• 제목/요약/키워드: plastic display substrate

검색결과 127건 처리시간 0.034초

Plasma Oxidation Effect on Ultralow Temperature Polycrystalline Silicon TFT on Plastic Substrate

  • Kim, Yong-Hae;Moon, Jae-Hyun;Chung, Choong-Heui;Yun, Sun-Jin;Park, Dong-Jin;Lim, Jung-Wook;Song, Yoon-Ho;Lee, Jin-Ho
    • 한국정보디스플레이학회:학술대회논문집
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    • 한국정보디스플레이학회 2006년도 6th International Meeting on Information Display
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    • pp.1122-1125
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    • 2006
  • The TFT performances were enhanced and stabilized by plasma oxidation of the polycrystalline Si surface prior to the plasma enhanced atomic layer deposition of $Al_2O_3$ gate dielectric film. We attribute the improvement to the formation of a high quality oxide interface layer between the gate dielectric film and the poly-Si film. The interface oxide has a predominant effect on the TFT's characteristics, and is regulated by the gap distance between the electrode and the polycrystalline Si surface.

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Laser Direct Patterning of Carbon Nanotube Film

  • 윤지욱;조성학;장원석
    • 한국진공학회:학술대회논문집
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    • 한국진공학회 2012년도 제42회 동계 정기 학술대회 초록집
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    • pp.203-203
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    • 2012
  • The SWCNTs network are formed on various plastic substrates such as poly(ethylene terephthalate) (PET), polyimide (PI) and soda lime glass using roll-to-roll printing and spray process. Selective patterning of carbon nanotubes film on transparent substrates was performed using a femtosecond laser. This process has many advantages because it is performed without chemicals and is easily applied to large-area patterning. It could also control the transparency and conductivity of CNT film by selective removal of CNTs. Furthermore, selective cutting of carbon nanotube using a femtosecond laser does not cause any phase change in the CNTs, as usually shown in focused ion beam irradiation of the CNTs. The patterned SWCNT films on transparent substrate can be used electrode layer for touch panels of flexible or flat panel display instead indium tin oxide (ITO) film.

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Flexible, Transparent Thin-Film Transistors Fabricated by Ink-Jet Printing with Carbon Nanotube-Based Conducting Ink

  • Lee, Yeon-Ju;Lee, Woo-Suk;Jeong, Soo-Kyeong;Choi, Seok-Ju;Kim, Hye-Min;Chun, Jin-Young;Kim, Sung-Ho;Geckeler, Kurt E.
    • 한국정보디스플레이학회:학술대회논문집
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    • 한국정보디스플레이학회 2009년도 9th International Meeting on Information Display
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    • pp.920-922
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    • 2009
  • Flexible, transparent thin-film transistor with active layers composed of carbon nanotube-based conducting ink were fabricated on a plastic substrate by ink-jet printing. The properties of the formulated conducting ink containing carbon nanotubes, a conducting polymer, and additives were characterized and optimized. The conducting ink was applied to flexible thin-film transistors using ink-jet printing.

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High performance OTFT using PEDOT:PSS on plastic substrate by inkjet printing

  • Lee, Myung-Won;Choi, Jae-Chul;Park, Jong-Seung;Song, Chung-Kun
    • 한국정보디스플레이학회:학술대회논문집
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    • 한국정보디스플레이학회 2009년도 9th International Meeting on Information Display
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    • pp.874-876
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    • 2009
  • This is a report on fabrication and electrical characteristics of pentacene OTFT that uses conducting PEDOT/PSS as source drain electrodes. We demonstrate enhanced conductivity of PEDOT/PSS film with glycerol and optimize properties for ink jet printing. We also present the application of oxygen plasma technique in order to favor selective spreading for subsequent inkjet printing.

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The triple layer anode for flexible top emission organic lightemitting devices

  • Chung, Sung-Mook;Hwang, Chi-Sun;Lee, Jeong-Ik;KoPark, Sang-Hee;Yang, Yong-Suk;Do, Lee-Mi;Chu, Hye-Yong
    • 한국정보디스플레이학회:학술대회논문집
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    • 한국정보디스플레이학회 2007년도 7th International Meeting on Information Display 제7권1호
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    • pp.698-701
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    • 2007
  • A top emission organic light emitting diode comprising of a triple anode on polycarbonate $film/TNATA/NPB/Alq_3:C545T/cathodes$ has been fabricated. The triple layer structure of Cr/Al/Cr allowed for fabrication of a crack-free anode and provided better higher work function than ITO anode.The anode showed compatibility with flexible plastic substrate and no crack was formed during bending test while ITO anode showed crack.

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비정질 IZTO기반의 투명 박막 트렌지스터 특성 (Characteristics of amorphous IZTO-based transparent thin film transistors)

  • 신한재;이근영;한동철;이도경
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2009년도 하계학술대회 논문집
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    • pp.151-151
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    • 2009
  • Recently, there has been increasing interest in amorphous oxide semiconductors to find alternative materials for an amorphous silicon or organic semiconductor layer as a channel in thin film transistors(TFTs) for transparent electronic devices owing to their high mobility and low photo-sensitivity. The fabriction of amorphous oxide-based TFTs at room temperature on plastic substrates is a key technology to realize transparent flexible electronics. Amorphous oxides allows for controllable conductivity, which permits it to be used both as a transparent semiconductor or conductor, and so to be used both as active and source/drain layers in TFTs. One of the materials that is being responsible for this revolution in the electronics is indium-zinc-tin oxide(IZTO). Since this is relatively new material, it is important to study the properties of room-temperature deposited IZTO thin films and exploration in a possible integration of the material in flexible TFT devices. In this research, we deposited IZTO thin films on polyethylene naphthalate substrate at room temperature by using magnetron sputtering system and investigated their properties. Furthermore, we revealed the fabrication and characteristics of top-gate-type transparent TFTs with IZTO layers, seen in Fig. 1. The experimental results show that by varying the oxygen flow rate during deposition, it can be prepared the IZTO thin films of two-types; One a conductive film that exhibits a resistivity of $2\times10^{-4}$ ohm${\cdot}$cm; the other, semiconductor film with a resistivity of 9 ohm${\cdot}$cm. The TFT devices with IZTO layers are optically transparent in visible region and operate in enhancement mode. The threshold voltage, field effect mobility, on-off current ratio, and sub-threshold slope of the TFT are -0.5 V, $7.2\;cm^2/Vs$, $\sim10^7$ and 0.2 V/decade, respectively. These results will contribute to applications of select TFT to transparent flexible electronics.

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공정압력이 SiO2 버퍼층을 갖는 PES 기판위에 증착한 ITZO 박막의 전기적 및 광학적 특성에 미치는 영향 (Effect of Working Pressure on the Electrical and Optical Properties of ITZO Thin Films Deposited on PES Substrate with SiO2 Buffer Layer)

  • 정양희;최병균;강성준
    • 한국전자통신학회논문지
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    • 제14권5호
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    • pp.887-892
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    • 2019
  • 본 연구에서는 플라스틱 기판 중에서 가장 내열성이 우수하다고 알려진 PES 기판위에 버퍼층으로 20nm두께로 $SiO_2$ 박막을 플라즈마 화학기상증착 법으로 증착한 후, ITZO 박막을 고주파 마그네트론 스퍼터링 법으로 증착하여 공정압력에 따른 ITZO 박막의 전기적 및 광학적 특성을 조사하였다. 공정압력 3 mTorr 에서 증착한 ITZO 박막이 $8.02{\times}10^{-4}{\Omega}-cm$의 비저항과 $50.13{\Omega}/sq.$의 면저항으로 가장 우수한 전기적 특성을 보였다. 모든 ITZO 박막의 가시광 영역(400-800 nm)에서 평균 투과도는 공정압력에 무관하게 80 %이상으로 나타났다. 재료평가지수는 3 mTorr에서 증착한 ITZO 박막에서 $23.90{\times}10^{-4}{\Omega}^{-1}$로 가장 큰 값을 나타내었다. 본 연구를 통해 ITZO 박막이 차세대 플렉시블 디스플레이 소자에서 ITO 박막을 대체할 매우 유망한 재료라는 것을 알 수 있었다.

Ultrafast and flexible UV photodetector based on NiO

  • Kim, Hong-sik;Patel, Malkeshkumar;Kim, Hyunki;Kim, Joondong
    • 한국진공학회:학술대회논문집
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    • 한국진공학회 2016년도 제50회 동계 정기학술대회 초록집
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    • pp.389.2-389.2
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    • 2016
  • The flexible solid state device has been widely studied as portable and wearable device applications such as display, sensor and curved circuits. A zero-bias operation without any external power consumption is a highly-demanding feature of semiconductor devices, including optical communication, environment monitoring and digital imaging applications. Moreover, the flexibility of device would give the degree of freedom of transparent electronics. Functional and transparent abrupt p/n junction device has been realized by combining of p-type NiO and n-type ZnO metal oxide semiconductors. The use of a plastic polyethylene terephthalate (PET) film substrate spontaneously allows the flexible feature of the devices. The functional design of p-NiO/n-ZnO metal oxide device provides a high rectifying ratio of 189 to ensure the quality junction quality. This all transparent metal oxide device can be operated without external power supply. The flexible p-NiO/n-ZnO device exhibit substantial photodetection performances of quick response time of $68{\mu}s$. We may suggest an efficient design scheme of flexible and functional metal oxide-based transparent electronics.

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Properties of IZTO Thin Films Deposited on PEN Substrates with Different Working Pressures

  • Park, Jong-Chan;Kang, Seong-Jun;Yoon, Yung-Sup
    • 한국세라믹학회지
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    • 제52권3호
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    • pp.224-227
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    • 2015
  • In this work, the properties of Indium-Zinc-Tin-Oxide (IZTO) thin films, deposited on polyethylene naphthalate (PEN) with a $SiO_2$ buffer layer, were analyzed with different working pressures. After depositing the $SiO_2$ buffer layer on PEN substrates by plasma-enhanced chemical vapor deposition (PECVD), the IZTO thin films were deposited by RF magnetron sputtering with 1 to 7-mTorr working pressure. All the IZTO thin films show an amorphous structure, regardless of the working pressure. The best morphological, electrical, and optical properties are obtained at 3-mTorr working pressure, with a surface roughness of 2.112-nm, a sheet resistance of $8.87-{\Omega}/sq$, and a transmittance at 550-nm of 88.44%. These results indicate that IZTO thin films deposited on PEN have outstanding electrical and optical properties, and the PEN plastic substrate is a suitable material for display devices.

투명 유연 박막 트랜지스터의 구현을 위한 열처리된 산화아연 박막의 전사방법 개발 (Transfer of Heat-treated ZnO Thin-film Plastic Substrates for Transparent and Flexible Thin-film Transistors)

  • 권순열;정동건;최영찬;이재용;공성호
    • 센서학회지
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    • 제27권3호
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    • pp.182-185
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    • 2018
  • Zinc oxide (ZnO) thin films have the advantages of growing at a low temperature and obtaining high charge mobility (carrier mobility) [1]. Furthermore, the zinc oxide thin film can be used to control application resistance depending on its oxygen content. ZnO has the desired physical properties, a transparent nature, with a flexible display that makes it ideal for use as a thin-film transistor. Though these transparent flexible thin-film transistors can be manufactured in various manners, manufacturing large-area transistors using a solution process is easier owing to the low cost and flexible substrate. The advantage of being able to process at low temperatures has been attracting attention as a preferred method. However, in the case of a thin-film transistor fabricated through a solution process, it is reported that charge mobility is lower. To improve upon this, a method of improving the crystallinity through heat treatment and increasing electron mobility has been reported. However, as the heat treatment temperature is relatively high at $500^{\circ}C$, an application where a flexible substrate is absent would be more suitable.