simulation of Miniaturized n-MOSFET based Non-Isothermal Non-Equilibrium Transport Model (디바이스 시뮬레이션 기술을 이용한 미세 n-MOSFET의 비등온 비형형장에 있어서의 특성해석)

  • Choi, Won-Cheol
    • Journal of the Korean Society of Industry Convergence
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    • v.4 no.3
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    • pp.329-337
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    • 2001
  • This simulator is developed for the analysis of a MOSFET based on Thermally Coupled Energy Transport Model(TCETM). The simulator has the ability to calculate not only stationary characteristics but also non - stationary characteristics of a MOSFET. It solves basic semiconductor devices equations including Possion equation, current continuity equations for electrons and holes, energy balance equation for electrons and heat flow equation, using finite difference method. The conventional semiconductor device simulation technique, based on the Drift-Diffusion Model (DDM), neglects the thermal and other energy-related properties of a miniaturized device. I, therefore, developed a simulator based on the Thermally Coupled Energy Transport Model (TCETM) which treats not only steady-state but also transient phenomena of such a small-size MOSFET. In particular, the present paper investigates the breakdown characteristics in transient conditions. As a result, we found that the breakdown voltage has been largely underestimated by the DDM in transient conditions.

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Reliability of MOS Capacitors and MOSFET's with Oxide and Reoxidized-Nitrided-Oxide as Gate Insulators (산화막 및 재산화질화산화막의 MOS 캐패시터와 MOSFET의 신뢰성)

  • 노태문;이경수;유병곤;남기수
    • Journal of the Korean Institute of Telematics and Electronics A
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    • v.30A no.11
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    • pp.105-112
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    • 1993
  • Oxide and reoxidized-nitrided-oxide were formed by furnace oxidation and rapid thermal processing (RTP). MOS capacitor and n-MOSFET's with those films as gate insulators were fabricated. The electrical characteristics of insulators were evaluated by current-voltage, high-frequency capacitance-voltage (C-V), and time-dependent dielectrical breakdown (TDDB) measurements. The hot carrier effects of MOSFET's were also investigated. Time-dependent dielectrical breakdown (TDDB) characteristics show that the life time of reoxidized-nitrided-oxide films is about 3 times longer than that of oxides. Hot carrier effects reveal that the life time of MOSFET's with reoxidized-nitrided-oxides is about 3 times longer than that of MOSFET's with oxides. Therefore, it is found that the reliability of dielectric films estimated by the hot carrier effects of MOSFET's is consistent with that of dielectric films from TDDB method.

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Electrical Properties of XLPE Power Cable by DCP and TMPTA Content (전력 cable용 XLPE의 제조과정 중 가교제와 가교조제의 함량이 미치는 전기적 특성)

  • Kim, Gyu-Sik;Lim, Kee-Joe;Ryu, Boo-Hyung;Park, Soo-Gil
    • Proceedings of the KIEE Conference
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    • 2000.07c
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    • pp.2077-2080
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    • 2000
  • We studied about electrical, chemical and mechanical characteristics of XLPE by dicumyl peroxide(DCP) and trimethylolpropane triacrylate(TMPTA) content ratio. DCP content was changed from 1.0 to 2.5phr increasing 0.5phr. TMPTA content was changed 0.5 to 1.5phr increasing 0.5phr. Thermal analysis (DSC) was carried out in order to observe tendency of 79 according to DCP and TMPTA content. In experimental results, content DCP 2.0phr and TMPTA 1.0phr has highest breakdown strength. Content DCP 2.0phr and TMPTA 0.5phr has lowest dielectric constant. Tendency of Tg did not affected by DCP and TMPTA content. Breakdown strength and Specific inductive capacity was measured.

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A Study on Thermal, Mechanical and Electrical Properties as Silane Treated Epoxy/MICA Composites (실란처리된 Epoxy/MICA 콤포지트의 열적, 기계적 전기적 특성연구)

  • Park, Jae-Jun
    • The Transactions of The Korean Institute of Electrical Engineers
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    • v.62 no.2
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    • pp.213-218
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    • 2013
  • In this study, epoxy/mica composite was prepared by mixing with mechanical stirrer together with homogenizer, and the effect of amino-type silane coupling agent was also studied. To reduce the viscosity without any decrement of other properties, 1,4-Butanediol diglycidyl ether (1,4-BDGE) as an aliphatic epoxy reactive diluent was introduced to the epoxy/mica composite in order to use as vanish for high voltage motor and generator stator winding. It was confirmed by scanning electron microscopy (SEM) observation that interfacial characteristics between organic epoxy and inorganic mica was modified by coupling agent treatment so that glass transition temperature increased, and tensile strength and electrical breakdown strength increased. The properties were estimated by Weibull statistical analysis and the ac electrical breakdown strength was 20.2% modified by treating silane coupling agent.