• 한국생산제조학회지
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• 제20권4호
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• pp.395-400
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• 2011

Scanning Probe Lithography is a method to localized oxidation on single crystal silicon wafer surface. This study demonstrates nanometer scale non contact lithography process on (100) silicon (p-type) wafer surface using AFM(Atomic force microscope) apparatuses and pulse controlling methods. AFM-based experimental apparatuses are connected the DC pulse generator that supplies ultra short pulses between conductive tip and single crystal silicon wafer surface maintaining constant humidity during processes. Then ultra short pulse durations are controlled according to various experimental conditions. Non contact lithography of using ultra short pulse induces electrochemical reaction between micro-scale tip and silicon wafer surface. Various growths of oxides can be created by ultra short pulse non contact lithography modification according to various pulse durations and applied constant humidity environment.

• 한국정보통신학회논문지
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• 제16권10호
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• pp.2163-2170
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• 2012

신호수신시스템은 수신신호의 주파수, 펄스변조, 스캔 변조, 펄스내 위상변조, 펄스내 주파수 변조 등 다양한 신호에 대한 측정 및 분석능력을 보유하여야 한다. 이러한 신호수신시스템의 성능을 평가하기 위하여 신호원들을 실험실 환경에서 효율적으로 모의발생하고 다수 전파가 존재하는 실제 운영환경과 유사한 복잡한 전파환경을 모의발생할 수 있는 효율적인 신호원 발생기를 제안한다. 제안한 모의전파신호원을 신호수신시스템 개발 전 과정에 걸쳐 활용할 경우 정확한 성능 검증 및 시험 비용을 절감할 수 있다.

• 대한전기학회:학술대회논문집
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• 대한전기학회 2006년도 제37회 하계학술대회 논문집 B
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• pp.719-720
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• 2006

In the mechanical system, optimization of motion control is very essential in the aspect of automation technique progress. In the servo system, the function of controller is very important but most of the controllers have played only the role of pulse generator because the controller with main function is very expensive. In this thesis, the system was composed of PC, commonly used driver AC servo motor and a produced control board. The PC transmit a gain, a locus data to a driver and controller. At the same time, it converts imformation from the controller and convert them into data and offer an output with graph. The role of a controller is to trasmit a locus data to a driver and counting the pulse on the phase of an encoder to the PC. We have performed the experiment in order to confirm with variable PID parameter capable of the optimization of gain tuning with the counting of feedback control sensor signal with regard to the external interface into the system, such as torque. Based on the experiment result, we have confirmed as follows: First, it was confirmed that we could easily input control factors P.I Gain, constant $K_P,\;K_I$ into PC. Second, not only pulse generator function was possible, but with this pulse it was also possible to count using software with PIC chip. And third, using the multi-purpose PIC micro chip, simple operation and the formation of small size AC Servo Controller was possible.

• KIEE International Transactions on Electrophysics and Applications
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• 제4C권3호
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• pp.91-95
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• 2004

The pulsed power system is widely available for use in pulse generator applications. Generally, the pulse generator is required for very short pulse width and high peak value. We have designed and fabricated our own pulsed type power system and through its use, we investigated microbe removal characteristics. This paper introduces a simple pulsed power system for removing various microbes caused by dirty water. This system includes a 2 times power supply circuit, IR2110 operated by using a fixed voltage regulator 7812 and 7805, and the switching MOSFET (Metal Oxide Semiconductor Field Effect Transistor). We can also control this process by using a PIC one chip microprocessor. As a result, we can obtain good removing characteristics of various microbes by adjusting the charging voltage, the pulse repetition rate and the electrical field inducing time.

• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 2002년도 춘계합동학술대회 논문집
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• pp.180-183
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• 2002

The pulsed power system was widely making use good of many industrial and environments. The pulse generator generally required for short pulse duration and high peak value was forced to consider its volume and economy. In this paper, this system is designed and fabricated which has a compact size of pulse generator with switched MOSFET. We have studied the removal of rust material using Arc discharging. It have tested their characteristics by adjusting variable voltage charging and pulse repetition rate. As a result, We can eliminate rust materials with this device.

• 한국산학기술학회논문지
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• 제18권6호
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• pp.558-566
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• 2017

본 연구는 MOSFET을 이용하여 안정적인 구형파를 구현함과 동시에 순간적인 전류의 상승을 최대한 줄여 전체 회로의 안정성 이 확보된 폐수처리용 전자방사식 OH radical generator를 개발하고자 하였다. 이와 같은 문제를 해결하고 안정성이 확보된 전자방사식 고압 저전력 방전을 이용한 폐수처리용 전자방사식 OH radical generator를 개발하고 그 성능을 평가하고자 하였다. 실험은 2016년 11월부터 2017년 3월까지 실시하였다. 그 결과 AC 체배 변환기의 입력 단에 연결되는 Power MOSFET의 drain 전류는 CR-스너버 구조의 부궤환(negative feedback) 회로를 통해 안정적이고 일정한 펄스 파형을 제공할 수 있었으며 AC 체배 변환기의 여기 전류(excitation current) 감소 및 발진 회로의 안정성을 상승시킬 수 있었다. 또한 이와 같은 회로를 갖는 전자방사식 OH radical generator에서 OH radical을 안정정적으로 발생시킬 수 있었다. 또한 살균능을 평가한 결과, E. coli, S. aureus와 S. flexneri는 60분 후 최대 99.9%이상의 살균력을 보였다. 본 연구 결과를 기반으로, MOSFET을 이용하여 안정적인 구형파를 구현함과 동시에 순간적인 전류의 상승을 최대한 줄여 전체 회로의 안정성이 확보된 살균능이 우수한 폐수처리용 전자방사식 OH radical generator를 개발하였다.

• Nuclear Engineering and Technology
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• 제36권4호
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• pp.357-363
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• 2004

A prototype long pulse ion source was developed, and the beam extraction experiments of the ion source were carried out at the Neutral Beam Test Stand (NBTS) of the Korea Superconducting Tokamak Advanced Research (KSTAR). The ion source consists of a magnetic bucket plasma generator, with multi-pole cusp fields, and a set of tetrode accelerators with circular apertures. Design requirements for the ion source were a 120kV/65A deuterium beam and a 300 s pulse length. Arc discharges of the plasma generator were controlled by using the emission-limited mode, in turn controlled by the applied heating voltage of the cathode filaments. Stable and efficient arc plasmas with a maximum arc power of 100 kW were produced using the constant power mode operation of an arc power supply. A maximum ion density of $8.3{\times}10^{11}\;cm^{-3}$ was obtained by using electrostatic probes, and an optimum arc efficiency of 0.46 A/kW was estimated. The accelerating and decelerating voltages were applied repeatedly, using the re-triggering mode operation of the high voltage switches during a beam pulse, when beam disruptions occurred. The decelerating voltage was always applied prior to the accelerating voltage, to suppress effectively the back-streaming electrons produced at the time of an initial beam formation, by the pre-programmed fast-switch control system. A maximum beam power of 0.9 MW (i.e. $70\;kV{\times}12.5\;A$) with hydrogen was measured for a pulse duration of 0.8 s. Optimum beam perveance, deduced from the ratio of the gradient grid current to the total beam current, was $0.7\;{\mu}perv$. Stable beams for a long pulse duration of $5{\sim}10\;s$ were tested at low accelerating voltages.

• 대한전기학회:학술대회논문집
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• 대한전기학회 1989년도 하계종합학술대회 논문집
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• pp.625-628
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• 1989

광섬유와 micro변형기를 이용하여 다점 압력 계측 system을 구성하여 실험을 행하였다. 그 결과 pulse generator와 analog switch를 이용함으로써 100ns의 광 pulse를 쉽게 얻을 수 있었으며, 또한 3개의 광 pulse를 analog switch를 이용하여 쉽게 분리할 수 있었다. 한편 변형기에 가한 힘과 광 손실간의 상관관계를 이론치와 비교하여 조사한 결과 힘과 광손실간의 상관관계는 이론치와 실험치가 유사한 경향을 나타내는 것을 알 수 있었다.

• 대한전기학회:학술대회논문집
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• 대한전기학회 2005년도 추계학술대회 논문집 전기물성,응용부문
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• pp.207-209
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• 2005

Ultra wide band electromagnetic energy can be transmitted to a far field by emitting the nanoseconds high voltage pulse electromagnetic energy via an antenna. This UWB EM energy is expected to be used in post-packing pasteurization of food, detection of buried objects or underground water veins and caves and the treatment of waste water or polluted gas. The nanoseconds pulse forming for UWB generation using high voltage blumlein line and an ultrafast switch is mentioned.

• Current Optics and Photonics
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• 제6권6호
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• pp.576-582
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• 2022

Plasmonic high-order harmonic generation (HHG) is used in nanoscale optical applications because it can help in realizing a compact coherent ultrashort pulse generator on the nanoscale, using plasmonic field enhancement. The plasmonic amplification of nanostructures induces nonlinear optical phenomena such as second-order harmonic generation, third-order harmonic generation, frequency mixing, and HHG. This amplification also causes damage to the structure itself. In this study, the plasmonic amplification according to the design of a metal-coated sapphire conical structure is theoretically calculated, and we analyze the effects of this optical amplification on HHG and damage to the sample.