• Title/Summary/Keyword: precision measurement

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Measurement of Grating Pitch Standards using Optical Diffractometry and Uncertainty Analysis (광 회절계를 이용한 격자 피치 표준 시편의 측정 및 불확도 해석)

  • Kim Jong-Ahn;Kim Jae-Wan;Park Byong-Chon;Kang Chu-Shik;Eom Tae-Bong
    • Journal of the Korean Society for Precision Engineering
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    • v.23 no.8 s.185
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    • pp.72-79
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    • 2006
  • We measured grating pitch standards using optical diffractometry and analyzed measurement uncertainty. Grating pitch standards have been used widely as a magnification standard for a scanning electron microscope (SEM) and a scanning probe microscope (SPM). Thus, to establish the meter-traceability in nano-metrology using SPM and SEM, it is important to certify grating pitch standards accurately. The optical diffractometer consists of two laser sources, argon ion laser (488 nm) and He-Cd laser (325 nm), optics to make an incident beam, a precision rotary table and a quadrant photo-diode to detect the position of diffraction beam. The precision rotary table incorporates a calibrated angle encoder, enabling the precise and accurate measurement of diffraction angle. Applying the measured diffraction angle to the grating equation, the mean pitch of grating specimen can be obtained very accurately. The pitch and orthogonality of two-dimensional grating pitch standards were measured, and the measurement uncertainty was analyzed according to the Guide to the Expression of Uncertainty in Measurement. The expanded uncertainties (k = 2) in pitch measurement were less than 0.015 nm and 0.03 nm for the specimen with the nominal pitch of 300 nm and 1000 nm. In the case of orthogonality measurement, the expanded uncertainties were less than $0.006^{\circ}$. In the pitch measurement, the main uncertainty source was the variation of measured pitch values according to the diffraction order. The measurement results show that the optical diffractometry can be used as an effective calibration tool for grating pitch standards.

Realization of High Precision Position Measurement System Using M-sequence Encoded Laser Beam Scanning

  • Takayama, Jun-ya;Shinji Ohyama;Akira Kobayashi
    • 제어로봇시스템학회:학술대회논문집
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    • 2001.10a
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    • pp.107.5-107
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    • 2001
  • In this report, as the active position measurement system, a new method for two-dimensional position measurement system using a concept of semi-open type signal field has proposed. The feature of this system is realizing a position measurement only by scanning the encoded laser beams from scanning points to a measurement field, and observed it. First, both system configuration and encoding method are considered concretely, and M-sequence signal is selected for encoding. Next system design is performed to realize the theoretical measurement accuracy, and applied to a position measurement experiments. Experimental results show that measurement precision is larger than theoretical values. Furthermore, method for improving the measurement ...

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Calibration and INvestigation into Measurement Performance of a Visual Sensing System (시각측정시스템의 캘리브레이션 및 측정성능 검토)

  • Kim, Jin-Young;Cho, Hyung-Suck
    • Journal of the Korean Society for Precision Engineering
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    • v.16 no.8
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    • pp.113-121
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    • 1999
  • It is necessary to calibrate measurement systems to enhance its measurement accuracy. The visual sensing system that is presented in our previous work has to be calibrated, too. It is a multiple mirror system for three-dimensional measurement, which is composed of a camera and a series of mirrors. It is important to calibrate the positions and orientations of the mirrors relative to the camera because they have direct influence on the relationship between the image plane and the task space. This paper presents the calibration method for the visual sensing system. To confirm the measurement performance of the implemented system. its measurement accuracy in measuring the locations in three-dimensional space is investigated. A series of experiments for measuring the locations of the circle-shaped marks are performed. Experimental results show that the sensing system can be effectively used for three-dimensional measurement.

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On-Machine Measurement of Sculptured Surfaces Based on CAD/CAM/CAI Integration : I. Measurement Error Modeling (CAD/CAM/CAI 통합에 기초한 자유곡면의 On-Machine Measurement : I. 측정오차 모델링)

  • Cho, Myeong-Woo;Lee, Se-Hee;Seo, Tae-Il
    • Journal of the Korean Society for Precision Engineering
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    • v.16 no.10
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    • pp.172-181
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    • 1999
  • The objective of this research is to develop a measurement error model for sculptured surfaces in On-Machine Measurement (OMM) process based on a closed-loop configuration. The geometric error model of each axis of a vertical CNC Machining center is derived using a 4${\times}$4 homogeneous transformation matrix. The ideal locations of a touch-type probe for the scupltured surface measurement are calculated from the parametric surface representation and X-, Y- directional geometric errors of the machine. Also, the actual coordinates of the probe are calculated by considering the pre-travel variation of a probe and Z-directional geometric errors. Then, the step-by-step measurement error analysis method is suggested based on a closed-loop configuration of the machining center including workpiece and probe errors. The simulation study shows the simplicity and effectiveness of the proposed error modeling strategy.

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Optimal Measurement Placement for Static Harmonic State Estimation in the Power Systems based on Genetic Algorithm

  • Dehkordl, Behzad Mirzaeian;Fesharaki, Fariborz Haghighatdar;Kiyournarsi, Arash
    • Journal of Electrical Engineering and Technology
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    • v.4 no.2
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    • pp.175-184
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    • 2009
  • In this paper, a method for optimal measurement placement in the problem of static harmonic state estimation in power systems is proposed. At first, for achieving to a suitable method by considering the precision factor of the estimation, a procedure based on Genetic Algorithm (GA) for optimal placement is suggested. Optimal placement by regarding the precision factor has an evident solution, and the proposed method is successful in achieving the mentioned solution. But, the previous applied method, which is called the Sequential Elimination (SE) algorithm, can not achieve to the evident solution of the mentioned problem. Finally, considering both precision and economic factors together in solving the optimal placement problem, a practical method based on GA is proposed. The simulation results are shown an improvement in the precision of the estimation by using the proposed method.

Improvement of Measurement Accuracy for Absolute Height by Using Two Types of Doppler and Heterodyne Optical Interferometry (도플러방식과 헤테로다인 방식의 광간섭법을 병용한 절대높이 측정 정밀도 향상)

  • Ahn, Geun-Sik;Jhang, Kyung-Young;Moon, Heui-Kwan
    • Journal of the Korean Society for Precision Engineering
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    • v.13 no.6
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    • pp.128-135
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    • 1996
  • This paper proposes a high precision measurement technique to obtain the height of gage block with a few millimeter height. The proposed technique is consisted of two steps : In the first step, laser position transducer and electric micrometer are adopted to obtain a coarse value of the height of gage block, and then, in the second step, heterodyne laser interferometry is adopted to acquire the precision value. A new kind of phase detector is constructed in the low cost for the heterodyne interferometer and its linearity with ${\pm}1%$ is confirmed by experiment. Also measurement error factors due to enviroments are discussed and methodology to reduce such errors is proposed. Preliminary experiments are carried out for the gage blocks of as high as a few millimeter.

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NC Technology for High-Precision Machining in Machining Centers (머시닝센터에서 고정밀 가공을 위한 NC 기술)

  • 정성종
    • Proceedings of the Korean Society of Precision Engineering Conference
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    • 1994.10a
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    • pp.748-754
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    • 1994
  • This paper deals with a geometric error simulator, measurement and inspection of workpiece errors on the machine tools, and identification and compensation methodology of thermal errors in machining centers. In order to raise the machining accuracy of workpieces a measurement and inspection system on the machine tool is developed. By using MPPGT module Manual and CNC type CMMs are realized on the machining centers. To compensate for geometric and thermal deformation errors of machining centers, a real time and an off line geometric adaptive control system were developed on the machining centers. A vertical and a horizontal machining center equipped with FANUC 0MC were used for experiments. Performance of the systems were confirmed with a large amount of experiment.

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Precision Analysis of the Depth Measurement System Using a Single Camera with a Rotating Mirror (회전 평면경과 단일 카메라를 이용한 거리측정 시스템의 정밀도 분석)

  • ;;;Chun Shin Lin
    • The Transactions of the Korean Institute of Electrical Engineers D
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    • v.52 no.11
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    • pp.626-633
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    • 2003
  • Theoretical analysis of the depth measurement system with the use of a single camera and a rotating mirror has been done. A camera in front of a rotating mirror acquires a sequence of reflected images, from which depth information is extracted. For an object point at a longer distance, the corresponding pixel in the sequence of images moves at a higher speed. Depth measurement based on such pixel movement is investigated. Since the mirror rotates along an axis that is in parallel with the vertical axis of the image plane, the image of an object will only move horizontally. This eases the task of finding corresponding image points. In this paper, the principle of the depth measurement-based on the relation of the pixel movement speed and the depth of objects have been investigated. Also, necessary mathematics to implement the technique is derived and presented. The factors affecting the measurement precision have been studied. Analysis shows that the measurement error increases with the increase of depth. The rotational angle of the mirror between two image-takings also affects the measurement precision. Experimental results using the real camera-mirror setup are reported.

Ray Tracing-based Simulation of Image Formation in an Equipment for Automated Optical Inspection (광선 추적법에 의한 자동 광검사 장비의 결상 과정 전산모사)

  • Jung, Sang-Chul;Lee, Yoon-Suk;Kim, Dae-Chan;Park, Se-Geun;O, Beom-Hoan;Lee, El-Hang;Lee, Seung-Gol;Park, Sung-Chan;Choi, Tae-Il
    • Korean Journal of Optics and Photonics
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    • v.20 no.4
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    • pp.223-229
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    • 2009
  • This paper describes the development of a simulator which can numerically calculate an image to be acquired in a machine vision system for automated optical inspection. The simulator is based on a ray tracing technique and composed of three modules which are an illuminating system, a specimen and an imaging system. Kinds of model parameters for modules and their values are carefully chosen from the direct measurement and the observation of related phenomena. Finally, the validity of the simulator is evaluated by logical analysis and by comparison with measured images.

A Study on the Effect of Tip Radius of Diamond Stylus Machined by Ion Sputter in Surface Roughness Measurement (이온스파터 가공한 다이아몬드 촉침의 선단반경이 표면거칠기 측정에 미치는 영향)

  • Han, Eung-Gyo;No, Byeong-Ok;Yu, Yeong-Deok
    • Journal of the Korean Society for Precision Engineering
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    • v.7 no.3
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    • pp.37-47
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    • 1990
  • In accordance with the high precision of mechanical elements, it has been required to high precision in surface roughness measurement and, therefore, stylus tip radius is manufa- ctured less than 2 .mu. m through ion sputter machining. In this experiment, by suing ion sputter machined stylus pf fine tip, radius and lapping machined stylus, surface roughness of standard specimens, silicon wafer were measured and then Rmax, Ra, RMS value were investi- gatedaccording to the variation of tip radius of stylus. As a result, measuring error due to the variation of stylus tip radius in surface roughness measurement was decreased by using ion sputter machined stylus and also the measuring accuracy was improved. And the measuring variation of Ra, RMS calculated from correlation coefficient lager than 0.9 on the wave of short period and amplitude using ion sputter machined stylus of fine tip radius.

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