Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference (한국전기전자재료학회:학술대회논문집)
- 1998.06a
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- Pages.131-134
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- 1998
Nanometer Scale Vacuum Lithography using Plasma Polymerization and Plasma Etching
플라즈마 중합과 플라즈마 에칭을 이용한 나노미터 단위의 진공리소그래피
Abstract
This work was carried out to develop a pattern on the nanometer scale using plasma polymerization and plasma etching. This study is also aimed at developing a resist for the nano process and a vacuum lithography process. The thin films of plasma polymerization were fabricated by the plasma po1ymerization of inter-electrode capacitively coupled gas flow system. After delineating the pattern at accelerating voltage of 30[kV]. ranging the dose of 1∼500[
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