• Transactions of the Korean Society of Mechanical Engineers A
• /
• v.29 no.7 s.238
• /
• pp.998-1004
• /
• 2005

A nano-stereolithography (NSL) process has been developed for fabrication of 3D shell structures which can be applied to various nano/micro-fluidic devices. By the process, a complicated 3D shell structure on a scale of several microns can be fabricated using lamination of layers with a resolution of 150 nm in size, so it does not require the use of my sacrificial layer or any supporting structure. A layer was fabricated by means of solidifying liquid-state monomers using two-photon absorption (TPA) induced using a femtosecond laser processing. When the polymerization process is finished, unsolidified liquid state resins can be removed easily by dropping several droplets of ethanol fur developing the fabricated structure. Through this work, some 3D shell structures, which can be applied to various applications such as nano/micro-fluidic devices and MEMS system, were fabricated using the developed process.

• Journal of the Korean Magnetic Resonance Society
• /
• v.20 no.1
• /
• pp.7-12
• /
• 2016

PTMEG(Polytetramethylene ether glycol) is a polymer compound widely used as a wide range of applications in the textile industry. PTMEG substance carrying various 1,800~2,000 molecular weight are mainly used as the raw material of the spandex production. Molecular weight and degree of polymerization value for 4 different PTMEG samples under pilot plant scale synthetic process were determined by a new quantitative NMR method. In NMR experiments, p-toluenesulfonic acid(TSOH) was used for external standard material of PTMEG quantitative analysis. were measuring The concentration of the primary standard TSOH was measured by UV/Vis spectroscopy. By using NMR peak assignments and the integral values of designated proton NMR peaks, We were able to measure the % composition of the synthetic PTMEG polymers, concentrations, molecular weight and the degree of polymerization that show the synthetic process of each manufacturing pilot plant. By utilizing a newly developed quantitative NMR method were able to obtain the molecular weight of PTMEG samples within 0.08 error % range.

• Proceedings of the Polymer Society of Korea Conference
• /
• 2006.10a
• /
• pp.331-331
• /
• 2006

Polylactic acid (PLA) is a promising polymer because it can be derived from renewable resources and provides a biodegradable alternative to petrochemical based polymers. This research aims to synthesize PLA, through direct polycondensation and also tries to avoid the occurrence of separation by-product and the use of catalysts in the process. The polymerization of lactic acid was done at three different temperatures $150^{\circ}C,\;180^{\circ}C\;and\;200^{\circ}C$ for 90 h without catalysts and organic solvent. The proposed process provides results that are comparable to those that incorporate catalysts; during polymerization temperature was $180^{\circ}C$ the molecular weight of PLA obtained reached 42448 Da. The thermal properties of PLA analysis by Differential Scanning Calorimetry (DSC).

• Proceedings of the KIEE Conference
• /
• 1998.07d
• /
• pp.1343-1345
• /
• 1998

This work was carried out to develop a pattern on the nanometer scale using plasma polymerization and plasma etching. This study is also aimed at developing a resist for the nano process and a vacuum lithography process. The thin films of plasma polymerization were fabricated by the plasma polymerization of inter-electrode capacitively coupled gas flow system. After delineating the pattern at accelerating voltage of 30[kV], ranging the dose of $1-500[{\mu}C/cm^2$], the pattern was developed with dry type and formed by plasma etching.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
• /
• 1998.06a
• /
• pp.131-134
• /
• 1998

This work was carried out to develop a pattern on the nanometer scale using plasma polymerization and plasma etching. This study is also aimed at developing a resist for the nano process and a vacuum lithography process. The thin films of plasma polymerization were fabricated by the plasma po1ymerization of inter-electrode capacitively coupled gas flow system. After delineating the pattern at accelerating voltage of 30[kV]. ranging the dose of 1∼500[${\mu}$C/$\textrm{cm}^2$], the pattern was developed with dry tree and formed by plasma etching. By analysing of the molecule structure using FT-lR, it was confirmed that the thin films of PPMST contains the functional radicals of the MST monomer. The thin films of PPMST had a highly crosslinked structure resulting in a higher molecule weight than the conventional resist.

• Bulletin of the Korean Chemical Society
• /
• v.34 no.8
• /
• pp.2451-2454
• /
• 2013

Poly(methyl methacrylate) coated $BaF_2:Er^{3+}$ nanoparticles were prepared via a novel reverse-emulsion polymerization process using methyl methacrylate as continuous phase and water as dispersed phase. Preparation and coating of $BaF_2:Er^{3+}$ particles were processed in a single step. The resulting polymeric composites show the characteristic $Er^{3+}$ luminescence at excitation of 980 nm and may have potential applications in amplified optical networks.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
• /
• 2002.07a
• /
• pp.190-193
• /
• 2002

The processing technology of organic thin-film transistors (Ons) performances have improved fur the last decade. Gate insulator layer has generally used inorganic layer, such as silicon oxide which has properties of a low electrical conductivity and a high breakdown field. However, inorganic insulating layers, which are formed at high temperature, may affect other layers termed on a substrate through preceding processes. On the other hand, organic insulating layers, which are formed at low temperature, dose not affect pre-process. Known wet-processing methods for fabricating organic insulating layers include a spin coating, dipping and Langmuir-Blodgett film processes. In this paper, we propose the new dry-processing method of organic gate dielectric film in field-effect transistors. Vapor deposition polymerization (VDP) that is mainly used to the conducting polymers is introduced to form the gate dielectric. This method is appropriate to mass production in various end-user applications, for example, flat panel displays, because it has the advantages of shadow mask patterning and in-situ dry process with flexible low-cost large area displays. Also we fabricated four by four active pixels with all-organic thin-film transistors and phosphorescent organic light emitting devices.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
• /
• 2003.07a
• /
• pp.185-190
• /
• 2003

In this paper, it was demonstrated that the organic thin film transistors were fabricated by the organic gate insulators with vapor deposition polymerization (VDP) processing. In order to form polyimide as a gate insulator, vapor deposition polymerization process was also introduced instead of spin-coating process, where polyimide film was co-deposited by high-vacuum thermal evaporation from 4,4'-oxydiphthalic anhydride (ODPA) and 4,4'-oxydianiline (ODA) and 2,2-bis(3,4-dicarboxyphenyl)hexafluoropropane dianhydride (6FDA) and ODA, and cured at $150^{\circ}C$ for 1hr. Electrical output characteristics in our organic thin film transistors using the staggered-inverted top-contact structure obtained to the saturated slop in the saturation region and the subthreshold non-linearity in the triode region. Field effect mobility, threshold voltage, and on-off current ratio in $0.45\;{\mu}m$ thick gate dielectric layer were about $0.17\;cm^2/Vs$, -7 V, and $10^6\;A/A$, respectively. Details on the explanation of compared to organic thin-film transistors (OTFTS) electrical characteristics of ODPA-ODA and 6FDA-ODA as gate insulators by fabricated thermal co-deposition method.

• Current Optics and Photonics
• /
• v.6 no.4
• /
• pp.381-391
• /
• 2022

Two-photon-polymerization additive-manufacturing systems feature high resolution and precision. However, there are few reports on specific methods and possible problems concerning the use of small lasers to independently build such platforms. In this paper, a femtosecond-laser two-photon-polymerization additive-manufacturing system containing an optical unit, control unit, monitoring unit, and testing unit is built using a miniature femtosecond laser, with a detailed building process and corresponding control software that is developed independently. This system has integrated functions of light-spot detection, interface searching, micro-/nanomanufacturing, and performance testing. In addition, possible problems in the processes of platform establishment, resin preparation, and actual polymerization for two-photon-polymerization additive manufacturing are explained specifically, and the causes of these problems analyzed. Moreover, the impacts of different power levels and scanning speeds on the degree of polymerization are compared, and the influence of the magnification of the object lens on the linewidth is analyzed in detail. A qualitative analysis model is established, and the concepts of the threshold broadening and focus narrowing effects are proposed, with their influences and cooperative relation discussed. Besides, a linear structure with micrometer accuracy is manufactured at the millimeter scale.

• Proceedings of the Polymer Society of Korea Conference
• /
• 2006.10a
• /
• pp.83-84
• /
• 2006

In aqueous phase, we directly prepared conducting and photoluminescent nano-structured particles by oxidation polymerization. Thiophene(PT) was initiated by $FeCl_{3}/H_{2}O_{2}$ (catalyst/oxidant) combination system. And, polydispersed core-shell poly(styrene/thiophene) and polyaniline(PANI)-coated multi core-shell polystyrene latex particles were successfully prepared by oxidative and radical polymerization. The resulting latex particles have fine improved luminescence and conductive efficiency and dispersion state due to the PT and PANI shell. Hyper functionalized nanoparticle would be expected to increase the processibility in various electrical and electro-optical fields.