• Title/Summary/Keyword: silicon content

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Precise Property Control in Silicon Nitride Ceramics by $\alpha$/$\beta$ Phase Ratio Control

  • Kawaoka, H.;Kusunose, T.;Choa, Y-H.;Sekino, T.;Niihara, K.
    • Proceedings of the Korea Association of Crystal Growth Conference
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    • 2000.06a
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    • pp.59-64
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    • 2000
  • Silicon nitride ceramics with various α/β phase ratio were fabricated by controlling sintering conditions of PECS process. Mechanical properties varied systematically with α/β ratio. Young's modulus and hardness increased with α-Si₃N₄ volume fraction, and fracture strength and toughness increased with β-Si₃N₄ content.

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Plasma Resistance and Etch Mechanism of High Purity SiC under Fluorocarbon Plasma

  • Jang, Mi-Ran;Paek, Yeong-Kyeun;Lee, Sung-Min
    • Journal of the Korean Ceramic Society
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    • v.49 no.4
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    • pp.328-332
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    • 2012
  • Etch rates of Si and high purity SiC have been compared for various fluorocarbon plasmas. The relative plasma resistance of SiC, which is defined as the etch rate ratio of Si to SiC, varied between 1.4 and 4.1, showing generally higher plasma resistance of SiC. High resolution X-ray photoelectron analysis revealed that etched SiC has a surface carbon content higher than that of etched Si, resulting in a thicker fluorocarbon polymer layer on the SiC surface. The plasma resistance of SiC was correlated with this thick fluorocarbon polymer layer, which reduced the reaction probability of fluorine-containing species in the plasma with silicon from the SiC substrate. The remnant carbon after the removal of Si as volatile etch products augments the surface carbon, and seems to be the origin of the higher plasma resistance of SiC.

Edge Cut Process for Reducing Ni Content at Channel Edge Region in Metal Induced Lateral Crystallization Poly-Si TFTs

  • SEOK, Ki Hwan;Kim, Hyung Yoon;Park, Jae Hyo;Lee, Sol Kyu;Lee, Yong Hee;Joo, Seung Ki
    • JSTS:Journal of Semiconductor Technology and Science
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    • v.16 no.2
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    • pp.166-171
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    • 2016
  • Nickel silicide is main issue in Polycrystalline silicon Thin Film Transistor (TFT) which is made by Metal Induced Lateral Crystallization (MILC) method. This Nickel silicide acts as a defect center, and this defect is one of the biggest reason of the high leakage current. In this research, we fabricated polycrystalline TFTs with novel method called Edge Cut (EC). With this new fabrication method, we assumed that nickel silicide at the edge of the channel region is reduced. Electrical properties are measured and trap state density also calculated using Levinson & Proano method.

Effect of Silicon in Steels and Galvannealing Heat Cycles on Powdering Behavior of High Strength Galvannealed Steels (고강도 용융아연 도금강판의 파우더링 특성에 미치는 실리콘 및 합금화 열처리의 영향)

  • 이호종;오용택;김종상
    • Journal of the Korean institute of surface engineering
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    • v.33 no.2
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    • pp.135-144
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    • 2000
  • Hot-dip galvannealed sheet (GA) with high strength of $45kg/mm^2$ in tensile strength, has developed for automotive applications. However, for a successful application, the powdering behaviour of GA must be minimized. The powdering of galvannealed coatings was reduced as the silicon content in the steel increased. Rapid heating and rapid cooling rate during the galvannealing process improved the powdering resistance due to the suppression of not only the ξ phase, but also the $ \Gamma _1$, phase. An analysis of the Fe-Zn alloy phases and its relation to the powdering behaviour are discussed with SEM micrographs.

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Analysis of Trace Trichlorosilane in High Purity Silicon Tetrachloride by Near-IR Spectroscopy (근적외선 분광법을 이용한 고순도 SiCI4 중의 미량 불순물 SiHCI3의 분석)

  • Park, Chan-Jo;Lee, Sueg-Geun
    • Analytical Science and Technology
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    • v.15 no.1
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    • pp.87-90
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    • 2002
  • The content of $SiHCl_3$ as a trace impurity in $SiCl_4$ was analyzed by Near IR spectrophotometer with optical fiber. The strong absorption bands of $5345{\sim}5116cm^{-1}$ and $4848{\sim}4349cm^{-1}$ were used for analysis of $SiHCl_3$, and the detection limit of impurity $SiCl_3$ was appeared to be 0.005 % in the spectrum. The quantitative analysis by Near IR spectrophotometry showed the analytical possibility of trace impurity in $SiCl_4$ without sample pre-treatment not only in the laboratory but also in the field.

Possible Strategies for Microstructure Control of Liquid-Phase-Sintered Silicon Carbide Ceramics

  • Chun, Yong-Seong;Kim, Young-Wook
    • Journal of the Korean Ceramic Society
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    • v.42 no.8 s.279
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    • pp.542-547
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    • 2005
  • Keys to the attainment of tailored properties in SiC ceramics are microstructure control and judicious selection of the sintering additives. In this study, three different strategies for controlling microstructure of liquid-phase-sintered SiC ceramics (LPS-SiC) have been suggested: control of the initial $\alpha-SiC$ content in the starting powder, a seeding technique, and a post-sintering heat treatment. The strategies suggested offer substantial flexibility for producing toughened SiC ceramics whereby grain size, grain size distribution, and aspect ratio can be effectively controlled. The present results suggest that the proposed strategies are suitable for the manufacture of toughened SiC ceramics with improved toughness.

Oxidation Behavior of $SiC/MoSi_2$ Composites Prepared by Reaction Sintering Method (반응소결에 의하여 제조된 $SiC/MoSi_2$ 복합체의 산화 거동)

  • 양준환;한인섭;우상국;서동수
    • Journal of the Korean Ceramic Society
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    • v.31 no.12
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    • pp.1588-1598
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    • 1994
  • The SiC/MoSi2 composite materials were fabricated by infiltrating the mixture of molybdenum disilicide and metal silicon(MoSi2+Si=100) to a porous compact of silicon carbide and graphite under the vacuum atmosphere of 10-1 torr. The specimen were oxidized in dry air under 1 atm at 130$0^{\circ}C$~150$0^{\circ}C$ for 240 hours. The oxidation behavior was evaluated by the weight gain and loss per unit area of the oxidized samples. Also, SEM and XRD analysis of the oxidized surface of the samples were carried out. With increasing the MoSi2 content and oxidation temperature, the passive oxidation was found. The trend of weight gain of all samples was followed the parabolic rate law with the formation of a protective layer of cristobalite on the surface.

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Effect of Primary Si Size and Residual Stress on the Mechanical Properties of B.390 Al Alloys (B.390 알루미늄 합금의 기계적 특성에 미치는 초정 Si 입자크기와 잔류응력의 영향)

  • Kim, Heon-Joo;Park, Jeong-Wook
    • Journal of the Korean Society for Heat Treatment
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    • v.18 no.3
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    • pp.157-163
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    • 2005
  • Effects of refinement of primary Si and residual stress on the mechanical properties of Aluminum B.390 alloy have been examined. Calcium was found to have an effect on the size of primary silicon particles. Primary silicon particle was refined as Ca content decreased. Refinement of primary Si particles led to an improvement in mechanical properties of the alloy; increase of elongation was prominent, above all. By the increase of compressive residual stress in the matrix alloy, tensile strength increased but elongation decreased.

Field emission property of the nitrogen doped diamond-like carbon film prepared by filtered cathodic vacuum arc technique (진공아크방전으로 제작된 다이아몬드상 탄소 박막의 질소 도우핑에 따른 전계 방출 특성)

  • Choi, M.S.;Kim, Y.S.;Lee, H.S.;Park, J.S.;Jeon, D.;Kim, J.K.
    • Proceedings of the KIEE Conference
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    • 1997.11a
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    • pp.273-275
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    • 1997
  • We fabricated the conventional silicon tips coated with a diamond-like carbon (DLC) film. The DLC films are prepared by the filtered cathodic vacuum arc (FCVA) technique. With increasing nitrogen content in DLC film, the work function($\phi$) and the turn-on voltage decrease and the emission current increases. This phenomenon is due to the fact that the Fermi-level moves to the conduction band by increasing nitrogen doping concentration. We have tested on the stability of the DLC film coated silicon tip during 2 hours at 500V.

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A study on the characterization of properties and stabilities of a solar cell using diamond-like carbon/silicon heterojunctions (다이어몬드상 탄소/실리콘 이종접합 태양전지의 특성 및 신뢰성 분석에 관한 연구)

  • Park, Jin-Seok
    • Proceedings of the KIEE Conference
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    • 1997.11a
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    • pp.683-687
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    • 1997
  • The purpose of this work is to develop a highly reliable solar cell based on the diamond-like carbon(DLC)/silicon heterojunction. Thin films of DLC have been deposited by employing both filtered cathodic vacuum arc(FCVA) and magnetron plasma-enhanced chemical vapor deposition(m-PECVD) systems. Structural, electrical, and optical properties of DLC films deposited are systematically analyzed as a function of deposition conditions, such as magnetic field, substrate bias voltage, gas pressure, and nitrogen content. The I-V measurement has been used to elucidate the mechanism responsible for the conduction process in the DLC/Si junction. Photoresponse characteristics of the junction are measured and its reliability against temperature and light stresses is also analyzed.

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