• The Transactions of The Korean Institute of Electrical Engineers
• /
• v.57 no.3
• /
• pp.453-457
• /
• 2008

We studied on the dependency of parameters which those were used to design a ballast of ICP light source. These parameters were derived from Barkhausen criterion equation about the oscillating condition of ballast. Comparing with a change of turns, we can suggest that a change of l is suitable to control a $I_p$ of an ICP light source. According to the Z-l equation, we can find an optimum rating power of ICP light sources corresponding to l.

• Proceedings of the Korean Vacuum Society Conference
• /
• 2014.02a
• /
• pp.247.1-247.1
• /
• 2014

The capacitive coupled plasma is used widely in the semiconductor industries. Especially, the uniformity of the industrial plasma is heavily related with defect ratio of devices. Therefore, the industries need the capacitive coupled plasma source which can generate the uniform plasma and control the plasma's uniformity. To achieving the uniformity of the large area plasma, we designed multi-powered electrodes. We controlled the uniformity by controlling the power of each electrode. After this work, we started to research another concept of the plasma device. We make the plasma chamber that has multi-ground electrodes imaginary (CST microwave studio) and simulate the electric field. The shape of the multi-ground electrodes is ring type, and it is same as the shape of the multi-power electrodes that we researched before. The diameter of the side electrode's edge is 300mm. We assumed that the plasma uniformity is related with the impedance of ground electrodes. Therefore we simulated the imaginary chamber in three cases. First, we connected L (inductor) and C (capacitor) at the center of multi-ground electrodes. Second, we changed electric conductivity of multi-ground electrode. Third, we changed the insulator's thickness between the center ground electrode and the side ground electrode. The driving frequency is 2, 13.56 and 100 MHz. We switched our multi-powered electrode system to multi-ground electrode system. After switching, we measured the plasma uniformity after installing a variable vacuum capacitor at the ground line. We investigate the effect of ground electrodes' impedance to plasma uniformity.

• Proceedings of the KIPE Conference
• /
• 2014.07a
• /
• pp.47-48
• /
• 2014

기본적으로 전력전송개념에서 최대의 전력이 전달하기 위해서는 전력전송단과 부하단사이의 임피던스를 맞추어 주어야 최대의 전력이 전달된다. 무선전력전송 역시 RF Source와 송수신 코일간의 임피던스를 맞추어야 최대의 전력전달과 효율을 기대할 수 있다. 따라서 송수신 코일과 부하간에 임피던스 매칭은 필수적으로 필요하다. 매칭이 원할하지 않을 경우 RF Source에 반사전력이 반사되어 심각한 손실을 발생할 수 있으며, 수신부의 부하단에 최대로 전력이 전달되지 않으며 전체 시스템 효율이 나빠지게 된다. 임피던스 매칭회로 타입에는 여러가지 타입이 사용되는데 대표적으로 L type, T Type, ${\pi}$ type이 일반적으로 사용된다. 본 연구에서는 L type, T type, ${\pi}$ type 방식을 이용하여 각 타입별 매칭범위와 매칭특성에 대한 기초실험을 수행하였다.

• 한국정보디스플레이학회:학술대회논문집
• /
• 2004.08a
• /
• pp.568-570
• /
• 2004

A shielding effectiveness of mesh screen filter of plasma display panel (PDP) has been calculated in this paper. Since the screen filter is located near the radiation source, the near field wave impedance of the radiation source, i.e., the PDP electrodes, has been considered to calculate the shielding effectiveness. The near field shielding effectiveness of screen filter at 30${\sim}$300 MHz has been estimated to be more than 65${\sim}$80 dB. The measured shielding effectiveness of screen filter is 10${\sim}$50 dB at 30${\sim}$300 MHz[1]. The resulting discrepancy indicates that there are other EMI emission sources such as emission from PCB and cable besides the PDP electrodes.

• Proceedings of the Korean Vacuum Society Conference
• /
• 2012.02a
• /
• pp.180-180
• /
• 2012

A microplasma system source based on microwave parallel stripline resonator (MPSR) was developed for the generation of microplasmas in a wide range of pressure from some torr to 760 torr. This source was operated at its resonance frequency that much depends upon not only its discharge gap size but also operated pressure. This paper applied a simple circuit model to analyze the effects of discharge gap size and pressure to resonance frequency and impedance of MPSR in the cases with and without plasma exist inside the discharge gap. In the process of calculating, the conformal mapping method was used to estimate the capacitance of the MPSR. The calculating results by using circuit model agree well with the simulation results that using commercial CST microwave studio software.

• JSTS:Journal of Semiconductor Technology and Science
• /
• v.13 no.4
• /
• pp.387-394
• /
• 2013

As the feature size of integrated circuits continues to decrease, the challenge of achieving an oxidation-free exposed layer after photoresist (PR) stripping is becoming a critical issue for semiconductor device fabrication. In this article, the hydrogen plasma characteristics in direct plasma and the PR stripping rate in remote plasma were studied using a $120{\Phi}$ cylindrical inductively coupled plasma source. E mode, H mode and E-H mode transitions were observed, which were defined by matching the $V_{rms}$ and total impedance. In addition, the dependence of the E-H mode transition on pressure was examined and the corresponding plasma instability regions were identified. The plasma density and electron temperature increased gradually under the same process conditions. In contrast, the PR stripping rate decreased with increasing proportion of $H_2$ gas in mixed $H_2/N_2$ plasma. The decrease in concentration of reactive radicals for the removal of PR with increasing $H_2$ gas flow rate suggests that NH radicals have a dominant effect as the main volatile product.

• Journal of the Korean institute of surface engineering
• /
• v.39 no.3
• /
• pp.142-146
• /
• 2006

A novel internal-type linear inductive antenna, which we refer to as a double comb-type antenna, was developed for a large-area plasma source with substrate size of $880\;mm{\times}660\;mm$ ($4^{th}$ generation glass size). In this study, effect of plasma confinement by applying multi-polar magnetic field was investigated. High density plasmas of the order of $3.18{\times}10^{11}\;cm^{-3}$ could be obtained with a pressure of 15 mTorr Ar at an inductive power of 5000 W with good plasma stability. This plasma density is higher than that obtained for the conventional double comb-type antenna, possibly due to the plasma confinement, low rf voltage, resulting in high power transfer efficiency. Also, due to the remarkable reduction in the antenna rf voltage and length, a plasma uniformity of less than 3% could be obtained within a substrate area of $880\;mm{\times}660\;mm$ as rf power increased.

• Proceedings of the Korean Vacuum Society Conference
• /
• 2011.08a
• /
• pp.142-142
• /
• 2011

Microwave diagnostics method for plasma science and engineering is vigorous research area for its good characteristics such as high sensitivity, reliability, and broad measurement spectrum from low density plasma to high density. We investigate mechanism of microwave probes (hairpin, impedance and absorbtionf probe) and apply it for interpretation of full transmitted spectrum of cutoff probe. Mechanism of the spectrum having same key roles of I-V curve of Langmuir probe is not exactly revealed yet in spite of its importance. This study elucidates physics behind it using a circuit model and E/M wave simulation. Circuit model reveals exact cut-off peak frequency taking account of a collision frequency and a plasma frequency and it enable precise diagnostics of plasma densty from low pressure to high pressre. Cut-off like peaks have been obstacle for choosing cut-off peak is analyzed by E/M simulation and one of cutoff like peaks made by probe holder used for acquire plasma density with cutoff peak applying the hairpin relation. Furthermore, phase difference method for plasma density is conducted. This method uses a single microwave frequency source and it is low-priced.

• Transactions on Electrical and Electronic Materials
• /
• v.10 no.4
• /
• pp.111-115
• /
• 2009

We present a study on the reflection of optically controlled microwave pulses from non uniform plasma layers in semiconductors. The transient response of the microwave pulses in different plasma layers has been evaluated by means of the reflection function of dielectric microstrip lines. The lines were used with an open-ended termination containing an optically induced plasma region, which was illuminated by a light source. The reflection characteristics impedance resulting from the presence of plasma is evaluated by means of the equivalent transmission line model. We have analyzed the variation of the transient response in a 0.01 cm layer with a surface frequency in the region of 128 GHz. In the reflection the variation of the diffusion length $L_D$ is large compared with the absorption depth $1/{\alpha}_l$. The variation of the characteristic response of the plasma layer with differentially localized pulses has been evaluated analytically. The change of the reflection amplitude has been observed at depths of 0.1 cm, 0.01 cm and $0.1{\times}10^{-5}$ cm respectively.

• 한국연소학회:학술대회논문집
• /
• 2007.05a
• /
• pp.27-30
• /
• 2007

We have been setting up experiments on propagation of shock waves generated by the pulsed laser ablation. One side of a thin metal foil is subjected to laser ablation as a shock wave is generated from a localized spot of high intensity energy source. The resulting reactive shock wave, which penetrates through the foil is reflected by an acoustic impedance which causes the metal foil to high-strain rate deform. This short time physics is captured on an ICCD camera. The focus of our research is generating reactive shock wave and high strain rate deforming of thin metal foil for accelerating micro-particles to a very high speed on the orders of several thousand meter per second. Somce innovative applications of this device will be discussed.