• Journal of Korean Neurosurgical Society
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• v.67 no.4
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• pp.418-430
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• 2024

Objective : Isoflurane, a widely used common inhalational anesthetic agent, can induce brain toxicity. The challenge lies in protecting neurologically compromised patients from neurotoxic anesthetics. Choline alfoscerate (L-α-Glycerophosphorylcholine, α-GPC) is recognized for its neuroprotective properties against oxidative stress and inflammation, but its optimal therapeutic window and indications are still under investigation. This study explores the impact of α-GPC on human astrocytes, the most abundant cells in the brain that protect against oxidative stress, under isoflurane exposure. Methods : This study was designed to examine changes in factors related to isoflurane-induced toxicity following α-GPC administration. Primary human astrocytes were pretreated with varying doses of α-GPC (ranging from 0.1 to 10.0 µM) for 24 hours prior to 2.5% isoflurane exposure. In vitro analysis of cell morphology, water-soluble tetrazolium salt-1 assay, quantitative real-time polymerase chain reaction, proteome profiler array, and transcriptome sequencing were conducted. Results : A significant morphological damage to human astrocytes was observed in the group that had been pretreated with 10.0 mM of α-GPC and exposed to 2.5% isoflurane. A decrease in cell viability was identified in the group pretreated with 10.0 µM of α-GPC and exposed to 2.5% isoflurane compared to the group exposed only to 2.5% isoflurane. Quantitative real-time polymerase chain reaction revealed that mRNA expression of heme-oxygenase 1 and hypoxia-inducible factor-1α, which were reduced by isoflurane, was further suppressed by 10.0 µM α-GPC pretreatment. The proteome profiler array demonstrated that α-GPC pretreatment influenced a variety of factors associated with apoptosis induced by oxidative stress. Additionally, transcriptome sequencing identified pathways significantly related to changes in isoflurane-induced toxicity caused by α-GPC pretreatment. Conclusion : The findings suggest that α-GPC pretreatment could potentially enhance the vulnerability of primary human astrocytes to isoflurane-induced toxicity by diminishing the expression of antioxidant factors, potentially leading to amplified cell damage.

• Transactions of the Society of Information Storage Systems
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• v.3 no.3
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• pp.129-134
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• 2007

Boron nitride (BN) is a highly attractive material for wear resistant applications of mechanical components. BN is super hard and it is the second hardest of all known materials. It also has a high thermal stability, high abrasive wear resistance, and in contrast to diamond, BN does not react with ferrous materials. The motivation of this work is to investigate the tribological properties of BN for potential applications in ultra-precision components for data storage, printing, and other precision devices. In this work, the wear characteristics of BN thin films deposited on DLC or Ti buffer layer with silicon substrate using RF-magnetron sputtering technique were analyzed. Wear tests were conducted by using a pin-on-disk type tester and the wear tracks were measured with a surface profiler. Experimental results showed that wear characteristics were dependent on the sputtering conditions and buffer layer. Particularly, BN coated on DLC layer showed better wear resistant behavior. The range of the wear rates for the BN films tested in this work was about 20 to $100{\mu}m^3$/cycle.

• The Journal of Korean Institute of Communications and Information Sciences
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• v.32 no.9C
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• pp.913-921
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• 2007

Retargetable compiler which generates executable code for a target processor and performance profiler are required to design a processor optimized for a specific application. This paper presents an architecture exploration methodology based on ADL (Architecture Description Language). We synthesized instruction set and optimized processor structure using information extracted from application program. The information of operation sequences executed frequently and register usage are used for processor optimization. Architecture exploration has been performed for JPEG encoder to show the effectiveness of the system. The ASIP designed using the proposed method shows 1.97 times better performance.

• Asian Journal of Atmospheric Environment
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• v.5 no.4
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• pp.216-227
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• 2011

A Sea breeze front (SBF) appears clear particularly if there is opposing wind, and the convergence zone along a SBF affects air quality in coastal areas. This study analyzes features of SBF separation in the presence of an opposing flow in the southeastern coastal area of Korea Peninsula. Using a Regional Atmospheric Modeling System (RAMS) numerical simulation and an opposing flow, two types of SBF were observed at Masan coastal area of Korea. In one, the SBF penetrated inland despite of the opposing flow at Jinhae (1100 LST), Wondong (1700 LST), Saenglim (1700 LST), and Miryang (1700 LST). In the other, the SBF remained on the coastline along with Jinhae (1100 LST), Masan (1400 LST), Jinbuk (1400 LST), and Gaecheon (1700 LST), because the inflow of the sea breeze was not sufficient to penetrate inland against the opposing flow. This study shows that SBFs are affected by the formation of an opposing flow, as well as the inflows of a sea breeze and the opposing flow.

• 한국신재생에너지학회:학술대회논문집
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• 2010.11a
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• pp.41.2-41.2
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• 2010

최근 태양전지 제조비용 절감을 위해 초박형 실리콘 태양전지 개발이 활발히 이루어지고 있다. 이에 따라 후면전계(Back Surface Field, BSF) 특성에 대한 관심이 높아지는 추세이다. 이에 본 연구에서는 후면의 결정방향 및 표면구조에 따라 형성되는 후면전계(BSF)의 특성에 대해 알아보고자 하였다. 후면이 절삭손상층 식각(Saw damage etching) 후 (100)면이 드러난 실리콘 기판과 텍스쳐링(Texturing) 후 (111)면이 드러난 실리콘 기판에 후면 전극을 스크린 인쇄 후 Ramp up rate을 달리 하여 소성 공정(RTP system)을 통해 후면전계(BSF)를 형성하여 비교하였다. 후면전계(BSF)의 형상과 특성만을 평가하기 위하여 염산을 이용하여 후면 전극층을 제거하였다. 후면 전극 제거 후 주사전자현미경(Scanning Electron Microscopy)과 3차원 미세형상측정기(Non-contacting optical profiler)로 후면전계(BSF)의 형상을 비교하였다. 또한 후면전계(BSF)의 특성을 평가하고자 Quasi-Steady-State Photo Conductance(QSSPC)를 사용하여 포화전류(Saturation current, $J_0$)을 측정하였고, 면저항 측정기(4-point probe)로 면저항을 측정하여 비교하였다. 후면 전계(BSF)는 (100)면과 (111)면에서 모두 Ramp up rate이 빠를수록 향상된 특성을 보였고, (111)면에서 더 큰 차이를 보였다.

• Proceedings of the Korean Vacuum Society Conference
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• 2016.02a
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• pp.342-342
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• 2016

최근 반도체 제조 공정 기술이 발전함에 따라, 나노 영역에서의 열 및 전기 특성에 관련하여 깊이 있는 연구들이 많이 수행되고 있다. 그 중 반도체 기판의 표면 거칠기는 열전도도 및 전하 이동도와 밀접한 관련이 있으며 나노 소자의 특성을 결정짓는 중요한 요소가 된다. 표면이 거친 정도에 따라 포논 산란 작용이 열적 특성에 영향을 미치며 표면 거칠기와 상응하는 포논의 파장은 이를 산란시켜 열전도도를 감소시키는 것으로 보고되었다[1]. 또한, 트랜지스터의 소형화에 따라 수직 전계가 증가하며 그 결과, 표면 거칠기 성분이 표면에서의 전자 및 홀의 이동 특성에 영향을 미친다. 따라서 원자 층 두께의 표면 거칠기의 중요성이 부각되며 이에 대한 물성 연구가 수행되어야 한다. <100> 벌크 실리콘에서 약산 용액인 500-MIF를 이용하여 시간에 따라 dipping을 진행한 후 표면 거칠기의 변화를 profiler (Tencor P-2)로 측정하여 확인하였다. 거칠기는 dipping을 시작한 후 10분부터 18분까지 약 $3{\AA}/min$의 변화를 가지는 것으로 관측이 되었다. 또한 Hall measurement system으로 벌크 실리콘에서의 온도에 따른 전하 이동도를 측정하였다. 측정 결과, 300 K일 때 p-type 벌크 실리콘의 전형적인 전하 이동도 값인 약 $450cm^2/V{\cdot}s$을 얻었으며, 저온에서는 높은 이동도를 가지다가 온도가 증가할수록 이동도가 감소하는 형태를 확인하였다. 서로 다른 표면 거칠기를 가지는 반도체 기판을 저온부터 상온 이상까지 온도의 변화를 주어 그에 따른 전하 이동도를 측정하고 열전도도 및 전하 이동도의 특성을 분석하였다.

• Proceedings of the Korean Vacuum Society Conference
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• 2016.02a
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• pp.272.2-272.2
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• 2016

Copper-Tin (CuSn) thin films were synthsized by rf magnetron co-sputtering method with pure Cu and Sn metal targets with various rf powers and sputtering times. The obtained CuSn thin films were characterized by a surface profiler (alpha step), X-ray diffraction (XRD), X-ray photoelectron spectroscopy (XPS), X-ray induced Auger electron spectroscopy (XAES), and contact angle measurement. The deposition rates were calculated by the thickness of CuSn thin films and sputtering times. We observed hexagonal Cu20Sn6 and cubic Cu39Sn11 phases from the films by XRD measurement. From the survey XPS spectra, the Cu and Sn main peaks were observed. Therefore, we could conclude CuSn thin films were successfully fabricated on the substrate in this study. The changes of oxidation states and chemical environment of the films were investigated with high resolution XPS spectra in the regions of Cu 2p, Cu LMM, and Sn 3d. Surface free energy (SFE) and wettability of the CuSn thin films were studied with distilled water (DW) and ethylene glycol (EG) using the contact angle measurement. The total SFE of CuSn thin films decreased as rf power on Cu target increased. The contribution to the total SFE of dispersive SFE was relatively superior to polar SFE.

• Journal of the Semiconductor & Display Technology
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• v.6 no.4
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• pp.11-15
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• 2007

As preparing electrode for the OLED with the sputtering process, in order to be lower damage of the bottom organic layer and increase the life-time of the OLED, we prepared Al electrode for that by using Facing Targets Sputtering (FTS) system. Al electrode directly deposited on the cell (LiF/EML/HTL/Bottom electrode). Deposition condition was the working gas (Ar, Kr and Ar+Kr) and working gas pressure (1 and 6 mTorr). The film thickness and I-V curve of Al/cell were evaluated by a $\acute{a}$-step profiler and a semiconductor parameter (HP4156A) measurement. The thin film surface image was observed by a Atomic Force Microscope (AFM). In result, in comparison with about 11 [V] of the turn-on voltage of Al/cell with using the pure Ar gas, when Al thin film was deposited using the Ar-Kr mixture gas, the surface morphology was improved in some region and the turn-on voltage of Al/cell could be decreased to about 7 [V].

• The Journal of the Korea institute of electronic communication sciences
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• v.12 no.5
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• pp.731-736
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• 2017

In this paper, we report the fabrication of concave surface fiber tips for optical resonators. It was confirmed that the radius of curvature on fiber end can be controlled by introducing the hydrofluoric acid solution and the wavelength of $1.55{\mu}m$ laser which is absorbed well in the etchant to induce the photothermal effect. Using the microscope images, we observed the proposed concave fiber tip fabrication method is effective to make the controllable concave tips. We also observed changes in the size of the beam emitted from the tips with the various radius of curvature using the beam profiler. The authors believe that the proposed method will be applied to resonators for optical communications.

• Journal of the Korean Society of Fisheries and Ocean Technology
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• v.50 no.4
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• pp.551-555
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• 2014

ADCPs have been widely used to estimate the dynamic characteristics and biomass of sound scattering layers (SSLs), and swimming speed of fish schools for analyzing SSLs spatial distribution and/or various behavior patterns. This result showed that the verification of the mean volume backscattering strength (MVBS or averaged SV, dB) acquired by the ADCP would be necessary for a quantitative analysis on the spatial distribution and the biomass estimation of the SSLs or fish school when ADCP is used for estimating their biomass. In addition, the calibrated sphere method was used to verify values of each MVBS obtained from 4 beams of ADCP (153.6 kHz) on the base of 3 frequencies (38, 120, 200 kHz) of Scientific echo sounder's split beam system. Then, the measured SV values were compared and analyzed in its Target Strength (TS, dB) values estimated by a theoretical acoustic scattering model.