• 제목/요약/키워드: substrate degradation

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Thermal Degradation of Black Cobalt Solar Selective Coatings (흑색 코발트 태양 선택흡수막의 열퇴화)

  • Lee, Kil-Dong
    • Journal of the Korean Solar Energy Society
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    • v.35 no.4
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    • pp.9-15
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    • 2015
  • Black cobalt solar selective coatings were prepared by using an electroplating method. The changes in the optical properties of the black cobalt selective coating due to thermal degradation were analyzed by using the Auger electron spectroscopy (AES) and spectrophotometer. The black cobalt selective coating was prepared on a copper substrate by using a synthesized electrolyte with $CoCl_2$ and KSCN at a current density of ${\sim}0.5A/dm^2$ for 45s ~ 60s. Its optical properties were a solar absorptance (${\alpha}$) of the order of 0.80 ~ 0.84 and a thermal emittance (${\epsilon}$) of 0.01. From the AES depth profile analysis of heated sample, thermal degradation of the black cobalt selective coating heated for 33 hours at temperature of $350^{\circ}C$ occurred primarily due to interdiffusion at interface of cobalt and copper substrate. This results were predictable that the ${\alpha}$ decreases due to the thermal oxidation and diffusion.

Degradation of Polycrystalline Silicon Thin Film Transistor by Inducing Stress (스트레스 인가에 의한 다결정 실리콘 박막 트랜지스터의 열화 특성)

  • 백도현;이용재
    • Proceedings of the IEEK Conference
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    • 2000.06b
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    • pp.322-325
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    • 2000
  • N-channel poly-Si TFT, Processed by Solid Phase Crystalline(SPC) on a glass substrate, has been investigated by measuring its electrical properties before and after electrical stressing. It is observed that the threshold voltage shift due to electrical stress varies with various stress conditions. Threshold voltages measured in 1.5$\mu\textrm{m}$ and 3$\mu\textrm{m}$ poly-Si TFTs are 3.3V, 3.V respectively. With the threshold voltage shia the degradation of transconductance(G$\_$m/) and subthreshold swing(S) is also observed.

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A study on the degradation by the hot carrier trapping of the submicron MOSFET with long stress condition (장시간 스트레스 조건에서 submicron MOSFET의 열전자 트래핑에 의한 노화현상에 대한 연구)

  • 홍순석
    • Electrical & Electronic Materials
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    • v.8 no.3
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    • pp.357-361
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    • 1995
  • An experiment on characteristics of nMOSFET's in the long stress condition with the maximum of the substrate current has been carried out in order to study on the degradation due to the hot-carrier effect. Based on the measured result of the threshold voltage, the damage is mostly due to the hole injection into the oxide. After long stress, it was shown that the drain current increased at low gate voltages and hence decreased at high gate voltages.

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Effects of the Dielectric Constant and Thickness of a Feed Substrate on the Characteristics of an Aperture Coupled Microstrip Patch Antenna (급전 기판의 유전상수 및 두께가 개구면 결합 마이크로스트립 패치 안테나의 특성에 미치는 영향)

  • Bak, Hye-Lin;Koo, Hwan-Mo;Kim, Boo-Gyoun
    • Journal of the Institute of Electronics and Information Engineers
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    • v.51 no.7
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    • pp.49-59
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    • 2014
  • Effects of the dielectric constant and thickness of a feed substrate on the bandwidth and radiation characteristics of an aperture coupled microstrip patch antenna (ACMPA) are investigated. The optimized return loss bandwidth of an ACMPA increases without the degradation of radiation characteristics as the feed substrate dielectric constant increases for the same feed substrate thickness. The optimized return loss bandwidth of an ACMPA with the dielectric constant of a feed substrate of 10, which is compatible with the high dielectric constant monolithic microwave integrated circuit (MMIC) materials, increases without the degradation of radiation characteristics as the thickness of a feed substrate decreases. The ACMPA configuration is suitable for integration with MMICs.

Hot electron induced degradation model of the DC and RF characteristics of RF-nMOSFET (Hot electron에 의한 RF-nMOSFET의 DC및 RF 특성 열화 모델)

  • 이병진;홍성희;유종근;전석희;박종태
    • Journal of the Korean Institute of Telematics and Electronics D
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    • v.35D no.11
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    • pp.62-69
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    • 1998
  • The general degradation model has been applied to analyze the hot carrier induced degradation of the DC and RF characteristics of RF-nMOSFET. The degradation of cut-off frequency has been severer than the degradation of bulk MOSFET drain current. The value of the degradation rate n and the degradation parameter m for RF-nMOSFET has been equal to those for bulk MOSFET. The decrease of device degradation with the increase of fingers could be explained by the large source/drain parasitic resistance and drain saturation voltage. It has been also found that the RF performance degradation could be explained by the decrease of $g_{m}$ and $C_{gd}$ and the increase of $g_{ds}$ after stress. The degradation of the DC and RF characteristics of RF-nMOSFET could be predicted by the measurement of the substrate current.t.

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Effect of pH on the Degradation of 2, 4-Dinitrophenol in Sequencing Batch Reactor Process (연속회분식(連續回分式) 처리공정(處理工程)에 의한 2, 4-Dinitrophenol분해시(分解時) pH의 영향(影響))

  • Jo, Kwan-Hyung
    • Journal of Korean Society of Water and Wastewater
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    • v.12 no.1
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    • pp.96-101
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    • 1998
  • Substrate inhibition of 2,4-dinitrophenol (DNP) degradation was investigated using activated sludge which had been adapted to mineralize DNP. DNP is a metabolic uncoupler, preventing cells from making energy for growth and it has been suggested that pH may be important in mitigating effects of uncouplers. After acclimation of the activated sludge, the effect of pH on toxicity of DNP at high concentration (75 mg/L) was investigated, over a pH range of 5 to 9. DNP inhibition was found to be strongly dependent on mixed liquor pH. The DNP degradation rate was highest in the pH range of 6.95 to 7.84; at pH 5.94 degradation of 75 mg/L DNP was significantly inhibited; at pH < 5.77, DNP degradation was completely inhibited after approximately 30% of the DNP was degraded. By comparison, no significant effect of pH variation in the same range was seen on glucose uptake by the activated sludge culture.

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Hot-Carrier-Induced Degradation in Submicron MOS Transistors (Submicron MOS 트랜지스터의 뜨거운 운반자에 의한 노쇠현상)

  • 최병진;강광남
    • Journal of the Korean Institute of Telematics and Electronics
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    • v.25 no.7
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    • pp.780-790
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    • 1988
  • We have studied the hot-carrier-induced degradation caused by the high channel electric field due to the decrease of the gate length of MOSFET used in VLSI. Under DC stress, the condition in which maximum substrate current occures gave the worst degradation. Under AC dynamic stress, other conditions, the pulse shape and the falling rate, gave enormous effects on the degradation phenomena, especially at 77K. Threshold voltage, transconductance, channel conductance and gate current were measured and compared under various stress conditions. The threshold voltage was almost completely recovered by hot-injection stress as a reverse-stress. But, the transconductance was rapidly degraded under hot-hole injection and recovered by sequential hot-electron stress. The Si-SiO2 interface state density was analyzed by a charge pumping technique and the charge pumping current showed the same trend as the threshold voltage shift in degradation process.

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Analogue Substrate Cometabolism by Chemical Oxidation of Recalcitrant PAHs (난분해 PAHs의 화학적산화에 의한 유사기질동시대사)

  • 류선정;박갑성
    • Journal of Korea Soil Environment Society
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    • v.3 no.3
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    • pp.87-92
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    • 1998
  • The effect of chemically oxidized intermediates of Polynuclear Aromatic Hydrocarbon (PAH) compounds on the degradation of the parent PAHs was characterized and evaluated for the context of cooxidation. Anthracene and pyrene exhibited extensive degradation (mean percent removal of 57.5%) after 28 days of incubation by introducing the Fenton oxidation intermediate of the PAH compounds, while unoxidized anthracene and pyrene exhibited 12.5% removal The chemical oxidation products can serve as a structually similar analogue substrates for a consortia of soil microorganisms and as a metabolic intermediates in the biodegradation sequence of the parent PAH compounds. These results may be interpreted in the context of cooxidation mechanism whereby high recalcitrant PAH compounds are biodegraded in the soil and suggest a potential tool for bioremediation of PAHs contaminated soils and protection of groundwater.

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Circuit-Level Reliability Simulation and Its Applications (회로 레벨의 신뢰성 시뮬레이션 및 그 응용)

  • 천병식;최창훈;김경호
    • Journal of the Korean Institute of Telematics and Electronics A
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    • v.31A no.1
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    • pp.93-102
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    • 1994
  • This paper, presents SECRET(SEC REliability Tool), which predicts reliability problems related to the hot-carrier and electromigration effects on the submicron MOSFETs and interconnections. To simulate DC and AC lifetime for hot-carrier damaged devices, we have developed an accurate substrate current model with the geometric sensitivity, which has been verified over the wide ranges of transistor geometries. A guideline can be provided to design hot-carrier resistant circuits by the analysis of HOREL(HOT-carrier RFsistant Logic) effect, and circuit degradation with respect to physical parameter degradation such as the threshold voltage and the mobility can also be expected. In SECRET, DC and AC MTTF values of metal lines are calculated based on lossy transmission line analysis, and parasitic resistances, inductances and capacitances of metal lines are accurately considered when they operate in the condition of high speed. Also, circuit-level reliability simulation can be applied to the determination of metal line width and-that of optimal capacitor size in substrate bias generation circuit. Experimental results obtained from the several real circuits show that SECERT is very useful to estimate and analyze reliability problems.

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