Preparation of Boron Carbide Thin Films Coated by Reactive Magnetron Sputtering (반응성 마그네트론 스퍼터링법에 의한 보론카바이드 박막의 제조)

• Lee, Gwang-Eun;Lee, Jeong-Yeong;Park, Myeong-Jin;Kim, Jong-Hui;Lee, Cheon-Bae;Kim, Jong-O
• • Proceedings of the Korean Ceranic Society Conference
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  • 2003.04a
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  • pp.227.2-227
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  • 2003
• PDF

Electric and magnetic properties of magnetic semiconductor $ZnCo_2O_4$ by reactive sputtering (반응성 스퍼터링으로 제조한 $ZnCo_2O_4$ 자성반도체의 전.자기적 특성 연구)

• 김현중;송인창;심재호;김효진;김도진;임영언;주웅길
• • Proceedings of the Korean Magnestics Society Conference
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  • 2003.06a
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  • pp.50-51
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  • 2003
• PDF

Electrical properties of AlN thin film deposited by asymmetric bipolar pulsed dc reactive sputtering (비대칭 펄스 직류 반응성 스퍼터링으로 증착된 AlN 박막의 전기적 특성)

• Kim, Ju-Hyeong;Lee, Si-Hyeong;Lee, Jeon-Guk;An, Jin-Ho
• • Proceedings of the Korean Ceranic Society Conference
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  • 2000.10a
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  • pp.52.1-52
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  • 2000
• PDF

TCR Properties of TaNx Thin Film Deposited by Reactive Sputtering (반응성 스퍼터링법으로 제조된 TaNx 박막 저항체의 TCR 특성 변화)

• Choe, Yong-Rak;Kim, Seon-Hwa;Song, Gyu-Ho;Han, Seung-Yong;Jeong, Jun-Hyeok
• • Proceedings of the Materials Research Society of Korea Conference
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  • 2005.05a
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  • pp.248-248
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  • 2005
• PDF

Effects of AIN Content on Microstructure and Hardness of $(Ti_{1-x}Al_x)N$ Thin Films Deposited by Reactive Sputtering (박막내 AIN 함량이 $(Ti_{1-x}Al_x)N$ 박막의 미세구조와 미세경도에 미치는 영향)

• 박종관;박주동;오태성
• • Proceedings of the Materials Research Society of Korea Conference
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  • 1996.11a
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  • pp.144-145
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  • 1996
• PDF

Deposition of $TiO_2$ films by reactive ICP-sputtering (유도결합플라즈마가 적용된 반응성 스퍼터법을 이용한 $TiO_2$ 박막의 증착)

• Han, Yeong-Hun;Jeong, Seung-Jae;Lee, Jeong-Jung
• • Proceedings of the Korean Institute of Surface Engineering Conference
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  • 2005.11a
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  • pp.119-119
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  • 2005
• PDF

Properties Comparision of $TiO_2$ and TiO-N made by Reactive Magnetron Sputtering

• Park, Jang-Sick;Park, Sang-Won;Kim, Tae-Woo;Kim, Sung-Kuk;Ahn, Won-Sul
• • Proceedings of the Korean Vacuum Society Conference
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  • 2004.08a
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  • pp.126-126
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  • 2004
• PDF

The electrochromic properties between amorphous and crystalline Ni oxide thin films grown by reactive RF sputtering (반응성 RF 스퍼터링법에 의해 성장된 비정질 및 결정질 Ni 산화물 박막의 전기변색 특성에 관한 연구)

• 안광순;염준호;김석순;나윤채;성영은
• • Proceedings of the Materials Research Society of Korea Conference
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  • 2001.11a
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  • pp.173-173
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  • 2001
• PDF

The electrochromic properties of tungsten oxide thin films grown by reactive RF sputtering under differenct $Ar/O_2$ ratio ($Ar/O_2$ 비율에 따른 반응성 RF 스퍼터링법에 의해 성장된 텅스텐 산화물 박막의 전기변색 특성 연구)

• 나윤채;안광순;염준호;김석순;성영은
• • Proceedings of the Materials Research Society of Korea Conference
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  • 2001.11a
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  • pp.177-177
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  • 2001
• PDF

High rate deposition of MgO films by reactive magnetron sputtering with additional electron emission

• Nam, Kyung-H.;Chung, Yun-M.;Han, Jeon-G.
• • Proceedings of the Korean Vacuum Society Conference
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  • 2002.06a
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  • pp.196-196
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  • 2002
• PDF

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