• Title/Summary/Keyword: space plasma

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ESTIMATE OF CORONAL MAGNETIC FIELD STRENGTH USING PLASMOID ACCELERATION MEASUREMENT

  • Jang, Min-Hwan;Choe, G.S.;Lee, K.S.;Moon, Y.J.;Kim, Kap-Sung
    • Journal of The Korean Astronomical Society
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    • v.42 no.6
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    • pp.175-184
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    • 2009
  • A method of estimating the lower bound of coronal magnetic field strength in the neighborhood of an ejecting plasmoid is presented. Based on the assumption that the plasma ejecta is within a magnetic island, an analytical expression for the force acting on the ejecta is derived. The method is applied to a limb coronal mass ejection event, and a lower bound of the magnetic field strength just below the CME core is estimated. The method is expected to provide useful information on the strength of reconnecting magnetic field if applied to X-ray plasma ejecta.

Development of Space Divided PE-ALD System and Process Design for Gap-Fill Process in Advanced Memory Devices (차세대 메모리 디바이스Gap-Fill 공정 위한 공간 분할 PE-ALD개발 및 공정 설계)

  • Lee, Baek-Ju;Hwang, Jae-Soon;Seo, Dong-Won;Choi, Jae-Wook
    • Journal of the Korean institute of surface engineering
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    • v.53 no.3
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    • pp.124-129
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    • 2020
  • This study is for the development of high temperature ALD SiO2 film process, optimized for gap-fill process in manufacturing memory products, using a space-divided PE-ALD system equipped with an independent control dual plasma system and orbital moving unit. Space divided PE-ALD System has high productivity, and various applications can be applied according to Top Lid Design. But space divided ALD system has a limitation to realize concentric deposition map due to process influence due to disk rotation. In order to solve this problem, we developed an orbit rotation moving unit in which disk and wafer. Also we used Independent dual plasma system to enhance thin film properties. Improve productivity and film density for gap-fill process by having deposition and surface treatment in one cycle. Optimize deposition process for gap-fill patterns with different depths by utilizing our independently controlled dual plasma system to insert N2and/or He plasma during surface treatment, Provide void-free gap-fill process for high aspect ratio gap-fill patterns (up to 50:1) with convex curvature by adjusting deposition and surface treatment recipe in a cycle.

Plasma Uniformity Analysis of Inductively Coupled Plasma Assisted Magnetron Sputtering by a 2D Voltage Probe Array

  • Joo, Junghoon
    • Applied Science and Convergence Technology
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    • v.23 no.4
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    • pp.161-168
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    • 2014
  • A real-time monitoring of immersed antenna type inductively coupled plasma (ICP) was done with a homemade 2 dimensional voltage probe array to check the uniformity of the plasma. Measured voltage values with a high impedance voltmeter are close to the floating potential of the plasma. As the substrate carrier was moving into a magnetron sputtering plasma diffusive from a $125mm{\times}625mm$ size cathode, measured results showed reliably separation of plasma into the upper and lower empty space over the carrier. Infra red thermal imaging camera was used to observe the cross corner effect in situ without eroding a target to the end of the usage. 3 dimensional particle trace model was used to analyze the magnetron discharge's behavior.

NEW FRONTIERS IN THERMAL PLASMAS FROM SPACE TO NANOMATERIALS

  • Boulos, Maher I.
    • Nuclear Engineering and Technology
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    • v.44 no.1
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    • pp.1-8
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    • 2012
  • Thermal plasma technology has been at the center of major developments over the past century. It has found numerous applications ranging from aerospace materials testing to nanopowder synthesis and processing. In the present review highlights of principal breakthroughs in this field are presented with emphasis on an analysis of the basic phenomena involved, and the potential of the technology for industrial scale applications.

Analysis of Electromagnetic Fields Radiated from an Aperture on Conducting Plane Covered with a Moving Plasma Layer (운동중인 플라즈마 층으로 덮인 평면 도체성의 개구면에 의한 복사전자계 해석)

  • 김남태;이상설
    • Journal of the Korean Institute of Telematics and Electronics A
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    • v.28A no.9
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    • pp.715-720
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    • 1991
  • The electromagnetic fields radiated from an aperture on a conducting plance covered with a moving uniaxial plasma layer are analyzed. From wave equations in moving plasma and free space region, their solutions are obtained and radiation fields are determined by applying proper boundary conditions in each region. For a particular case of isotropic plasma layer, our results correspond to well-known results.

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Dusty Plasmas-from space to semiconductor & display industries (더스티 플라즈마 연구 동향)

  • Chai, Kil-Byoung
    • Vacuum Magazine
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    • v.4 no.2
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    • pp.4-9
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    • 2017
  • Dusty plasmas consisting of electrons, ions, neutral gas molecules, and small solid-state 'dust' particles are ubiquitous. Examples include plasma processing, fusion plasmas, polar mesospheric clouds, Saturn's rings, comet tails, and protoplanetary disks. Since Voyager I and II discovered dusty plasmas in our solar system, dusty plasmas have been extensively studied from space & basic sciences to semiconductor & display industries. Here, a brief review on dusty plasma research is given and some remarkable results are introduced.