• 한국염색가공학회지
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• 제13권4호
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• pp.272-281
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• 2001

Shrink resist finishing of wool fabric was carried out with MONAMIN BTN shrink resist agent after chlorination with D.C.C.A.(dichloro isocyanuric acid). The purpose of this study is to investigate the effect of treating conditions, such as concentrations of D.C.C.A and MONAMIN BTN, pH of treating bath, dying times, curing times and temperatures, on shrink resist finishing. Mechanical properties of the treated fabric were measured by KES-FB system. The optimum chlorination of wool corresponds to 2∼3%(o.w.f.) of D.C.C.A. without rendering the damage on surface of wool fiber. Also it seems likely that the shirink resist finishing carried out at 2 ∼3%(o.w.f.) of MONAMIN BTN and pH 7∼8 of treating bath is effective in increasing a softness of hand.

• 패션비즈니스
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• 제19권2호
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• pp.23-35
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• 2015

In this study, the effect of shrink-resist treatment agent on the wool finishing, specifically anti-felting of wool product was studied. We aimed at providing preliminary data leading to the diversification of high-value added fashionable wool product. Two type of wool fabrics, dense and sheer, were employed. The fabric specimens were treated with solutions of shrink-resist treatment agent with wet pick-up rate 110%, 130%, and 150%, respectively, by using a padding mangle. The solution treated fabric specimens were then dried at room temperature first, at $90^{\circ}C$ for 15 minutes in a drying oven, and finally cured at $130^{\circ}C$ for 3 minutes. Cured wool fabric specimens were then subjected to a felting process. The physical and mechanical properties, including shrinkage rate along warp/filling direction, thickness at specified measurement pressure, drape stiffness, and air-permeability, were analyzed. After felting process, the shrinkage rates of wool fabric specimens, treated with shrink-resist treatment agent, were lower than those of control wool fabric specimens. The stiffness values of wool fabric specimens measured by using Flexometer were increased.

• 복식문화연구
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• 제12권6호
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• pp.945-952
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• 2004

Shrink-resist effects and properties of the knitted fabrics from wool/acrylic(W/A) fiber blends were determined to find out an optimal blending ratio keeping the quality properties of wool products. The test fabrics were knitted by a weft knitting machine with all needle knitting structure ($0{\times}0$ rib) under the same knitting conditions with five different types of yarns: $W100\%,\;A100\%$, and W/A blended yarns(70/30, 50/50, 30/70). Shrinkage during repeated washing, electrostatic propensity, thermal resistance and pilling propensity of W/A knits. The shrink resistance was significantly enhanced on repeated washing of W/A knits, especially, over $50\%$ acrylic blended knits. Addition of strong physical force and alkali detergent applied in this washing experiment brought about superior effects with the low shrinkage rate although it was very severe washing conditions for wool fabrics. The results from the washing experiment implies that W/A blend knits can be machine washed at individual households with other ordinary laundry. There was some changes and variation found in thermal resistance, electrostatic propensity, and pilling. W/A 50/50 blended knits did not bring serious changes to other physical properties comparing with original wool, which helps consumers care wool knitted clothes more conveniently.

• 한국의류산업학회지
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• 제3권3호
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• pp.283-289
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• 2001

Shrink resist finishing of wool fabric was carried out with Monoethanol aminesulphite (MONAMIN BTN) shrink resist agent after chlorination with Dichloro isocyanuric acid (DCCA). The purpose of this study is to investigate the effect of treating conditions, such as concentrations of DCCA and MONAMIN BTN, pH of treating bath, dyeing times, curing times and temperatures, on dyeing property of wool fabrics. K/S values and fastness properties of dyed wool fabrics were measured. The K/S values of dyed fabrics were increased gradually with increasing concentration, and decreased with increasing curing time. The optimum dyeing time and curing temperature were 60 min and $140^{\circ}C$, respectively. Also it seems likely that the shrink resist finishing carried out at 3% (o.w.f.) of MONAMIN BTN and pH 7 of resin treating bath is effective in increasing K/S values. Light fastness of fabric dyed was very poor and the fastness of fabric dyed was not influenced by the treatment conditions.

• 한국염색가공학회지
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• 제3권2호
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• pp.1-9
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• 1991

In order to improve the shrink resistance of wool, the fabric was treated with D.C.C.A.(Di-chloro Isocyanuric Acid) and Hercosett. The results obtained as follows, 1. The optimum condition for the shrink resistance of wool fabric was Hercosett concentration of about 2.0~2.5%(o.w.f), pH of 7, the curing temperature of about $140^{\circ}C$, and curing time of 3 minutes. 2. The physical properties with the experimental conditions, such as the tensile strength, bending strengh, crease recovery, tearing strengh were confirmed by measurements.

• 한국섬유공학회:학술대회논문집
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• 한국섬유공학회 2002년도 봄 학술발표회 논문집
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• pp.404-409
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• 2002

양모 소비의 증가와 함께 고급화, 다양화 등 소비자의 요구도 커짐에 따라 이러한 소비자의 요구를 만족시키기 위한 많은 연구가 행해져 왔다. 양모는 그 자신이 원래, 다종기능을 갖는 섬유이며 건강유지에는 이상적이지만 그 기능을 강조하는 가공, 새로운 기능을 부가하는 가공 등 종래의 가공기술을 개량, 혁신하여 가는 것이 중요하다. 특히 세탁하여도 줄지 않거나 보관과 취급이 용이한 방축성이 크게 요구됨에 따라 방축가공에 관한 연구가 활발히 이루어졌다. (중략)

• 한국진공학회:학술대회논문집
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• 한국진공학회 2012년도 제42회 동계 정기 학술대회 초록집
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• pp.460-460
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• 2012

반도체 Device가 Shrink 함에 따라 Pattern Size가 작아지게 되고, 이로 인해 Photo Resist 물질 자체만으로는 원하는 Patterning 물질들을 Plasma Etching 하기가 어려워지고 있다. 이로 인해 Photoresist를 대체할 Hard Mask 개념이 도입되었으며, 이 Hardmask Layer 중 Amorphous Carbon Layer 가 가장 널리 사용되고 지고 있다. 이 Amorphous Carbon 계열의 Hardmask를 Etching 하기 위해서 기본적으로 O2 Plasma가 사용되는데, 이 O2 Plasma 내의 Oxygen Species들이 가지는 등 방성 Diffusion 특성으로 인해, 원하고자 하는 미세 Pattern의 Vertical Profile을 얻는데 많은 어려움이 있어왔다. 이를 Control 하기 인해 O2 Plasma Parameter들의 변화 및 Source/Bias Power 등의 변수가 연구되어 왔으며, 이와 다른 접근으로, N2 및 CO, CO2, SO2 등의 여러 Additive Gas 들의 첨가를 통해 미세 Pattern의 Profile을 개선하고, Plasma Etching 특성을 개선하는 연구가 같이 진행되어져 왔다. 본 논문에서 VLSI Device의 Masking Layer로 사용되는, Carbon 계 유기 층의 Plasma 식각 특성에 대한 연구를 진행하였다. Plasma Etchant로 사용되는 O2 Plasma에 새로운 첨가제 가스인 카르보닐 황화물 (COS) Gas를 추가하였을 시 나타나는 Plasma 내의 변화를 Plasma Parameter 및 IR 및 XPS, OES 분석을 통하여 규명하고, 이로 인한 Etch Rate 및 Plasma Potential에 대해 비교 분석하였다. COS Gas를 정량적으로 추가할 시, Plasma의 변화 및 이로 인해 얻어지는 Pattern에서의 Etchant Species들의 변화를 통해 Profile의 변화를 Mechanism 적으로 규명할 수 있었으며, 이로 인해 기존의 O2 Plasma를 통해 얻어진 Vertical Profile 대비, COS Additive Gas를 추가하였을 경우, Pattern Profile 변화가 개선됨을 최종적으로 확인 할 수 있었다.