• 제목/요약/키워드: silicon carbide (SiC)

검색결과 563건 처리시간 0.028초

급속가열 이력 제어에 의한 $Si_3-N_4-SiC$계 미분말 시편의 치밀화 (Densification of Ultrafine $Si_3-N_4-SiC$ Powder Compacts by Rapid Heating under Controlled Thermograms)

  • 이형직
    • 한국세라믹학회지
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    • 제32권7호
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    • pp.832-838
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    • 1995
  • The densifying behavior of ultrafine amorphous Si3N4 (about 20 nm)-$\beta$-SiC (about 40~80 nm) powders (O2 : 1.3~15wt%, 0$700^{\circ}C$ within 15 sec and then immediately cooled and held at 135$0^{\circ}C$ for 10 min in N2 atmosphere without resorting to additives using a Xe image heating apparatus. Using an ultrafine pure Si3N4 powder with particle size less than 30nm, further more, mixed with an appropriate amount of $\beta$-SiC, was found to be advantageous to obtain uniform and homogeneous microstructure. In addition, ultrafine Si3N4 powders were also proved to be effective as sintering additive on densifying large sized Si3N4 powder compacts.

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Diffusion coefficient estimation of Si vapor infiltration into porous graphite

  • Park, Jang-Sick
    • 한국진공학회:학술대회논문집
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    • 한국진공학회 2015년도 제49회 하계 정기학술대회 초록집
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    • pp.190.1-190.1
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    • 2015
  • Graphite has excellent mechanical and physical properties. It is known to advanced materials and is used to materials for molds, thermal treatment of furnace, sinter of diamond and cemented carbide tool etc. SiC materials are coated on the surface and holes of graphite to protect particles emitted from porous graphite with 5%~20% porosity and make graphite hard surface. SiC materials have high durability and thermal stability. Thermal CVD method is widely used to manufacture SiC thin films but high cost of machine investment and production are required. SiC thin films manufactured by Si reaction liquid and vapore with carbon are effective because of low cost of machine and production. SiC thin films made by vapor silicon infiltration into porous graphite can be obtained for shorter time than liquid silicon. Si materials are evaporated to the graphite surface in about $10^{-2}$ torr and high temperature. Si materials are melted in $1410^{\circ}C$. Si vapor is infiltrated into the surface hole of porous graphite and $Si_xC_y$ compound is made. $Si_x$ component is proportional to the Si vapor concentration. Si diffusion coefficient is estimated from quadratic equation obtained by Fick's second law. The steady stae is assumed. Si concentration variation for the depth from graphite surface is fitted to quadratic equation. Diffusion coefficient of Si vapor is estimated at about $10^{-8}cm^2s^{-1}$.

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LSI 공법으로 제작된 C/SiC 복합재의 압축거동 평가 (Compressive Fracture Behavior of C/SiC composite fabricated by Liquid Silicon Infiltration)

  • 윤동현;김재훈
    • 한국안전학회지
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    • 제33권1호
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    • pp.1-6
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    • 2018
  • The effects of the fiber direction, specimen size and temperature on the compressive strength of carbon fiber reinforced silicon carbide composite (C/SiC composite) manufactured by liquid silicon infiltration(LSI) is investigated. Tests were conducted in accordance with ASTM C 695 at room temperature and elevated temperatures. Experiments are conducted with two different specimens considering grain direction. With grain (W/G) specimens have a carbon fibers parallel to the load direction, but across grain (A/G) specimens have a perpendicular carbon fibers. To verify the specimen size effect of C/SiC composite, two types of specimens are manufactured. One has a one to two ratio of diameter to height and the other has a one to one ratio. The compressive strength of C/SiC composite increased as temperature rise. As specimens are larger, compressive strength of A/G specimens increased, however compressive strength of W/G decreased.

탄화규소 휘스커의 합성(I) : 반응기구의 율속반응 (Synthesis of Silicon Carbide Whiskers (I) : Reaction Mechanism and Rate-Controlling Reaction)

  • 최헌진;이준근
    • 한국세라믹학회지
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    • 제35권12호
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    • pp.1336-1336
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    • 1998
  • 2단계 열탄소환원법으로 탄화규소 휘스커를 Ar과 H2분위기에서 기상-고상, 2단계, 기상-액상-고상 성장기구를 통해 각각 합성하였다. Ar분위기에서 탄화규소 휘스커는 다음과 같은 반응기구로 성장하였다. SiO2(S)+C(s)-SiO(v)+CO(v) SiO(v)3CO(v)=SiC(s)whisker+2CO2(v) 2C(s)+2CO2(v)=4CO(v) 이때 전체 반응속도는 세번째 반응에 참여하는 탄소에 의해 지배되었다. 따라서 이 반응이 휘스커 합성의 율속반응으로 판단되었다. 한편 H2 분위기에서 탄화규소 휘스커는 다음과 같은 반응기구로 성장하였다.SiO2(s)+C(s)=SiO(v)+CO(v) 2C(s)+4H2(v)=2CH4(v) SiO(v)+2CH4(v)=SiC(s)whisker+CO(v)+4H2(v) 이때 전체 반응속도는 SiO(v) 기체의발생 속도에 의해 지배되었다. 따라서 첫번째 반응이 휘스커 합성의 율속 반응인 것으로 판단되었다.

Densification Mechanism of NITE-SiC and $SiC_f/SiC$ Composites

  • 윤한기
    • 한국해양공학회:학술대회논문집
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    • 한국해양공학회 2006년 창립20주년기념 정기학술대회 및 국제워크샵
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    • pp.181-184
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    • 2006
  • Nano Infiltration Transient Eutectic Phase - Silicon Carbide (NITE-SiC) and $SiC_f/SiC$ composite have been fabricated by a Hot Pressing (HP) process, using SiC powder with an average size of about 30nm. Alumina ($Al_2O_3$) and Yttria ($Y_2O_3$) were used for additives materials. These mixed powders were sintered at the temperature a of $1300^{\circ}C$, $1650^{\circ}C$, $1800^{\circ}C$ and $1900^{\circ}C$ under an applied pressure of 20MPa. And unidirection and two dimension woven structures of $SiC_f/SiC$ composites were prepared starting from Tyranno SA fiber. Densification of microstructure gives an effect to density. Specially, Densification Mechanism basically is important from the sintering which use the HP. In this study, the densification of NITE-SiC and $SiC_f/SiC$ composite mechanism by a press displacement appears investigated. The mechanism on the densification of each sintering temperature was investigated. The each step is shows a with each other different mechanism quality.

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산화막 형성 방법에 따른 전계판 구조 탄화규소 쇼트키 다이오드의 역전압 특성 (Reverse Characteristics of Field Plate Edge Terminated SiC Schottky Diode with $SiO_2$ formed Various Methods)

  • 방욱;정희종;김남균;김상철;서길수;김형우;청콴유;김은동
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2004년도 하계학술대회 논문집 Vol.5 No.1
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    • pp.409-412
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    • 2004
  • Edge termination technique is essential fer the fabrication of high volage devices. A proper edge termination technique is also needed in the fabrication of Silicon Carbide power devices for obtaining a stable high blocking voltage properties. Among the many techniques, the field plate formation is the easiest one that can utilize it for commercial usage. The growth of thick thermal oxide is difficult for SiC, however. In this paper, 6A grade SiC schottky barrier diodes(SBD) were fabricated with field plate edge termination. The oxides which is field plate were formed various methods such as dry oxidation, 10% $N_2O$ nitrided oxidation and PECVD deposition. The reverse characteristics of the SiC SBD with various oxide field plate were investigated.

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액상 실리콘 침투법으로 제작된 대구경 위성 망원경용 SiC 반사경의 결함 검사와 물성 계수 측정 (Defect Inspection and Physical-parameter Measurement for Silicon Carbide Large-aperture Optical Satellite Telescope Mirrors Made by the Liquid-silicon Infiltration Method)

  • 배종인;김정원;이행복;김명훈
    • 한국광학회지
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    • 제33권5호
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    • pp.218-229
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    • 2022
  • 실리콘 카바이드(SiC) 소재를 이용해서 위성용 대구경 망원경의 경량 반사경을 제작하는 과정에서 발생할 수 있는 결함과 SiC 소재의 기계 및 열적 특성을 조사했다. SiC 반사경 제작에는 advanced ceramic material (ACM) 공법이라고 불리는 탄소성형체를 이용한 액상 실리콘 침투 소결법 및 화학기상 증착법이 사용되었으며, 크기와 형상이 다른 네 가지 SiC 반사경을 개발했다. 반사경의 크기 및 형상에 따라 구분하여 광학 소재의 결함을 검사하는 기준과 방법을 체계적으로 제시했고, 경면 표면검사 및 소재 내부 결함 탐지를 위한 비파괴 검사법과 결과에 대해 분석했다. 또한, 반사경을 설계하고, 최종 완성품의 기계적 열적 안정성을 계산하고 예측하기 위해 필요한 밀도, 탄성계수, 비열, 열전달 계수 등을 포함한 14종의 물성 계수 측정값을 공인시험을 통해 추출했으며, 특히 측정 신뢰도 향상을 위해 주요 물성인 탄성계수, 열팽창 계수, 굽힘 강도 측정 방법과 결과에 대해 자세히 연구했다.