• 제목/요약/키워드: substrate

검색결과 15,733건 처리시간 0.037초

Substrate 효과를 고려한 De-embedding Model (De-embedding Model including Substrate Effects)

  • 황의순;이동익;정웅
    • 대한전자공학회:학술대회논문집
    • /
    • 대한전자공학회 1999년도 하계종합학술대회 논문집
    • /
    • pp.895-898
    • /
    • 1999
  • Recently, small signal modeling of CMOS device becomes more difficult because the design rule goes into deep submicron. De-embedding of substrate parameters is important in order to use CMOS devices at RF frequencies. In this paper, we suggest a new de-embedding model with refined physical meaning and accuracy. In GaAs IC’s, the substrate is almost an insulator but Si substrate has the semiconducting characteristics. It offers some troubles if it is treated like GaAs substrate. The conducting substrate is modeled with five resistances, which leads to very accurate modeling so long as the pad layout is symmetrical. Frequency range is up to 39㎓ and fitting accuracy is as small as 0.00037 on least square errors.

  • PDF

펄스 레이저 증착법으로 성장된 ZnO 막의 광학 특성 (Optical Properties of ZnO Films Grown by Pulsed Laser Deposition)

  • 조신호
    • 한국전기전자재료학회:학술대회논문집
    • /
    • 한국전기전자재료학회 2005년도 추계학술대회 논문집 Vol.18
    • /
    • pp.113-114
    • /
    • 2005
  • We present the effect of substrate temperature on the structural and optical properties of ZnO films grown on sapphire substrate by pulsed laser deposition. Growing at higher substrate temperature results in an increase in the surface roughness. The optimum c-axis orientation of the ZnO films occurs at the substrate temperature of 700$^{\circ}C$ The decay time shows a rapid increase in the substrate temperature from 400$^{\circ}C$ to 500$^{\circ}C$ and falls down gradually as the substrate temperature is approached to 700$^{\circ}C$.

  • PDF

ZnO 기판 위에 Hydride Vapor-Phase Epitaxy법에 의한 GaN의 성장 (Growth of GaN on ZnO Substrate by Hydride Vapor-Phase Epitaxy)

  • 조성룡;김선태
    • 한국재료학회지
    • /
    • 제12권4호
    • /
    • pp.304-307
    • /
    • 2002
  • A zinc oxide (ZnO) single crystal was used as a substrate in the hydride vapor-phase epitaxy (HVPE) growth of GaN and the structural and optical properties of GaN layer were characterized by x- ray diffraction, transmission electron microscopy, secondary ion mass spectrometry, and photoluminescence (PL) analysis. Despite a good lattice match and an identical structure, ZnO is not an appropriate substrate for application of HVPE growth of GaN. Thick film could not be grown. The substrate reacted with process gases and Ga, being unstable at high temperatures. The crystallinity of ZnO substrate deteriorated seriously with growth time, and a thin alloy layer formed at the growth interface due to the reaction between ZnO and GaN. The PL from a GaN layer demonstrated the impurity contamination during growth possibly due to the out-diffusion from the substrate.

기판스테이지 온도에 관한 연구 (A Study on Substrate Stage Temperature)

  • 김선기;이우영;강흥석
    • 반도체디스플레이기술학회지
    • /
    • 제5권4호
    • /
    • pp.35-40
    • /
    • 2006
  • This paper shows that the effect of exposing on the top area and a solution which using a water circulation system. Semiconductor substrate stage is made from Aluminum and is repeated the sequence of exposing (150), turning OFF shutter, taking 30 sec. interval at the top area of stage. So the temperature of substrate temperature rises continuously. On this, we made a waterway at the inner part of the substrate stage and operated a water circulation system. We measured the temperature of a substrate stage surface with a thermocouple attached to the substrate stage. To analyze the top area's temperature, we used Analysis Program ANSYS for analysis and 3D CAD program Solid-Works for modeling.

  • PDF

반도체용 PCB 기판시스템의 구조해석 (Structural Analysis of a PCB Substrate System for Semiconductor)

  • 임경화;양손;윤종국;김영균;유선중
    • 반도체디스플레이기술학회지
    • /
    • 제10권4호
    • /
    • pp.113-118
    • /
    • 2011
  • According to the high accuracy of semiconductor equipments, PCB substrate with much thin thickness is required. However, it is very difficult to sustain the PCB substrate without deformation in case of horizontal installation, due to low bending stiffness. In this research, new PCB process equipment with vertical installation has been developed in order to solve the problem of PCB substrate damage during etching process. As the main parts of etching system on PCB substrate, PCB substrate and JIG are analyzed through finite element method and experimental test. Through the analysis results of stress state, we could find the optimal JIG design to make the damage as low as possible.

기판온도에 따른 (Ba,Sr)TiO$_3$ 박막의 구조적 특성 (Structural Properties of (Ba,Sr)TiO$_3$ Thin Films with Substrate Temperature)

  • 이상철;임성수;정장호;배선기;이영희
    • 한국전기전자재료학회:학술대회논문집
    • /
    • 한국전기전자재료학회 1999년도 춘계학술대회 논문집
    • /
    • pp.649-652
    • /
    • 1999
  • The (Ba, Sr)TiO$_3$(BST) thin films were fabricated on Pt/Ti/SiO$_2$/Si substrate by RF sputtering technique. The structural properties of the BST thin films were investigated with substrate temperature by XRD, SEM, EDS and AES depth profils. Increasing the substrate temperature, barium multi titanate phases were decreased. The BST thin film had a structure of perovskite type, and had peaks of (100), (200) at the substrate temperature of 50$0^{\circ}C$. When the BST thin films were deposited at the substrate temperature of 50$0^{\circ}C$, the composition ratio of Ba/sr was 52/48.

  • PDF

Wrinkling of a homogeneous thin solid film deposited on a functionally graded substrate

  • Noroozi, Masoud
    • Structural Engineering and Mechanics
    • /
    • 제74권2호
    • /
    • pp.215-225
    • /
    • 2020
  • Thin films easily wrinkle under compressive loading due to their small bending stiffness resulting from their tiny thickness. For a thin film deposited on a functionally graded substrate with non-uniform stiffness exponentially changes along the length span in this paper, the uniaxial wrinkling problem is solved analytically in terms of hyper-Bessel functions. For infinite, semi-infinite and finite length systems the wrinkling load and wrinkling wavenumber are determined and compared with those in literature. In comparison with a homogeneous substrate-bounded film in which the wrinkling pattern is uniform along the length span, for a functionally graded substrate-film system the wrinkles accumulate around the softer location of the functionally graded substrate. Therefore, the effective length of the film influenced by the wrinkles decreases, the amplitude of the wrinkles on softer regions of the functionally graded substrate grows and the wrinkling load of the functionally graded substrates with higher softening rate decreases more. The results of the current research are expected to be useful in science and technology of thin films and wrinkling of the structures especially living tissues.

Different formation of carbon nanofilaments as a function of the gap between the substrate and the microwave plasma

  • Kim Sung-Hoon
    • 한국결정성장학회지
    • /
    • 제16권1호
    • /
    • pp.20-24
    • /
    • 2006
  • Iridium-catalyzed carbon nanofilaments were formed on MgO substrate as a function of the gap between the substrate and the plasma using microwave plasma-enhanced chemical vapor deposition method. Under the remote plasma condition, carbon nanofibers were formed on the substrate. Under the adjacent plasma condition, on the other hand, carbon nanotubes-like materials instead of carbon nanofibers could be formed. When the substrate immersed into the plasma, any carbon nanofilaments formation couldn't be observed. During the reaction, the substrate temperatures were measured as a function of the gap. Based on these results, the cause for the different carbon nanofilaments formation according to the gap was discussed.

플라즈마 표면 처리에 의한 ITO 박막 제작 특성 (Characteristic of ITO thin film with plasma surface treatment)

  • 김상모;손인환;박상준;김경환
    • 한국전기전자재료학회:학술대회논문집
    • /
    • 한국전기전자재료학회 2007년도 추계학술대회 논문집
    • /
    • pp.404-405
    • /
    • 2007
  • Tin-doped indium thin film is outstanding material among transparent Conductive Oxide (TCO) materials. ITO thin films show a low electrical resistance(<$10^{-4}\;[{\Omega}{\cdot}m]$) and high transmittance(>80%) in the visible range. ITO thin films usually have been deposited on the glass substrate. In order to apply flexible display, the substrate should have the ability to bend and be deposited without substrate heat. Also properties of ITO thin film depend on what kind of substrate. In this study, we prepared ITO thin film on the polycarbonate (PC) substrate by using Facing Target Sputtering (FTS) system. Before deposition of ITO thin film, PC substrate took plasma surface treatment. The electrical and surface properties of as-deposited thin films were investigated by Hall Effect measurement, UV/VIS spectrometer and the surface property of substrate is investigated by Contact angle measurement.

  • PDF

Athermalized Polymeric Arrayed-Waveguide Grating by Partial Detachment from a Si Substrate

  • Lee, Jong-Moo;Ahn, Joon-Tae;Park, Sun-Tak;Lee, Myung-Hyun
    • ETRI Journal
    • /
    • 제26권3호
    • /
    • pp.281-284
    • /
    • 2004
  • We demonstrate a new fabrication method for adjusting the temperature dependence of a polymeric arrayed-waveguide grating (AWG) on a Si substrate. A temperature-dependent wavelength shift of-0.1nm/$^{\circ}C$ in a polymeric AWG on a Si substrate is reduced of+0.1nm/$^{\circ}C$ by detaching part of the polymer film, including the grating channel region of the AWG, from the Si substrate while the other parts remain fixed on the substrate.

  • PDF