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Analysis of Trace Trichlorosilane in High Purity Silicon Tetrachloride by Near-IR Spectroscopy  

Park, Chan-Jo (Chemical Analysis Laboratory, Korea Research Institute of Chemical Technology)
Lee, Sueg-Geun (Chemical Analysis Laboratory, Korea Research Institute of Chemical Technology)
Publication Information
Analytical Science and Technology / v.15, no.1, 2002 , pp. 87-90 More about this Journal
Abstract
The content of $SiHCl_3$ as a trace impurity in $SiCl_4$ was analyzed by Near IR spectrophotometer with optical fiber. The strong absorption bands of $5345{\sim}5116cm^{-1}$ and $4848{\sim}4349cm^{-1}$ were used for analysis of $SiHCl_3$, and the detection limit of impurity $SiCl_3$ was appeared to be 0.005 ％ in the spectrum. The quantitative analysis by Near IR spectrophotometry showed the analytical possibility of trace impurity in $SiCl_4$ without sample pre-treatment not only in the laboratory but also in the field.
Keywords
near IR; optical fiber; silicon tetrachloride; trichlorosilane;
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