Browse > Article
http://dx.doi.org/10.5695/JKISE.2017.50.6.480

Soft Mold Imprinting Fabrication of Anti-reflection Film using Self-Organized Nanostructure Polymer Surfaces Irradiated by Ion Beams  

Lee, Seunghun (Surface Technology Department, Korea Institute of Materials Science)
Byeon, Eun-Yeon (Surface Technology Department, Korea Institute of Materials Science)
Choi, Juyeon (Surface Technology Department, Korea Institute of Materials Science)
Jung, Sunghoon (Surface Technology Department, Korea Institute of Materials Science)
Yu, Byeong-Gil (JPE)
Kim, Do-Geun (Surface Technology Department, Korea Institute of Materials Science)
Publication Information
Journal of the Korean institute of surface engineering / v.50, no.6, 2017 , pp. 480-485 More about this Journal
Abstract
Soft mold imprinting method that uses nanostructured polymer mold was investigated for anti-reflection film fabrication. The nanostructured soft mold was polyethylene terephthalate(PET) irradiated by oxygen ion beams. The collisional energy transfer between oxygen ion and the polymer surface induced cross-linking and scission reactions, resulting in self-organized nanostructures with regular patterns of the wavenumber of $5{\mu}m^{-1}$. Post processes including ultra-violet curable resin coating and delamination fabricated anti-reflection films. The imprinted resin surface also showed the consistent wavenumber, $5{\mu}m^{-1}$. Pristine PET, oxygen ion beam treated PET, and imprinted replica sample showed total transmittance of 91.04, 93.25, and 93.57-93.88%, respectively.
Keywords
Anti-reflection; Nano structure; Polymer; Ion beam; Soft mold;
Citations & Related Records
연도 인용수 순위
  • Reference
1 K Choi, S H Park, Y M Song, Y T Lee, C K Hwangbo, H Yang and H S Lee, Nano-tailoring the surface structure for the monolithic highperformance antireflection polymer film, Adv. Mater. 22 (2010) 3713-3718.   DOI
2 P Lalanne and G M Morris, Antireflection behavior of silicon subwavelength periodic structures for visible light, Nanotechnology 8 (1997) 53.   DOI
3 K Nakamura, I Amimori, H Hokazono and J Watanabe, Anti-glare and anti-reflection film, polarizing plate, and image display device, U.S. Patent No. 6,693,746. 17 Feb. (2004).
4 K-S Han, J-H Shin, W-Y Yoon and H Lee, Enhanced performance of solar cells with antireflection layer fabricated by nano-imprint lithography, Sol. Energy Mater. Sol. Cells 95 (2011) 288-291.   DOI
5 J Zhang, S Shen, X X Dong and L S Chen, Lowcost fabrication of large area sub-wavelength antireflective structures on polymer film using a soft PUA mold, Opt. Express 22 (2014) 1842-1851.   DOI
6 M C Coen, R Lehmann, P Groening and L Schlapbach, Modification of the micro-and nanotopography of several polymers by plasma treatments, Appl. Surf. Sci. 207 (2003) 276-286.   DOI
7 J Yun, T S Bae, S Lee, S Lee, J Rha and G H Lee, Interface between oxide coatings and plasmadamaged polymers and its effects on coating adhesion and structure, Plasma Process. Polym. 9 (2012) 135-48.   DOI
8 J Cai and L Qi, Recent advances in antireflective surfaces based on nanostructure arrays, Mater. Horizons 2 (2015) 37-53.   DOI
9 S Lee, E-Y Byun, J-K Kim and D-G Kim, Ar and $O_2$ linear ion beam PET treatments using an anode layer ion source, Curr. Appl. Phys. 14 (2014) S180-S182.   DOI
10 C Bohm and J Perrin, Retarding-field analyzer for measurements of ion energy distributions and secondary electron emission coefficients in lowpressure radio frequency discharges, Rev. Sci. Instrum. 64 (1993) 31-44.   DOI
11 J F Ziegler M D Ziegler and J P Biersack, SRIM - The stopping and range of ions in matter, Nucl. Instruments Methods Phys. Res. Sect. B Beam Interact. with Mater. Atoms 268 (2010) 1818-1823.   DOI
12 D F McMillen and D M Golden, Hydrocarbon bond dissociation energies, Annu. Rev. Phys. Chem. 33 (1982) 493-532.   DOI
13 A Hossinger, Simulation of ion implantation for ULSI technology, Thesis (2000) Technische Univ. Wien, Wien (Austria).