SELECTIVE AREA DEPOSITION OF BORON AND DELTA DOPING OF SILICON BY SYNCHROTRON RADIATION FOR ULSI APPLICATION

  • Lee, Sunwoo- (Samsung Electro-Mechanics Co., Research & Development Center, Laboratory for Thin Film Devices) ;
  • Peter-A.Dowben (University of Nebraska, Department of Physics and Center for materials Research & Analysis, Lincoln, USA)
  • 발행 : 1993.11.01