• 제목/요약/키워드: selective deposition

검색결과 233건 처리시간 0.025초

furnace 열처리와 질소 플라즈마 처리에 의한 유기화학증착법을 이용한 선택적 구리 증착 (Selective Cu-MOCVD by Furnace Annealing and N$_{2}$ Plasma Pretreatment)

  • 곽성관;정관수
    • 대한전자공학회논문지SD
    • /
    • 제37권3호
    • /
    • pp.27-33
    • /
    • 2000
  • 선택성을 향상시키기 위해서 BPSG(Borophosphosilicate glass) 위에 형성한 TiN 패턴을 로(furnace) 열처리와 질소 플라즈마 처리를 한 후 유기 화학 기상 증착법(MOCVD; Metal Organic Chemical Vapor Deposition)으로 구리 박막을 증착하였다. 먼저 650℃∼750℃에서 열처리한 후 150℃에서 구리 박막을 증착시켰을 때 750℃에서 열처리한 경우 TiN 표면 위에만 선택적으로 구리 증착이 일어났다. 질소 플라즈마 처리를 한 경우도 마찬가지로 BPSG 위에 구리 핵 형성이 억제됨을 알 수 있었다. 플라즈마 처리 온도를 증가시킬수록 BPSG 위의 구리 핵 형성이 더 효과적으로 억제되었다. 열처리와 플라즈마 처리 후 증착된 기판 표면을 TOF-SIMS(Time-of-Flight Secondary Ion Mass Spectrometry)로 분석하였을 때 플라즈마 처리가 BPSG 표면의 구리 증착 작용기인 0-H(hydroxyl)기를 제거하여 구리의 선택성이 향상되었다고 해석하였다.

  • PDF

Selective Chemical Vapor Deposition of $\beta$-SiC on Si Substrate Using Hexamethyldisilane/HCl/$H_2$ Gas System

  • Yang, Won-Jae;Kim, Seong-Jin;Chung, Yong-Sun;Auh, Keun-Ho
    • 한국결정성장학회:학술대회논문집
    • /
    • 한국결정성장학회 1998년도 PROCEEDINGS OF THE 15TH KACG TECHNICAL MEETING-PACIFIC RIM 3 SATELLITE SYMPOSIUM SESSION 4, HOTEL HYUNDAI, KYONGJU, SEPTEMBER 20-23, 1998
    • /
    • pp.91-95
    • /
    • 1998
  • Selectivity of SiC deposition on a Si substrate partially covered with a masking material was investigated by introducing HCl gas into hexamethyldisilane/H2 gas system during the deposition. the schedule of the precursor and HCl gas flows was modified so that the selectivity of SiC deposition between a Si substrate and a mask material should be improved. It was confirmed that the selectivity of SiC deposition was improved by introducing HCl gas. Also, the pulse gas flow technique was effective to enhance the selectivity.

  • PDF

Hydrogen-Permselective TiO$_2$2/SiO$_2$2 Membranes Formed by Chemical Vapor Deposition

  • Nam, Suk-Woo;Ha, Heung-Yong;Yoon, Sung-Pil;Jonghee Han;Lim, Tae-Hoon;Oh, In-Hwan;Seong- Ahn Hong
    • Korean Membrane Journal
    • /
    • 제3권1호
    • /
    • pp.69-74
    • /
    • 2001
  • Films of TiO$_2$/SiO$_2$ were deposited on the inner surface of the porous glass support tubes by decomposition of tetraisopropyl titanate (TIPT) and tetraethyl orthosilicate (TEOS) at atmospheric pressure. Dense and hydrogen -permselective membranes were formed at 400-600$\^{C}$. The permeation rates of H$_2$ through the membrane at 600$\^{C}$ were 0.2-0.4 ㎤(STP)/min-㎠ atm and H$_2$:N$_2$permeation ratios were above 1000. The permeation properties of the membranes were investigated at various deposition temperatures and TIPT/TEOS concentrations. Decomposition of TIPT alone at temperatures above 400$\^{C}$ produced porous crystalline TiO$_2$ films and they were not H7-selective. Decomposition of TEOS produced H$_2$-permeable SiO$_2$ films at 400-600$\^{C}$ but film deposition rate was very low. Addition of TIFT to the TEOS stream significantly accelerated the deposition rate and produced highly H$_2$-selective films. Increasing the TIPT/TEOS concentration ratio increased the deposition rate. The TiO$_2$/SiO$_2$ membranes formed at 600 $\^{C}$ have the permeation properties comparable to those of SiO$_2$ membranes produced from TEOS.

  • PDF

원추형 기판 위에 탄소 나노튜브의 선택적 성장이 전계방출 특성에 미치는 영향 (Effects of Selective Growth on Electron-emission Properties of Conical-type Carbon Nanotube Field-emitters)

  • 김부종;노영록;박진석
    • 반도체디스플레이기술학회지
    • /
    • 제11권1호
    • /
    • pp.61-65
    • /
    • 2012
  • In this study, for use of carbon nanotubes (CNTs) as a cold cathode of x-ray tubes, we examine the effects of selective growth of CNTs on their field emission properties and long-term stability. The selective growth of CNTs was performed by selectively etching the catalyst layer which was used for CNTs' nucleation. CNTs were grown on conical-type tungsten substrates using an inductively-coupled plasma chemical vapor deposition system. For all the grown CNTs, their morphologies and microstructures were analyzed by field-emission scanning electron microscope and Raman spectroscopy. The electron-emission properties of CNTs and the long-term stability of emission currents were measured and characterized according to the CNTs' growth position on the substrate.

선택적 레이저 용융 공정으로 제작된 시편의 SUS316L 에너지밀도 및 비드 중첩률에 따른 기계적 특성 변화 분석 (Impact of Energy Density and Bead Overlap Ratio of a SUS316L Specimen Fabricated using Selective Laser Melting on Mechanical Characteristics)

  • 이동욱;김우성;성지현;김철;이호진
    • 한국기계가공학회지
    • /
    • 제20권8호
    • /
    • pp.42-51
    • /
    • 2021
  • Investigations of process parameters are essential when fabricating high-quality parts using additive manufacturing. This study investigates the change in the mechanical characteristics of a SUS316L specimen fabricated using selective laser melting based on the energy density and bead overlap ratio. The SUS316L powder particles were spherical and 35 ㎛ in size. Single-bead and hexahedral shape deposition experiments were performed sequentially. A single bead experiment was performed to obtain the bead overlap ratios for different laser parameters utilizing laser power and scan speed as experimental parameters. A hexahedral shape deposition experiment was also performed to observe the difference in mechanical properties, such as the internal porosity, surface roughness, and hardness, based on the energy density and bead overlap ratio of the three-dimensional printed part. Laser power, scan speed, overlap ratio, and layer thickness were chosen as parameters for the hexahedral shape deposition experiment. Accordingly, the energy density applied for three-dimensional printing, and the experimental parameters were calculated, and the energy density and bead overlap ratio for fabricating parts with good properties have been suggested.

UV Laser를 이용한 Borosilicate-Glass (BSG)층의 선택적 에미터 형성 (Selective Emitter Formation of Borosilicate-Glass (BSG) Layer using UV Laser)

  • 김가민;장효식
    • 한국재료학회지
    • /
    • 제31권12호
    • /
    • pp.727-731
    • /
    • 2021
  • In this study, we have investigated a selective emitter using a UV laser on BBr3 diffusion doping layer. The selective emitter has two regions of high and low doping concentration alternatively and this structure can remove the disadvantages of homogeneous emitter doping. The selective emitters were fabricated by using UV laser of 355 nm on the homogeneous emitters which were formed on n-type Si by BBr3 diffusion in the furnace and the heavy boron doping regions were formed on the laser regions. In the optimized laser doping process, we are able to achieve a highly concentrated emitter with a surface resistance of up to 43 Ω/□ from 105 ± 6 Ω/□ borosilicate glass (BSG) layer on Si. In order to compare the characteristics and confirm the passivation effect, the annealing is performed after Al2O3 deposition using an ALD. After the annealing, the selective emitter shows a better effect than the high concentration doped emitter and a level equivalent to that of the low concentration doped emitter.