• 자원환경지질
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• 제24권3호
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• pp.219-226
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• 1991

High quality quartz crystals are grown in 0.5N NaOH + LiOH solution on the seed crystal at $370-395^{\circ}C$ and $1200-1300kg/cm^2$ condition. Growth rates are determined by the crystal thickness grown on the seed crystals with Z(0001) and X($11\bar{2}0$) direction. Relatively high growth rate of Z(0001) direction gradually changes as the temperaure difference (${\Delta}$ Ti) between growth and dissolution zones from 25 to $10^{\circ}C$. The X axis direction is affeced by ${\Delta}$ Ti, and +X($11\bar{2}0$) direction shows a high growth rate than -X($\bar{1}\bar{1}20$) direction. According to the variation with kinds of solutions used, the crystal growth that in NaOH solution is found to be slower than that in $Na_2CO_3$ solution. However, for the case in the NaOH solution mixed with LiOH, it shows a favorable growth rate in terms of grown crystal quality.

• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 2007년도 하계학술대회 논문집 Vol.8
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• pp.125-126
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• 2007

Polycrystalline silicon thin-film-transistors (Poly-Si TFT's) with a amorphous-$Si_xGe_y$ seed layer have been fabricated to improve the performance of TFT. The dependence of crystal structure and electrical characteristics on the the Ge fractions in $Si_xGe_y$ seed layer were investigated. As a result, the increase of grain size and enhancement of electrical characteristics were obtained from the poly-Si TFT's with amorphous-SixGey seed layer.

• 한국물환경학회지
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• 제21권1호
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• pp.59-65
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• 2005

A phosphate recovery system from artificial wastewater was developed using a completely mixed phosphorus crystallization reactor, in which powdered converter slag was used as a seeding crystal. In preliminary test, the optimal pH range for meta-stable hydroxyapatite crystallization for high phosphorus concentration was observed to be 6.0 to 7.0, which was different from the conventionally known pH range (8.0~9.5) for effective crystallization in relatively low phosphorus concentration less than 5 mg/L. The average phosphorus removal efficiency in a lab-scaled completely mixed crystallization system for artificial wastewater with about 100 mg/L of average $PO_4-P$ concentration was shown to be 60.9% for 40 days of lapsed time. XRD analysis exhibited that crystalline of hydroxyapatite formed on the surface of seed crystal, which was also observed in SEM analysis. In EDS mapping analysis, composition mole ratio (=Ca/P) of the crystalline was found to be 1.78, indicating the crystalline on the surface of seed crystal is likely to be hydroxyapatite. Particle size distribution analysis showed that average size of seed crystal increased from $28{\mu}m$ up to $50{\mu}m$, suggesting that phosphorus recycling from wastewater with high phosphorus concentration can be successfully obtained by using the phosphorus crystallization recovery system.

• Current Photovoltaic Research
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• 제1권2호
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• pp.103-108
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• 2013

Epitaxial growth of a high-quality thin Si film is essential for the application to low-cost thin-film Si solar cells. A polycrystalline Si film was grown on a $SiO_2$ substrate at $450^{\circ}C$ by a Al-assisted crystal growth process. For the purpose, a thin Al layer was deposited on the $SiO_2$ substrate for Al-assisted crystal growth. However, the epitaxial growth of Si film resulted in a rough surface with humps. Then, we introduced a thin amorphous Si seed layer on the Al film to minimize the initial roughness of Si film. With the help of the Si seed layer, the surface of the epitaxial Si film was smooth and the crystallinity of the Si film was much improved. The grain size of the $1.5-{\mu}m$-thick Si film was as large as 1 mm. The Al content in the Si film was 3.7% and the hole concentration was estimated to be $3{\times}10^{17}/cm^3$, which was one order of magnitude higher than desirable value for Si base layer. The results suggest that Al-doped Si layer could be use as a seed layer for additional epitaxial growth of intrinsic or boron-doped Si layer because the Al-doped Si layer has large grains.

• 한국결정학회지
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• 제3권1호
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• pp.37-43
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• 1992

비선형광학 단결정인 KTiOP04는 Nd:YAG 레 이저의 제2고조파 발생장치로 가장 널리 이용되 는 물질이다. 본 연구에서는 낮은 점도를 갖는 3K2W04. P2O5 응제를 이용하여 TSSG법에 의한 KTiOP04 단결 정 육성 실 험 을 하였다. KTiOP04 육 성에 적합하도록 온도구배가 작은 전기로와 정밀 한 회전인상장치를 제작하였으며,용액 내 수직온도 구배는 용액표면과 용액 밑부분의 온도차가 1℃로 매우 작았다. 성장 과정의 관찰과 조절이 용이하도록 종자정을 용액 표면에 위치시켰다. 용액의 조성은 66.7mol%의 KTiOP04를 포함하도록 고정하였으며 이 용액의 포화온도는 1020℃ 였다. 냉각속도가 0 2℃/h, 결정의 회전속도가 50 rpm인 성장조건에서 a-, b-, c-축으로의 길이 가 각각 23 ×25 ×25mm3인 포유물이 없는 양질의 단결정을 얻을 수 있었다. 성장된 K,Tiop04 단결정은 크게 발달한 (201)면과 (011), (110), (100) 면들로 이루어져 있었으며 (101) 면이 관찰되기도 하였다.

• 한국결정성장학회지
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• 제25권1호
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• pp.32-34
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• 2015

PVT(Physical vapor transport)법으로 벌크형 종자 결정을 이용하여 AlN 단결정을 성장 시켰다. 성장과정은 고주파 유도 가열 코일을 이용한 방법으로 진행되었다. 카본 도가니의 하단에 원료 분말을 장입하고 종자 결정은 도가니의 상부에 부착하였다. 성장 조건으로 온도는 $2000{\sim}2100^{\circ}C$ 사이에서 이루어 졌으며 챔버내 압은 $1{\times}10^{-1}{\sim}200$ Torr로 유지하였다. 또한 가열 위치를 결정짓는 hot-zone 조절이 성장의 시간이 진행됨에 따라 수정되었다. 이러한 조건하에 약 600시간 성장시킨 결과로 장축 직경 17 mm 두께 7 mm의 AlN 단결정이 얻어졌으며, Laue X-Ray 장치을 이용하여 성장된 결정의 방향을 조사한 결과 R방향[011]으로 성장 되었음을 알 수 있었다.

• 한국결정성장학회지
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• 제29권3호
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• pp.140-142
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• 2019

자외선 LED용 기판소재로 응용가능한 AlN(질화알루미늄) 단결정을 물리기상이동법(Physical Vapor Transport Method)으로 성장하기 위해 성장 거동을 조사하였다. 다결정의 종자결정을 사용하였으며, 직경은 3인치급이었고, 120시간 동안 성장공정을 수행하여 길이 약 4 mm의 다결정상을 얻었다. 본 연구에서는 성장 조건과 대형의 도가니를 사용하였을 경우의 성장 거동에 대하여 고찰하여 보고자 하였다.

• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 2009년도 추계학술대회 논문집
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• pp.128-128
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• 2009

The effect of seed layer on the preparation of tin oxide thin film by ALD using tetrakis(ethylmethylamino) tin precursor was examined. The average growth rate of tin oxide film is about 1.4 A/cycle from $50^{\circ}C$ to $150^{\circ}C$. The rate rapidly decreases at the substrate temperature at $200^{\circ}C$. The seed effect was not observed in crystal growth of thin oxide. However, the crystalline growth of seed material in tin oxide was detected by thermal annealing. ALD-grown seeded tin oxide thin film after thermal annealed was characterized by ellipsometry, XRD, AFM and XPS.

• Transactions on Electrical and Electronic Materials
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• 제11권5호
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• pp.222-225
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• 2010

The preparation of tin oxide thin films by atomic layer deposition (ALD), using a tetrakis (ethylmethylamino) tin precursor, and the effects of a seed layer on film growth were examined. The average growth rate of tin oxide films was approximately 1.2 to 1.4 A/cycle from $50^{\circ}C$ to $150^{\circ}C$. The rate rapidly decreased at the substrate temperature at $200^{\circ}C$. A seed effect was not observed in the crystal growth of tin oxide. However, crystallinity and the growth of seed material were detected by XPS after thermal annealing. ALD-grown seeded tin oxide thin films, as-deposited and after thermal annealing, were characterized by X-ray diffraction, atomic force microscopy and XPS.

• 한국초전도ㆍ저온공학회논문지
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• 제19권3호
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• pp.33-39
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• 2017

This study presents that the orientation and the geometry of seed affect on the growth behavior of melt processed single grain REBCO bulk superconductor and its magnetic properties. The effects of seed geometry have been investigated for thin $30mm{\times}30mm$ rectangular powder compacts. Single grain REBCO bulk superconductors have been grown successfully by a top seed melt growth method for 8-mm thick vertical thin REBCO slab. Asymmetric structures have been developed at the front surface and at the rear surface of the specimen. Higher magnetic properties have been obtained for the specimen that c-axis is normal to the specimen surface. The relationships between microstructure, grain growth and magnetic properties have been discussed.