• Title/Summary/Keyword: source resistance

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Study on the Calculation of Towing Force for LNG Bunkering Barge (LNG 벙커링 바지의 예인력 계산에 관한 연구)

  • Oh, Seung-Hoon;Jung, Jae-Hwan;Hwang, Sung-Chul;Jung, Hyun-Woo;Cho, Seok-Kyu;Jung, Dong-Ho
    • Proceedings of the Korean Institute of Navigation and Port Research Conference
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    • 2018.11a
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    • pp.158-161
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    • 2018
  • In this paper, the towing force is calculated for the LNG bunker barge. LNG bunkering barge is being developed as an infrastructure for the bunkering of LNG(Liquefied Natural Gas), an eco-friendly energy source. In the case of the LNG bunker barge, a self-propulsion is considered through retrofit from an operating point. Therefore, the LNG bunker barge is similar to the shape of the ship as compared to a towed barge, so a rule of the towed barge overestimates the towing force. In order to improve accuracy, the calm water resistance is calculated according to the ITTC 1978 method considering the wave resistance by the Rankine source method. The added resistance in waves is calculated using the modified radiated energy method considering the shortwave correction method of NMRI. The performance of the towing resistances through the calm water resistance and the added resistance in waves was compared with rules of the towed barge.

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Study on the Estimation of Towing Force for LNG Bunkering Barge (LNG 벙커링 바지의 예인력 산정에 관한 연구)

  • Oh, Seung-Hoon;Jung, Dong-Ho;Jung, Jae-Hwan;Hwang, Sung-Chul;Cho, Seok-Kyu;Sung, Hong-Gun
    • Journal of Navigation and Port Research
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    • v.42 no.6
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    • pp.378-387
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    • 2018
  • In this paper, the towing force for the LNG bunkering barge was investigated. Currently, LNG bunkering barge is being developed as an infrastructure for the bunkering of LNG (Liquefied Natural Gas), an eco-friendly energy source. In the case of the LNG bunkering barge, self-propulsion is considered through retrofit from an operating point. Therefore, the LNG bunkering barge's shape is similar to that of the ship as compared to a towed barge, so a rule of the towed barge overestimates the towing force. In order to improve accuracy, the calm water resistance was calculated using ITTC 1978 method which considers wave resistance by the Rankine source method. The added resistance in waves was calculated using the modified radiated energy method which considers the shortwave correction method of NMRI. The performance of the towing resistances through the calm water resistance and the added resistance in waves was compared to rules associated with towed barges.

Genetics of Fusarium Wilt Resistance in Pigeonpea (Cajanus cajan) and Efficacy of Associated SSR Markers

  • Singh, Deepu;Sinha, B.;Rai, V.P.;Singh, M.N.;Singh, D.K.;Kumar, R.;Singh, A.K.
    • The Plant Pathology Journal
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    • v.32 no.2
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    • pp.95-101
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    • 2016
  • Inheritance of resistance to Fusarium wilt (FW) disease caused by Fusarium udum was investigated in pigeonpea using four different long duration FW resistant genotypes viz., BDN-2004-1, BDN-2001-9, BWR-133 and IPA-234. Based on the $F_2$ segregation pattern, FW resistance has been reported to be governed by one dominant gene in BDN-2004-1 and BDN-2001-9, two duplicate dominant genes in BWR-133 and two dominant complimentary genes in resistance source IPA-234. Further, the efficacy of six simple sequence repeat (SSR) markers namely, ASSR-1, ASSR-23, ASSR-148, ASSR-229, ASSR-363 and ASSR-366 reported to be associated with FW resistance were also tested and concluded that markers ASSR-1, ASSR-23, ASSR-148 will be used for screening of parental genotypes in pigeonpea FW resistance breeding programs. The information on genetics of FW resistance generated from this study would be used, to introgress FW resistance into susceptible but highly adopted cultivars through marker-assisted backcross breeding and in conventional breeding programs.

Inheritance of Cyst Nematode Resistance in a New Genetic Source, Glycine max PI 494182

  • Arelli, Prakash R.;Wang, Dechun
    • Journal of Crop Science and Biotechnology
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    • v.11 no.3
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    • pp.177-180
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    • 2008
  • Worldwide, cyst nematode(Heterodera glycines Ichinohe) is the most destructive pathogen of cultivated soybean. In the USA, current annual yield losses are estimated to be nearly a billion dollars. Crop losses are primarily reduced by the use of resistant cultivars. Nematode populations are variable and have adapted to reproduce on resistant cultivars over time because resistance primarily traces to two soybean accessions. It is important to use diverse resistance sources to develop new nematode resistant cultivars. Soybean PI 494182 is a recent introduction from Japan and found to be resistant to multiple nematode populations. It is yellow seeded and maturity group 0. We have determined inheritance of resistance in PI 494182 using $F_{2:3}$ families derived from cross PI 494182 X cv. Skylla. Skylla is a susceptible parent. Three nematode populations, races 1, 3, and 5, corresponding to HG types 2.5.7, 0, and 2.5.7 were used to bioassay 162 $F_{2:3}$ families in greenhouse experiments. Based on Chi-square tests, a two-gene model is proposed for resistance to race 1 and a three-gene model is proposed for conditioning resistance to both races 3 and 5. Correlation coefficient analysis indicated that some genes conditioning resistance to races 1, 3, and 5 are shared or closely linked with each other. These results will be useful to soybean breeders for developing soybean cultivars for broad resistance to nematodes.

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Study on Memristive Characteristics in Electronic Devices Based on Vanadium Dioxide Thin Films Using 966nm Laser Pulses (966nm 레이저 펄스를 이용한 바나듐 이산화물 박막 기반 전자 소자에서의 멤리스터 특성에 관한 연구)

  • Kim, Jihoon;Lee, Yong Wook
    • Journal of the Korean Institute of Illuminating and Electrical Installation Engineers
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    • v.29 no.11
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    • pp.59-65
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    • 2015
  • By harnessing the thermal hysteresis behavior of vanadium dioxide($VO_2$), we demonstrated multi-resistance states in a two-terminal electronic device based on a $VO_2$ thin film by using a 966nm infrared laser diode as an excitation light source for resistance modulation. Before stimulating the device using 966nm laser pulses, the thermal hysteresis behavior of the device resistance was measured by using a temperature chamber. After that, the $VO_2$ device was thermally biased at ${\sim}71.6^{\circ}C$ so that its temperature fell into the thermal hysteresis region of the device resistance. Six multi-states of the device resistance could be obtained in the fabricated $VO_2$ device by five successive laser pulses with equal 10ms duration and increasing power. Each resistance states were maintained while the temperature bias was applied. And, the resistance fluctuation level was within 2.2% of the stabilized resistance and decreased down to less than 0.9% of the stabilized resistance 5s after the illumination.

Development of an Optimum Hull Form for a Container Ship with Minimum Wave Resistance (최소 조파저항을 가지는 컨테이너선의 선형최적화 기법에 대한 연구)

  • 최희종;서광철;김방은;전호환
    • Journal of the Society of Naval Architects of Korea
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    • v.40 no.4
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    • pp.8-15
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    • 2003
  • This paper presents the method for developing an optimum hull form with minimum wave resistance using SQP(sequential quadratic programming) as an optimization technique. The wave resistance is evaluated by a Rankine source panel method with non-linear free surface conditions and the ITTC 1957 friction line is used to predict the frictional resistance coefficient. The geometry of the hull surface is represented and modified using B-spline surface patches. The optimization method is applied to Series 60 hull and KCS(KRISO 3600 TEU Container Ship). The obtained results prove that the method is appropriate for preliminary hull form design.

Hydrodynamic Hull Form Design Using an Optimization Technique

  • Park, Dong-Woo;Choi, Hee-Jong
    • International Journal of Ocean System Engineering
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    • v.3 no.1
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    • pp.1-9
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    • 2013
  • A design procedure for a ship with minimum resistance had been developed using a numerical optimization method called SQP (Sequential Quadratic Programming) combined with computational fluid dynamics (CFD) technique. The frictional resistance coefficient was estimated by the ITTC 1957 model-ship correlation line formula and the wave-making resistance coefficient was evaluated by the potential-flow panel method with the nonlinear free surface boundary conditions. The geometry of the hull surface was represented and modified by B-spline surface modeling technique during the optimization process. The Series 60 ($C_B$=0.60) hull was selected as a parent hull to obtain an optimized hull that produces minimum resistance. The models of the parent and optimized hull forms were tested at calm water condition in order to demonstrate the validity of the proposed methodolgy.

Effects of some factors on the thermal-dissipation characteristics of high-power LED packages

  • Ji, Peng Fei;Moon, Cheol-Hee
    • Journal of Information Display
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    • v.13 no.1
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    • pp.1-6
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    • 2012
  • Decreasing the thermal resistance is the critical issue for high-brightness light-emitting diodes. In this paper, the effects of some design factors, such as chip size (24 and 35 mil), substrate material (AlN and high-temperature co-fired ceramic), and die-attach material (Ag epoxy and PbSn solder), on the thermal-dissipation characteristics were investigated. Using the thermal transient method, the temperature sensitivity parameter, $R_{th}$ (thermal resistance), and junction temperature were estimated. The 35-mil chip showed better thermal dissipation, leading to lower thermal resistance and lower junction temperature, owing to its smaller heat source density compared with that of the 24-mil chip. By adopting an AlN substrate and a PbSn solder, which have higher thermal conductivity, the thermal resistance of the 24-mil chip can be decreased and can be made the same as that of the 35-mil chip.

Resistance distribution in large area thin film type SFCLS (박막형 대면적 초전도 한류소자에서의 저항 분포)

  • 김혜림;최효상;현옥배
    • Progress in Superconductivity and Cryogenics
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    • v.4 no.1
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    • pp.89-93
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    • 2002
  • We investigated the resistance distribution n 4"diameter SFCLS. $YBa_2CU_3O_7$ films coated in-situ with a gold layer were patterned into 3 mm wide 142 cm long meander lines by Photolithography. The limiters were tested with simulated fault currents. The resistance was uniform all over the film except at the edge. At lower source voltages, CFCLs did not quench simultaneously and the resistance distribution was less uniform. Compared with 2" diameter SFCLS 4" SFCLS had similar values and time dependence of resistivity at similar electric fields The resistance distribution was more uniform in 4" SFCLS. The area at the edge where the distribution was not uniform was around 3 mm wide in SFCLs of both sizes. The experimental results were quantitatively explained with a heat transfer concept.

Electrical Properties of Renewable Energy Carbon Film for Light Source Technology (광원 적용을 위한 신재생에너지 카본 박막의 전기적 특성)

  • Lee Sang-Heon
    • The Transactions of the Korean Institute of Electrical Engineers C
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    • v.54 no.12
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    • pp.558-560
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    • 2005
  • The carbon film was deposited by the electrolysis of methanol solution. Carbon films have been grown on silicon substrates using the method of chemical process. From investigations of the Raman spectroscopy and the FTIR spectroscopy, the carbon film deposited by the electrolysis was identified the hydrogenated carbon film with the porous structure. The carbon film deposited by elctrolysis of methanol was identified as the hydrogenated carbon film with porous structure. Deposition parameters for the growth of the carbon films were current density, methanol liquid temperature. We electrical resistance and surface morphology of carbon films formed various conditions specified by deposition parameters. It was clarified that the high electrical resistance carbon films with smooth surface morphology are grown when a distance between the electrodes is relatively wider. We found that the electrical resistance in the films independent of both current density and methanol liquid temperature. The temperature dependence of the electrical resistance in the low resistance carbon films is different from one obtained in graphite..