1 |
ITRS (International Technology Roadmap for Semiconductors) 2006 Update: http://public.itrs.net/
|
2 |
J. van Schoot, O. Noordman, P. Vanoppen, F. Blok, D. Yim, C.-H. Park, B.-H. Cho, T. Theeuwes, and Y.-H. Min, 'CD Uniformity Improvement by Active Scanner Corrections Corrections,' in Optical Microlithography XV, A. Yen, Ed., Proc. SPIE, vol. 4691, pp. 304-314, 2002
DOI
|
3 |
J. W. Goodman, Introduction to Fourier optics (McGraw-Hill, Singapore, 1996), Chap. 3
|
4 |
E. Zait, V. Dmitriev, S. Oshemkov, G. Ben-Zvi, D. Michaelis, 'CD Variation Correction by Local Transmission Control of Photomasks Done with a Novel Laser Based Process,' in Metrology, Inspection, and Process Control for Microlithography XX, Chas N. Archie, Ed., Proc. SPIE, vol. 6152, pp. 615225-1–615225-6, 2006
DOI
|
5 |
J. R. Park, S. H. Kim, J.-H. Park, D. G. Lee, S.-Y. Kim, B.-C. Cha, and S.-W. Choi, 'Correction of Critical Dimension Uniformity on a Wafer by Controlling Backside Transmittance Distribution of a Photomask,' Jpn. J. Appl. Phys., vol. 43, no. 9A, pp. 6012-6019, 2004
DOI
|
6 |
A. K. Wong, Resolution Enhancement Techniques in Optical Lithography (SPIE Press, Washington, USA. 2001), Chap. 2
|
7 |
H. J. Yoo, Y.-H. Oh, B.-S. Park, S. S. Choi, Y. J. Jeon, C. Lee, and S.-C. Park, 'Lithographic Performance Enhancement Using Dummy Diffraction Mask,' Jpn, J. Appl. Phys., vol. 32, no. 12B, pp. 5903-5908, 1993
DOI
|
8 |
D. Yim, S. Lee, S. Lee, Y.-H. Oh, H. B. Chung, and H. J. Yoo, 'Effect of Degree of Coherence in Optical Lithography Using Dummy Diffraction Mask,' Jpn, J. Appl. Phys., vol. 35, no. 2A, pp. 780-785, 1996
DOI
|
9 |
김순호, 최성운, 문성용, 박진홍, '광학 장치 및 이의 제조 방법', 대한민국특허 등록번호 10-0555531, 2006
|
10 |
J. R. Park, S.-W. Choi, G.-S. Yeo, and S. H. Jang, 'Photomask Having a Transparency-Adjusting Layer, Method of Manufacturing the Photomask, and Exposure Method Using the Photomask', U. S. Patent 7001697, 2006
|