• The Journal of the Acoustical Society of Korea
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• v.34 no.6
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• pp.411-422
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• 2015

This paper presents an overview of the geological environment investigation and underwater acoustic measurements for the purpose of "Study on the Relationship between the Geological Environment and Acoustic Propagation in Shallow Water", which are jointly carried out by KIOST (Korea Institute of Ocean Science & Technology) and Hanyang University in the western shallow water off the Taean peninsula in the Yellow Sea in April-May 2013. The experimental site was made up of various sediment types and bedforms due to the strong tidal currents and coastal geomorphological characteristics. The geological characteristics of the study area were intensively investigated using multi-beam echo sounder, sub-bottom profiler, sparker system and grab sampler. Acoustic measurements with a wide range of research topics in a frequency range of 20~16,000 Hz: 1) low frequency sound propagation, 2) mid-frequency bottom loss, 3) spatial coherence analysis of ambient noise, and 4) mid- frequency bottom backscattering were performed using low- and mid-frequency sound sources and vertical line array. This paper summarizes the topics that motivated the experiment, methodologies of the acoustic measurements, and acoustic data analysis based on the measured geological characteristics, and describes summary results of the geological, meteorological, and oceanographic conditions found during the experiments.

• Geophysics and Geophysical Exploration
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• v.14 no.4
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• pp.289-297
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• 2011

Chirp sub-bottom profilers (SBP) data are comparatively higher-resolution data than other seismic data and it's raw signal can be used as a final section after conducting basic filtering. However, Chirp SBP signal has possibility to include various noise in high-frequency band and to provide the distorted image for the complex geological structure in time domain. This study aims at the goal to establish the workflow of Chirp SBP data processing for enhanced image and to analyze the proper parameters for the domestic continental shelf. After pre-processing, we include the dynamic S/N filtering to eliminate the high-frequency component noise, the dip scan stack to enhance the continuity of reflection events and finally the post-stack depth migration to correct the distorted structure on the time domain sections. We demonstrated our workflow on the data acquired by domestically widely used equipments and then we could obtain the improved seismic sections of depth domain. This workflow seems to provide the proper seismic section to interpretation when applied to data processing of Chirp SBP that are largely used for domestic acquisition.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2008.11a
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• pp.363-363
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• 2008

The development of dry etching process for sapphire wafer with plasma has been key issues for the opto-electric devices. The challenges are increasing control and obtaining low plasma induced-damage because an unwanted scattering of radiation is caused by the spatial disorder of pattern and variation of surface roughness. The plasma-induced damages during plasma etching process can be classified as impurity contamination of residual etch products or bonding disruption in lattice due to charged particle bombardment. Therefor, fine pattern technology with low damaged etching process and high etch rate are urgently needed. Until now, there are a lot of reports on the etching of sapphire wafer with using $Cl_2$/Ar, $BCl_3$/Ar, HBr/Ar and so on [1]. However, the etch behavior of sapphire wafer have investigated with variation of only one parameter while other parameters are fixed. In this study, we investigated the effect of pressure and other parameters on the etch rate and the selectivity. We selected $BCl_3$ as an etch ant because $BCl_3$ plasmas are widely used in etching process of oxide materials. In plasma, the $BCl_3$ molecule can be dissociated into B radical, $B^+$ ion, Cl radical and $Cl^+$ ion. However, the $BCl_3$ molecule can be dissociated into B radical or $B^+$ ion easier than Cl radical or $Cl^+$ ion. First, we evaluated the etch behaviors of sapphire wafer in $BCl_3$/additive gases (Ar, $N_2,Cl_2$) gases. The behavior of etch rate of sapphire substrate was monitored as a function of additive gas ratio to $BCl_3$ based plasma, total flow rate, r.f. power, d.c. bias under different pressures of 5 mTorr, 10 mTorr, 20 mTorr and 30 mTorr. The etch rates of sapphire wafer, $SiO_2$ and PR were measured with using alpha step surface profiler. In order to understand the changes of radicals, volume density of Cl, B radical and BCl molecule were investigated with optical emission spectroscopy (OES). The chemical states of $Al_2O_3$ thin films were studied with energy dispersive X-ray (EDX) and depth profile anlysis of auger electron spectroscopy (AES). The enhancement of sapphire substrate can be explained by the reactive ion etching mechanism with the competition of the formation of volatile $AlCl_3$, $Al_2Cl_6$ or $BOCl_3$ and the sputter effect by energetic ions.

• Journal of the Korean earth science society
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• v.41 no.5
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• pp.459-468
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• 2020

In this study, the selection criteria for the occurrence of sea breezes in the Boseong area during the spring season (March-May) of 2016-2017 were prepared for the analysis of vertical weather characteristics. For this purpose, wind speed values were determined using the measured precipitation, cloud volume, wind direction, the difference between the ground and sea temperature, a wind Profiler at an altitude of 1 km, and numerical model data. The dates of the sea breezes in Boseong were classified according to the selection criteria, and the spatial and temporal characteristics of the sea breezes were identified by analyzing the time and altitude of the sea breeze and the size of the wind speed. Sea breezes occurred 23 out of 183 days (12%), and in Boseong, at least 1.2 out of 10 spring days exhibited sea breezes. Sea winds ranged from 1200 to 1800 LST, mainly from ground to 700 m altitude during the day. In addition, the maximum wind speed averaged 4.9 m s^-1, at an altitude of 40 m at 1600 LST, showing relatively lower values than those in a preceding study. This seems to be owing to the reduction in wind speed due to the complexity of the coastal terrain.

• Journal of the Korean Society of Marine Environment & Safety
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• v.12 no.4 s.27
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• pp.301-306
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• 2006

In order to estimate the characteristics of water movements around artificial upwelling structure, current measurements were carried out along lines E-W and S-N on May 4th(neap tide} and May 30th(spring tide), 2006. In the study area, southeastward flow was dominant during the field observations, and the pattern of water movement in the upper layer above 30m depth was different from that in the lower layer below 30m depth Vertical flow(w-component} around the artificial structure area and western area was shown to be upward flow, but downward flow occurred in the southern, northern and eastern parts at the neap tide. At the spring tide, the ebb current along E-W line showed upwelling flow in the eastern part and western area and showed upwelling flow near the artificial structure area and downwelling flow far away that one. At the spring tide, upward flow was dominant along S-N line during the flood current Volume transport by upward flow was higher than that by downward flow. Volume transport by upward flow during ebb of neap tide was greater than during flood current of neap tide, but was reverse at the spring tide.

• Journal of dental hygiene science
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• v.11 no.5
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• pp.405-410
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• 2011

The aim of this study was to evaluate antibacterial effect of Cl coated titanium. To coat the Cl on the titanium, first, the titanium was modified by blasting treatment with hydroxyapatite and alumina powder. Anodization process was completed using electrolyte solution of 0.04 M ${\beta}$-glycerol phosphate disodium salt n-hydrate, 0.4 M calcium acetate n-hydrate and 1 M NaCl on the condition of 250 voltages for 3 min. Surface morphology and elements' observation were performed with scanning electron microscopy and energy dispersive spectroscopy and surface profiler was used to analyze the surface roughness. Antibacterial effect was evaluated by film adhesion method. The anodized titanium after blasting showed dimpled surface contained the Cl. Surface average roughness of these surfaces had significantly higher compared to polished titanium. Result of antibacterial test showed that anodized titanium after blasting had an enhanced antibacterial effect compared to the polished titanium. Therefore, these results suggested that titanium contained Cl by anodization after blasting had a rough surface as well as antibacterial effect.

• Journal of Korea Water Resources Association
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• v.40 no.12
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• pp.957-968
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• 2007

It is essential to obtain accurate and highly reliable streamflow data for quantitative management for water resources. Thereafter such real-time streamflow gauging methods as ultrasonic flowmeter and index-velocity are introduced recently. Since these methods calculate flowrate through entire cross-section by measuring partial velocities of it, rational and theoretical basis are necessary for accurate estimation of discharge. The purpose of the present study lies in analysis on the applicability of Chiu#s(1987, 1988) two dimensional velocity distribution equations by applying them to natural rivers and by comparing simulated velocity distributions with observed ones obtained with ADCP. Maximum and mean velocities are calculated from observed data to estimate entropy parameter M. Such isovel shape parameters as h and $\beta_i$ are estimated by object function based on least squares criterion. In case optimized parameters are applied, Chiu#s velocity distributions fairly well simulate observed ones. By using 14 simulated data sets which have relatively high correlation coefficients, properties of parameters are analyzed and h, $\beta_i$ are estimated for velocity-unknown river sections. When estimated parameters are adopted for verification, simulated velocity distributions well reproduce real ones. Finally, calculated discharges display rough agreement with measured data. The results of the present study mean that if parameters related are properly estimated, Chiu#s velocity distribution is likely to reproduce the real one of natural rivers.

• Proceedings of the Korea Water Resources Association Conference
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• 2011.05a
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• pp.308-308
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• 2011

하천에서 유량을 산정하기 위해서 전자파표면유속계를 이용하여 표면유속을 측정하고 수심평균유속환산계수 0.85를 일률적으로 적용하여 수심평균유속을 산정하고 있다. 이 수심평균유속환산계수 0.85의 적절성에 대한 논의가 지속되어져 왔으나 그 동안에는 이에 대한 현장검증을 할 수 있는 방법이 없었던 실정이다. 하지만 최근 들어서는 ADCP(Acoustic Doppler Current Profiler)의 하천용 Application인 StreamPro ADCP가 개발되어 이를 이용하면 홍수기에 수심별 유속을 측정할 수 있다. 다만 홍수기에 StreamPro ADCP의 적용시에는 여러 가지 높은 위험성이 상존하는 것은 인지의 사실이지만, 그 외의 별다른 방법이 없는 실정이다. 따라서 홍수기에 StreamPro ADCP를 이용하여 수심별 유속을 측정하고 이와 동시에 측정한 표면유속을 이용하여 수심평균유속환산계수를 산정하여 기존에 환산계수로 적용하고 있는 0.85의 적절성을 파악하고자 하였다. 흐름조건별 수심평균유속환산계수 산정을 위하여 평수기 용담 수자원시험유역의 동향지점에서 수심평균유속환산계수를 산정한 결과 0.632~1.352로 넓게 분포하고 있음을 파악하였다. 이렇게 계수가 실제 적용하는 0.85와는 크게 차이가 나는 이유로는 수심이 얕아서 바닥마찰의 영향이 크기 때문인 것으로 판단되었다. 이에 본 연구에서는 여러 지점에서 홍수기 수심별 유속의 실측을 통하여 수심평균유속환산계수 분포정도를 산정하고자 하였다. 대청댐 상류의 수통수위표가 위치해 있는 적벽대교지점에서 StreamPro ADCP를 이용하여 수심평균유속환산계수를 산정한 결과 0.735~0.986 사이에 분포하고 있다. 측정한 결과의 수심평균유속환산계수의 평균값은 0.853으로 기존에 수심평균유속의 산정을 위하여 적용하고 있는 0.85와 거의 일치함을 보이고 있다. 측정당시 수심이 3.6 m에 이르고 있고 유속 또한 1.55 m/s에 이르고 있어 홍수시 일반하천에서 발생하는 수위와 유속임을 감안할 때, 0.735~0.986의 수심평균유속환산계수는 홍수시 순간적인 변화의 폭이 큼을 알 수 있다. 이렇게 순간적인 변화가 큰 이유로는 난류의 성분이 강해서 나타나는 것으로 이를 평균하면 0.853으로 나타나고 있어 홍수시에 수심평균유속환산계수를 0.85를 사용하여도 무방함을 알 수 있다. 동향지점에서 홍수기에 수심별 유속의 실측을 통하여 수심평균유속환산계수를 산정하고자 하였다. 그러나 이 지점은 강한 와류로 인하여 ADCP가 심하게 흔들림으로 인하여 순간적인 유속의 차이가 최대 4배까지 보임을 알 수 있다. 이로 인하여 수심평균유속환산계수의 범위는 0.233~0.983에 이른다. 측정당시 표면유속이 2.07 m/s 인 것을 감안하여 이 표면유속에 상응하는 수심별 유속 자료만을 이용하여 산정시, 수심평균유속환산계수는 0.876이다. 하천의 하류지점에서 수심별 유속을 측정하여 수심평균유속환산계수를 산정하고자 한강하류로 유입하는 굴포천의 구교 및 박촌1교 지점에서 유속측정을 실시하였다. 이들 두 지점은 홍수기에 조차도 유속이 1 m/s 에 이르지 못하는 지점으로, 수심평균유속환산계수를 산정한 결과 각각 0.826, 0.833을 나타내고 있어, 수심평균유속환산계수 0.85가 홍수기뿐만 아니라 평 갈수기에도 적용할 수 있는 가능성을 확인하였다.

• Atmosphere
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• v.16 no.3
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• pp.247-257
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• 2006

The Yeong-dong heavy snowfall forecast supporting system has been developed during the last several years. In order to construct the conceptual model, we have examined the characteristics of heavy snowfalls in the Yeong-dong region classified into three precipitation patterns. This system is divided into two parts: forecast and observation. The main purpose of the forecast part is to produce value-added data and to display the geography based features reprocessing the numerical model results associated with a heavy snowfall. The forecast part consists of four submenus: synoptic fields, regional fields, precipitation and snowfall, and verification. Each offers guidance tips and data related with the prediction of heavy snowfalls, which helps weather forecasters understand better their meteorological conditions. The observation portion shows data of wind profiler and snow monitoring for application to nowcasting. The heavy snowfall forecast supporting system was applied and tested to the heavy snowfall event on 28 February 2006. In the beginning stage, this event showed the characteristics of warm precipitation pattern in the wind and surface pressure fields. However, we expected later on the weak warm precipitation pattern because the center of low pressure passing through the Straits of Korea was becoming weak. It was appeared that Gangwon Short Range Prediction System simulated a small amount of precipitation in the Yeong-dong region and this result generally agrees with the observations.

• Proceedings of the Korean Vacuum Society Conference
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• 2011.02a
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• pp.67-67
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• 2011

Pulsed DC $BCl_3/SF_6$ 플라즈마를 사용하여 GaAs와 AlGaAs의 건식 식각을 연구하였다. 식각 공정 변수는 가스 유량 (50~100 % $BCl_3$ in $BCl_3/SF_6$), 펄스 파워 (450~600 V), 펄스 주파수 (100~250 KHz), 리버스 시간 (0.4~1.2 ${\mu}s$)이었다. 식각 공정 후 표면 단차 측정기 (Surface profiler)를 사용하여 표면의 단차와 거칠기를 분석하였다. 그 결과를 이용하여 식각률 (Etch rate), 표면거칠기 (Surface roughness), 식각 선택비 (Selectivity)와 같은 특성 평가를 하였다. 실험 후 주사 현미경 (FE-SEM, Field Emission Scanning Electron Microscopy)을 이용, 식각 후 시료의 단면과 표면을 관찰하였다. 실험 결과에 의하면 1) 18 sccm $BCl_3$ / 2 sccm $SF_6$, 500 V (Pulsed DC voltage), 0.7 ${\mu}s$ (Reverse time), 200 KHz (Pulsed DC frequency), 공정 압력이 100 mTorr인 조건에서 GaAs와 Al0.2Ga0.8As의 식각 선택비가 약 48:1로 우수한 결과를 나타내었다. 2) 펄스 파워 (Pulsed DC voltage), 리버스 시간(Reverse time), 펄스 주파수(Pulsed DC frequency)의 증가에 따라 각각 500~550 V, 0.7~1.0 ${\mu}s$, 그리고 200~250 KHz 구간에서 AlGaAs에 대한 GaAs의 선택비가 감소하게 되는 것을 알 수 있었다. 이는 척 (chuck)에 인가되는 전류와 파워를 증가시키고, 따라서 GaAs의 식각률이 크게 증가했지만 AlGaAs 또한 식각률이 증가하게 되면서 GaAs에 대한 식각 선택비가 감소한 것으로 생각된다. 3) 표면 단차 측정기와 주사전자현미경 사진 결과에서는 GaAs의 경우 10% $SF_6$ (18 sccm $BCl_3$ / 2 sccm $SF_6$)가 혼합된 조건에서 상당히 매끈한 표면 (RMS roughness < 1.0 nm)과 높은 식각률 (~0.35 ${\mu}m$/min), 수직의 식각 측벽 확보에서 매우 좋은 결과를 보여주었다. 또한 같은 공정 조건에서 AlGaAs는 식각이 거의 되지 않은 결과 (~0.03 ${\mu}m$/min)를 보여주었다. 위의 결과들을 종합해 볼 때 Pulsed DC $BCl_3/SF_6$ 플라즈마는 GaAs와 AlGaAs의 선택적 식각 공정에서 매우 우수한 공정 결과를 나타내었다.