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A Study on Taper Etching of Polysilicon-Part I : The Experimental Study (다결정실리콘의 경사식각에 관한 연구 - 제 1 부 : 실험적 고찰)

  • Lee, Jung-Kyu;Suh, Dong-Ryang;Byun, Jae-Dong
    • Journal of the Korean Institute of Telematics and Electronics
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    • v.26 no.7
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    • pp.50-57
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    • 1989
  • Tapered etching of polysilicon films has been achieved by implanting phosphorus ions into the polysilicon film and using plasma etch in either $CF_4-O_2\;or\;SF_6$. A two-step plasma etching method is also proposed to control the taper angle of the etched edge without changing the implantion conditions. The taper angle is determined by the ratio of the etch rate of the undamaged region to that of the damaged top region of the polysilicon layer. The ratio is found to be dependent on the implantion dose, the implantion energy and the anisotropy of etching. The minimum angle in our experiments is about $10^{\circ}$. When the two-step etching method is employed, the taper angles can be controlled from the minimum angle up to about $55^{\circ}$.

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Color Interpolation Algorithm for Pixel Resolution Modus of Image Sensor (영상센서의 출력 해상도 모드를 고려한 색상 보간 알고리즘)

  • Kim, Bu-Gong;Kim, Moon-Cheol
    • Journal of the Institute of Electronics and Information Engineers
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    • v.51 no.9
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    • pp.129-138
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    • 2014
  • Various interpolations for digital imaging devices with a single image sensor have proposed. However, conventional methods did not consider the resolution modus of image sensor using periodic sampling. Therefore, the resulting images have problems such as quality degradation and color artifacts(color moire, zipper). In this paper, we propose a color interpolation algorithm for pixel resolution modus of image sensor. The proposed algorithm consisted of an initial step to compensate edge prediction effectively and refinement step using minimum directions for pixel resolution modus. To analyze a result of the proposed algorithm with conventional methods, we evaluated subjectively using images quality comparison and objectively using PSNR(Peak Signal to Noise Ratio). Experimental results showed that the proposed algorithm was more successful in eliminating the color artifacts than conventional methods judged by both objective and subjective criteria.

Smartphone Based Retouching Method for Watercolor Painting Effect Using Mean Shift Segmentation (Mean Shift Segmentation을 이용한 스마트폰 기반의 수채화 효과 변환 기법)

  • Lee, Sang-Geol;Kim, Cheol-Ki;Cha, Eui-Young
    • Proceedings of the Korean Institute of Information and Commucation Sciences Conference
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    • 2010.10a
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    • pp.206-208
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    • 2010
  • We propose a retouching method that converts a photography taken by smartphone to a watercolor painting image using bilateral filtering and mean shift segmentation which are mostly used in image processing. The first step is to convert an input image to fit the screen resolution of smartphone. And next step is to weaken high frequency components of the image, while preserving the edge of image using the bilateral filtering. And after that we perform mean shift segmentation from the bilateral filtered image. We apply parameters of mean shift segmentation considering the processing speed of smartphone. Experimental result shows that our method can be applied to various types of image and bring better result.

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A Study on sub 0.1$\mu\textrm{m}$ ULSI Device Quality Using Novel Titanium Silicide Formation Process & STI (새로운 티타늅 실리사이드 형성공정과 STI를 이용한 서브 0,1$\mu\textrm{m}$ ULSI급 소자의 특성연구)

  • Eom, Geum-Yong;O, Hwan-Sul
    • Journal of the Institute of Electronics Engineers of Korea SD
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    • v.39 no.5
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    • pp.1-7
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    • 2002
  • Deep sub-micron bulk CMOS circuits require gate electrode materials such as metal silicide and titanium silicide for gate oxides. Many authors have conducted research to improve the quality of the sub-micron gate oxide. However, few have reported on the electrical quality and reliability of an ultra-thin gate. In this paper, we will recommend a novel shallow trench isolation structure and a two-step TiS $i_2$ formation process to improve the corner metal oxide semiconductor field-effect transistor (MOSFET) for sub-0.1${\mu}{\textrm}{m}$ VLSI devices. Differently from using normal LOCOS technology, deep sub-micron CMOS devices using the novel shallow trench isolation (STI) technology have unique "inverse narrow-channel effects" when the channel width of the device is scaled down. The titanium silicide process has problems because fluorine contamination caused by the gate sidewall etching inhibits the silicide reaction and accelerates agglomeration. To resolve these Problems, we developed a novel two-step deposited silicide process. The key point of this process is the deposition and subsequent removal of titanium before the titanium silicide process. It was found by using focused ion beam transmission electron microscopy that the STI structure improved the narrow channel effect and reduced the junction leakage current and threshold voltage at the edge of the channel. In terms of transistor characteristics, we also obtained a low gate voltage variation and a low trap density, saturation current, some more to be large transconductance at the channel for sub-0.1${\mu}{\textrm}{m}$ VLSI devices.

Improvement in the Quality of Ultrasonographic Images Using Wavelet Conversion and a Boundary Detection Filter (Wavelet 변환과 경계선 검출 필터를 이용한 초음파 영상의 화질증대)

  • Han, Dong-Kyun;Rhim, Jae-Dong;Lee, Jun-Haeng
    • Journal of the Korean Society of Radiology
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    • v.2 no.1
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    • pp.23-29
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    • 2008
  • The present study proposed a method that dissolves ultrasonographic images into multiple resolutions using wavelet conversion and a boundary detection filter and improves the quality of ultrasonographic images through boundary detection filtering. In order to reduce noises and strengthen edges, the proposed method adjusted selectivity coefficient by area step by step from a low resolution image obtained from wavelet converted images to a high resolution image and performed edge filtering in consideration of direction. Through this method, we generated a selective low pass filtering effect in areas except edges by decreasing the wavelet coefficient for pixels in spot areas, improved continuity by smoothing edges in the tangential direction, and enhanced contrast by thinning in the normal direction. Through an experiment, we compared the filtering method using a non linear anisotropic expansion model and the filtering method using wavelet contraction structure in single resolution.

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A study on suspension state matrix to improve load/unload performance (로드/언로드 성능향상을 위한 서스펜션 상태행렬 연구)

  • Lee, Yong-Hyun;Kim, Ki-Hoon;Kim, Seok-Hwan;Park, No-Cheol;Park, Young-Pil;Park, Kyoung-Su;Kim, Cheol-Soon
    • Transactions of the Society of Information Storage Systems
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    • v.5 no.1
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    • pp.47-52
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    • 2009
  • Most hard disk drives that apply the ramp load/unload technology unload the heads at the outer edge of the disk while the disk is rotating. The load/unload includes the benefits as like an increased areal density, a reduced power consumption and an improved shock resistance. A lot of papers investigating the effects of the various load/unload parameters such as a suspension tab, a limiter, a ramp and air-bearing surface designs have been published. However, in previous researches, an effect of the suspension is not considered at each load/unload step. In this paper, we focus that a variation of the state matrix affects the load/unload performance on based on a state matrix that is a stiffness matrix of the suspension. Because the state matrix is related to the suspension at each load/unload step, to change the state matrix means the structural change of the suspension. Therefore, we investigated a range of a pitch static attitude(PSA) and a roll static attitude(RSA) for load/unload performance. We also analyzed an effect of the variation of the state matrix a range of load/unload velocity occurred a slider-disk contact. We determined the variation of the state matrix to improve the load/unload performance through comparison of each factor of state matrix.

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Optical Structures of Multilayer Coatings of Antireflection Lenses and their Transmission Characteristics (무반사 렌즈용 다층박막의 광학적 구조 및 광투과 특성)

  • 김상열;최성숙
    • Korean Journal of Optics and Photonics
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    • v.6 no.4
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    • pp.259-265
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    • 1995
  • Antireflection coatings on optical lenses commertially available in domestic market are optically analyzed. Transmission spectra and reflection spectra are collected using spectrophotometers. The apparent absorption spectra around the absorption band edge are dominated by the substrate absorption. The reflection spectra and the apparent absorption spectra at visible region between 400nm and 700nm show very strong correlation to each other except a couple samples. The discrepency observed in the latters are due to an increased absorption in visible region by the substrate, which is negative effect of these samples. An antireflection coating consisted of $SiO_2/TiO_2/SiO_2/ZrO_2/Cr$ is made on c-Si substrate for spectroscopic ellispometry analysis. A film-by-film coating is accomplished and between each film deposition, ex-situ spectroscopic ellipsometry measurements are made. The analysis of the spectroscopic ellipsometry data reveals that the average film densities of $ZrO_2$ and $TiO_2$ reach only 80% of their respective packing densities and thick films are inhomogeneous along film growth direction. Discussions are made toward in-situ, real-time monitoring of the film growth so that a real-time feedback is possible to achieve a post-correction to minor deviations occured in the previous step. step.

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Characteristics of Plasma Sprayed BSCCO Superconductor Coatings with Annealing Time After Partial Melt Process (BSCCO 플라즈마 용사피막의 부분용융열처리 후 어닐링 시간에 따른 초전도 특성)

  • Park, Jeong-Sik;Lee, Seon-Hong;Park, Kyeung-Chae
    • Korean Journal of Materials Research
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    • v.24 no.2
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    • pp.116-122
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    • 2014
  • $Bi_2Sr_2CaCu_2O_x$(Bi-2212) and $Bi_2Sr_2Ca_2Cu_3O_y$(Bi-2223) high-Tc superconductors(HTS) have been manufactured by plasma spraying, partial melt process(PMP) and annealing treatment(AT). A Bi-2212/2223 HTS coating layer was synthesized through the peritectic reaction between a 0212 oxide coating layer and 2001 oxide coating layer by the PMP-AT process. The 2212 HTS layer consists of whiskers grown in the diffusion direction. The Bi-2223 phase and secondary phase in the Bi-2212 layer were observed. The secondary phase was distributed uniformly over the whole layer. As annealing time goes on, the Bi-2212 phase decreases with mis-orientation and irregular shape, but the Bi-2223 phase increases because a new Bi-2223 phase is formed inside the pre-existing Bi-2212 crystals, and because of the nucleation of a Bi-2223 phase at the edge of Bi-2212 crystals by diffusion of Ca and Cu-O bilayers. In this study the spray coated layer showed superconducting transitions with an onset Tc of about both 115 K, and 50 K. There were two steps. Step 1 at 115 K is due to the diamagnetism of the Bi-2223 phase and step 2 at 50 K is due to the diamagnetism of the Bi-2212 phase.

The Size Correction Method of Eyes Region using Morphing (모핑을 이용한 눈 영역 크기 보정 기법)

  • Goo, Eun-jin;Cha, Eui-young
    • Proceedings of the Korean Institute of Information and Commucation Sciences Conference
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    • 2013.10a
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    • pp.83-86
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    • 2013
  • In this paper, by using the Morphing, if the size of the eyes of both sides are not the same, we propose a method to correct the size of eyes area. First, by using the Haar-like feature from a input image that is input, to detect the shape of the eyes and face. After inverting the left and right eye region of one of the shape of the eyes detected sets the correspondence between the second with a line to control the shape of the eyes detected using eyes that is detected with canny edge, in the previous step. To the Warping to match the correspondence was then set in the previous step, an area of each eye. Then, I merge the image which merged in the eye area is detected from the original image. As a result, a system result of the experiment in the test image and face image seen from the front, the proposed, prove to be more efficient than a method of keying the size of the eye only.

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Minimum Movement of a Robot for Sorting on a Cycle (사이클 상에서 정렬을 위한 로봇의 최소 움직임)

  • Kim, Jae-Hoon
    • Journal of the Korea Institute of Information and Communication Engineering
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    • v.21 no.2
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    • pp.429-434
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    • 2017
  • In a graph G=(V, E) with n vertices, there is an unique box which is finally laid on each vertex. Thus each vertex and box is both numbered from 1 to n and the box i should be laid on the vertex i. But, the box ${\pi}$(i) is initially located on the vertex i according to a permutation ${\pi}$. In each step, the robot can walk along an edge of G and can carry at most one box at a time. Also when arriving at a vertex, the robot can swap the box placed there with the box it is carrying. The problem is to minimize the total step so that every vertex has its own box, that is, the shuffled boxes are sorted. In this paper, we shall find an upper bound of the minimum number of steps and show that the movement of the robot is found in $O(n^2)$ time when G is a cycle.