• 제목/요약/키워드: spray pyrolysis deposition

검색결과 52건 처리시간 0.026초

NiCrAl 합금 폼의 안정성 향상을 위해 코팅된 Nb-doped TiO2의 효과 (The Effect of Nb-doped TiO2 Coating for Improving Stability of NiCrAl Alloy Foam)

  • 조현기;신동요;안효진
    • 한국재료학회지
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    • 제29권5호
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    • pp.328-335
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    • 2019
  • Nb-doped $TiO_2$(NTO) coated NiCrAl alloy foam for hydrogen production is prepared using ultrasonic spray pyrolysis deposition(USPD) method. To optimize the size and distribution of NTO particles based on good physical and chemical stability, we synthesize particles by adjusting the weight ratio of the Nb precursor solution(5 wt%, 10 wt% and 15 wt%). The morphological, chemical bonding, and structural properties of the NTO coated NiCrAl alloy foam are investigated by X-ray diffraction(XRD), X-ray photo-electron spectroscopy(XPS), and Field-Emission Scanning Electron Microscopy(FESEM). As a result, the samples of controlled Nb weight ratio exhibit a common diffraction pattern at ${\sim}25.3^{\circ}$, corresponding to the(101) plane, and have chemical bonding(O-Nb=O) at 534 eV. The NTO particles with the optimum weight ratio of N (10 wt%) show a uniform distribution with a size of ~18.2-21.0 nm. In addition, they exhibit the highest corrosion resistance even in the electrochemical stability estimation. As a result, the introduction of NTO coated NiCrAl alloy foam by USPD improves the chemical stability of the NiCrAl alloy foam by protecting the direct electrochemical reaction between the foam and the electrolyte. Thus, the optimized NTO coating can be proposed for excellent protection of NiCrAl alloy foam for hydrocarbon-based steam methane reforming(SMR).

초음파 분무 열분해 증착 중 기판 회전 속도에 따른 플루오린 도핑 된 주석산화물 막의 전기적 및 광학적 특성 (Electrical and Optical Properties of Fluorine-Doped Tin Oxide Films Fabricated at Different Substrate Rotating Speeds during Ultrasonic Spray Pyrolysis Deposition)

  • 이기원;조명훈;안효진
    • 한국재료학회지
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    • 제34권1호
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    • pp.55-62
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    • 2024
  • Fluorine-doped tin oxide (FTO) has been used as a representative transparent conductive oxide (TCO) in various optoelectronic applications, including light emitting diodes, solar cells, photo-detectors, and electrochromic devices. The FTO plays an important role in providing electron transfer between active layers and external circuits while maintaining high transmittance in the devices. Herein, we report the effects of substrate rotation speed on the electrical and optical properties of FTO films during ultrasonic spray pyrolysis deposition (USPD). The substrate rotation speeds were adjusted to 2, 6, 10, and 14 rpm. As the substrate rotation speed increased from 2 to 14 rpm, the FTO films exhibited different film morphologies, including crystallite size, surface roughness, crystal texture, and film thickness. This FTO film engineering can be attributed to the variable nucleation and growth behaviors of FTO crystallites according to substrate rotation speeds during USPD. Among the FTO films with different substrate rotation speeds, the FTO film fabricated at 6 rpm showed the best optimized TCO characteristics when considering both electrical (sheet resistance of 13.73 Ω/□) and optical (average transmittance of 86.76 % at 400~700 nm) properties with a figure of merit (0.018 Ω-1).

CdS 박막제작 및 그 특성(발광 및 수광 소자 응용을 위한에 II-VI족 화합물 반도체들의 접착에 관한 기초연구) (Growth and Properties of CdS Thin films(A Study on the adhesion of II-VI compound semiconductor for applications in light emitting and absorbing devices))

  • Kang, Hyun-Shik;Cho, Ji-Eun;Kim, Kyung-Wha
    • 태양에너지
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    • 제17권2호
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    • pp.55-66
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    • 1997
  • CdTe/CdS 태양전지 제작에 필요한 다결정 CdS 박막을 ITO 전도 유리기판위에 SSD법, SPD법 및 CBD법 으로 제작하고 열처리 한 후 그 결정구조와 광학적 특성을 조사하였다. 박막은 모두 Wurtzite 구조를 보였고 SSD법과 CBD법의 박막은 $0.5{\mu}m$ 크기의 CdS 입자가 불규칙적으로 형성되어 증착되어 있음을 보였고, $400^{\circ}C$로 진공중에서 열처리 할 때 입자의 크기가 약간 증가하였다. SPD법의 박막은 (002)방향으로 결정이 성장되고 입자의 크기가 $0.1-0.3{\mu}m$ 이었다. 에너지 밴드갭 및 결함 상태를 광학적 흡수, 광 루미니센스, 라만 및 광 열 편기 스펙트럼(PDS) 측정을 통해 조사하였다.

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그래핀 옥사이드의 에어로졸 분무열분해 공정을 통한 면직물의 전기전도성 및 물성 평가 (Application and Functionalization of Graphene Oxide on Cotton Fabric Via Aerosol Spray Pyrolysis)

  • 엄현지;조길수
    • 한국의류산업학회지
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    • 제24권1호
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    • pp.138-145
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    • 2022
  • Today, graphene loaded textiles are being considered promising smart clothing due to their high conductivity. In this study, we reported reduced graphene oxide(r-GO) deposited pure cotton fabrics fabricated with a colloidal solution of graphene(GO), using a one-step aerosol spray pyrolysis(ASP) process and their potential application on smart textiles. The ASP process is advantageous in that it is easily implementable and can be applied for continuous processing. Moreover, this process has never been applied to deposit r-GO on pure cotton fabric. The field emission-scanning microscopy (FE-SEM) observation, Fourier transform-infrared(FT-IR) analysis, Raman spectroscopy, X-ray diffraction(XRD) analysis, and ultraviolet transmittance(UVT) were used to evaluate material properties of the r-GO colloids. The resistance was also measured to evaluate the electrical conductivity of the specimens. The results revealed that the r-GO was successfully deposed on specimens, and the specimen with the highest electrical conductivity demonstrated an electrical resistance value of 2.27 kΩ/sq. Taken together, the results revealed that the ASP method demonstrated a high potential for effective deposition of r-GO on cotton fabric specimens and is a prospect for the development of conductive cotton-based smart clothing. Therefore, this study is also meaningful in that the ASP process can be newly applied by depositing r-GO on the pure cotton fabric.

Sn과 SnO 박막을 이용한 SnxSy 박막 합성

  • 김태훈;김정주;이준형;허영우
    • 한국진공학회:학술대회논문집
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    • 한국진공학회 2016년도 제50회 동계 정기학술대회 초록집
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    • pp.266.1-266.1
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    • 2016
  • 최근 태양전지에 대한 연구가 활발하기 이루어지고 있다. 그 중 본 연구에선 태양전지에 사용될 광흡수층에 대한 연구로 광흡수층은 광흡수계수와 밴드갭의 영향을 받고 SnS가 적합한 특성을 지니고 있다고 판단하여 이에 대한 합성과 특성에 대한 연구를 진행 하였다. SnxSy 박막은 Electrochemical deposition, Spray pyrolysis deposition, Furnace를 이용하는 등 다양한 방법이 있다. 이러한 방법들은 대부분 막질이 좋지 않다고 알려져 있는데 그 중 Furnace를 이용하는 방법은 간단하며 넓은 면적에 쉽게 증착이 가능하다는 장점이 있지만 S의 양과 온도에 민감하다. 본 연구에서는 Sn과 SnO 박막을 전구체로 사용하였으며 S의 양과 온도를 조절하여 로를 이용하여 합성하였다. 이에 대한 조성 및 구조적 특성을 분석하기 위해 XRD를 전기적 특성을 확인하기 위하여 Hall effect measurement를 통하여 측정하였다.

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Laser Ablated Carbon Thin Film from Carbon Nanotubes and Their Property Studies

  • Sharon, Maheshwar;Rusop, M.;Soga, T.;Afre, Rakesh A.
    • Carbon letters
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    • 제9권1호
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    • pp.17-22
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    • 2008
  • A carbon nanotube (CNT) of diameter ~20 nm has been synthesized by spray pyrolysis of turpentine oil using Ni/Fe catalyst. Pellet of CNTs has been used as a target to produce semiconducting carbon thin film of band gap 1.4 eV. Presence of oxygen pressure in the pulse laser deposition (PLD) chamber helped to control the $sp^3/sp^2$ ratio to achieve the desired band gap. Results are discussed with the help of Raman spectra, SEM TEM micrographs and optical measurements suggest that semiconducting carbon thin film deposited by PLD technique has retained its nanotubes structure except that its diameter has increased from 20 nm to 150 nm.

SOx 가스감지용 SAW 가스 센서 개발 (Development of SAW Gas Sensor for Monitoring SOx Gas)

  • 이찬우;노용래;정종식;백성기
    • 센서학회지
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    • 제5권3호
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    • pp.41-48
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    • 1996
  • SOx 가스를 고감도로 감지할 수 있는 SAW 가스 센서를 개발하였다. 이는 SAW device 위에 SOx 가스에 감응하는 재료를 박막으로 증착함으로써 고감도의 마이크로 센서형으로 한 것이다. SOx 감응 재료로서 CdS를 선정하였으며, 이를 SAW device 위에 박막화하기 위해 초음파 분무 노즐을 이용한 분무 열분해의 박막 증착공정을 응용하였다. 초음파 분무 노즐을 통하여 생성된 균일하고 미세한 입자들은 기판위에서 안정한 열분해 환경을 조성함으로써 센서 감응막을 위한 넓은 표면적의 박막을 증착 시켰는데 기판의 온도는 $300^{\circ}C$ 내외에서 최소 50 nm수준의 결정립의 박막을 얻었다. 이렇게 하여 얻은 SAW 가스 센서는 $SO_{2}$ 가스에 감응하였으며 재현성도 보였다. 다른 가스의 존재하에서 $SO_{2}$ 가스에 대한 선택성에 관하여는 계속적인 연구가 필요하다.

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Effect of Sulfurization on CIGS Thin Films by RF Magnetron Sputtering Using a Cu(In1-xGax)Se2 Single Target

  • Jung, Sung Hee;Chung, Chee Won
    • 한국진공학회:학술대회논문집
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    • 한국진공학회 2013년도 제44회 동계 정기학술대회 초록집
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    • pp.675-675
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    • 2013
  • CIGS thin films have received a great attention as a promising material for solar cells due to their high absorption coefficient, appropriate bandgap, long-term stability, and low cost production. CIGS thin films have been deposited by various methods such as co-evaporation, sputtering, spray pyrolysis and electro-deposition. In this study, Cu(In,Ga)Se2(CIGS) thin films were prepared using a single quaternary target by rf magnetron sputtering. The effect of sulfurization on the structural, compositional and electrical properties of the films was examined in order to develop the deposition process. An optimal sulfurization process will be selected for the preparation of CIGS thin films with good structural, optical and electrical properties by applying various sulfurization processes. In addition, the electrical properties of CIGS thin films were investigated by post-deposition annealing process. The carrier concentration of CIG(SSe) thin films after sulfurization was increased from $10^{14}cm^{-3}$ to $10^{16}cm^{-3}$ and the resistivity was increased from 10 ${\Omega}cm$ to $10^3$ ${\Omega}cm$. It is confirmed that CIG(SSe) thin films prepared at optimal deposition condition have similar atomic ratio to the target value after sulfurization.

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Aerosol Jet Deposition of $CuInS_2$ Thin Films

  • Fan, Rong;Kong, Seon-Mi;Kim, Dong-Chan;Chung, Chee-Won
    • 한국진공학회:학술대회논문집
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    • 한국진공학회 2011년도 제40회 동계학술대회 초록집
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    • pp.159-159
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    • 2011
  • Among the semiconductor ternary compounds in the I-III-$VI_2$ series, $CulnS_2$ ($CulnSe_2$) are one of the promising materials for photovoltaic applications because of the suitability of their electrical and optical properties. The $CuInS_2$ thin film is one of I-III-$VI_2$ type semiconductors, which crystallizes in the chalcopyrite structure. Its direct band gap of 1.5 eV, high absorption coefficient and environmental viewpoint that $CuInS_2$ does not contain any toxic constituents make it suitable for terrestrial photovoltaic applications. A variety of techniques have been applied to deposit $CuInS_2$ thin films, such as single/double source evaporation, coevaporation, rf sputtering, chemical vapor deposition and chemical spray pyrolysis. This is the first report that $CuInS_2$ thin films have been prepared by Aerosol Jet Deposition (AJD) technique which is a novel and attractive method because thin films with high deposition rate can be grown at very low cost. In this study, $CuInS_2$ thin films have been prepared by Aerosol Jet Deposition (AJD) method which employs a nozzle expansion. The mixed fluid is expanded through the nozzle into the chamber evacuated in a lower pressure to deposit $CuInS_2$ films on Mo coated glass substrate. In this AJD system, the characteristics of $CuInS_2$ films are dependent on various deposition parameters, such as compositional ratio of precursor solution, flow rate of carrier gas, stagnation pressure, substrate temperature, nozzle shape, nozzle size and chamber pressure, etc. In this report, $CuInS_2$ thin films are deposited using the deposition parameters such as the compositional ratio of the precursor solution and the substrate temperature. The deposited $CuInS_2$ thin films will be analyzed in terms of deposition rate, crystal structure, and optical properties.

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안티몬 도핑된 주석 산화물 투명전도막의 몰 농도에 따른 치밀한 표면 구조 제조 (Fabrication of compact surface structure by molar concentration on Sb-doped SnO2 transparent conducting films)

  • 배주원;구본율;안효진
    • 한국분말재료학회지
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    • 제25권1호
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    • pp.54-59
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    • 2018
  • Sb-doped $SnO_2$ (ATO) transparent conducting films are fabricated using horizontal ultrasonic spray pyrolysis deposition (HUSPD) to form uniform and compact film structures with homogeneously supplied precursor solution. To optimize the molar concentration and transparent conducting performance of the ATO films using HUSPD, we use precursor solutions of 0.15, 0.20, 0.25, and 0.30 M. As the molar concentration increases, the resultant ATO films exhibit more compact surface structures because of the larger crystallite sizes and higher ATO crystallinity because of the greater thickness from the accelerated growth of ATO. Thus, the ATO films prepared at 0.25 M have the best transparent conducting performance ($12.60{\pm}0.21{\Omega}/{\square}$ sheet resistance and 80.83% optical transmittance) and the highest figure-of-merit value ($9.44{\pm}0.17{\times}10^{-3}{\Omega}^{-1}$). The improvement in transparent conducting performance is attributed to the enhanced carrier concentration by the improved ATO crystallinity and Hall mobility with the compact surface structure and preferred (211) orientation, ascribed to the accelerated growth of ATO at the optimized molar concentration. Therefore, ATO films fabricated using HUSPD are transparent conducting film candidates for optoelectronic devices.