• 한국정보디스플레이학회:학술대회논문집
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• 한국정보디스플레이학회 2007년도 7th International Meeting on Information Display 제7권1호
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• pp.316-319
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• 2007

In this paper, high precision molding process was developed using a soft mold to fabricate fine closed-types of the barrier ribs for PDP. A green sheet was employed to fabricate the barrier ribs in this process. The soft mold with good demolding characteristics was replicated from a master mold. An optimal forming load which would not fracture the soft mold was also determined. The barrier ribs of rectangular type with upper width of $30\;{\mu}m$ would be fabricated by this process.

• 한국정밀공학회:학술대회논문집
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• 한국정밀공학회 2012년도 춘계학술대회 논문집
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• pp.489-490
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• 2012

• 반도체디스플레이기술학회지
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• 제10권4호
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• pp.53-59
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• 2011

Recently there have been considerable attentions on nanoimprint lithography (NIL) by the display device and semiconductor industry due to its potential abilities that enable cost-effective and high-throughput nanofabrication. Although one of the current major research trends of NIL is large-area patterning, the technical difficulties to keep the uniformity of the residual layer become severer as the imprinting area increases more and more. In this paper we focused on the deformation of the $2^{nd}$ generation TFT-LCD sized ($370{\times}470mm^2$) large-area soft mold in the UV imprinting process. A mold was fabricated with PDMS(Poly-dimethyl Siloxane) layered glass back plate(t0.5). Besides, the mold includes large surrounding wall type protrusions of 1.9 mm width and the via-hole(7 ${\mu}m$ diameter) patterend area. The large surrounding wall type protrusions cause the proximity effect which severely degrades the uniformity of residual layer in the via-hole patterend area. Therefore the deformation of the mold was calculated by finite element analysis to assess the effect of large surrounding wall type protrusions and the flexiblity of the mold. The deformation of soft mold was verified by the measurements qualitatively.

• 한국정보디스플레이학회:학술대회논문집
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• 한국정보디스플레이학회 2002년도 International Meeting on Information Display
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• pp.639-642
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• 2002

A new PDP barrier rib formation technique was investigated utilizing transparent soft maid made of silicon resin. Transparent soft mold was fabricated by pouring a silicone resin into the base mold made with photosensitive glass. The photosensitive barrier rib paste was coated on the glass substrate and dried in a 90 $^{\circ}C$ convection oven for 20min. The transparent soft mold was pressed on top of the semi-dry barrier rib layer and then irradiated with a UV lamp to a total dose of $900{\sim}1000mJ/cm^2$ The soft maid was then removed from the pressed barrier rib by winding up and fine pattern of barrier rib was obtained. The photosensitive barrier rib paste makes the demolding easy due to reduced interfacial forces and shrinking of paste materials.

• 한국표면공학회지
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• 제50권6호
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• pp.480-485
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• 2017

Soft mold imprinting method that uses nanostructured polymer mold was investigated for anti-reflection film fabrication. The nanostructured soft mold was polyethylene terephthalate(PET) irradiated by oxygen ion beams. The collisional energy transfer between oxygen ion and the polymer surface induced cross-linking and scission reactions, resulting in self-organized nanostructures with regular patterns of the wavenumber of $5{\mu}m^{-1}$. Post processes including ultra-violet curable resin coating and delamination fabricated anti-reflection films. The imprinted resin surface also showed the consistent wavenumber, $5{\mu}m^{-1}$. Pristine PET, oxygen ion beam treated PET, and imprinted replica sample showed total transmittance of 91.04, 93.25, and 93.57-93.88%, respectively.

• 한국정밀공학회:학술대회논문집
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• 한국정밀공학회 2013년도 춘계학술대회 논문집
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• pp.633-634
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• 2013

• 한국정밀공학회:학술대회논문집
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• 한국정밀공학회 2008년도 춘계학술대회 논문집
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• pp.589-590
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• 2008

• 마이크로전자및패키징학회지
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• 제21권2호
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• pp.85-89
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• 2014

본 연구에서는 자기 소프트 몰드를 이용하여 피치 143.59 nm의 고 성능 NWGP(Nano Wire Grid Polarizer) 필름의 새로운 제조 방법을 제안하였다. 제작된 편광필름은 $6cm{\times}6cm$의 PET기판위에 알루미늄 격자 구조를 가지고 있으며, 이는 TFT-LCD(Thin Flat Transistor Liquid Crystal Display)에 응용 가능할 것으로 보인다. 자기 소프트 몰드는 너비 70.39 nm의 규격으로 제작되었으며, 이를 이용하여 2단계의 복제과정을 거쳐 제작되어진다. 이를 통해 본 연구에서는 기판위에 75.68 nm 선폭과 64.76 nm의 높이 143.59 nm pitch를 가지는 격자구조의 NWGP 패턴을 제작하였다. 또한, 이는 800 nm 파장 영역 대에서 75%의 최대 투과율과 10%의 최소 투과율을 가지는 것을 확인하였다. 따라서, 본 공정을 통해 독창적인 저 비용의 나노패터닝 기술로 디스플레이 산업에서 적용되어 질 것으로 보여진다.

• 한국분말재료학회지
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• 제14권3호
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• pp.202-207
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• 2007

Novel polymer mold process for fabrication of microcomponents using metal nanopowders was developed and experimentally optimized. Polymer mold for forming green components was produced by using a hard master mold and polydimethylsiloxane (PDMS). In the preparation of metallic powder premix for the green components without any defect, 90 wt.% 17-4PH statinless steel nanopowders and 10 wt.% organic binder were mixed by a ball milling process. The green components with very clear gear shape were formed by filling the powder premix into the PDMS soft mold in surrounding at about $100^{\circ}C$. Cold isostatic pressing (CIP) was very potent process to decrease a porosity in the sintered microcomponent. The microgear fabricated by the improved process showed a good dimension tolerance of about 1.2%.

• Elastomers and Composites
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• 제39권4호
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• pp.286-293
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• 2004

경도를 달리하는 에스테르계 및 에테르계 열가소성 폴리우레탄(thermoplastic polyurethane: TPU)의 사출에서 금형 온도가 물리적 성질에 미치는 영향을 조사하였다. TPU의 연질부 유리전이온도는 금형 온도 변화에 따라 거의 변화하지 않았으며, 연질부와 경질부의 상분리는 금형온도의 영향을 별로 받지 않는 것으로 판단되었다. 그러나 에스테르계와 에테르계 TPU는 종류에 관계없이 공통적으로 경도가 높은 TPU들은 금형온도를 높이는 경우 결정성, 고무상 평탄 온도영역, 인장강도가 감소하였으나, 경도가 낮은 TPU들은 오히려 결정성, 고무상 평탄 온도영역, 인장강도의 증가를 보였다. TPU의 사출 성형 금형 온도에 따른 물리적 성질의 차이를 결정성 경질부의 결정화와 물리적 가교효과 차이로 해석하였다.