• Title/Summary/Keyword: remanent polarization.

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Piezoelectric and Ferroelectric Properties of $[Bi_{1-x}(Na_{0.7-x}K_{0.2}Li_{0.1})]_{0.5}Ba_xTiO_3$ Lead-Free Piezoelectric Ceramics (비납계 $[Bi_{1-x}(Na_{0.7-x}K_{0.2}Li_{0.1})]_{0.5}Ba_xTiO_3$ 압전 세라믹의 압전-유전특성)

  • Lee, Dae-Su;Jeong, Soon-Jong;Kim, Min-Su;Park, Eun-Cheol;Song, Jae-Sung
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2006.06a
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    • pp.271-271
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    • 2006
  • The structural, dielectric and piezoelectric properties of $[Bi_{1-x}(Na_{0.7-x}K_{0.2}Li_{0.1})]_{0.5}BaxTiO_3$ (BNKLBxT) ceramics were studied for the compositional range, x = 0-0.08. The samples were prepared by conventional sintering technique. The result of X-ray diffraction (XRD) suggest that $Ba^{2+}$ diffuse into the $[Bi(Na_{0.7}K_{0.2}Li_{0.1})]_{0.5}TiO_3$ (BNKLT) lattices to form a solid solution with a single phase perovskite structure. The ceramic show excellent piezoelectric and ferroelectric properties, and optimum properties measured are as follows: piezoelectric constant $d_{33}=230pC/N$, planar electromechanical coupling factor $k_p\;=\;40.3%$, remanent polarization $P_r\;=\;30\;{\mu}C/cm^2$, and coercive field $E_c\; =\;2.5\;kV/mm$, respectively.

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Annealing Temperature Properties of SBT Thin Film for Semiconductor Device (반도체 소자용 SBT 박막의 후속 열처리 특성)

  • Oh, Yong-Cheul;Kim, Ki-Joon;Jeon, Dong-Keun;Hong, Sun-Pyo;Kim, Sang-Jin;Song, Ja-Yoon;Lee, Joon-Ung
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2004.07b
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    • pp.697-700
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    • 2004
  • The SBT$(Sr_{0.8}Bi_{2.4}Ta_2O_9)$ thin films for semiconductor device were deposited on Pt-coated $Pt/TiO_2/SiO_2Si$ wafer by RF magnetron sputtering method at $400[^{\circ}C]$ and annealed at the temperature range from $600[^{\circ}C]$ to $850[^{\circ}C]$. The top electrodes(Pt) were deposited on SBT thin film by DC sputtering method. The crystallinity of SBT thin films were increased with increase of annealing temperature in the temperature range of $600[{\circ}C]\sim850[^{\circ}C]$. The annealing temperature properties were to be most excellent in the case of annealed SBT thin film at $750^{\circ}C]$. And, the maximum remanent polarization$(2P_r)$ and the coercive electric field$(E_c)$ at annealing temperature of $750[^{\circ}C]$ obtained about $11.60[{\mu}C/cm^2]$ and 48[kV/cm], respectively. Specially, it was seen that fatigue properties does not change in $10^{10}$ switching cycle.

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Annealing Time Properties of SBT Capacitors by RF Sputtering method (RF 스퍼터링법에 의한 SBT 커패시터의 열처리 시간 특성)

  • Cho, Choon-Nam;Oh, Yong-Cheul;Kim, Jin-Sa;Shin, Cheol-Gi;Lee, Dong-Gu;Choi, Woon-Shick;Lee, Sung-Ill;Lee, Joon-Ung
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2004.07b
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    • pp.817-820
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    • 2004
  • The $Sr_{0.7}Bi_{2.6}Ta_2O_9$(SBT) thin films are deposited on Pt-coated electrode($Pt/TiO_2/SiO_2/Si$) using a RF magnetron sputtering method. The ferroelectric properties of SBT capacitors with annealing time were studied. In the SEM images, Bi-layered perovskite phase was crystallized at 10min and grains largely grew with annealing tune. SBT thin films are transformed from initial amorphous phase to the fully formed layer-structured perovskite. During the annealing process at $750^{\circ}C$, we found that an fluorite-like stage is formed after 3min. In the XRD pattern, the SBT thin films after 3min annealing time had (105) orientation. The ferroelectric properties of SBT capacitor with annealing time represent a favorable properties at 60 min. The maximum remanent polarization and the coercive electric field with 60 min are $12.40C/cm^2$ and 30kV/cm, respectively. The leakage current density with 60min is $6.81{\times}10^{-10}A/cm^2$.

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Pyroelectricity of BaTiO3-doped PMNT ferroelectric system for pyroelectric sensor

  • Yeon Jung Kim
    • Journal of the Korean institute of surface engineering
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    • v.56 no.6
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    • pp.380-385
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    • 2023
  • In this study, an MPB PMNT system containing 0.05 to 0.10 wt.% BaTiO3 was synthesized using a traditional chemical method and its pyroelectricity was investigated. Pyroelectricity, dielectricity, and ferroelectricity of the synthesized BaTiO3-PMNT system were analyzed by heat treatment at 1240~1280 ℃ for 4 hours to evaluate its applicability as a pyroelectric sensor. Unlike the simple ABO3 ferroelectric, the BaTiO3-doped PMNT system exhibited phase transition characteristics over a wide temperature range typical of complex perovskite structures. Although no dramatic change could be confirmed depending on the amount of BaTiO3 added, stable pyroelectricity was maintained near room temperature and over a wide temperature range. When the amount of BaTiO3 added increased from 0.05BaTiO3-PMNT to 0.10BaTiO3-PMNT, the electric field slightly increased from 5.00×103 kV/m to 6.75×103 kV/m, and the maximum value of remanent polarization slightly increased from 0.223 C/m2 to 0.234 C/m2. The pyroelectric coefficients of 0.05BaTiO3-PMNT and 0.10BaTiO3- PMNT at room temperature were measured to be ~0.0084 C/m2K and ~0.0043 C/m2K, respectively. The relaxor ferroelectric properties of the BaTiO3-PMNT system were confirmed by analyzing the plot of Kmax/K versus (T-Tmax)γ. The BaTiO3-doped MPB PMNT system showed a distinct pyroelectric performance index at room temperature, and the values were Fv ~ 0.0362 m2/C, Fd ~ 0.575×10-4 Pa-1/2.

Crystalline structures and electrical properties of $Pb[(Zr,Sn)Ti]NbO_3$ Thin Films deposited using RF Magnetron Sputtering Method (RF 마그네트론 스퍼터링 방법으로 제작된 $Pb[(Zr,Sn)Ti]NbO_3$ 박막의 결정구조와 전기적 특성)

  • Choi, Woo-Chang;Choi, Yong-Jung;Choi, Hyek-Hwan;Lee, Myoung-Kyo;Kwon, Tae-Ha
    • Journal of Sensor Science and Technology
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    • v.9 no.3
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    • pp.242-247
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    • 2000
  • $Pb_{0.99}[(Zr_{0.6}Sn_{0.4})_{0.9}Ti_{0.1}]_{0.98}Nb_{0.02}O_3(PNZST)$ thin films were deposited by RF magnetron sputtering on $(La_{0.5}Sr_{0.5})CoO_3(LSCO)/Pt/Ti/SiO_2/Si$ substrate using a PNZST target with excess PbO of 10 mole%. The thin films deposited at substrate temperature of $500^{\circ}C$, and at RF power of 80W were crystallized to a perovskite phase after rapid thermal annealing(RTA). The thin films annealed at $650^{\circ}C$ for 10 seconds in air exhibited the good structures and electrical properties. The fabricated PNZST capacitor had a remanent polarization value of about $20\;{\mu}C/cm^2$ and coercive field of about 50 kV/cm. The reduction of the polarization after $2.2{\times}10^9$ switching cycles was less than 10%.

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Characteristics of the Crystal Structure and Electrical Properties of Metal/Ferroelectric/Insulator/Semiconductor (Metal/Ferroelectric/Insulator/Semiconductor 구조의 결정 구조 및 전기적 특성에 관한 연구)

  • 신동석;최훈상;최인훈;이호녕;김용태
    • Journal of the Korean Vacuum Society
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    • v.7 no.3
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    • pp.195-200
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    • 1998
  • We have investigated the crystal structure and electrical properties of Pt/SBT/$CeO_2$/Si(MFIS) and Pt/SBT/Si(MFS) structures for the gate oxide of ferroelectric memory. XRD spectra and SEM showed that the SBT film of SBT/$CeO_2$/Si structure had larger grain than that of SBT/Si structure. Furthermore HRTEM showed that SBT/$CeO_2$/Si had 5 nm thick $SiO_2$layer and very smooth interface but SBT/Si had 6nm thick $SiO_2$layer and 7nm thick amorphous intermediate interface. Therefore, $CeO_2$film between SBT film and Si substrate is confirmed as a good candidate for a diffusion barrier. The remanent polarization decreased and coercive voltage increased in Pt/SBT/$CeO_2/Pt/SiO_2$/Si structure. This effect may increase memory window of MFIS structure directly related to the coercive voltage. From the capacitance-voltage characteristics, the memory of Pt/SBT(140 nm)/$CeO_2$(25 nm)/Si structure were in the range of 1~2 V at the applied voltage of 4~6 V. The memory window increased with the thickness of SBT film. These results may be due to voltage applied at SBT films. The leakage currents of Pt/SBT/$CeO_2$/Si and Pt/SBT/Si were $ 10^8A/\textrm{cm}^2$ and $ 10^6 A/\textrm{cm}^2$, respectively.

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Electrode Dependence of Asymmetric Behavior of (La,Sr)CoO₃/Pb(Zr,Ti)O₃/(La,Sr)CoO₃ Thin Film Capacitors ((La,Sr)CoO₃/Pb(Zr,Ti)O₃/(La,Sr)CoO₃박막 캐패시터의 비대칭성의 전극 의존성)

  • 최치홍;이재찬;박배호;노태원
    • Journal of the Korean Ceramic Society
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    • v.35 no.7
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    • pp.647-647
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    • 1998
  • (La,Sr)CoO3/Pb(Zr,Ti)O3/(La,Sr)CoO3 (LSCO) heterostructures have been grown on LaAlO3 substrates by pulsed laser deposition (PLD) to investigate asymmetric polarization of Pb(Zr,Ti)O3 (PZT) thin flims with different electrode configuration. P-V hysteresis loop of LSCO/PZT/LSCO was symmetric. However, LaCoO3 (LCO_/PZT/LSCO showed a largely asymmetric P-V hystersis loop and large relaxation of the remanent polarization at the negatively poled state, which means that the negatively poled state was unstable. On the other hand, LSCO/PZT/LCO exhibited large relaxation of the positively poled state. The asymmetric behavior of the polarized states implies the presence of an interal electric firld inside the PZT layer. It is suggested that internal electric field is caused by built-in voltages at LCO/PZT and LSCO/PZT interfaces. The built-in voltages at LCO/PZT and CSCO/PZT interfaces were 0.6 V and -0.12 V, respectively.

Characteristics of $Pt/SrBi_2Ta_2O_9/ZrO_2/Si$ structures for NDRO ERAM (NDRO FRAM 소자를 위한 $Pt/SrBi_2Ta_2O_9/ZrO_2/Si$ 구조의 특성에 관한 연구)

  • 김은홍;최훈상;최인훈
    • Journal of the Korean Vacuum Society
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    • v.9 no.4
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    • pp.315-320
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    • 2000
  • We have investigated the crystal structure and electrical properties of Pt/SBT/$ZrO_2$/Si (MFIS) and Pt/SBT/Si (MFS) structures for the gate oxide of ferroelectric memory. XRD spectra and SEM showed that the SBT film of SBT/$ZrO_2$/Si structure had larger grain than that of SBT/Si structure. $ZrO_2$ film between SBT film and Si substrate is confirmed as a good candidate for a diffusion barrier by the analysis of AES. The remanent polarization decreased and coercive voltage increased in Pt/SBT/$ZrO_2$/Pt/$SiO_2$/Si structure. This effect may increase memory window of MFIS structure directly related to the coercive voltage. From the capacitance-volt-age characteristics, the memory windows of Pt/SBT (210 nm)/$ZrO_2$ (28 nm)/Si structure were in the range of 1~l.5 V at the applied voltage of 4~6 V. The current densities of Pt/SBT/ZrO$_2$/Si with as -deposited Pt electrode and annealed at $800^{\circ}C$ in $O_2$ambient were $8\times10^{-8} A/\textrm{cm}^2$ and $4\times10^{-8}A/\textrm{cm}^2$ , respectively.

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Ferroelectric Properties of Pb[(Zr,Sn)Ti]NbO3 Thin Films with Various Composition Ratio (조성비에 따른 Pb[(Zr,Sn)Ti]NbO3 박막의 강유전 특성)

  • Choi, Woo-Chang;Choi, Hyek-Hwan;Lee, Myoung-Kyo;Kwon, Tae-Ha
    • Journal of Sensor Science and Technology
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    • v.11 no.1
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    • pp.48-53
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    • 2002
  • Ferroelectric $Pb_{0.99}[(Zr_{0.6}Sn_{0.4})_{1-x}Ti_x]_{0.98}Nb_{0.02}O_3$(PNZST) thin films were deposited by a RF magnetron sputtering on $(La_{0.5}Sr_{0.5})CoO_3$(LSCO)/Pt/Ti/$SiO_2$/Si substrate using a PNZST target with excess PbO of 10 mole%. The crystallinity and electrical properties of the thin films with various composition ratio were investigated. The thin films deposited at the substrate temperature of $500^{\circ}C$ and the power of 80 W were crystallized to a perovskite phase after rapid thermal annealing(RTA) at $650^{\circ}C$ for 10 seconds in air. A PNZST thin films with Ti of 10 mole% showed the good crystallinity and ferroelectric properties. The remanent polarization and coercive field of the PNZST capacitor were about $20\;{\mu}C/cm^2$ and 50 kV/cm, respectively. The reduction of the polarization after $2.2{\times}10^9$ switching cycles was less than 10%.

Electrical Properties of ReMnO3(Re:Y, Ho, Er) Thin Film Prepared by MOCVD Method (화학 기상 증착법으로 제조한 ReMnO3(Re:Y, Ho, Er) 박막의 전기적 특성)

  • Kim, Eung-Soo;Chae, Jung-Hoon;Kang, Seung-Gu
    • Journal of the Korean Ceramic Society
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    • v.39 no.12
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    • pp.1128-1132
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    • 2002
  • $ReMnO_3$(Re:Y, Ho, Er) thin films were prepared by MOCVD method available to non-volatile memory device with MFS-FET structure. $ReMnO_3$ thin films were deposited on the Si(100) substrate at 700${\circ}C$ for 2h. When the films were post-annealed at 900${\circ}C$ for 1h in air, the single phase of hexagonal $ReMnO_3$ thin films were detected. Ferroelectric properties of $ReMnO_3$ thin films were dependent on the degree of c-axis orientation in the single phase of hexagonal structure and remnant polarization (Pr) of $YMnO_3$ thin films with high degree of c-axis orientation was 105 nC/$cm^2$. Leakage current density was dependent on the grain size of microstructure and that of $YMnO_3$ thin films with grain size of 100∼150 nm was $10^{-8}$ A/$cm^2$ at applied voltage of 0.5 V.