• Title/Summary/Keyword: quantum annealing

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Photoluminescence Characteristics of InAs Quantum Dots Grown on AlAs Epitaxial Layer (AlAs 에피층 위에 성장된 InAs 양자점의 Photoluminescence 특성연구)

  • Kim, Ki-Hong;Sim, Jun-Hyoung;Bae, In-Ho
    • Korean Journal of Materials Research
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    • v.19 no.7
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    • pp.356-361
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    • 2009
  • The optical characterization of self-assembled InAs/AlAs Quantum Dots(QD) grown by MBE(Molecular Beam Epitaxy) was investigated by using Photoluminescence(PL) spectroscopy. The influence of thin AlAs barrier on QDs were carried out by utilizing a pumping beam that has lower energy than that of the AlAs barrier. This provides the evidence for the tunneling of carriers from the GaAs layer, which results in a strong QD intensity compared to the GaAs at the 16 K PL spectrum. The presence of two QDs signals were found to be associated with the ground-states transitions from QDs with a bimodal size distribution made by the excitation power-dependent PL. From the temperature-dependent PL, the rapid red shift of the peak emission that was related to the QD2 from the increasing temperature was attributed to the coherence between the QDs of bimodal size distribution. A red shift of the PL peak of QDs emission and the reduction of the FWHM(Full Width at Half Maximum) were observed when the annealing temperatures ranged from 500 $^{\circ}C$ to 750 $^{\circ}C$, which indicates that the interdiffusion between the dots and the capping layer was caused by an improvement in the uniformity size of the QDs.

Encapsulated Silicon Nanocrystals Formed in Silica by Ion Beam Synthesis

  • Choi, Han-Woo;Woo, Hyung-Joo;Kim, Joon-Kon;Kim, Gi-Dong;Hong, Wan-Hong;Ji, Young-Yong
    • Bulletin of the Korean Chemical Society
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    • v.25 no.4
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    • pp.525-528
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    • 2004
  • The photoluminescence (PL) emission of Si nanocrystals synthesized by 400 keV Si ion implanted in $SiO_2$ is studied as a function of ion dose and annealing time. The formation of nanocrystals at around 600 nm from the surface was confirmed by RBS and HRTEM, and the Si nanocrystals showed a wide and very intense PL emission at 700-900 nm. The intensity of this emission showed a typical behaviour with a fast transitory increase to reach a saturation with the annealing time, however, the red shift increased continuously because of the Ostwald ripening. The oversaturation of dose derived a decrease of PL intensity because of the diminishment of quantum confinement. A strong enhancement of PL intensity by H passivation was confirmed also, and the possible mechanism is discussed.

Preparation and Opticaa Properties of CuCl Nanocrystallites Dispersed Nonlinear Optical Glass by Sol-Gel Process (솔-젤법에 의한 CuCl 미세결정이 분산된 비선형 광학유리의 제조 및 광특성)

  • 송석표;한원택;김병호
    • Journal of the Korean Ceramic Society
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    • v.34 no.9
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    • pp.941-948
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    • 1997
  • CuCl nanocrystallites dispersed nonlinear optical silica and borosilicate glasses were fabricated by sol-gel process. CuCl powder was dissolved in TEOS(Si(OC2H5)4) and TMB((CH3O)3B), precursors of silica and borosilicate glasses, with ethanol, water and HCl, and precipitated through the heat treatment in the matrix glass. The optical properties of CuCl doped glasses were measured using the spectrophotometer at room temperature and low temperature(77K); Z1, 2 and Z3 exciton peaks from the absorption spectra, were observed at about 370 nm and 380 nm, respectively. The average radius of nanocrystallites, calculated from the blue shift of Z3 excitons, was measured according to annealing temperature and time. The precipitation temperature of CuCl nanocrystallites was decreased when boron was added to silica glass. Increase of annealing temperature and time made average radius of nanocrystallites saturated about 2 nm.

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Characterisation of $TiO_2$ film synthesized using titaniumtetrachlo precusor ($TiCl_3$를 이용해서 합성된 $TiO_2$ 박막의 특성)

  • 김강혁;이창근;이규환;김인수
    • Proceedings of the Materials Research Society of Korea Conference
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    • 2003.11a
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    • pp.111-111
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    • 2003
  • The peroxo titanic acid solution was successfully prepared using titanium trichloride as a precursor. The basic properties of the TiO2 film prepared by the solution were investigated in view of phase change, bandgap energy, crystalline size etc. The film displayed amorphous TiO$_2$ at room temperature, anatase above 281$^{\circ}C$ and a mixture of anatase and rutile at 99$0^{\circ}C$, The crystalline size increases with annealing temperatures, while the bandgap energies decrease due to the quantum size effect and the formation of rutile phase which has low bandgap energy. As a result of TG-DTA, it was found that annealing treatment at 99$0^{\circ}C$ for 2h formed a mixtures of anatase and rutile through three steps: (1) the removal of physically adsorbed water (2) the decomposition of peroxo group (3) amorphous-anatase or anatase-rutile phase transformation.

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Magnetic and structural properties of ultrathin magnetic films: Ni/Pt(111)

  • Nahm, T.U.;Oh, S.J.
    • Journal of the Korean Vacuum Society
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    • v.12 no.S1
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    • pp.17-20
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    • 2003
  • We have studied magnetic and structural properties of ultrathin Ni films grown on PI(lII) surface using in situ surface magneto-optic Kerr effect and X-ray photoelectron spectroscopy. Perpendicular magnetic anisotropy was absent, and longitudinal Kerr signal was only detectable for Ni films thicker than 6 monolayers. Enhancement in longitudinal Kerr signal by 30% was achieved by post-annealing at temperatures below 800K, but upon annealing at 820K, surface alloy was formed. By using core-level binding-energy shifts, the composition was determined to be Ni 70 at. %.

Formation mechanism of silicon nanocrystals fabricated by pulsed laser deposition (펄스레이저 증착법에 의한 실리콘 나노결정 형성 메커니즘)

  • Kim, Jong-Hoon;Jeon, Kyeong-Ah;Kim, Gun-Hee;Lee, Sang-Yeol
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2004.07a
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    • pp.162-164
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    • 2004
  • Nanocrystalline silicon(nc-Si) thin films on the silicon substrates have been prepared by pulsed laser deposition(PLD). The optical and structural properties of films have been investigated depending on deposition temperature, annealing, and oxidation process. When the deposition temperature increased, photoluminescence(PL) intensity abruptly decreased and peaks showed red shift. Annealing process could reduce the number of defect centers. Oxidation had a considerable effect upon the formation and isolation of the nanocrystals. These results indicate that the formation mechanism of Si nanocrystals grown by PLD can be explained by three steps of growth, passivating defect centers, and isolation, sequentially.

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Influence of Annealing Temperature on Structural and Thermoelectrical Properties of Bismuth-Telluride-Selenide Ternary Compound Thin Film

  • Kim, Youngmoon;Choi, Hyejin;Kim, Taehyeon;Cho, Mann-Ho
    • Proceedings of the Korean Vacuum Society Conference
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    • 2014.02a
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    • pp.304.2-304.2
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    • 2014
  • Chalcogenides (Te,Se) and pnictogens(Bi,Sb) materials have been widely investigated as thermoelectric materials. Especially, Bi2Te3 (Bismuth telluride) compound thermoelectric materials in thin film and nanowires are known to have the highest thermoelectric figure of merit ZT at room temperature. Currently, the thermoelectric material research is mostly driven in two directions: (1) enhancing the Seebeck coefficient, electrical conductivity using quantum confinement effects and (2) decreasing thermal conductivity using phonon scattering effect. Herein we demonstrated influence of annealing temperature on structural and thermoelectrical properties of Bismuth-telluride-selenide ternary compound thin film. Te-rich Bismuth-telluride-selenide ternary compound thin film prepared co-deposited by thermal evaporation techniques. After annealing treatment, co-deposited thin film was transformed amorphous phase to Bi2Te3-Bi2Te2Se1 polycrystalline thin film. In the experiment, to investigate the structural and thermoelectric characteristics of Bi2Te3-i2Te2Se1 films, we measured Rutherford Backscattering spectrometry (RBS), X-ray diffraction (XRD), Raman spectroscopy, Scanning eletron microscopy (SEM), Transmission electron microscopy (TEM), Seebeck coefficient measurement and Hall measurement. After annealing treatment, electrical conductivity and Seebeck coefficient was increased by defect states dominated by selenium vacant sites. These charged selenium vacancies behave as electron donors, resulting in carrier concentration was increased. Moreover, Thermal conductivity was significantly decreased because phonon scattering was enhanced through the grain boundary in Bi2Te3-Bi2Te2Se1 polycrystalline compound. As a result, The enhancement of thermoelectric figure-of-merit could be obtained by optimal annealing treatment.

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Fabrication of YB$_{a2}Cu_3O_{7-{\delta}}/SrTiO_3/YB_{a2}Cu_3O_{7-{\delta}}$ multilayer structure for ground plane of single flux quantum digital circuit (단자속 양자 디지털 회로의 접지면을 위한 YB$_{a2}Cu_3O_{7-{\delta}}/SrTiO_3/YB_{a2}Cu_3O_{\7-{\delta}}$ 다층 구조의 제작)

  • Jang, Ju-Eok;Kim, Young-Hwan;Kim, Young-Hwan;Lee, Jong-Min;Park, Jong-Hyeog;Kang, Joon-Hee
    • 한국초전도학회:학술대회논문집
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    • v.9
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    • pp.71-74
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    • 1999
  • We have fabricated high-T$_c$ superconducting YBa$_2Cu_3O_{7-{\delta}}\;/SrTiO_3/\;YBa_2Cu_3O_{7-{\delta}}$ (YBCO/STO/YBCO) multilayer structure on (001) $SrTiO_3$ substrate by using pulsed laser deposition technique for applying to ground plane of single flux quantum digital circuits. In this structure, the top and bottom YBCO layers were connected through the holes in the STO insulating layer. The critical temperature of the two YBCO layers connected each other was 86 K after annealing at 500 $^{\circ}C$ in $O_2$ atm for about 60 hr. This result shows that the annealing process is very important fabricating YBCO/STO/YBCO multilayer structure An experiment to optimize the fabrication process of YSCO/ST0/YBCO multilayer structure with good quality is in progress.

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Effect of hydrogen on the photoluminescence of Silicon nanocrystalline thin films (실리콘 나노결정 박막에서 수소 패시베이션 효과)

  • Jeon, Kyung-Ah;Kim, Jong-Hoon;Kim, Gun-Hee;Lee, Sang-Yeol
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2004.07b
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    • pp.1033-1036
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    • 2004
  • Si nanocrystallites thin films on p-type (100) Si substrate have been fabricated by pulsed laser deposition using a Nd:YAG laser. After deposition, samples were annealed at the temperatures of 400 to $800^{\circ}C$. Hydrogen passivation was then performed in the forming gas (95% $N_2$ + 5% $H_2$) for 1 hr. Strong violet-indigo photoluminescence has been observed at room temperature from nitrogen ambient-annealed Si nanocrystallites. The variation of photoluminescence (PL) Properties of Si nanocrystallites thin films has been investigated depending on annealing temperatures with hydrogen passivation. From the results of PL, Fourier transform infrared (FTIR), and high-resolution transmission electron microscopy (HRTEM) measurements, it is observed that the origin of violet-indigo PL from the nanocrystalline silicon in the silicon oxide film is related to the quantum size effect of Si nanocrystallites and oxygen vacancies in the SiOx(x : 1.6-1.8) matrix affects the emission intensity.

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