• Title/Summary/Keyword: plasma reactor

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Surface Modification of Polymeric Material Using Atmospheric Plasma (대기압 플라즈마를 이용한 고분자 소재의 표면개질)

  • Sim, Dong-Hyun;Seul, Soo-Duk
    • Polymer(Korea)
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    • v.32 no.5
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    • pp.433-439
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    • 2008
  • An atmospheric plasma pre-treatment method was applied to polyurethane foam (density: 0.27) and rubber (butadiene rubber) to improve its contact angle and adhesion using atmospheric plate type reactor. In order to investigate the optimum reaction condition of plasma treatment, type of treatment gas (nitrogen, argon, oxygen, air), rate of gas flow ($30{\sim}100\;mL/min$), and treated time ($0{\sim}30\;s$) were examined in a plate plasma reactor. The result of the surface modification with respect to the treatment procedure was characterized by using SEM and ATR-FTIR. Due to a decrease of the contact angle of various materials, the greatest adhesion strength was achieved at optimum condition such as flow rate of 100 mL/min, reaction time of polyurethane foam 10 s and rubber 3 s for an atmosphere nitrogen gas. Consequently, the atmospheric plasma treatment reduced the wettability of the polyurethane foam and rubber also resulted in the improvement of the adhesion.

Plasma Technology of Coal Gasification

  • Karpenko, E.I.;Messerle, V.E.;Lockwood, F.;Ustimenko, A.
    • Transactions on Electrical and Electronic Materials
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    • v.2 no.3
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    • pp.7-11
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    • 2001
  • Utility boiler operators seeking to gain the greatest economic advantage from their units are faced with three challenges, namely the obligatory light-up fuel costs, the additional expense of supplementary fuel firing should they wish to use a cheaper fuel that may be beyond the original burner manufacturer’s stability and combustion performance assurances and the immediate environmental impact of both. The novel use of plasma arc technology can provide a solution to these challenges. This paper introduces the work being undertaken through a joint collaboration between the EU, Kazahkstan and Russia in order to develop a tried and tested engineering methodology and a mathematical based application and sensitivity analysis approach for the design and optimisation stage of these plasma devices that, as a consequence, their assist in their universal introduction.

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The atmospheric plasma reactor with water wall to decompose CF4

  • Itatani, Ryohei;Deguchi, Mikio;Toda, Toshihiko;Ban, Heitaro
    • Journal of the Korean institute of surface engineering
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    • v.34 no.5
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    • pp.391-394
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    • 2001
  • A new type plasma reactor is proposed to decompose CF4 diluted with N2 gas in atmospheric pressure. The arc plasmas is surrounded with a waterwall which acts as a source of water vapor, the solvent of HF, resultant product after decomposition, and conveyer to take away fluorine compound from exhaust gas. Abatement more than 99% is achieved by small size plasmas such as 1 cm in diameter, 25cm in length and 3.4KW of DC discharge power in such gas as the mixture of 100 sccm of CF4 and 15 slm of N2. Reactors of this type are to be expanded to such a system as Nitrogen flow of 50 slm with 200 sccm of CF4 and 7-8 KW discharge power.

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Satistical Analysis of SiO2 Contact Hole Etching in a Magnetically Enhanced Reactive Ion Etching Reactor

  • Liu, Chunli;Shrauner, B.
    • Journal of Magnetics
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    • v.15 no.3
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    • pp.132-137
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    • 2010
  • Plasma etching of $SiO_2$ contact holes was statistically analyzed by a fractional factorial experimental design. The analysis revealed the dependence of the etch rate and DC self-bias voltage on the input factors of the magnetically enhanced reactive ion etching reactor, including gas pressure, magnetic field, and the gas flow rates of $CHF_3$, $CF_4$, and Ar. Empirical models of the DC self-bias voltage and etch rate were obtained. The DC self-bias voltage was found to be determined mainly by the operating pressure and the magnetic field, and the etch rate was related mainly to the pressure and the flow rates of Ar and $CHF_3$.

Image Observation of NO Particles Using ICCD camera (ICCD Camera를 이용한 NO 입자의 Image 관측)

  • 전용우;최준영;최상태;박원주;이광식;신용철
    • Proceedings of the Korean Institute of IIIuminating and Electrical Installation Engineers Conference
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    • 2000.11a
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    • pp.209-213
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    • 2000
  • In this paper, the removal rate of NO in a reactor is measured first using nonthermal plasma generated from a wire-cylinder type reactor, then the spatial density distribution of NO particles is investigated using ICCD(Intensified Charged Coupled Device) camera. This research uses nonthermal plasma from electrical discharge to analyze the NO characteristics, and the measurements of NO discharge image and Distribution are performed using the ICCD camera to examine the NO characteristics more closely. Furthermore, the method of Laser Induced Fluorescence (LIF) is used to analyze the particular behavior of NO particles more specifically, to suggest a method of reducing exhaust gas, a serious environmental problem.

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Synthesis of Diamond-Like Carbon Films by R.F.Plasma CVD (고주파플라즈마 CVD법에 의한 다이아몬드상 탄소박막의 합성)

  • 박상현;이덕출
    • The Transactions of the Korean Institute of Electrical Engineers
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    • v.39 no.10
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    • pp.1037-1043
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    • 1990
  • Diamond thin films were synthesized from the mixed gases of methane and hydrogen on silicon substrates by RF plasma chemical vapor deposition and deposited films were investigated by SEM, X-ray diffractometry and Raman spectroscopy. It is found that high quality diamond-like carbon films were successfully synthesized by PECVD under the deposition condition of 1-10 vol% of methane concentration, 0.15-0.4torr of reactor pressure, 500W of RF power, and 5-20hr of reaction time. Especially, cubo-octahedral diamond-like carbon particles were synthesized by employing 1.0 vol % of methane concentration and 0.4torr of the reactor pressure.

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A study on the characteristics of electron beam resist with addition of organometallic monomer (유기금속의 첨가에 따른 전자빔 레지스트 특성조사)

  • 박종관;이덕출;우호환;이종태;김보열
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 1994.11a
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    • pp.152-155
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    • 1994
  • The purpose of this paper is to develope an electron beam resist by the plasma polymerization. Plasma co-polymerized resist was prepared using an interelectrode gas-flow-type reactor. And then delineated pattern in the resist was developed with gas flow type reactor using Ar and O$_2$ gas as etching gas. We study about the effects of discharge power and mixing rate of the copolymerized thin film. The characteristics of molecular structure of thin film was investigated by FT-lR, DSC and GPC, and then was discussed in relation to its quality as a resist.

The study on Reactor Parameters of Atmosphere Plasma Power Supply (대기압 프라즈마 전원장치의 반응기 파라메터에 관한 연구)

  • Lee, Yong-Duk;Lee, Woo-Cheol;Lee, Taeck-Ki;Yoo, Hyo-Yol;Park, Hyung-Jin
    • Proceedings of the KIEE Conference
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    • 2006.07b
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    • pp.915-916
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    • 2006
  • This paper proposed the extraction method of reactor parameters in atmosphere plasma power supply. This methods is performed by detection of phase difference between inverter voltage and current, and extraction of impedance through active, reactive power. The validity of the proposed scheme is investigated through simulation results.

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A study of decomposition of harmful gases using Composite catalyst by Photocatalytic plasma reactions (복합촉매를 이용한 플라즈마 반응에 의한 유해가스의 제거에 관한 연구)

  • Kim, Gwan-Jung;U, In-Seong;Park, Hwa-Yong;Lee, Hong-Ju
    • Proceedings of the Safety Management and Science Conference
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    • 2012.04a
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    • pp.421-433
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    • 2012
  • The objective of this study is to obtain the optimal process condition and the maximum decomposition efficiency by measuring the decomposition efficiency, electricity consumption, and voltage in accordance with the change of the process variables such as the frequency, maintaining time period, concentration, electrode material, thickness of the electrode, the number of windings of the electrode, and added materials etc. of the harmful atmospheric contamination gases such as NO, $NO_2$, and $SO_2$etc. with the plasma which is generated by the discharging of the specially designed and manufactured $TiO_2$ catalysis reactor and SPCP reactor.

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The Study on the application of plasma co-polymerized (MMA-Styrene) thin film as E-beam resist (플라즈마중합법에 의한 (MMA+Styrene) 박막의 E-beam용 레지스트 특성에 대한 연구)

  • Jung, Y.;Park, J.K.;Park, S.K.;Park, J.Y.;Park, S.H.;Lee, D.C.
    • Proceedings of the KIEE Conference
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    • 1993.07b
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    • pp.1183-1185
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    • 1993
  • The plasma polymerized thin film of MMA+Sty was prepared using a capacitively coupled gas-flow-type reactor. This thin films were also delincated by the electron-beam apparatus with an acceleration voltage 30KV, and the pattern in the resist was developed with the gas-flow-type reactor using an argon as an etchant. The effect of discharge power on groth rate and etching rate of the thin film were studied. The molacular structure of the resist was investigated by ESCA and FT-IR.

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