• 분석과학
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• 제9권3호
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• pp.1069-1075
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• 1996

• 한국가시화정보학회지
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• 제1권1호
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• pp.28-33
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• 2003

This paper presents the visualization method in which 3-dimensional(3D) microchannel flow can be detected using a confocal scanning microscope. By soft-lithography, we fabricated various Bio-MEMS(Micro Electro-Mechanical System) devices such as a disposable microchip for a flow cytometer and a micro-mixer, which have 3D structures. Injecting aqueous fluorescent solution in the microfluidic devices, we measured the flow in a steady state by the confocal scanning microscope. At first, we explain the principle of the confocal scanning microscope. And then we show the results from 3D visualization of microscopic flow structures using the confocal scanning microscope.

• 한국정밀공학회지
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• 제20권3호
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• pp.5-14
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• 2003

• 제어로봇시스템학회:학술대회논문집
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• 제어로봇시스템학회 2001년도 ICCAS
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• pp.99.3-99
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• 2001

In fluorescence mode confocal scanning microscope, level of detected signal is very low. In object scanning type confocal scanning microscope, the additional optical system with objective lens and plane mirror was proposed to increase signal intensity, but there was none for beam scanning type confocal scanning microscope. We propose reflecting optical systems which improve signal intensity in beam scanning type confocal scanning microscope. We choose one of the proposed optical systems and design the optical system, i.e., select optical components and assign distances between the selected components. To design the optical system, we use finite ray tracing method and make cost function to be minimized.

• 한국정밀공학회지
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• 제25권4호
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• pp.53-60
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• 2008

Electron detectors used in scanning electron microscope accept electrons emitted from the specimen and convert them to an electrical signal that, after amplification, is used to modulate the gray-level intensities on a cathode ray tube, producing an image of the specimen. Electron detector is one of the key components dominating the performance of scanning electron microscope so that the development of electron detectors having high performance is indispensable to acquire high quality images using scanning electron microscope. In this paper, we designed and manufactured an electron detector and conducted a couple of image capture experiments using it. In particular, scintillator which generates light photons when it is struck by high-energy electrons was manufactured and experimental studies on the optimization of manufacturing condition was carried out. From experiments to evaluate the performance of our detector, it was verified that the performance of our detector is equivalent to or better than that of the conventional one.

• 한국광학회지
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• 제8권2호
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• pp.165-168
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• 1997

780 nm의 반도체 레이저, compact disk의 광 pick-up용 actuator, 그리고 4분할 photodiode를 이용하여 scanning confocal microscope를 구성하여 시료면의 높이와 재질의 차이를 측정하였다. 4분할 photodiode에 검출되는 오차 신호를 이용하여 렌즈가 장착되어 있는 actuator를 움직이면서 시료면에 레이저 광속의 초점이 항상 위치하도록 하였으며, 이 때 actuator에 흐르고 있는 전류를 시료면의 높이로 나타내어 3차원 영상으로 표현하였다. 또한 재질의 차이는 4분할 photodiode에 검출되는 합산 신호를 이용하여 컬러 프린터에 나타나는 3차원 영상의 색을 다르게 나타내었다. 전체적인 크기도 30 mm * 20 mm * 20 mm 로서 작고 간단하며 scan 영역은 최대 1.6 mm * 1.6 mm이다. 반사광의 세기를 이용한 scanning confocal microscope의 영상과 4분할 photodiode에 검출되는 오차 신호를 적분하는 방식을 이용한 scanning confocal microscope의 영상을 구하여 그 차이를 비교하였다.

• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 2004년도 추계학술대회 논문집 Vol.17
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• pp.522-525
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• 2004

ITO thin films $({\sim}150\;nm)$ are deposited on glass substrates by different deposition condition. The sheet resistance of ITO thin films measured by using a four probe station. The microstructure of these films is determined using a X-ray diffractometer (XRD) and a scanning electron microscope (SEM) and a atomic force microscope (AFM). The sheet resistance of ITO thin films compared $s_{11}$ values by using a near field scanning microwave microscope.

• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 2004년도 하계학술대회 논문집 Vol.5 No.2
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• pp.1042-1045
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• 2004

ITO thin films ($\sim150nm$) are deposited on glass substrates by different deposition condition. The sheet resistance of ITO thin films measured by using a four probe station. The microstructure of these films is determined using a X-ray diffractometer (XRD) and a scanning electron microscope (SEM) and a atomic force microscope (AEM). The sheet resistance of ITO thin films compared $s_11$ values by using a near field scanning microwave microscope.

• Applied Microscopy
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• 제2권1호
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• pp.39-46
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• 1972

There are many kinds of microscopes suitable for general studies; optical microscopes(OM), conventional transmission electron microscopes (TEM), and scanning electron microscopes(SEM). The optical microscopes and the conventional transmission electron microscopes are very familiar. The images of these microscopes are directly formed on an image plane with one or more image forming lenses. On the other hand, the image of the scanning electron microscope is formed on a fluorescent screen of a cathode ray tube using a scanning system similar to television technique. In this paper, the features and some applications of the scanning electron microscope will be discussed briefly. The recently available scanning electron microscope, combining a resolution of about $200{\AA}$ with great depth of field, is favorable when compared to the replica technique. It avoids the problem of specimen damage and the introduction of artifacts. In addition, it permits the examination of many samples that can not be replicated, and provides a broader range of information. The scanning electron microscope has found application in diverse fields of study including biology, chemistry, materials science, semiconductor technology, and many others. In scanning electron microscopy, the secondary electron method. the backscattererd electron method, and the electromotive force method are most widely used, and the transmitted electron method will become more useful. Change-over of magnification can be easily done by controlling the scanning width of the electron probe. It is possible. to continuously vary the magnification over the range from 100 times to 1.00,000 times without readjustment of focusing. Conclusion: With the development of a scanning. electron microscope, it is now possible to observe almost all-information produced through interactions between substances and electrons in the form of image. When the probe is properly focused on the specimen, changing magnification of specimen orientation does not require any change in focus. This is quite different from the conventional transmission electron microscope. It is worthwhile to note that the typical probe currents of $10^{-10}$ to $10^{-12}\;{\AA}$ are for below the $10^{-5}$ to $10^{-7}\;{\AA}$ of a conventional. transmission microscope. This reduces specimen contamination and specimen damage due to heatings. Outstanding features of the scanning electron microscope include the 'stereoscopic observation of a bulky or fiber specimen in high resolution' and 'observation of potential distribution and electromotive force in semiconductor devices'.

• 한국정밀공학회지
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• 제21권2호
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• pp.92-99
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• 2004

The errors can cause the serious loss of the performance of a precision machine system. In this paper, we proposed the method of allocating the alignment tolerances of the parts and applied this method to get the optimal tolerances of a Confocal Scanning Microscope. In general, tight tolerances are required to maintain the performance of a system, but a high cost of manufacturing and assembling is required to preserve the tight tolerances. The purpose of allocating the optimal tolerances is minimizing the cost while keeping the high performance of the system. In the optimal problem, we maximized the tolerances while maintaining the performance requirements. The Monte Carlo Method, a statistical simulation method, is used in tolerance analysis. Alignment tolerances of optical components of the confocal scanning microscope are optimized to minimize the cost and to maintain the observation performance of the microscope. We can also apply this method to the other precision machine system.