• Title/Summary/Keyword: pyrochlore

검색결과 174건 처리시간 0.021초

유리기판위에 증착한 50% Pb-excess PZT박막의 전기적특성 (Electrical Properties of 50% Pb-excess PZT Thin Films Deposited on the Glass Substrates)

  • 정규원;박영;주필연;박기엽;송준태
    • 한국전기전자재료학회논문지
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    • 제14권5호
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    • pp.370-375
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    • 2001
  • PZT thin films (3500${\AA}$) ahve been prepared onto Pt/Ti/corning glass (1737) substrates with a RF magnetron sputtering system using Pb$\sub$1.50/(Zr$\sub$0.52/,Ti$\sub$0.48)O$_3$ ceramic target. We used two-step annealing techniques, PZT thin films were grown at a 300$^{\circ}C$ substrate temperature and then subjected to an RTA treatment. In case of 500$^{\circ}C$ RTA temperature show pyrochlore phase. The formation of Perovskite phase started above 600$^{\circ}C$ and PZT thin films generated (101) preferred orientation. As the RTA time and temperature increased, crystallization of PZT films were enhanced. The PZT capacitors fabricated at 650$^{\circ}C$ for 10 minutes RTA treatment showed remanent polarization 30 ${\mu}$C/$\textrm{cm}^2$, saturation polarization 42${\mu}$C/$\textrm{cm}^2$, coercive field 110kV/cm, leakage current density 2.83x10$\^$-7/A/$\textrm{cm}^2$, remanent polarization were decreased by 30% after 10$\^$9/ cycles.

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Perovskite PMT-PT계의 강유전 특성 및 확산상전이 (Ferroelectric Properties and DPT in the Perovskite PMT-PT System)

  • 김연중
    • 한국진공학회지
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    • 제17권2호
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    • pp.122-129
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    • 2008
  • Perovskite 구조의 PMT-PT계 고용체를 precursor columbite를 이용한 산화물 혼합법으로 제작하여 결정립의 성장과 상전이 현상을 분석하였다. $1250^{\circ}C$에서 4시간 유지하여 제작한 시편의 소결밀도는 이론밀도의 97% 이상이었고, 완전한 perovskite phase를 형성하였다. 치밀하게 소결 처리된 시편의 결정립의 크기는 $6\sim8{\mu}m$로 측정되었다. PMT-PT 고용체계는 복합 강유전 고용체의 전형적인 P-E 이력현상과 강한 진동수 분산특성이 관찰되었다. 특히 PMT가 70% 이하인 조성은 상전이 온도 이상에서도 자발분극이 완전히 소멸하지 않는 relaxor 특성을 보였으며, 유전상수와 유전손실의 큰 진동수 의존성을 보였다.

Stabilization of the Perovskite Phase and Electrical Properties of Ferroelectrics in the Pb2(Sc,Nb)O6 System

  • Kim, Yeon Jung
    • Applied Science and Convergence Technology
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    • 제24권6호
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    • pp.224-227
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    • 2015
  • Ferroelectric $Pb_2(Sc,Nb)O_6$ were prepared under two different sintering conditions using the oxide mixing method and the electrical properties were measured. The sintering conditions were $1350^{\circ}C$ for 25 minutes and $1400^{\circ}C$ for 20 minutes. EDX spectroscopy and XRD were used to determine the crystalline characteristic of the $Pb_2(Sc,Nb)O_6$ compositions Pyrochlore phase showed about 2% in all $Pb_2(Sc,Nb)O_6$ specimens. It expands the growth of crystals in samples sintered at $1400^{\circ}C$ than $1350^{\circ}C$, but all samples were the optimal crystallization. The temperature and frequency dependence of the complex dielectric constant and admittance were measured to analyze the electrical properties. The high dielectric constant of the specimens reflects the good stoichiometry and crystallization. The maximum value of the dielectric constant in the two specimens treated with sintering at $1350^{\circ}C$ and $1400^{\circ}C$ were more than 27,000, and the dielectric loss at room temperature is smaller than 0.05. The maximum dielectric constant decreased with increasing frequency, the transition temperature also increased in $Pb_2(Sc,Nb)O_6$ compositions. The admittance and susceptance values reach a peak at all temperatures, and the magnitude of the peak increases with increasing measuring temperature. Strong frequency dependent of maximum admittance, susceptance, dielectric constant and dielectric loss were observed.

용융염 합성법에 의한 $Pb(Sc_{1/2}Ta_{1/2})O_3$의 제조 (Preparation of $Pb(Sc_{1/2}Ta_{1/2})O_3$, by the molten salt synthesis method)

  • 박경봉;김태희
    • 한국결정성장학회지
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    • 제15권3호
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    • pp.99-103
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    • 2005
  • NaCl-KCl을 flux로 사용한 용융염 합성법을 이용하여 $Pb(Sc_{1/2}Ta_{1/2})O_3$, 분말을 제조하였다. $700^{\circ}C$에서 $800^{\circ}C$의 온도범위에서 상형성 및 분말 상태의 변화를 조사하였다. 용융염 합성법으로 $750^{\circ}C$ 2시간 하소하였을 때, 순수한 페로브스카이트 구조를 가진 $Pb(Sc_{1/2}Ta_{1/2})O_3$ 상이 형성되었으며, 평균 입자 크기는 $0.5\{mu}m$ 이하이고 입방체와 유사한 형상을 갖는 분말이 제조되었다. DIA, X-선 회절 분석, 미세구조 변화를 통해 합성된 분말의 특성을 고찰하였다.

붕규산염 유리 첨가에 따른 $Bi_2(Zn_{1/3}Nb_{2/3})_2O_7$의 저온 소결 및 유전 특성 (Low Temperature Sintering and Dielectric Properties of $Bi_2(Zn_{1/3}Nb_{2/3})_2O_7$ with (ZBS, BZBS) glasses)

  • 김관수;박종국;윤상옥;김신;김윤한;강석용
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2008년도 하계학술대회 논문집 Vol.9
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    • pp.342-342
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    • 2008
  • The low temperature sintering and microwave dielectric properties of ceramic/glass composites which were composed of ceramics in the $Bi_2(Zn_{1/3}Nb_{2/3})_2O_7$ and zinc borosilicate glass/bismuth-zinc borosilicate glass were investigated with a view to applying the microwave dielectrics to low temperature co-fired ceramics. The $Bi_2(Zn_{1/3}Nb_{2/3})_2O_7$ addition of 5 wt% ZBS and BZBS glass ensured a successful sintering below $900^{\circ}C$. In addition, pyrochlore phase was observed in the all composition. $Bi_2(Zn_{1/3}Nb_{2/3})_2O_7$ with 5 wt% BZBS glasss demonstrated 70 as the dielectric constant ($\varepsilon_r$), 2,500 GHz as the Q$\times$f value, and -40 ppm/$^{\circ}C$ as TCF.

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Dielectric Properties of PZT(20/80)/PZT(80/20) Heterolayered Thick Films Fabricated by Screen-printing Method

  • Lee, Sung-Gap;Lee, Young-Hie
    • Transactions on Electrical and Electronic Materials
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    • 제7권3호
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    • pp.129-133
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    • 2006
  • Ferroelectric PZT heterolayered thick films were fabricated by the alkoxide-based sol-gel method. PZT(20/80) and PZT(80/20) paste were made and alternately screen-printed on the alumina substrates. The coating and drying procedure was repeated 4 times to form the heterolayered thick films. The thickness of the PZT heterolayered thick films was approximately $60{\mu}m$. All PZT thick films showed the typical XRD patterns of a polycrystalline rhombohedral structure. And in the PZT thick films sintered at $1100^{\circ}C$, the pyrochlore phase was observed due to the evaporation of PbO. The relative dielectric constant and the dielectric loss of the PZT thick films sintered at $1050^{\circ}C$ were 445.2 and 1.90 % at 1 kHz, respectively. The remanent polarization and coercive field of the PZT thick films sintered at $1050^{\circ}C$ were $14.15{\mu}C/cm^2$ and 19.13 kV/cm, respectively.

PMN 계 유전체 적용 EL 소자의 광전특성 연구 (The Study of Opto-electric Properties in EL Device with PMN Dielectric Layer)

  • 금정훈;한다솔;안성일;이성의
    • 한국전기전자재료학회논문지
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    • 제22권9호
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    • pp.776-780
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    • 2009
  • In this study, the opto-electric properties of EL devices with PMN dielectric layer with variation of firing tempereature were investigated. For the PMN dielectric layer process, the paste was prepared by optimization of quantitative mixing of PMN powder, $BaTiO_3$, Glass Frit, $\alpha$-Terpineol and ethyl cellulose. The EL device stack consists of Alumina substrate ($Al_2O_3$), metallic electrode (Au), insulating layer (manufactured PMN paste), phosphor layer (ELPP- 030, ELK) and transparent electrode (ITO), which is well structure as a thick film EL device. The phase transformation properties of PMN dielectric with various firing temperatures of $150^{\circ}C$ to $850^{\circ}C$ was characterized by XRD. Also the opto-electric properties of EL devices with different firing temperature were investigated by LCR meter and spectrometer. We found the best opto-electric property was obtained at the condition of $550^{\circ}C$ firing which is 3432.96 $cd/m^2$ at 1948.3 pF Capacitance, 40 kHz Frequency, 40% Duty, Vth+330 V voltage.

RF magnetron sputtering으로 제작한 BLT 박막의 후열처리 시 가스비 변화에 따른 전기적 특성에 관한 연구 (The effect of electrical properties by gas ratio on $Bi_{3.25}La_{0.75}Ti_3O_{12}$ thin films deposited by RF magnetron sputtering during being annealed)

  • 이규일;김응권;강현일;송준태
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2003년도 춘계학술대회 논문집 센서 박막재료 반도체 세라믹
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    • pp.49-52
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    • 2003
  • The role of gas ratio with the crystallization behavior and electrical properties in $Bi_{3.25}La_{0.75}Ti_3O_{12}$(BLT) thin films by rf magnetron sputtering method has not been precisely defined. In this work, the ferroelectric properties of these films with gas variation was investigated. BLT thin films were deposited on the Pt/Ti bottom electrode by rf magnetron sputtering method and then they were crystallized by rapid thermal annealing (RTA). The experiment showed that all BLT films indicated perovskite polycrystalline structure with preferred orientation (020) and (0012). And no pyrochlore phase was observed. The fabricated film annealed with $O_2$ of 15 sccm showed that value of leakage current was $9.67{\times}10^{-7}A/cm^2$ at 50kV /em, and the value of remanent polarization (2Pr=Pr+-Pr-) was $11.8{\mu}C/cm^2$. Therefore we induce access to memory device application by rf-magnetron sputtering method in this report.

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Preparation and Characterization of Small Sized PZT Powders: A Sol-Gel Modified Approach

  • 최규만;이해춘
    • 한국정보전자통신기술학회논문지
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    • 제1권2호
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    • pp.27-32
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    • 2008
  • A current research basically diverted towards an increase in the operational output with the minimization of the materials used, which ultimately scaled down the dimensions of ceramic electronic components. In this direction the nano-technology pave the revolutionary changes in particular the electronic industries. The applications of nano-sized particles or nano-sized materials are hence, playing a significant role for various purposes. The PZT(lead, zirconium, titanium) based ceramics which, are reported to be ferroelectric materials have their important applications in the areas of surface acoustic waves (SAW), filters, infrared detectors, actuators, ferroelectric random access memory, speakers, electronic switches etc. Moreover, these PZT materials possess the large electro mechanical coupling factor, large spontaneous polarization, low dielectric loss and low internal stress etc. Hence, keeping in view the unique properties of PZT piezoelectric ceramics we also tried to synthesize indigenously the small sized PZT ceramic powder in the laboratory by using the modified sol-gel approach. In this paper, propyl alcohol based sol-gel method was used for preparation of PZT piezoelectric ceramic. The powder obtained by this sol-gel process was calcined and sintering to reach a pyrochlore-free crystal phase. The characterization of synthesized material was carried out by the XRD analysis and the surface morphology was determined by high resolution scanning electron microscopy.

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Si 기판위에 증착한 SrTiO$_3$ /PbTiG$_3$ 고용체 박막의 구조적 특성 및 C-V 특성 (Structural and C-V characteristics of SrTiO$_3$ /PbTiO$_3$ thin film deposited on Si)

  • 이현숙;이광배;김윤정;박장우
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2000년도 하계학술대회 논문집
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    • pp.71-74
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    • 2000
  • Pt/Pb$TiO_3$/$SrTiO_3$/p-Si films were prepared by metallo-organic solution deposition(M0SD) method and investigated its structure and ferroelectric properties. Crystallinity of specimen as a funtions of post annealing temperature and the thickness of $SrTiO_3$(STO) buffer layer was studied using XRD and AFM. Based on C-V and P-E curve, $PbTiO_3$(PTO) capacitors showed good ferroelectric hysteresis arising from the polarization switching properties. When the thickness of ST0 buffer layer between PTO and Si substrate was 260 nrn and the post annealing temperature was $650^{\circ}C$, it was showed that production of the pyrochlore phase due to interdiffusion of Si into FTO was prevented. The dielectric constant of FTO thin films calculated from a maximum Cma in the accumulation region was 180 and the dielectric loss was 0.30 at 100 kHz frequency. The memory window in the C-V curve is 1.6V at a gate voltage of 5V.

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