• 한국전기전자재료학회논문지
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• 제14권9호
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• pp.731-735
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• 2001

S $r_{0.89}$B $i_{2.4}$T $a_2$ $O_{9}$ (SBT) thin films are deposited on Pt-coated electrode(Pt/Ti $O_2$/ $SiO_2$/Si) using RF magnetron sputtering method. In the XRD pattern, the SBT thin films had (105) orientation. As annealing temperature was increased from $600^{\circ}C$ to 85$0^{\circ}C$, the intensities of peak were increased. In the SEM images, Bi-layered perovskite phase was crystallized above $650^{\circ}C$ and rod-like grains grew above 75$0^{\circ}C$. The maximum remanent polarization and the coercive electric field at annealing temperature of 75$0^{\circ}C$ are 11.60$\mu$C/$\textrm{cm}^2$ and 48kV/cm respectively. The dielectric constant and leakage current density at annealing temperature of 75$0^{\circ}C$ are 213 and 1.01x10$^{-8}$ A/$\textrm{cm}^2$, respectively. The fatigue characteristics of SBT thin filmsdid not change up to 10$^{10}$ switching cycles.s.s.

• E2M - 전기 전자와 첨단 소재
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• 제10권10호
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• pp.1041-1047
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• 1997

In this paper the dielectric properties of (0.8-x)Pb(Mb$_{1}$3//Nb/2/3)O$_3$/BaTiO$_3$-CaZrO$_3$(x=0.1, 0.15, 0.2, 0.25) ceramics were investigated. Specimens were prepared by the conventional mixed oxide method and sintering temperature and time were 1000~115$0^{\circ}C$ 2hr, respectively. The structural and dielectric properties with variation of sintering temperature and composition were investigated. All the specimens sintered at 115$0^{\circ}C$ for 2hr showed the highest value of 1043. With increasing the contents of CZ and frequency dielectric constant was decreased and which was decreased with increasing temperature from 3$0^{\circ}C$ to 15$0^{\circ}C$.

• 한국반도체및디스플레이장비학회:학술대회논문집
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• 한국반도체및디스플레이장비학회 2006년도 추계학술대회 발표 논문집
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• pp.110-114
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• 2006

Dielectric properties of glass-ceramics with fresnoite(Ba2TiSi208) crystals have been investigated in xK20-(33.3-x)BaO-16.7TiO2-50SiO2 ($0{\leq}x{\leq}20mol%$) glasses. The glassy nature was analyzed by differential thermal analyses and glass-ceramics was variable and control table by the processing parameters like time and temperature. Dielectric constant was measured over a temperature from 125K to 425k at frequencies form 100Hz to 1MHz, and laid in the range 16-10. Piezoelectric constant d33 was measured using a YE2703A d33meter and changed from 5.9 to 4.8pCN-1 with x contents. The spontaneous polarization Ps estimated from the hysteresis at ${\pm}1.2kV$ was ${\sim}0.3\;{\mu}C/cm2$ at room temperature.

• 동력기계공학회지
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• 제15권2호
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• pp.42-48
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• 2011

440A martensitic stainless steels which were modified with reduced carbon content(~0.5%) and addition of small amount of nickel, vanadium, tungsten and molybdenum were manufactured. Effects of alloying elements and tempering temperatures on the uniform corrosion in the solution of lN H2S04 were investigated through the electrochemical polarization test. When tempering temperature is constant, corrosion current density in active-passive transition point, Icorr, decreased a little with an increase of austenitizing temperature. In addition to this, when austenitizing temperature is constant, longer holding time showed a little lower Icorr and Ipass, passive current density. And when austenitized at $1050^{\circ}C$ and tempered in a range of $350{\sim}750^{\circ}C$, best anti-corrosion properties were obtained at $350^{\circ}C$ tempering temperature while worst at $450^{\circ}C$ or $550^{\circ}C$. The specimens tempered at below $450^{\circ}C$ and above $550^{\circ}C$, similar and good anti-corrosion characteristics were obtained regardless of alloying elements added, showing anti-corrosion characteristics are influenced more by tempering temperature than by alloying elements.

• 한국전기전자재료학회논문지
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• 제11권10호
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• pp.866-870
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• 1998

PLZT thin films were fabricated with different Zr/Ti ratios by pulsed laser deposition. PLZT films deposited on Pt/Ti/SiO$_2$/Si substrate. This PLZT thin films of 5000$\AA$ thickness were crystallized at $600^{\circ}C$, $O_2$ pressure 200m Torr. 2/55/45 PLZT thin film showed a maximum dielectric constant value of $\varepsilon$\ulcorner=1550 and dielectric loss was 0.03 at 10kHz. At 2/70/30 PLZT thin film, coercive field and remnant polarization was respectively 19[kV/cm], 8[$\mu$C/$\textrm{cm}^2$]. Raman spectroscopy results showed that the bands of spectra became broader as the amount of Zr mol% increased and two crystal phase coexisted at 2/55/45 PLZT film. Raman spectroscopy was useful for crystal structure analysis of PLZT thin films.

• Transactions on Electrical and Electronic Materials
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• 제1권1호
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• pp.22-25
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• 2000

Polycrystalline SBTN layered ferroelectric thin film with various Nb mole ratios were prepared by sol-gel method Pt/ $SiO_2$/Si (100) substrates. The films were annealed at different temperature and characterized in terms of phase and microstructure. The films were crystallized with a high (105) diffraction intensity and had rodike structure, SBTN films fired at 800$^{circ}C$ revealed standard hysteresis loops with no fatigue for up to 10$^{10}$ cycles. At an applied voltage of 5V the dielectric constant($varepsilon$) , dissipation factor (tan $delta$), remanent polarization(ZPr) and coercive field(Ec) of typical S $r_{0.8}$B $i_{2.3}$(T $a_{1-x}$ N $b_{x}$) $O_{9+}$$alpha$/ thin film(x=0.1) prepared on Pt/ $SiO_2$/Si (100) were about 277.7, 0.042, 3.74$mu$C/$textrm{cm}^2$, and 24.8kv/cm respectively.ly.y. respectively.ly.y.y..

• 지구물리와물리탐사
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• 제16권3호
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• pp.180-189
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• 2013

물리탐사는 금속광상에서 광화대를 탐사하는데 효율적인 방법으로 국내 외에서 전략광물자원을 개발하기 위하여 널리 이용되고 있다. 물리탐사 결과로부터 광화대를 정확하게 해석하기 위하여 암석의 물리적 특성을 이해하는 것이 매우 중요하다. 따라서 이 연구는 국내 대표적 스카른 광상인 가곡광산의 광석 및 모암을 대상으로 실내에서 다양한 물성을 측정하였으며, 그 결과로부터 가곡 스카른 광상을 구성하는 지층의 물리적 특성을 파악하고자 하였다. 암석시료는 시추코어 및 노두에서 채취하였으며, 시료의 물성은 실내 암석물성 측정시스템을 이용하여 밀도, 대자율, 전기비저항, 광대역 유도분극을 측정하였다. 그 결과 광석은 모암에 비하여 낮은 전기비저항과 높은 대자율 및 밀도를 보였으며, 광대역 유도분극에서 큰 위상과 특정한 임계주파수가 나타났다. 광석의 광대역 유도분극 측정 자료를 Cole-Cole 역산을 통하여 얻은 충전성과 시간상수로부터 황화광물의 함량과 입자의 크기를 추정할 수 있어 스카른 광상 탐사에서 유용할 것으로 기대된다.

• 마이크로전자및패키징학회지
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• 제26권4호
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• pp.63-68
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• 2019

온도 및 압축응력 변화에 따른 PIN-PMN-PT계 압전 단결정의 유전 특성과 압전 특성을 조사하였다. 단결정의 결정상은 110℃ 영역에서 강유전 rhombohedral 구조에서 tetragonal 구조로, 190℃ 영역에서 tetragonal 구조로부터 상유전 cubic 구조로 변화하였다. 전계 인가에 따른 분극 및 변위의 변화율로부터 압전상수와 비유전율을 계산하였으며, 이는 계측기로부터 측정된 값과 유사한 수준을 나타내었다. 샘플에 인가되는 압축응력이 증가할수록 압전상수 d₃₃과 비유전율값은 증가하는 경향성을 나타내었다. 측정 온도 5℃에서 샘플에 인가되는 압축응력이 60 MPa인 경우 d₃₃ 값이 4500 pC/N로 계산되었으며, 측정 온도 60℃인 경우, 샘플에 인가되는 압축응력이 40 MPa 일 때 비유전율 62000이 계산되었다. 압축응력이 높아질 때 압전상수와 비유전율 값이 상승한 것은 rhombohedral 상에서 orthorhombic 상으로의 전이에 기인한 것으로 판단된다.

• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 2004년도 하계학술대회 논문집 Vol.5 No.2
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• pp.960-964
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• 2004

[ $Ba_2NaNb_5O_{15}$ ](BNN) thin films have been prepared by the ion beam sputter deposition (IBSD) method on Pt coated Si substrate at temperature as low as $600^{\circ}C$ XRD, SEM were used to investigate the crystallization and microstructure of the films. It was found that the films were crack-free and uniform in microstructure. The electric properties of thin films were carried out by observation of D-E hysteresis loop, dielectric constant and leakage current. It was found the deposition rate strongly influenced the phase formation of the films, where the phase of $BaNb_2O_6$ was always formed when the deposition rate was high. However, the single phase (tungsten bronze structure ) BNN thin film was obtained with the deposition rate as low as $22{\AA}/min$. The remanent polarization Pr and dielectric constant are about 1-2 ${\mu}C/cm^2$ and $100\sim200$, respectively. It was also founded the electric properties of thin films were influenced by the deposition rate. The Pr and dielectric constant of films increased with the decrease of deposition rate. The effects of annealing temperature and annealing time to the crystallization behavior of films were studied. The crystallization of thin film started at about $600^{\circ}C$. The adequate crystallization was gotten at the temperature of $650^{\circ}C$ when the annealing time is 0.5 hour or at the temperature of $600^{\circ}C$ when the annealing time is long as 6 hours.

• 한국산학기술학회논문지
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• 제11권11호
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• pp.4468-4472
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• 2010

ICP-CVD 방법에 의해 제작된 SiOC 박막을 유전상수와 화학적 이동의 상관성에 대하여 조사하였다. SiOC 박막은 플라즈마 에너지에 의해서 해리작용과 재결합작용에 의해서 cross link 구조를 갖게 되는 Si-O 와 C-O 결합으로 구성된 $930{\sim}1230\;cm^{-1}$ 영역에서 혼합된 Si-O-C 주 결합으로 이루어졌다. C-O 결합은 $1270cm^{-1}$에서 보여지는 Si-$CH_3$ 결합의 말단부분인 C-H 결합이 전기음성도가 큰 산소에 의해서 끌리는 효과로부터 만들어진 결합이다. 그러나 Si-O 결합은 Si-$CH_3$ 결합이 분해되고 난뒤 2차 이온결합에 의해서 만들어진 결합이다. Si-O 결합의 증가는 주결합에서 오른쪽 결합이 증가하기 때문이며, FTIR 스펙트라에 의해서 red shift로 나타났다. 이러한 결과는 SiOC 박막이 보다 더 안정되고 강한 박막임을 의미한다. 그래서 SiOC 박막은 열처리 후 비정질도가 높고 거칠기가 감소되는 것을 확인하였다.