• Title/Summary/Keyword: single crystalline

Search Result 681, Processing Time 0.031 seconds

Contact Resistance Analysis of High-Sheet-Resistance-Emitter Silicon Solar Cells (고면저항 에미터 결정질 실리콘 태양전지의 전면전극 접촉저항 분석)

  • Ahn, Jun-Yong;Cheong, Ju-Hwa;Do, Young-Gu;Kim, Min-Seo;Jeong, Ji-Weon
    • New & Renewable Energy
    • /
    • v.4 no.2
    • /
    • pp.74-80
    • /
    • 2008
  • To improve the blue responses of screen-printed single crystalline silicon solar cells, we investigated an emitter etch-back technique to obtain high emitter sheet resistances, where the defective dead layer on the emitter surface was etched and became thinner as the etch-back time increased, resulting in the monotonous increase of short circuit current and open circuit voltage. We found that an optimal etch-back time should be determined to achieve the maximal performance enhancement because of fill factor decrease due to a series resistance increment mainly affected by contact and lateral resistance in this case. To elucidate the reason for the fill factor decrease, we studied the resistance analysis by potential mapping to determine the contact and the lateral series resistance. As a result, we found that the fill factor decrease was attributed to the relatively fast increase of contact resistance due to the dead layer thinning down with the lowest contact resistivity when the emitter was contacted with screen-printed silver electrode.

  • PDF

Growth behavior and optical property of ZnO epitaxial films (ZnO 에피 박막의 성장 거동과 광 특성)

  • Kang Seung Min
    • Journal of the Korean Crystal Growth and Crystal Technology
    • /
    • v.14 no.6
    • /
    • pp.253-256
    • /
    • 2004
  • Growth of ZnO epitaxial films have been carried out on (0001) sapphire substrates by RF magnetron sputtering. The single crystalline ZnO films of the thickness about 400-500 mm were grown successfully. At the various substrate temperatures of 200~$600^{\circ}C$, the growth behavior and optical properties of the epitaxial films have been characterized. As-grown ZnO films were annealed at the temperatures of 400, 600 and $800^{\circ}C$ respectively in order to characterize the optical properties. The carrier concentration of ZnO films annealed at the temperature of $600^{\circ}C$ was measured $2.6${\times}$10^{16}\textrm{cm}^{-3}$ by Hall measurements.

Influence of Surface Morphology and Substrate on Thermal Stability and Desorption Behavior of Octanethiol Self-Assembled Monolayers

  • Ito, Eisuke;Gang, Hun-Gu;Ito, Hiromi;Hara, Masahiko;No, Jae-Geun
    • Proceedings of the Korean Vacuum Society Conference
    • /
    • 2012.08a
    • /
    • pp.219-219
    • /
    • 2012
  • The formation and thermal desorption behaviors of octanethiol (OT) SAMs on single crystalline Au (111) and polycrystalline Au, Ag, and Cu substrates were examined by X-ray photoelectron microscopy (XPS), thermal desorption spectroscopy (TDS), and contact angle (CA) measurements. XPS and CA measurements revealed that the adsorption of octanethiol (OT) molecules on these metals led to the formation of chemisorbed self-assembled monolayers (SAMs). Three main desorption fragments for dioctyl disulfide (C8SSC8+, dimer), octanethiolate (C8S+), and octanethiol (C8SH+) were monitored using TDS to understand the effects of surface morphology and the nature of metal substrates on the thermal desorption behavior of alkanethiols. TDS measurements showed that a sharp dimer peak with a very strong intensity on single crystalline Au (111) surface was dominantly observed at 370 K, whereas a broad peak on the polycrystalline Au surface was observed at 405 K. On the other hand, desorption behaviors of octanethiolates and octanethiols were quite similar. We concluded that substrate morphology strongly affects the dimerization process of alkanethiolates on Au surfaces. We also found that desorption intensity of the dimer is in the order of Au>>Ag>Cu, suggesting that the dimerization process occurs efficiently when the sulfur-metal bond has a more covalent character (Au) rather than an ionic character (Ag and Cu).

  • PDF

Extended Sacrificial Bulk Micromachining Process and Its Application to the Fabrication of X-axis Single-crystalline Silicon Micro-gyroscope

  • Kim, Jong-Pal;Park, Sang-Jun;Kwak, Dong-Hun;Ko, Hyoung-Ho;Song, Tae-Yong;Setiadi, Dadi;Carr, William;Buss, James;Dancho, Dong-Il
    • 제어로봇시스템학회:학술대회논문집
    • /
    • 2003.10a
    • /
    • pp.1547-1552
    • /
    • 2003
  • In this paper, we present a planar single-crystalline silicon x-axis micro-gyroscope fabricated with a perfectly aligned vertical actuation combs on one silicon wafer, using the extended SBM technology. The fabricated x-axis micro-gyroscope has the resolution of 0.1 deg/sec, the bandwidth of 100 Hz. These research results allow integrating 6 axes inertial measurement (3 accelerations and 3 angular rates) on the same silicon substrate using the same process for the first time.

  • PDF

Facile Synthesis of CdTe Nanorods from the Growth of Te Nanorods

  • Xu, Weiwei;Niu, Jinzhong;Zheng, Shuang;Tian, Guimin;Wu, Xinghui;Cheng, Yongguang;Hu, Xiaoyang;Liu, Shuaishuai;Hao, Haoshan
    • Journal of the Korean Chemical Society
    • /
    • v.61 no.4
    • /
    • pp.185-190
    • /
    • 2017
  • One-dimensional CdTe nanorods (NRs) are obtained by the reaction of various Cd precursors with single crystalline Te nanorod templates, which are pre-synthesized from Te precursors by a simple and reproducible solvothermal method. Throughout the process, the diffraction intensity of different crystal facets of single crystalline Te NRs varied with reaction times. Finally, by alloying Cd ions along the axial direction of Te NRs, polycrystalline cubic phase CdTe NRs with diameters of 80-150 nm and length up to $1.2-2.4{\mu}m$ are obtained. The nucleation and growth processes of Te and CdTe NRs are discussed in details, and their properties are characterized by XRD, SEM, TEM, Raman scattering, and UV-vis absorption spectra. It was found that the key elements of synthesizing CdTe NRs such as reaction temperatures and Cd sources will strongly influence the final shape of CdTe NRs.

Optically transparent and electrically conductive indium-tin-oxide nanowires for transparent photodetectors

  • Kim, Hyunki;Park, Wanghee;Ban, Dongkyun;Kim, Hong-Sik;Patel, Malkeshkumar;Yadav, Pankaj;Kim, Joondong
    • Proceedings of the Korean Vacuum Society Conference
    • /
    • 2016.02a
    • /
    • pp.390.2-390.2
    • /
    • 2016
  • Single crystalline indium-tin-oxide (ITO) nanowires (NWs) were grown by sputtering method. A thin Ni film of 5 nm was coated before ITO sputtering. Thermal treatment forms Ni nanoparticles, which act as templates to diffuse Ni into the sputtered ITO layer to grow single crystalline ITO NWs. Highly optical transparent photoelectric devices were realized by using a transparent metal-oxide semiconductor heterojunction by combining of p-type NiO and n-type ZnO. A functional template of ITO nanowires was applied to this transparent heterojunction device to enlarge the light-reactive surface. The ITO NWs/n-ZnO/p-NiO heterojunction device provided a significant high rectification ratio of 275 with a considerably low reverse saturation current of 0.2 nA. The optical transparency was about 80% for visible wavelengths, however showed an excellent blocking UV light. The nanostructured transparent heterojunction devices were applied for UV photodetectors to show ultra fast photoresponses with a rise time of 8.3 mS and a fall time of 20 ms, respectively. We suggest this transparent and super-performing UV responser can practically applied in transparent electronics and smart window applications.

  • PDF

Synthesis and Analysis of Ge2Sb2Te5 Nanowire Phase Change Memory Devices

  • Lee, Jun-Yeong;Kim, Jeong-Hyeon;Jeon, Deok-Jin;Han, Jae-Hyeon;Yeo, Jong-Seok
    • Proceedings of the Korean Vacuum Society Conference
    • /
    • 2015.08a
    • /
    • pp.222.2-222.2
    • /
    • 2015
  • A $Ge_2Sb_2Te_5$ nanowire (GST NW) phase change memory device is investigated with Joule heating electrodes. GST is the most promising phase change materials, thus has been studied for decades but atomic structure transition in the phase-change area of single crystalline phase-change material has not been clearly investigated. We fabricated a phase change memory (PCM) device consisting of GST NWs connected with WN electrodes. The GST NW has switching performance with the reset/set resistance ratio above $10^3$. We directly observed the changes in atomic structure between the ordered hexagonal close packed (HCP) structure and disordered amorphous phase of a reset-stop GST NW with cross-sectional STEM analysis. Amorphous areas are detected at the center of NW and side areas adjacent to heating electrodes. Direct imaging of phase change area verified the atomic structure transition from the migration and disordering of Ge and Sb atoms. Even with the repeated phase transitions, periodic arrangement of Te atoms is not significantly changed, thus acting as a template for recrystallization. This result provides a novel understanding on the phase-change mechanism in single crystalline phase-change materials.

  • PDF

CONTACT RESISTANCE ANALYSIS OF HIGH-SHEET-RESISTANCE-EMITTER SILICON SOLAR CELLS (고면저항 에미터 결정질 실리콘 태양전지의 전면전극 접촉저항 분석)

  • Ahn, Jun-Yong;Cheong, Ju-Hwa;Do, Young-Gu;Kim, Min-Seo;Jeong, Ji-Weon
    • 한국신재생에너지학회:학술대회논문집
    • /
    • 2008.05a
    • /
    • pp.390-393
    • /
    • 2008
  • To improve the blue responses of screen-printed single crystalline silicon solar cells, we investigated an emitter etch-back technique to obtain high emitter sheet resistances, where the defective dead layer on the emitter surface was etched and became thinner as the etch-back time increased, resulting in the monotonous increase of short circuit current and open circuit voltage. We found that an optimal etch-back time should be determined to achieve the maximal performance enhancement because of fill factor decrease due to a series resistance increment mainly affected by contact and lateral resistance in this case. To elucidate the reason for the fill factor decrease, we studied the resistance analysis by potential mapping to determine the contact and the lateral series resistance. As a result, we found that the fill factor decrease was attributed to the relatively fast increase of contact resistance due to the dead layer thinning down with the lowest contact resistivity when the emitter was contacted with screen-printed silver electrode.

  • PDF

A study on the $ALU^+$ crystalline solar cell characteristics affected by counts of rear side screen printings ($ALU^+$를 이용한 결정질 태양전지 후면 전극 Screen Printing 횟수에 따른 특성)

  • Choi, Jaewoo;Kim, Hyunyup;Yi, Junsin
    • 한국신재생에너지학회:학술대회논문집
    • /
    • 2011.05a
    • /
    • pp.123.1-123.1
    • /
    • 2011
  • 기존의 p-type 태양전지 공정과 유사한 공정으로 제작되는 n-type $ALU^+$태양전지는 후면에 Al을 screen printing하여 emitter층을 형성한 구조이다. screen printing은 공정의 단순화와 제조 단가의 저비용으로 인해, metalization 공정에서 많이 쓰이고 있다. 본 연구에서는 양산 가능한 n-type $ALU^+$태양전지 제작을 위해, 후면 Al emitter 층을 single, dobule, triple로 변경하며 Al의 양을 가변하였고, 그에 따른 특성의 변화를 연구하였다. screen printing 횟수가 변경된 후면 Al emitter 층의 특성은 DIV와 LIV 측정을 통해 분석하였다. 실험 결과 Al을 single printing 하였을 때보다, double, triple printing을 통하여 Al의 양을 증가하였을 때, DIV 데이터에서 직렬저항(Rs)가 $24.44{\Omega}/cm^2$에서 $0.31{\Omega}/cm^2$으로 감소하였고, 단락전류(Jsc)는 1.26mA/$cm^2$에서 37.7mA/$cm^2$으로 약 300% 증가한 것을 확인할 수 있었다. 프린팅 횟수에 따른 LIV 데이터의 Fill Factor를 분석하게 되면, double printing이 64.35%로 54.75%의 triple printing보다 약 1.17배 더 향상된 것으로 확인하였다. 이러한 결과를 바탕으로 후면 Al emitter 형성시에 Al의 양이 적절하지 못한 이유로, Al emitter가 제대로 형성되지 못하거나 과하게 형성되면, 태양전지 내부에 누설 저항의 변화와 누설 전류의 증가로 인해, 단락전류(Jsc)와 Fill Factor 감소의 주요 원인이 된다는 것을 확인할 수 있었다.

  • PDF

Application of Screen Printing and Photo Lithography Multi-layer Metal Contact for Single Crystalline Silicon Solar Cells (단결정 실리콘 태양전지를 위한 screen printing 전극과 photo lithography 다층전극의 적용에 대한 연구)

  • Kim, Do-Wan;Choi, Jun-Young;Lee, Eun-Joo;Lee, Soo-Hong
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
    • /
    • 2006.11a
    • /
    • pp.109-109
    • /
    • 2006
  • Screen printing (SP) metal contact is typically applied to the solar cells for mass production. However, SP metal contact has low aspect ratio, low accuracy, hard control of the substrate penetration and unclean process. On the other hand, photo lithograpy (PL) metal contact can reduce defects by metal contact. In this investigation, PL metal contact was obtained the multi-layer structure of Ti/Pd/Ag by e-beam process. We applied SP metal contact and PL metal contact to single crystalline silicon solar cells, and demonstrated the difference of conversion efficiency. Because PL metal contact silicon solar cell has Jsc (short circuit current density) better than silicon solar cell applied SP metal contact.

  • PDF