• Title/Summary/Keyword: texturing

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Analysis of Optical Process Depending On Texturing Process of Si Wafer (실리콘 웨이퍼의 표면조직화에 따른 광학적 특성분석)

  • Oh, Teresa
    • Journal of the Korea Institute of Information and Communication Engineering
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    • v.15 no.11
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    • pp.2439-2443
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    • 2011
  • To obtain the effect of texturing process in Solar cells, the Si-wafers were textured by using the IPA+DI water mixed etching solution with KOH alkaline. All samples were analyzed by the scanning electron microscopy for the surface images, and it was researched the correlation between the efficiency of optical properties and the effect of texturing. From the results of the surface images obtained by SEM, mc-Si wafer shows a isotropic surface but sc-Si wafers displays the unisotropic surface. The reflectance was improved at the sc-Si wafer textured uniformly, and the reflectance of over etched-samples increased.

Self-textured Al-doped ZnO transparent conducting oxide for p-i-n a-Si:H thin film solar cell

  • Kim, Do-Yeong;Lee, Jun-Sin;Kim, Hyeong-Jun
    • Proceedings of the Materials Research Society of Korea Conference
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    • 2009.11a
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    • pp.50.1-50.1
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    • 2009
  • Transparent conductive oxides (TCOs) play an important role in thin-film solar cells in terms of low cost and performance improvement. Al-doped ZnO (AZO) is a very promising material for thin-film solar cellfabrication because of the wide availability of its constituent raw materials and its low cost. In this study, AZO films were prepared by low pressurechemical vapor deposition (LPCVD) using trimethylaluminum (TMA), diethylzinc(DEZ), and water vapor. In order to improve the absorbance of light, atypical surface texturing method is wet etching of front electrode using chemical solution. Alternatively, LPCVD can create a rough surface during deposition. This "self-texturing" is a very useful technique, which can eliminate additional chemical texturing process. The introduction of a TMA doping source has a strong influence on resistivity and the diffusion of light in a wide wavelength range.The haze factor of AZO up to a value of 43 % at 600 nm was achieved without an additional surface texturing process by simple TMA doping. The use of AZO TCO resulted in energy conversion efficiencies of 7.7 % when it was applied to thep-i-n a-Si:H thin film solar cell, which was comparable to commercially available fluorine doped tin oxide ($SnO_2$:F).

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Study on laser texturing process for fabrication of high efficiency solar cell (고효율 태양전지 제작을 위한 레이저 텍스쳐링 연구)

  • Ko, Ji-Soo;Jeong, Han-Wook;Gong, Dae-Yeong;Lee, Won-Baek;Kim, Kwang-Ryul;Shin, Sung-Wook;Park, Hong-Jin;Choi, Byoung-Deog
    • 한국신재생에너지학회:학술대회논문집
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    • 2009.06a
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    • pp.143-146
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    • 2009
  • One of the most important issues of crystalline silicon solar cell is minimizing reflectance at the surface. Laser texturing is an isotropic process that will sculpt the surface of a silicon wafer, regardless of its crystallographic orientation. We investigated surface texturing process using Nd-YAG laser ($\lambda$=1064 nm) on multi-crystalline silicon wafer. Removal of slag formed after the laser process was performed using acid solution (HF : $HNO_3$ : $CH_3COOH$ : DI water). The reflectance and carrier lifetime of the samples were measured and analyzed using UV-Vis spectrophotometer and carrier lifetime tester. It was found that the minimum reflectance of the samples was 16.39% and maximum carrier life time was $21.8\;{\mu}s$.

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Effect on the Pyramid Structure with Saw Mark Density of Silicon Wafer Surface (실리콘 웨이퍼 표면의 saw mark 밀도에 따른 피라미드 구조의 영향)

  • Lee, Min Ji;Park, Jeong Eun;Lee, Young Min;Kang, Sang Muk;Lim, Donggun
    • Current Photovoltaic Research
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    • v.5 no.2
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    • pp.59-62
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    • 2017
  • Surface texturing is affected the uniformity and size of pyramid with saw mark defect density. To analysis the influence of the saw mark defect density, we textured various si wafer. When the texturing process proceeds without the saw mark removal, silicon wafer of low-saw mark defect density showed small pyramid size of $3.5{\mu}m$ with the lowest average value of the reflectance of 10.6%. When texturing carried out after removal of the saw mark using the TMAH solution, we obtained a reflectance of about 11% and the large pyramid size of $5{\mu}m$. As a result, saw mark wafers showed a better pyramid structure than saw mark-free wafer. This result showed that saw mark can take place more smooth etching by the KOH solution and saw mark-free wafer is determined to be a factor that have a higher reflectance and a large pyramid.

Study on the Fill Factor, Open Voltage, Short Current and Si Surface on Si-Solar Cell (태양전지의 실리콘 표면과 Fill Factor, 개방전압, 단락전류에 관한 연구)

  • Oh, Teresa
    • Journal of the Korea Academia-Industrial cooperation Society
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    • v.12 no.6
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    • pp.2735-2738
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    • 2011
  • To obtain the Si solar cells, the Si-wafers were textured by using the IPA+DI water mixed solution with KOH acids during the various 1~40 minutes at the temperature with $80^{\circ}C$, respectively. The samples were analyzed by the scanning electron microscopy for the surface images and the solar simulation for I-V measurement system. It was researched the correlation between the efficiency of solar cells and the effect of texturing. From the results of the surface images obtained by SEM, the efficiency was increased at the sample textured uniformly, and the efficiency of over etched-samples decreased.

Texturing of Multi-crystalline Silicon Using Isotropic Etching Solution (등방성 에칭용액을 이용한 다결정 실리콘의 표면조직화)

  • Eum, Jung-Hyun;Choi, Kwan-Young;Nahm, Sahn;Choi, Kyoon
    • Journal of the Korean Ceramic Society
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    • v.46 no.6
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    • pp.685-688
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    • 2009
  • Surface Texturing is very important process for high cell efficiency in crystalline silicon solar cell. Anisotropic texturing with an alkali etchant was known not to be able to produce uniform surface morphology in multi-crystalline silicon (mc-Si), because of its different etching rate with random crystal orientation. In order to reduce surface reflectance of mc-Si wafer, the general etching tendency was studied with HF/HN$O_3$/De-ionized Water acidic solution. And the surface structures of textured mc-Si in various HF/HN$O_3$ ratios were compared. The surface morphology and reflectance of textured silicon wafers were measured by FE-SEM and UVvisible spectrophotometer, respectively. We obtained average reflectance of $16{\sim}19$% for wavelength between 400 nm and 900 nm depending on different etching conditions.

Lubrication Characteristics of Surface Textured Parallel Thrust Bearing with Ellipsoidal Dimples (타원체 딤플로 Texturing한 평행 스러스트 베어링의 윤활특성)

  • Park, Tae-Jo;Kim, Min-Gyu
    • Tribology and Lubricants
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    • v.32 no.5
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    • pp.147-153
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    • 2016
  • Friction reduction between machine components is important for improving their efficiency and lifespan. In recent years, surface texturing has received considerable attention as a viable means to enhance the efficiency and tribological performance of highly sliding mechanical components such as parallel thrust bearings, mechanical face seals, and piston rings. In this study, we perform lubrication analysis to investigate the effect of dimple shapes and orientations on the lubrication characteristics of a surface textured parallel thrust bearing. Numerical analysis involves solving the continuity and Navier-Stokes equations using a commercial computational fluid dynamics (CFD) code, FLUENT. We use dimples consisting of hemispherical and different semiellipsoidal orientations for simulation. We compare pressure and streamline distributions, load capacity, friction force, and leakage flowrate for different numbers of dimples and orientations. We find that the dimple shapes, orientations, and their numbers starting from an inlet influence the lubrication characteristics. The results show that partial texturing of the bearing inlet region, and the ellipsoidal dimples with the major axis aligned along the lubricant flow direction exhibit the best lubrication characteristics in terms of higher load capacity and lower friction. The results can be used in the design of optimum dimple characteristics for parallel thrust bearings, for which further research is required.

Controlling the Depth of Microchannels Formed during Rolling-based Surface Texturing

  • Bui, Quang-Thanh;Ro, Seung-Kook;Park, Jong-Kweon
    • Journal of the Korean Society of Manufacturing Technology Engineers
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    • v.25 no.6
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    • pp.410-420
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    • 2016
  • The geometric dimension and shape of microchannels that are formed during surface texturing are widely studied for applications in flow control, and drag and friction reduction. In this research, a new method for controlling the deformation of U channels during micro-rolling-based surface texturing was developed. Since the width of the U channels is almost constant, controlling the depth is essential. A calibration procedure of initial rolling gap, and proportional-integral PI controllers and a linear interpolation have been applied simultaneously to control the depth. The PI controllers drive the position of the pre-U grooved roll as well as the rolling gap. The relationship between the channel depth and rolling gap is linearized to create a feedback signal in the depth control system. The depth of micro channels is studied on A2021 aluminum lamina surfaces. Overall, the experimental results demonstrated the feasibility of the method for controlling the depth of microchannels.

RIE/WET Texturing 구조의 결정질 태양전지의 입사각에 따른 양자효율

  • Seo, Il-Won;Son, Chan-Hui;Kim, Dong-Hae;Yun, Myeong-Su;No, Jun-Hyeong;Gang, Jeong-Uk;Jo, Gwang-Seop;Gwon, Gi-Cheong
    • Proceedings of the Korean Vacuum Society Conference
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    • 2012.02a
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    • pp.599-599
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    • 2012
  • 태양광 발전은 태양광의 입사각과 셀 단면이 이루는각도에 따라 출력특성이 변화된다. 따라서 태양의 위치에 따른 출력특성이 바뀌며 이에 의해 발전가능 시간이 변화된다. 더욱이 건재 일체형(BIPV)의 경우 설치 방향을 조절 할 수 없으므로 입사각에 따른 출력특성이 더욱 중요하다. 이와 따라 결정질 태양전지의 입사각에 따른 광학 특성 변화는 태양전지 표면에 형성되는 Texture의 영향을 받는다. 일반적으로 습식 texturing 방법으로는 화학적인 반응을 이용한 WET 공정, 그리고 건식 texturing 방법으로는 플라즈마를 이용한 reactive ion etching (RIE) 공정이 사용된다. 본 연구에서는 RIE, WET 공정을 사용하여 만든 texturing 구조의 결정질 태양전지를 SEM 장비를 이용하여 표면의 형상을 분석하고, 광 입사각에 따른 양자효율의 특성에 대하여 분석하였다.

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Effect of Surface Pyramids Size on Mono Silicon Solar Cell Performance

  • Kim, Hyeon-Ho;Kim, Su-Min;Park, Seong-Eun;Kim, Seong-Tak;Gang, Byeong-Jun;Tak, Seong-Ju;Kim, Dong-Hwan
    • Proceedings of the Materials Research Society of Korea Conference
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    • 2012.05a
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    • pp.100.2-100.2
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    • 2012
  • Surface texturing of crystalline silicon is carried out in alkaline solutions for anisotropic etching that leads to random pyramids of about $10{\mu}m$ in size. Recently textured pyramids size gradually reduced using new solution. In this paper, we investigated that texture pyramids size had an impact on emitter property and front electrode (Ag) contact. To make small (${\sim}3{\mu}m$) and large (${\sim}10{\mu}m$) pyramids size, texturing times control and one side texturing using a silicon nitride film were carried out. Then formation and quality of POCl3-diffused n+ emitter in furnace compare with small and large pyramids by using SEM images, simulation (SILVACO, Athena module) and emitter saturation current density (J0e). After metallization, Ag contact resistance was measured by transfer length method (TLM) pattern. And surface distributions of Ag crystallites were observed by SEM images. Also, performance of cell which is fabricated by screen-printed solar cells is compared by light I-V.

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