• Title/Summary/Keyword: polyimide processing

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The Effect of Single Wall Carbon Nanotubes on the Dipole Orientation and Piezoelectric Properties of Polymeric Nanocomposites

  • Kang, Jin-Ho;Park, Cheol;Gaik Steven J.;Lowther Sharon E.;Harrison Joycelyn S.
    • Proceedings of the Polymer Society of Korea Conference
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    • 2006.10a
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    • pp.245-245
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    • 2006
  • Recent studies of single wall carbon nanotube (SWNT)/polyimide nanocomposites indicate that these materials have a potential to provide the combination of structural integrity and sensing/actuation capability. This study shows the effect of the SWNT type and concentration on the dipole orientation and piezoelectric properties of the electroactive polymide nanocomposites using a thermally stimulated current (TSC) spectroscopy. These nanocomposites exhibit very thermally stable piezoelectric properties up to $150^{\circ}C$. This presentation will highlight the dipole orientation and electroactive characteristics of the SWNT/polyimide nanocomposites and discuss their potential multifunctional aerospace applications.

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Coupled Thermal-Structure Analysis of UV Laser Pulsing according to the Thickness of Copper Film on the Surface of Polyimide (UV 펄스 레이저 가공의 구리 박막 두께에 따른 열-구조 연성 해석)

  • Shin, Minjae;Shin, Bosung
    • Laser Solutions
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    • v.16 no.2
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    • pp.7-11
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    • 2013
  • Recently advanced laser processing is widely introduced to improve the efficiency of micro part production and to reduce the rate of inferior goods. In this paper the trend of delamination of single layer with both thin copper and polyimide according to the variation of copper thickness was investigated using the coupled thermal-structural analysis of ANSYS. From these analyses results, some conclusions were obtained. Firstly, the maximum temperature was increasing with respect to decrease of copper thickness. Secondly the maximum strain which was in general estimation the main effect of the delamination was observed in case of the copper thickness of $5{\mu}m$. Finally the trend of the delamination was decreasing with increasing the thickness of copper layer.

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Development of I-Chuck for Oxide Etcher (Oxide Etcher 용 E-Chuck의 기술개발)

  • 조남인;남형진;박순규
    • Journal of the Korea Academia-Industrial cooperation Society
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    • v.4 no.4
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    • pp.361-365
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    • 2003
  • A unipolar-type E-chuck was fabricated for the application of holding silicon wafers in the oxide etcher. For the fabrication of the unipolar ESC, core technologies such as coating of polyimide films and anodizing treatment of aluminum surface were developed. The polyimide films were prepared on thin coated copper substrates to minimize the plasma damage during the etch processing. Thin film heater technology was also developed for new type of E-chuck.

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Electrical Properties by Applied Electric Field of Polyimide Ultra Thin Films (Polyimide초박막의 전계인가에 따른 전기특성)

  • Choi, Y.I.;Chon, D.K.;Koo, H.B.;Kim, C.;Kyun, Y.S.;Lee, K.S.
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 1998.11a
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    • pp.73-76
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    • 1998
  • We give pressure stimulation into organic thin films and detect the induced displacement current. then manufacture a device under the accumulation condition that the state surface pressure is 15[mN/m]. In processing of a device manufacture. We can see the process is good from the change of a surface pressure for organic thin films and transfer ratio of area per molecule. The structure of manufactured device is Au/organic thin films(polyimide)/Au, the number of accumulated layers are 31,35, and 41. I-V characteristic of the device is measured from 0[V] to +5[V]. The maximum value of measured current is increased as the number of accumulated layers are decreased. The resistance for the number of accumulated layers, the energy density for an input voltage show desired results, and the insulation of a thin film is better as the interval between electrodes is larger.

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Development of Debris-free Process using Erasable Ink for Polymer Ablation (폴리머의 어블레이션 시 소거성 잉크를 이용한 잔유물 제거공정 개발)

  • Shin, D.S.;Lee, J.H.;Suh, J.;Kim, T.H.
    • Laser Solutions
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    • v.8 no.2
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    • pp.21-32
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    • 2005
  • The excimer laser ablation of a polymer occurs by the excitation of chemical bonds to energy levels that are above the dissociation energy. In this process, however, fragmented debris is finally ejected explosively by the scission of bonds and accumulates on the material surface. In the present work, a process for eliminating surface debris contamination generated by the laser ablation of a polymer is developed. The proposed approach for removing surface debris utilizes an erasable ink pasted on a polymide. The ink pasted polyimide is ablated by KrF excimer laser. The surface debris ejected from the polyimide is then combined with the ink layer on the polymer. Finally, both the surface debris and the ink layer are removed using adhesive tape or alcohol solvent. The results suggest that the erasable ink method is a simple, low cost, and extremely effective debris eliminating process.

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Preparation of Thermostable Polyimide/Polysiloxane Double Layered Films with Pressure-sensitive Adhesion Property (점착특성을 갖는 내열 폴리이미드/폴리실록산 이중층 필름 제조 연구)

  • Kwon, Eunjin;Jung, Hyun Min
    • Polymer(Korea)
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    • v.38 no.4
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    • pp.544-549
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    • 2014
  • Double layered film consisting of polyimide/polysiloxane and interface with nano domain structure was fabricated through stepwise layer formation and subsequent aging steps. During aging of film, nano phase separation occurred between the top layer polysiloxane and the upper layer of polyimide, which was observed by transmission electron microscope (TEM). A stable and uniform polysiloxane layer was obtained, showing the reproducible pressure-sensitive adhesion (PSA) property with the peel strength of 8-13 g/inch at even $300^{\circ}C$. In addition, the resulting polymide/polysiloxane film was thermo-stable up to $435^{\circ}C$, providing the promising properties suitable for application in microelectronics processing.

Residual Stress Behavior of High Temperature Polyimide Thin Films depending on the Structural Isomers of Diamine (Diamine의 구조적 이성질체에 따른 내열성 폴리이미드 박막의 잔류응력거동)

  • 임창호;정현수;한학수
    • Journal of the Microelectronics and Packaging Society
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    • v.6 no.2
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    • pp.23-30
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    • 1999
  • The relationships between morphological structures and residual stress behaviors of polyimide thin films depending on isomeric diamines were investigated. For this study, Poly(phenylene biphenyltetracarboximide) (BPDA-PDA) and poly(oxydiphenylene biphenyltetracarboximide) (BPDA-ODA) films were prepared from their isomeric diamines: 1,3-phenylene diamine (1,3-PDA) 1,4-phenylene diamine (1.4-PDA), 3,4'-oxydiphenylene diamine (3,4'-ODA), and 4,4'-oxydiphenylene diamine (4,4'-ODA), respectively. For those films, residual stresses were detected in-situ during thermal imidization of the isomeric polyimide as a function of processing temperature over the range of 25~$400^{\circ}C$ using. Thin Film Stress Analyzer (TFSA). In comparison, residual stress of BPDA-1.4PDA having better in-plain orientation and chain order was the lowest value of 7MPa whereas those of BPDA-1,3-PDA, BPDA-3,4'-ODA, and BPDA-4,4'-ODA were in the range of 40-50MPa. Conclusively, the effect of morphological nature (chain rigidity, chain order, orientation) and chain mobility relating to the g1ass transition behavior on the residual stress of isomeric polyimide thin films wart analyzed.

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A study on the Dielectric Characteristics of Polyimide Organic Ultra Thin Films (폴리이미드 유기초박막의 유전특성에 관한 연구)

  • Chon, D.K.;Lee, K.S.
    • Proceedings of the KIEE Conference
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    • 1999.07d
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    • pp.1744-1746
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    • 1999
  • In this paper, we give pressure stimulation into organic ultra thin films and detected the induced displacement current properties, and then manufacture a device under the accumulation condition. In processing of a device manufacture, we can see the process is good from the change of a surface pressure and transfer ratio of area per molecule of organic ultra thin films. The structure of manufactured device is MIM(Au/polyimide LB films/AU), the number of accumulated 19 layers. I-V characteristic of the device is measured from -5[V] to +5[V]. The maximum value of measured current is increased as the number of accumulated layers are decreased. The insulation of a thin film is better as the interval between electrodes is larger, and the insulation properties of a thin film is better as the distance between electrodes is larger.

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A Comparative Study on Cu Drift Diffusion of Low-k Dielectrics and Thermal Oxide by use of BTS Technique (BTS 방법을 사용한 Low-K 유전체 물질들과 산화막의 Cu 드리프트 확산에 대한 비교 연구)

  • Chu, Soon-Nam;Kwon, Jung-Youl;Kim, Jang-Won;Park, Jung-Cheul;Lee, Heon-Yong
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.20 no.2
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    • pp.106-112
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    • 2007
  • Advanced back-end processing requires the integration of low-k dielectrics and Cu. However, in the presence of an electric field and a temperature, positive Cu ions may drift rapidly through dielectric and causing reliability problems. Therefore, in this paper, Cu+ drift diffusion in two low-k materials and silicon oxide is evaluated. The drift diffusion is investigated by measuring shifts in the flat band voltage of capacitance-voltage measurements on Cu gate capacitors after bias thermal stressing. The Cu+ drift late in $SiO_{x}C_{y}\;(2.85{\pm}0.03)$ and Polyimide(2.7${\leq}k{\leq}3.0$) is Considerably lower than in thermal oxide.

Two-dimensional Laser Drilling Using the Superposition of Orthogonally Polarized Images from Two Computer-generated Holograms

  • Lee, Hwihyeong;Cha, Seongwoo;Ahn, Hee Kyung;Kong, Hong Jin
    • Current Optics and Photonics
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    • v.3 no.5
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    • pp.451-457
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    • 2019
  • Laser processing using holograms can greatly improve processing speed, by spatially distributing the laser energy on the target material. However, it is difficult to reconstruct an image with arrays of closely spaced spots for laser processing, because the specklelike interference pattern prevents the spots from getting close to each other. To resolve this problem, a line target was divided in two, reconstructed with orthogonally polarized beams, and then superposed. Their optical reconstruction was performed by computer-generated holograms and a pulsed laser. With this method, we performed two-dimensional (2D) laser drilling of polyimide film, with a kerf width of $20{\mu}m$ and a total processing length of 20 mm.