• Membrane Journal
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• v.8 no.2
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• pp.102-108
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• 1998

Permeation behavior of the semiconductor rinsing wastewater containing Si particles was examined by ultrafiltration using the polysulfone plate membrane. The permeation flux was gradually decreased with time. It was due to the growth of cake deposited on the membrane surface and the pore plugging by Si particles. Permeation flux of cross flow type was 1.4 times higher than that of the dead end flow type. Nitrogen back flushing which is the removing method of membrane fouling was superior to the water sweeping. With nitrogen back flushing, the decrease of permeation flux due to the fouling was recovered about 85 % to the initial flux in the flat plate membrane system. The rejection rate of Si particles was about 90 % and the size of Si particle in the permeate was about 70 nm.

• Journal of Korean Society of Environmental Engineers
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• v.34 no.10
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• pp.702-708
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• 2012

Tetrafluoromethane ($CF_4$) has been used as etching and Chemical Vapor Deposition (CVD) gases for semiconductor manufacturing processes. These gases need to be removed efficiently because of their strong absorption of infrared radiation and long atmospheric lifetimes which cause the global warming effect. Also, the wastewater including the fluorine is caused by of the ground water pollution. Long-term consumption of water containing excessive fluoride can lead to fluorosis of the teeth and bones. The wastewater including the fluorine among the by-product which is generated by using the waterjet plasma after destroying $CF_4$ by HF is generated. The system which can remove the hydrogen fluoride among the wastewater by using the electrocoagulation using this wastewater the aluminum electrode was developed. The operating condition such as initial pH, electrocoagulation time, wastewater flow rate, current density were investigated experimentally using a electrocoagulation. Through the parametric studies, the highest hydrogen fluoride destruction of 85% was achieved at 3.5 initial pH, 10 min electrocoagulation time, 10 mL/min wastewater flow rate and $159A/m^2$ current density.

• Journal of environmental and Sanitary engineering
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• v.15 no.2
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• pp.41-48
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• 2000

In this study, we have investigated the effect of the various operating conditions on the removal fluorine in the rinsed water for the semiconductor industry by using electrolysis process. The removal efficiency of fluorine was irrelevant to initial pH, and carbon anode was high-level treatment in the effect of various electrodes. Fluorine included in the wastewater is treated by the addition of a Ca(OH)2, removal efficiency of electrolysis was increased about 40%. Besides the removal efficiency of fluorine was increased as the current density was increased and this treatment system could reduce both the total sludge and running costs. The feasibility of the electrochemical treatment to the fluorine containing wastewater was verified from this study.

• Journal of Korean Society on Water Environment
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• v.28 no.5
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• pp.717-722
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• 2012

Fluoride can be easily found in semiconductor and display industry. However, there is a lack of research for its effects on the related wastewater treatment. The objective of this study is to evaluate the microbial inhibitory effect by fluoride injection. The research entailed the assessment of removal efficiency of $TCOD_{Cr}$ according to the fluoride concentration and also the Specific Oxygen Uptake Rate (SOUR) was measured. The laboratory scale reactor was prepared and operated with the fluoride concentrations of 0, 10, 50, 100, and 200 mg/L based on concentrations frequently occurring in the wastewater. The results from this study showed that, as the fluoride concentration increase, the Specific Substrate Utilization Rate (SSUR) tend to decrease as expected. Also, the increase in fluoride concentrations resulted in the decrease in SOUR. It is determined that fluoride injection affects the microbial activity. Especially, The addition of above 200 mg/L fluoride into reactor caused rapidly decreased SSUR and SOUR due to the inhibitory effects of fluoride.

• Clean Technology
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• v.4 no.1
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• pp.6-23
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• 1998

Recently, semiconductor industry has grown rapidly because of the large demand for electronic devices and equipment. The semiconductor industries have also played an important role on the economic growth in Korea. As the environmental regulations become strict, the proper environmental management and the well-developed waste minimization technologies in semiconductor industries are two of urgent problems to be solved. The semiconductor manufacturing process consists of a series of continuous chemical processes, such as cleaning, oxidation, diffusion, photolithography, etching and film deposition. During the processes, various environmentally hazardous wastes are produced. The wastes may be classified as wastewater, gaseous pollutants, and solid wastes. For waste minimization, the substitution of raw materials and process optimization techniques are used, while the selective destruction technologies of toxic chemicals contained in the wastes have been reported. Also, new technologies have been developed for source reduction and waste reduction, such as reduction of toxic chemical use and substitution of hazardous liquids with gaseous reactants or solvent.

• Journal of Korean Society of Environmental Engineers
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• v.32 no.7
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• pp.730-737
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• 2010

It is very important to remove fluoride ion before treating semiconductor wastewater containing high concentration of ammonia, phosphates, and fluoride ions by struvite formation. Calcium ion was generally added for the removal of fluoride ion. However, calcium ions remained after removal of fluoride ion can deteriorate the performance of struvite crystalization. It should be removed completely before struvite formation. In this study, the effect of fluoride and calcium ion concentration on the struvite crystalization was investigated. Removal efficiencies of ortho-phosphate with struvite formation were more abruptly decreased than those of ammonium nitrogen, as increase of fluoride ion concentration in synthetic wastewater. The structures of struvite formed in synthetic wastewater containing calcium ion of up to 500 mg/L were identical. Purity of struvite was deteriorated as increase of calcium ion over 500 mg/L. Removal efficiencies of ammonium nitrogen were more decreased than those of phosphate ions as increase of cacium ion in synthetic wastewater.

• Membrane Journal
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• v.32 no.1
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• pp.33-42
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• 2022

Growing industrialization leads to severe water pollution. Organic effluents from pharmaceuticals and textile industries released in wastewater adversely affect the environment and human health. Presence of antibiotics used for antibacterial treatment in wastewater leads to the growth of drug resistance bacteria, which is very harmful for human being. Various small organic molecules are used for the preparation of organic dye molecules in the textile industries. These molecules hardly degrade, which is present in the wastewater effluents from printing and dyeing industries. In order to address these problems, photoactive catalyst is embedded in the membrane and wastewater are passed through it. Through this process, organic molecules are photodegraded and at the same time, the degraded compounds are separated by the membrane. Titanium dioxide (TiO₂) is a semiconductor which behave as excellent photocatalyst. Photocatalytic ability is enhanced by the making its composite with other transition metal oxide and incorporated into polymeric membrane. In this review, the degradation of dye and drug molecules by photocatalytic membrane are discussed.

• Membrane Journal
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• v.9 no.1
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• pp.36-42
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• 1999

Permeation behavior of the semiconductor rinsing wastewater contammg Si particles was examined by ultrafiltration using the polyolefin tubular membrane. Flux decline with time was due to the growth of Si cake deposited on the membrane surface and the pore plugging by Si particles. Cake filtration from the cross flow application is compared to the combination of pore blocking and cake filtration from the dead-end application. The cake resistance is 3.16 x $10^{12}$ -4.34 X $\times$$10^{12}$ $m^{-1}$ for the cross flow and 6.6 x $\times$$10^{12}$ -12.19 X $\times$$10^{12}$ $\times$$m^{-1}$for the dead-end flow, respectively. At the initial stage of operation, permeation flux of cross flow type was 1.7 time higher than that of the dead end flow type. Permeation flux of cross flow was about 42 e 1m2 hr and the rejection rate of Si particles was about 96 %. The average particle size of Si particle in the permeate was 20 nm.

• Journal of Korean Society of Water and Wastewater
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• v.12 no.1
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• pp.88-95
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• 1998

The Electron/Hole Pair is generated when the Activation Energy produces by Ultraviolet Ray illumination to the Semiconductor. And $OH^-$ ion produces by Water Photo-Cleavage reacts with Positive Hole. As a result, OH Radical acting as strong oxidant is generated and then Photocatalytic Oxidation Reaction occurs. The Photocatalytic Oxidation can oxidize the chlorophenol to Chloride and Carbon Dioxide easier, safer and shorter than conventional Water Treatment Process With the same degree of chlorination, the $Cl^-$ ion at para (C4) position is most easily replaced by the OH radical. And then, the blocking effect of $OH^-$ ion between the $Cl^-$ ions and $Cl^-$ ions at symmetrical location is easily replaced by the OH radical. For mono-, di-, tri-chlorophenols, there is no obvious difference in decomposition rate, decomposition efficiency and completeness of the decomposition reaction except for 2,3-dichloropheno, 2,4,5-, 2,3,4-trichlorophenol. The decomposition efficiency is higher than 75% and completeness of the decomposition reaction is higher than 70%. Therefore, continuous flow photocatalytic reactor is promising process to remove the chlorinated aromatic compounds which is more toxic than non-chlorinated aromatic compound.

• Journal of Korean Society of Water and Wastewater
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• v.28 no.4
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• pp.391-396
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• 2014

Ultrapure water (UPW) is water containing nothing but water molecule ($H_2O$). The use of UPW is increasing in many industries such as the thermal and nuclear power plants, petrochemical plants, and semiconductor manufacturers. In order to produce UPW, several unit processes such as ion exchange, reverse osmosis (RO), ultraviolet (UV) oxidation should be efficiently arranged. In particular, RO process should remove not only ions but also low molecular weight (LMW) organic matters in UPW production system. But, the LMW organic matter removal data of RO membranes provided by manufacturers does not seem to be reasonable because they tested the removal in high concentration conditions like 1,000 ppm of isopropyl alcohol (IPA, MW=60.1). In this study, bench-scale experiments were carried out using 4-inches RO modules. IPA was used as a model LMW organic matter with low concentration conditions less than 1 ppm as total organic carbon (TOC). As a result, the IPA removal data by manufacturers turned out to be trustable because the effect of feed concentration on the IPA removal was negligble while the IPA removal efficiency became higher at higher permeate flux.