• Title/Summary/Keyword: quantum beam diffraction

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Development and Characterization of a 400-W Slab-type Nd:YAG Gain Module

  • Cha, Yong-Ho;Lee, Sungman;Lim, Gwon;Baik, Sung-Hoon;Kwon, Sung-Ok;Cha, Byung-Heon;Lee, Jung-Hwan;Kang, Eung-Cheol
    • Journal of the Optical Society of Korea
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    • v.16 no.1
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    • pp.53-56
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    • 2012
  • We have developed a slab-type Nd:YAG gain module based on the techniques of conduction cooling and end pumping. The Nd:YAG slab is end-capped on both ends by undoped pure YAG and is pumped through the end-caps by stacked arrays of laser diode bars. The slab's surfaces of total internal reflection are in contact on both sides with microchannel cooling blocks which are cooled by water circulation. The power oscillator based on the gain module generates more than 400 W at 1-kW pumping with a slope efficiency of 55%. The small-signal gain of the gain module is 10 in a single zig-zag pass, and the amplified beam shows a near diffraction-limited beam quality.

Nanomaterials Research Using Quantum Beam Technology

  • Kishimoto, Naoki;Kitazawa, Hideaki;Takeda, Yoshihiko
    • Proceedings of the Materials Research Society of Korea Conference
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    • 2011.10a
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    • pp.7-7
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    • 2011
  • Quantum beam technology has been expected to develop breakthroughs for nanotechnology during the third basic plan of science and technology (2006~2010). Recently, Green- or Life Innovations has taken over the national interests in the fourth basic science and technology plan (2011~2015). The NIMS (National Institute for Materials Science) has been conducting the corresponding mid-term research plans, as well as other national projects, such as nano-Green project (Global Research for Environment and Energy based on Nanomaterials science). In this lecture, the research trends in Japan and NIMS are firstly reviewed, and the typical achievements are highlighted over key nanotechnology fields. As one of the key nanotechnologies, the quantum beam research in NIMS focused on synchrotron radiation, neutron beams and ion/atom beams, having complementary attributes. The facilities used are SPring-8, nuclear reactor JRR-3, pulsed neutron source J-PARC and ion-laser-combined beams as well as excited atomic beams. Materials studied are typically fuel cell materials, superconducting/magnetic/multi-ferroic materials, quasicrystals, thermoelectric materials, precipitation-hardened steels, nanoparticle-dispersed materials. Here, we introduce a few topics of neutron scattering and ion beam nanofabrication. For neutron powder diffraction, the NIMS has developed multi-purpose pattern fitting software, post RIETAN2000. An ionic conductor, doped Pr2NiO4, which is a candidate for fuel-cell material, was analyzed by neutron powder diffraction with the software developed. The nuclear-density distribution derived revealed the two-dimensional network of the diffusion paths of oxygen ions at high temperatures. Using the high sensitivity of neutron beams for light elements, hydrogen states in a precipitation-strengthened steel were successfully evaluated. The small-angle neutron scattering (SANS) demonstrated the sensitive detection of hydrogen atoms trapped at the interfaces of nano-sized NbC. This result provides evidence for hydrogen embrittlement due to trapped hydrogen at precipitates. The ion beam technology can give novel functionality on a nano-scale and is targeting applications in plasmonics, ultra-fast optical communications, high-density recording and bio-patterning. The technologies developed are an ion-and-laser combined irradiation method for spatial control of nanoparticles, and a nano-masked ion irradiation method for patterning. Furthermore, we succeeded in implanting a wide-area nanopattern using nano-masks of anodic porous alumina. The patterning of ion implantation will be further applied for controlling protein adhesivity of biopolymers. It has thus been demonstrated that the quantum beam-based nanotechnology will lead the innovations both for nano-characterization and nano-fabrication.

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Annealing Effects on $Zn_{0.9}Cd_{0.1}$/Se/ZnSe Strained Single Quantum Well (Zn_{0.9}Cd_{0.1}/ZnSe 변형된 단일 양자우물구조의 열처리 효과)

  • 김동렬;배인호;손정식
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.13 no.6
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    • pp.467-471
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    • 2000
  • The thermal annealing effect of $Zn_{0.9}Cd_{0.1}$ single quantum-well structures grown by molecular beam epitaxy is investigated. As the results of before and after rapid thermal annealed samples a red shift of E1-HH1 peak by Cd interdiffusion during thermal annealing of ZnCeSe/ZnSe sample was observed. In the case of annealed sample over $450^{\circ}C$ donor and acceptor impurities related peaks were observed which seems to be due to a diffusion of Ga and As from GaAs substrate. And also interdiffusion phenomena is idenified by the results of DCX measurements and which are consisten with the PL measurements.

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Local strain / stress and their influence to mechano - electromagnetic properties of in composite superconducting wires

  • Osamura, Kozo;Machiya, Shutaro
    • Progress in Superconductivity and Cryogenics
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    • v.21 no.2
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    • pp.1-9
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    • 2019
  • Practical superconducting wires are designed with a composite structure to meet the desired engineering characteristics by expert selection of materials and design of the architecture. In practice, the local strain exerted on the superconducting component influences the electromagnetic properties. Here, recent progress in methods used to measure the local strain in practical superconducting wires and conductors using quantum beam techniques is introduced. Recent topics on the strain dependence of critical current are reviewed for three major practical wires: $Nb_3Sn$, BSCCO-2223 and REBCO tapes.

Influence of Quantum well Thickness Fluctuation on Optical Properties of InGaN/GaN Multi Quantum well Structure Grown by PA-MBE

  • Woo, Hyeonseok;Kim, Jongmin;Cho, Sangeun;Jo, Yongcheol;Roh, Cheong Hyun;Kim, Hyungsang;Hahn, Cheol-Koo;Im, Hyunsik
    • Applied Science and Convergence Technology
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    • v.26 no.3
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    • pp.52-54
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    • 2017
  • An InGaN/GaN multiple quantum well (MQW) structure is grown on a GaN/sapphire template using a plasma-assisted molecular beam epitaxy (PA-MBE). The fluctuation of the quantum well thickness formed from roughly-grown InGaN layer results in a disordered photoluminescence (PL) spectrum. The surface morphologies of the InGaN layers with various In compositions are investigated by reflection high energy electron diffraction (RHEED) and atomic force microscopy (AFM). A blurred InGaN/GaN hetero-interface and the non-uniform QW size is confirmed by high resolution transmission electron microscopy (HR-TEM). Inhomogeneity of the quantum confinement results in a degradation of the quantum efficiency even though the InGaN layer has a uniform In composition.

Growth Interruption Effects of GaAs/AlGaAs Quantum Wells Grown by Molecular Beam Epitaxy (분자선에피택시에 의해 성장한 GaAs/AlGaAs 양자우물의 성장 멈춤 효과)

  • Kim, Min-Su;Leem, Jae-Young
    • Journal of the Korean Vacuum Society
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    • v.19 no.5
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    • pp.365-370
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    • 2010
  • The growth interruption effects on growth mode of the GaAs and AlGaAs epitaxial layers grown on GaAs substrate by molecular beam epitaxy were investigated. Growth process of the epitaxial layers as a function of the growth interruption time was observed by reflection high energy electron diffraction (RHEED). The growth interruption time was 0, 15, 30, 60 s. The GaAs/$Al_{0.3}Ga_{0.7}As$ multi quantum wells (MQWs) with different growth interruption time were grown and its properties were investigated. RHEED intensity oscillation and optical property of the MQWs were dependent on the growth interruption time. When the growth interruption time was 30 s, interface between the well and barrier layers became sharper.

Planar Hall Effect of GaMnAs Grown via low Temperature Molecular Beam Epitaxy (저온 분자선에피탁시 방법으로 성장시킨 GaMnAs의 planar Hall 효과)

  • Kim, Gyeong-Hyeon;Park, Jong-Hun;Kim, Byeong-Du;Kim, Do-Jin;Kim, Hyo-Jin;Im, Yeong-Eon;Kim, Chang-Su
    • Korean Journal of Materials Research
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    • v.12 no.3
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    • pp.195-199
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    • 2002
  • Planar Hall effect of ferromagnetic GaMnAs thin films was investigated for the first time. The films were grown in an optimized growth condition via molecular beam epitaxy at low temperatures. For the optimization of the growth conditions, we used reflection high-energy electron diffraction, electrical conductivity, double crystal x-ray diffraction, and superconducting quantum interference device measurements techniques. We observed that the difference between the longitudinal resistance and the transverse resistance matches the planar Hall resistance. The ratio of the planar Hall resistance at saturation magnetic field to that at zero reached above 500%.

Fabrication of Nano-photonic Crystals with Lattice Constant of 460-nm by Inductively-coupled Plasma Etching Process (유도결합형 플라즈마 식각공정을 통해 제작된 460 nm 격자를 갖는 나노 광결정 특성)

  • Choi, Jae-Ho;Kim, Keun-Joo
    • Journal of the Semiconductor & Display Technology
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    • v.5 no.2 s.15
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    • pp.1-5
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    • 2006
  • The GaN thin film on the 8 periods InGaN/GaN multi-quantum well structure was grown on the sapphire substrate using metal-organic chemical vapor deposition. The nano-scaled triangular-lattice holes with the diameter of 150 nm were patterned on a polymethylmethacrylate blocking film using an electron beam nano-lithography system. The thin slab and two-dimensional photonic crystals with the thickness of 28 nm were fabricated on the GaN layer for the blue light diffraction sources. The photonic crystal with the lattice parameter of 460 nm enhances spectral intensity of photoluminescence indicating that the photonic crystals provides the source of nano-diffraction for the blue light of the 450-nm wavelength.

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Molecular beam epitaxial growth and characterization of Sb .delta.-doped Si layers using substrate temperature modulation technique (저온 변조 성장 기법을 이용하여 Sb가 ${\delta}$ 도핑된 다층 구조의 Si 분자선 박막 성장과 특성 분석)

  • Le, Chan ho
    • Journal of the Korean Institute of Telematics and Electronics A
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    • v.32A no.12
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    • pp.142-148
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    • 1995
  • Sb ${\delta}$-doped Si layers were grown by Si MBE (Molecular Beam Epitaxy) system using substrate temperature modulation technique. The Si substrate temperatures were modulated between 350$^{\circ}C$ and 600$^{\circ}C$. The doping profile was as narrow as 41$\AA$ and the doping concentration of up to 3.5${\times}10^{20}cm^{3}$ was obtained. The film quality was as good as bulk material as verified by RHEED (Reflected High Energy Electron Diffraction), SRP (Spreading Resistance Profiling) and Hall measurement. Since the film quality is not degraded after the growth a Sb ${\delta}$-doped Si layer, the ${\delta}$-doped layers can be repeated as many times as we want. The doping technique is useful for many Si devices including small scale devices and those which utilize quantum mechanical effects.

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