• Title/Summary/Keyword: random phase mask

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Optical Encryption Scheme for Cipher Feedback Block Mode Using Two-step Phase-shifting Interferometry

  • Jeon, Seok Hee;Gil, Sang Keun
    • Current Optics and Photonics
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    • v.5 no.2
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    • pp.155-163
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    • 2021
  • We propose a novel optical encryption scheme for cipher-feedback-block (CFB) mode, capable of encrypting two-dimensional (2D) page data with the use of two-step phase-shifting digital interferometry utilizing orthogonal polarization, in which the CFB algorithm is modified into an optical method to enhance security. The encryption is performed in the Fourier domain to record interferograms on charge-coupled devices (CCD)s with 256 quantized gray levels. A page of plaintext is encrypted into digital interferograms of ciphertexts, which are transmitted over a digital information network and then can be decrypted by digital computation according to the given CFB algorithm. The encryption key used in the decryption procedure and the plaintext are reconstructed by dual phase-shifting interferometry, providing high security in the cryptosystem. Also, each plaintext is sequentially encrypted using different encryption keys. The random-phase mask attached to the plaintext provides resistance against possible attacks. The feasibility and reliability of the proposed CFB method are verified and analyzed with numerical simulations.

Visual Cryptography Based on an Interferometric Encryption Technique

  • Lee, Sang-Su;Na, Jung-Chan;Sohn, Sung-Won;Park, Chee-Hang;Seo, Dong-Hoan;Kim, Soo-Joong
    • ETRI Journal
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    • v.24 no.5
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    • pp.373-380
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    • 2002
  • This paper presents a new method for a visual cryptography scheme that uses phase masks and an interferometer. To encrypt a binary image, we divided it into an arbitrary number of slides and encrypted them using an XOR process with a random key or keys. The phase mask for each encrypted image was fabricated nuder the proposed phase-assignment rule. For decryption, phase masks were placed on any path of the Mach-Zehnder interferometer. Through optical experiments, we confirmed that a secret binary image that was sliced could be recovered by the proposed method.

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Interferometric Image Encryption and Decryption using Binary Phase Hologram (이진 위상 홀로그램을 이용한 간섭성 영상 암호화 및 복원)

  • 김종윤;김정우
    • The Journal of the Korea Contents Association
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    • v.2 no.3
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    • pp.80-86
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    • 2002
  • In this paper, we propose the new optical security technique using two phase holograms based on interferometer. The encoded random phase image does not have any information on the original image. Without Hewing the key mask, one cannot decode the encrypted image and regenerate the original image. And the use of two phase only images in the proposed security system leads to maximum optical efficiency (100% in theory). Also they cannot be detected by an intensity detector such as a CCD camera. Computer simulations and optical experiments show performance of the proposed methods.

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Optical encryption of multiple images using amplitude mask and 2D chaos function (진폭 마스크와 2D 카오스 함수를 이용한 다중 이미지 광학 암호화)

  • Kim, Hwal;Jeon, Sungbin;Kim, Do-Hyung;Park, No-Cheol;Park, Young-Pil
    • Transactions of the Society of Information Storage Systems
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    • v.10 no.2
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    • pp.50-54
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    • 2014
  • Object image using DRPE(Double Random Phase Encryption) in 4f system is encrypted by space-division method using amplitude mask. However, this method has the weakness for the case of having partial data of amplitude mask which can access the original image. To improve the security, we propose the method using the 2-dimension logistic chaos function which shuffles the encrypted data. It is shown in simulation results that the proposed method is highly sensitive to chaos function parameters. To properly decrypt from shuffled encryption data, below 1e-5 % errors of each parameter should be required. Thus compared with conventional method the proposed shows the higher security level.

Image encryption using phase-based virtual image and interferometer

  • Seo, Dong-Hoan;Shin, Chang-Mok;Kim, Jong-Yun;Bae, Jang-Keun;Kim, Jeong-Woo;Kim, Soo-Joong
    • Proceedings of the IEEK Conference
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    • 2002.07a
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    • pp.631-634
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    • 2002
  • In this paper, we propose an improved optical security system using three phase-encoded images and the principle of interference. This optical system based on a Mach-Zehnder interferometer consists of one phase-encoded virtual image to be encrypted and two phase-encoded images, encrypting image and decrypting image, where every pixel in the three images has a phase value of '0' and '$\pi$'. The proposed encryption is performed by the multiplication of an encrypting image and a phase-encoded virtual image which dose not contain any information from the decrypted image. Therefore, even if the unauthorized users steal and analyze the encrypted image, they cannot reconstruct the required image. This virtual image protects the original image from counterfeiting and unauthorized access.. The decryption of the original image is simply performed by interfering between a reference wave and a direct pixel-to-pixel mapping image of the encrypted image with a decrypting image. Both computer simulations and optical experiments confirmed the effectiveness of the proposed optical technique for optical security applications.

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Transmittance controlled photomasks by use of backside phase patterns (후면 위상 패턴을 이용한 투과율 조절 포토마스크)

  • Park, Jong-Rak;Park, Jin-Hong
    • Korean Journal of Optics and Photonics
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    • v.15 no.1
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    • pp.79-85
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    • 2004
  • We report on a transmittance controlled photomask with phase patterns on the back quartz surface. Theoretical analysis for changes in illumination pupil shape with respect to the variation of size and density of backside phase patterns and experimental results for improvement of critical dimension uniformity on a wafer by using the transmittance controlled photomask are presented. As phase patterns for controlling transmittance of the photomask we used etched contact-hole type patterns with 180" rotative phase with respect to the unetched region. It is shown that pattern size on the backside of the photomask must be made as small as possible in order to keep the illumination pupil shape as close as possible to the original pupil shape and to achieve as large an illumination intensity drop as possible at a same pattern density. The distribution of illumination intensity drop suitable for correcting critical dimension error was realized by controlling pattern density of the contact-hole type phase patterns. We applied this transmittance controlled photomask to a critical layer of DRAM (Dynamic Random Access Memory) having a 140nm design rule and could achieve improvement of the critical dimension uniformity value from 24.0 nm to 10.7 nm in 3$\sigma$.TEX>.

Characteristics of holographic storage of random-phase-modulation-added binary amplitude data (랜덤 위상변조가 가미된 이진 진폭 데이터 영상의 홀로그래픽 저장 특성)

  • 오용석;신동학;장주석
    • Journal of the Korea Institute of Information and Communication Engineering
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    • v.5 no.2
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    • pp.289-296
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    • 2001
  • We propose a method to add phase-modulation to binary amplitude data pages using a twisted-nematic liquid crystal display as a dynamic phase mask. For this, the phase modulation characteristics of the display were examined both theoretically and experimentally, and an unexpected abnormal phenomenon was found experimentally in which the modulation property changed as the incident beam intensity increased. To investigate the characteristics of holographically storing the binary data images, eight pages of holograms were stored at one spot of in un-thick Dupont's photopolymer with angle multiplexing. When phase-modulation-added pages were stored at the Fourier plane, the uniformity of the signal beam at the plane was improved, and thus more holograms can be recorded with our method, compared with the conventional case of using only binary amplitude modulation under the same condition.

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Optical Security System Using Phase Mask and Interferometer (위상 카드와 간섭계를 이용한 광학적 보안 시스템)

  • Kim, Jong-Yun;Kim, Gi-Jeong;Park, Se-Jun;Kim, Cheol-Su;Bae, Jang-Geun;Kim, Jeong-U;Kim, Su-Jung
    • Journal of the Institute of Electronics Engineers of Korea SD
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    • v.38 no.1
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    • pp.37-43
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    • 2001
  • In this paper, we propose a new optical security technique using two phase masks based on interferometer. A binary random phase image is used as a reference image and the encrypted image is generated according to the phase difference between the reference image and the original image. If there is no phase difference of a same pixel position in two phase masks, interference intensity of the pixel has minimum value and if phase difference of a same pixel position in two phase masks is $\pi$, its interference intensity has maximum value. We can decrypt the original image by putting two phase masks on each of the two optical paths of the Mach-Zehnder interferometer. Computer simulation and the optical experiments show a good performance of the proposed optical security system.

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Application of Transmittance-Controlled Photomask Technology to ArF Lithography (투과율 조절 포토마스크 기술의 ArF 리소그래피 적용)

  • Lee, Dong-Gun;Park, Jong-Rak
    • Korean Journal of Optics and Photonics
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    • v.18 no.1
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    • pp.74-78
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    • 2007
  • We report theoretical and experimental results for application of transmittance-controlled photomask technology to ArF lithography. The transmittance-controlled photomask technology is thought to be a promising technique fo critical dimension (CD) uniformity correction on a wafer by use of phase patterns on the backside of a photomask. We could theoretically reproduce experimental results for illumination intensity drop with respect to the variation of backside phase patterns by considering light propagation from the backside to the front side of a photomask at the ArF lithography wavelength. We applied the transmittance-controlled photomask technology to ArF lithography for a critical layer of DRAM (Dynamic Random Access Memory) having a 110-nm design rule and found that the in-field CD uniformity value was improved from 13.8 nm to 9.7 nm in $3{\sigma}$.

Low-temperature solution-processed aluminum oxide layers for resistance random access memory on a flexible substrate

  • Sin, Jung-Won;Jo, Won-Ju
    • Proceedings of the Korean Vacuum Society Conference
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    • 2016.02a
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    • pp.257-257
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    • 2016
  • 최근에 메모리의 초고속화, 고집적화 및 초절전화가 요구되면서 resistive random access memory (ReRAM), ferroelectric RAM (FeRAM), phase change RAM (PRAM)등과 같은 차세대 메모리 기술이 활발히 연구되고 있다. 다양한 메모리 중에서 특히 resistive random access memory (ReRAM)는 빠른 동작 속도, 낮은 동작 전압, 대용량화와 비휘발성 등의 장점을 가진다. ReRAM 소자는 절연막의 저항 스위칭(resistance switching) 현상을 이용하여 동작하기 때문에 SiOx, AlOx, TaOx, ZrOx, NiOx, TiOx, 그리고 HfOx 등과 같은 금속 산화물에 대한 연구들이 활발하게 이루어지고 있다. 이와 같이 다양한 산화물 중에서 AlOx는 ReRAM의 절연막으로 적용되었을 때, 우수한 저항변화특성과 안정성을 가진다. 하지만, AlOx 박막을 형성하기 위하여 기존에 많이 사용되어지던 PVD (physical vapour deposition) 또는 CVD (chemical vapour deposition) 방법에서는 두께가 균일하고 막질이 우수한 박막을 얻을 수 있지만 고가의 진공장비 사용 및 대면적 공정이 곤란하다는 문제점이 있다. 한편, 용액 공정 방법은 공정과정이 간단하여 경제적이고 대면적화가 가능하며 저온에서 공정이 이루어지는 장점으로 많은 관심을 받고 있다. 본 연구에서는 sputtering 방법과 용액 공정 방법으로 형성한 AlOx 기반의 ReRAM에서 메모리 특성을 비교 및 평가하였다. 먼저, p-type Si 기판 위에 습식산화를 통하여 SiO2 300 nm를 성장시킨 후, electron beam evaporation으로 하부 전극을 형성하기 위하여 Ti와 Pt를 각각 10 nm와 100 nm의 두께로 증착하였다. 이후, 제작된 AlOx 용액을 spin coating 방법으로 1000 rpm 10 초, 6000 rpm 30 초의 조건으로 증착하였다. Solvent 및 불순물 제거를 위하여 $180^{\circ}C$의 온도에서 10 분 동안 열처리를 진행하였고, 상부 전극을 형성하기 위해 shadow mask를 이용하여 각각 50 nm, 100 nm 두께의 Ti와 Al을 electron beam evaporation 방법으로 증착하였다. 측정 결과, 용액 공정 방법으로 형성한 AlOx 기반의 ReRAM에서는 기존의 sputtering 방법으로 제작된 ReRAM에 비해서 저항 분포가 균일하지는 않았지만, 103 cycle 이상의 우수한 endurance 특성을 나타냈다. 또한, 1 V 내외로 동작 전압이 낮았으며 104 초 동안의 retention 측정에서도 메모리 특성이 일정하게 유지되었다. 결론적으로, 간단한 용액 공정 방법은 ReRAM 소자 제작에 많이 이용될 것으로 기대된다.

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