• Title/Summary/Keyword: process rate

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The Effect of Pressure and Platen Speed on the Material Removal Rate of Sapphire Wafer in the CMP Process (CMP 공정에서 압력과 정반속도가 사파이어 웨이퍼 재료제거율에 미치는 영향)

  • Park, Sanghyun;An, Bumsang;Lee, Jongchan
    • Tribology and Lubricants
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    • v.32 no.2
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    • pp.67-71
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    • 2016
  • This study investigates the characteristics of the sapphire wafer chemical mechanical polishing (CMP) process. The material removal rate is one of the most important factors since it has a significant impact on the production efficiency of a sapphire wafer. Some of the factors affecting the material removal rate include the pressure, platen speed and slurry. Among the factors affecting the CMP process, we analyzed the trends in the material removal rate and surface roughness, which are mechanical factors corresponding to both the pressure and platen speed, were analyzed. We also analyzed the increase in the material removal rate, which is proportional to the pressure and platen speed, using the Preston equation. In the experiment, after polishing a 4-inch sapphire wafer with increasing pressure and platen speed, we confirmed the material removal rate via thickness measurements. Further, surface roughness measurements of the sapphire wafer were performed using atomic force microscopy (AFM) equipment. Using the measurement results, we analyzed the trends in the surface roughness with the increase in material removal rate. In addition, the experimental results, confirmed that the material removal rate increases in proportion to the pressure and platen speed. However, the results showed no association between the material removal rate and surface roughness. The surface roughness after the CMP process showed a largely consistent trend. This study demonstrates the possibility to improve the production efficiency of sapphire wafer while maintaining stable quality via mechanical factors associated with the CMP process.

The Effect of Slurry flow Rate and Temperature on CMP Characteristic (슬러리 온도 및 유량에 따른 CMP 연마특성)

  • 정영석;김형재;최재영;정해도
    • Journal of the Korean Society for Precision Engineering
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    • v.21 no.11
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    • pp.46-52
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    • 2004
  • CMP (Chemical-Mechanical Polishing) is a process in which both chemical and mechanical mechanisms act simultaneously to produce the planarized wafer. CMP process is an extensive usage and continuing high growth rates in the semiconductor industry. The understanding of the process, however, is much slower. The nature of material removal from the wafer is still undefined and ambiguous. Material removal rate according to the slurry flow rate is also undefined and ambiguous. Thus, in this study, the basic mechanism of material removal rate as slurry flow rate is defined in terms of energy supply and energy loss.

A Study on the Advanced Treatment of Wastewater by Plants (식물을 이용한 오수의 고도처리에 관한 연구)

  • 이용두;김현희
    • Journal of Environmental Science International
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    • v.8 no.1
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    • pp.75-81
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    • 1999
  • In recent years increasing production and disposal of wastewater have caused an accelerated eutrophication of receiving waters. Therefore, in order to alleviate the detrimental impact of wastewater discharge, there is an increasing demand for removing the main nutrients, nitrogen and phosphorus, as well as the organic content of the waste water prior to disposal. This is effectively achieved by extended conventional treatment technology. However, the working expenses and energy requirements of such advanced treatment systems are rather high. So in a sparsely populated rural community is required development of wastewater treatment system combined with the regional characteristics. In this study, the systems are planted with Reeds and Amaryllis In A.C and estimated purification potential of system. The results obtained are as follows. BOD removal rate is 20% in the early stage, the last removal rate is 35% in A.C process and is 65% in Amaryllis+A.C process and is 50% in Reed+A.C process. T-N removal rate by Amaryllis is average 2.6g/$m^3$ㆍd, T-N removal rate by Reed is average 1.76g/$m^3$ㆍd. T-P removal rate by Amaryllis is average 0.27g/$m^3$ㆍd, T-P removal rate by Reed is average 0.25g/$m^3$ㆍd. BOD removal rate constant with retention time is 1.4494(1/d), T-N removal rate constant is 0.5428(1/d), T-P removal rate constant is 0.5287(1/d).

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A MULTIVARIATE JUMP DIFFUSION PROCESS FOR COUNTERPARTY RISK IN CDS RATES

  • Ramli, Siti Norafidah Mohd;Jang, Jiwook
    • Journal of the Korean Society for Industrial and Applied Mathematics
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    • v.19 no.1
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    • pp.23-45
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    • 2015
  • We consider counterparty risk in CDS rates. To do so, we use a multivariate jump diffusion process for obligors' default intensity, where jumps (i.e. magnitude of contribution of primary events to default intensities) occur simultaneously and their sizes are dependent. For these simultaneous jumps and their sizes, a homogeneous Poisson process. We apply copula-dependent default intensities of multivariate Cox process to derive the joint Laplace transform that provides us with joint survival/default probability and other relevant joint probabilities. For that purpose, the piecewise deterministic Markov process (PDMP) theory developed in [7] and the martingale methodology in [6] are used. We compute survival/default probability using three copulas, which are Farlie-Gumbel-Morgenstern (FGM), Gaussian and Student-t copulas, with exponential marginal distributions. We then apply the results to calculate CDS rates assuming deterministic rate of interest and recovery rate. We also conduct sensitivity analysis for the CDS rates by changing the relevant parameters and provide their figures.

Influence of Process Parameters on the Forming Compatibility in Composite Extrusion Rods (복합압출재료봉의 공정변수가 성형 적합성에 미치는 영향)

  • Jang, D.H.
    • Transactions of Materials Processing
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    • v.18 no.1
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    • pp.80-86
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    • 2009
  • This paper presents the plastic inhomogeneous deformation behavior of bimetal composite rods during the axisymmetric and steady-state extrusion process through a conical die. The rigid-plastic FE model considering frictional contact problem was used to analyze the co-extrusion process with material combinations of Cu/Al. Different cases of initial geometry shape for composite material were simulated under different conditions of co-extrusion process, which includes the interference and frictional conditions. From the simulation results, the sleeve cladding rate at the core/sleeve interface was recorded as a distribution of diameter ratio and interference conditions, which will be useful for the investigations of the bonding process during co-extrusion process. In addition, the results of the co-extrusion, connected with the results of the variations of diameter rate and average contact pressure, demonstrate a good agreement and present the possibility of describing the parameters of the plastic zones in non-uniform deformation of these type of composite materials.

A Synthetic Chart to Monitor The Defect Rate for High-Yield Processes

  • Kusukawa, Etsuko;Ohta, Hiroshi
    • Industrial Engineering and Management Systems
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    • v.4 no.2
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    • pp.158-164
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    • 2005
  • Kusukawa and Ohta presented the $CS_{CQ-r}$ chart to monitor the process defect $rate{\lambda}$ in high-yield processes that is derived from the count of defects. The $CS_{CQ-r}$ chart is more sensitive to $monitor{\lambda}$ than the CQ (Cumulative Quantity) chart proposed by Chan et al.. As a more superior chart in high-yield processes, we propose a Synthetic chart that is the integration of the CQ_-r chart and the $CS_{CQ-r}$chart. The quality characteristic of both charts is the number of units y required to observe r $({\geq}2)$ defects. It is assumed that this quantity is an Erlang random variable from the property that the quality characteristic of the CQ chart follows the exponential distribution. In use of the proposed Synthetic chart, the process is initially judged as either in-control or out-of-control by using the $CS_{CQ-r}$chart. If the process was not judged as in-control by the $CS_{CQ-r}$chart, the process is successively judged by using the $CQ_{-r}$chart to confirm the judgment of the $CS_{CQ-r}$chart. Through comparisons of ARL (Average Run Length), the proposed Synthetic chart is more superior to monitor the process defect rate in high-yield processes to the stand-alone $CS_{CQ-r}$ chart.

Landfill Leachate Treatment and Boron Removal by Reverse Osmosis (RO막을 이용한 매립지 침출수 처리 및 붕소 제거)

  • Jung, Soojung;Na, Sukhyun;Bae, Sangok;Lim, Byungjin
    • Journal of Korean Society on Water Environment
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    • v.28 no.5
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    • pp.657-662
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    • 2012
  • This study was carried out to evaluate the removal rate of organic and inorganic matters from landfill leachate using pre-treatment process as coagulation and limonite adsorption, and membrane process as RO (reverse osmosis) and NF(nanofiltration). By adding limonite adsorption as pre-treatment process, about 40% of organic matters in leachate was removed through pre-treatment process and 74.7% of boron was removed after RO process without pH adjustment. The rejection rate of boron in RO process mainly depends on the pH and increased at pH value of 10. RO process was performed as two stage system adjusting pH condtion to 7 and 10 in second RO stage for boron removal. Most (>90%) of TOC, Cl- and inorganic matters as Ca was rejected in first RO stage, the residue was rejected in second RO and the rejection rate was above 97%. Considering economic efficiency of operation cost, NF substituted for the first RO and total removal rate of TOC was above 90%. Through RO system toxicity to Daphnia in leachate was removed completely.

Comparison of membrane distillation with reverse osmosis process for the treatment of anaerobic digestate of livestock wastewater (가축분뇨 혐기 소화액 처리를 위한 막 증발과 역삼투 공정 성능 비교)

  • Kim, Seunghwan;Cho, Jinwoo
    • Journal of Korean Society of Water and Wastewater
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    • v.34 no.4
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    • pp.259-266
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    • 2020
  • In this study, a pilot-scale (3 ㎥/day) membrane distillation (MD) process was operated to treat digestate produced from anaerobic digestion of livestock wastewater. In order to evaluate the performance and energy cost of MD process, it was compared with the pilot scale (10 ㎥/day) reverse osmosis (RO) process, expected competitive process, under same feed condition. As results, MD process shows stable permeate flux (average 10.1 L/㎡/hr) until 150 hours, whereas permeate flux of RO process was decreased from 5.3 to 1.5 L/㎡/hr within 24 hours. In the case of removal of COD, TN, and TP, MD process shows a high removal rate (98.7, 93.7, and 99% respectively) stably until 150 hours. However, in the case of RO process, removal rate was decreased from 91.6 to 69.5% in COD and from 93.7 to 76.0% in TP during 100 hours of operation. Removal rate of TN in RO process was fluctuated in the range of 34.5-62.9% (average 44.6%) during the operation. As a result of energy cost analysis, MD process using waste heat for heating the feed shows 18% lower cost compare with RO process. Thus, overall efficiency of the MD process is higher then that of the RO process in terms of permeate flux, removal rate of salts, and operating cost (in the case of using waste heat) in treating the anaerobic digestate of livestock wastewater.

Inactivation of Microorganisms in Sewage Using a Pilot Plasma Reactor (Pilot 플라즈마 반응기를 이용한 하수 중 미생물의 불활성화)

  • Kim, Dong-Seog;Park, Young-Seek
    • Journal of Environmental Health Sciences
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    • v.39 no.3
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    • pp.289-299
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    • 2013
  • Objectives: For the field application of the dielectric barrier discharge plasma reactor, scale-up of the plasma reactor is needed. This study investigated the possibility of inactivation of microorganisms in sewage using pilot multi-plasma reactor. We also considered the possibility of degradation of total organic carbon (TOC) and nonbiodegradable matter ($UV_{254}$) in sewage. Methods: The pilot plasma reactor consists of plasma reactor with three plasma modules (discharge electrode and quartz dielectric tube), liquid-gas mixer, high voltage transformers, gas supply equipment and a liquid circulation system. In order to determine the operating conditions of the pilot plasma reactor, we performed experiments on the operation parameters such as gas and liquid flow rate and electric discharge voltage. Results: The experimental results showed that optimum operation conditions for the pilot plasma reactor in batch experiments were 1 L/min air flow rate), 4 L/min liquid circulation rate, and 13 kV electric discharge voltage, respectively. The main operation factor of the pilot plasma process was the high voltage. In continuous operation of the air plasma process, residual microorganisms, $UV_{254}$ absorbance and TOC removal rate at optimal condition of 13 kV were $10^{2.24}$ CFU/mL, 56.5% and 8.6%, respectively, while in oxygen plasma process at 10 kV, residual microorganisms, $UV_{254}$ absorbance and TOC removal rate at optimal conditions were $10^{1.0}$ CFU/mL, 73.3% and 24.4%, respectively. Electric power was increased exponentially with the increase in high voltage ($R^2$ = 0.9964). Electric power = $0.0492{\times}\exp^{(0.6027{\times}lectric\;discharge\;voltage)}$ Conclusions: Inactivation of microorganisms in sewage effluent using the pilot plasma process was done. The performance of oxygen plasma process was superior to air plasma process. The power consumption of oxygen plasma process was less than that of air plasma process. However, it was considered that the final evaluation of air and oxygen plasma must be evaluated by considering low power consumption, high process performance, operating costs and facility expenses of an oxygen generator.

Control of dissolved Oxygen Concentration and Specific Growth Rate in Fed-batch Fermentation (유가식 생물반응기에서의 용존산소농도 및 비성장속도의 제어)

  • Kim, Chang-Gyeom;Lee, Tae-Ho;Lee, Seung-Cheol;Chang, Yong-Keun;Chang, Ho-Nam
    • Microbiology and Biotechnology Letters
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    • v.21 no.4
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    • pp.354-365
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    • 1993
  • A novel control method with automatic tuning of PID controller parameters has been developed for efficient regulation of dissolved oxygen concentration in fed-batch fermentations of Escherichia coli. Agitation speed and oxygen partial pressure in the inlet gas stream were chosen to be the manipulated variables. A heuristic reasoning allowed improved tuning decisions from the supervision of control performance indices and it coule obviate the needs for process assumptions or disturbance patterns. The control input consisted of feedback and feedforword parts. The feedback part was determined by PID control and the feedforward part is determined from the feed rate. The proportional gain was updated on-line by a set of heuristics rules based on the supervision of three performance indices. These indices were output error covariance, the average value of output error, and input covariance, which were calculated on-line using a moving window. The integral and derivative time constants were determined from the period of output response. The specific growth rate was maintained at a low level to avoid acetic acid accumulation and thus to achieve a high cell density. The specific growthe rate was estimated from the carbon dioxide evolution rate. In fed-batch fermentation, the simutaneous control of dissolved oxygen concentration (at 0.2; fraction of saturated value) and specific growth rate (at 0.25$hr^{-1}$) was satisfactory for the entire culture period in spite of the changes in the feed rate and the switching of control input.

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