Resistance distribution in large area thin film type SFCLS

박막형 대면적 초전도 한류소자에서의 저항 분포

  • 김혜림 (한전전력연구원 신에너지그룹 책임연구원) ;
  • 최효상 (한전전력연구원 신에너지그룹 책임연구원) ;
  • 현옥배 (한전전력연구원 신에너지그룹 위촉연구원)
  • Published : 2002.05.01

Abstract

We investigated the resistance distribution n 4"diameter SFCLS. $YBa_2CU_3O_7$ films coated in-situ with a gold layer were patterned into 3 mm wide 142 cm long meander lines by Photolithography. The limiters were tested with simulated fault currents. The resistance was uniform all over the film except at the edge. At lower source voltages, CFCLs did not quench simultaneously and the resistance distribution was less uniform. Compared with 2" diameter SFCLS 4" SFCLS had similar values and time dependence of resistivity at similar electric fields The resistance distribution was more uniform in 4" SFCLS. The area at the edge where the distribution was not uniform was around 3 mm wide in SFCLs of both sizes. The experimental results were quantitatively explained with a heat transfer concept.

Keywords

References

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