• Title/Summary/Keyword: plasma polymerization method

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Surface Characterization of the Activated Carbon Fibers After Plasma Polymerization of Allylamine

  • Lu, Na;Tang, Shen;Ryu, Seung-Kon;Choi, Ho-Suk
    • Carbon letters
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    • v.6 no.4
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    • pp.243-247
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    • 2005
  • Plasma polymerization of allylamine subsequently after plasma pre-treatment was conducted on the activated carbon fibers (ACFs) for the immobilization of amine groups in the surface of ACFs. The change of structural properties of ACFs with respect to different polymerization conditions was investigated through BET method. The change of surface morphologies of ACFs with respect to different plasma polymerization power was also studied through AFM. It was found that the structural properties such as specific surface area and micropore volume could be optimized under certain plasma deposition conditions. It was reckoned that treatment and deposition showed adverse effect on plasma polymerization, in which the former developed the micro-structures of the ACFs and the latter tended to block the micro pores. The Fourier transform infrared spectroscopy (FTIR) revealed that the poly(allylamine) was successfully immobilized on the surface of ACFs and the amount of the deposited polymer layer was related to the plasma polymerization power. SEM results showed that the plasma deposited polymer layer were small and homogenously distributed. The size and the distribution of particles deposited were closely related to the plasma polymerization power, too.

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Resist characteristics and molecular structure control of polystyrene by plasma polymerization method (플라즈마중합법에 의한 폴리스티렌의 분자구조 제에 및 레지스트 특성 조사)

  • 박종관;김영봉;김보열;임응춘;이덕출
    • The Transactions of the Korean Institute of Electrical Engineers
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    • v.45 no.3
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    • pp.438-443
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    • 1996
  • The effect of plasma polymerization conditions on the structure of the plasma polymerized styrene were investigated by using Fourier Transform Infrared Ray(FT-IR), Differential Scanning Calorimetry (DSC), Gel Permeation Chromatography(GPC). Plasma polymerized thin film was prepared using an interelectrode inductively coupled gas-flow-type reactor. We show that polymerization parameters of thin film affect sensitivity and etching resistance of plasma polymerized styrene is 1.41~3.93, and deposition rate of that are 32~383[.angs./min] with discharge power. Swelling and etching resistance becomes more improved with increasing discharge power during plasma polymerization. (author). 11 refs., 10 figs., 1 tab.

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Optical Properties for Plasma Polymerization Thin Films Using Envelope Method By Spectrophotometry (ENVELOPE METHOD를 이용한 플라즈마 중합 유기박막의 광학특성)

  • Yoo, D.C.;Park, G.B.;Lee, D.C.;HwqangBo, C.K.;Jin, K.H.
    • Proceedings of the KIEE Conference
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    • 1991.07a
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    • pp.183-186
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    • 1991
  • In order to prepare the functional organic optic meterials, the capacitive coupled gas flow type plasma polymerization apparatus was designed and manufactured. Styrene and para-Xylene monomer were adopt as organic materisl. Optical constant, refrative index, extinction coefficient of organic thin films by the gas flow type plasma polymerization appratus were determined by envelope method using spectrophotometry. The refractive index of plasma polymerized thin films was decreased in accordance to increase of wave length and discharge time. The extinction coefficient was very small compared with refractive index. From the experimental result of optical constant and film thickness, it was considered that the films which had required optical properties and thickness can be prepared by control of polymerization condition.

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The Surface Effect of Polyimide Thin Film by Vapor Deposition Polymerization Method With Plasma Treatment (진공증착중합법에 의해 제조된 폴리이미드 박막의 플라즈마 처리에 의한 표면의 변화)

  • Kim, Hyeong-Gweon;Lee, Boong-Joo;Kim, Jong-Teak;Kim, Yong-Bong;Lee, Duck-Chool
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.11 no.5
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    • pp.340-346
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    • 1998
  • In this study, we intended to investigate aging effect of polyimide prepared by VDPD(vapor deposition polymerized method). The prepared polymide was treated by the oxygen and argon gas plasma. And we evaluated the polyimide treated by plasma from contact angle, surface leakage current, FT-IR and SEM. We know that the structure of polyimide at surface are changed to amide structure by plasma treating. It seems that strong energy of plasma causes breaking the molecular chin of the polyimide. And surface roughness increases with plasma treating time increased and sequentially the wettability and leakage current increases.

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A STUDY ON THE EVALUATION OF POLYMERIZATION SHRINKAGE OF COMPOSITE AND COMPOMER USING STRAIN GAUGE METHOD (스트레인 게이지법을 이용한 복합레진과 컴포머의 중합수축 평가에 관한 연구)

  • Kim, Yeun-Chul;Kim, Jong-Soo;Kwon, Soon-Won;Kim, Yong-Kee
    • Journal of the korean academy of Pediatric Dentistry
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    • v.29 no.1
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    • pp.19-29
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    • 2002
  • The purpose of this study was to compare the polymerization shrinkage and the compressive strength of composite and compomer cured with two different light sources ; conventional halogen-light curing unit and recently-developed plasma arc curing unit. The 'strain gauge method' was used for determination of polymerization shrinkage and the compressive strength was measured by universal testing machine. The results of the present study can be summarized as follows: 1. Filling materials in polyethylene molds showed the initial expansion in the early phase of polymerization. This was followed by the rapid contraction in volume during the first 60 seconds and gradually diminished as curing process continued. 2. The polymerization shrinkage in tooth samples was generally lower than in the mold samples. 3. The generally lower amount of linear polymerization shrinkage was observed in compomer and plasma arc curing unit group when compared to composite and conventional curing unit. 4. The higher compressive strength values was found in composite groups regardless curing methods. The results of this study strongly support the application of plasma arc system and fluoride-containing compomer in the field of clinical pediatric dentistry claiming its effectiveness in curing the esthetic dental materials and the anticariogenic capacity.

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Electrical Characteristic of PMMA Thin Film by Plasma Polymerization Method with Process Pressure and RF Substrate Bias Power (공정압력 및 기판바이어스 인가유무에 따른 PMMA 플라즈마중합박막의 전기적 특성)

  • Lee, Boong-Joo
    • The Journal of the Korea institute of electronic communication sciences
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    • v.6 no.5
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    • pp.697-702
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    • 2011
  • In this paper, We have fabricated PMMA thin films by plasma polymerization method for organic thin film transistor's insulator layer. In the electrical characteristic results with deposition pressures and substrate RF bias power in thin film deposition process, we have got dielectric constant of 3.4, high deposition rate of 8.6 [nm/min] and high insulation characteristics in condition of RF100 [W], Ar20 [sccm], 5 [mtorr], RF bias 20 [W]. Therefore, the fabricated thin films are possible as insulation layer of OTFT and organic memory.

Effect of plasma polythiophene as a buffer layer inserted on OLEDs (버퍼층으로서 플라즈마 polythiopheneol 유기EL소자에 미치는 영향)

  • Park, S.M.;Lee, B.J.;Kim, H.G.;Lim, K.B.;Kim, J.T.;Park, S.H.;Lim, E.C.;Lee, E.H.;Lee, D.C.
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2002.05c
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    • pp.177-180
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    • 2002
  • The purpose of this thesis is to develope buffer materials by the plasma polymerization method. In this article the buffer materials, plasma poly thiophene(PPTh) is used to study the interface of eter/organic in organic light emitting diodes(OLED). The interface of meter/organic materials is the important and critical objectives in development of OLED. The hole transport layer was N,N'-dipheneyl-N, N'bis-(3-methypheneyl)-1,1'dipheneyl-4,4'-diamine (TPD); the host material of mission layer was 8-tris-hydroxyquinoline aluminium (Alq3). When PPTh was inserted between ITO and TPD, emission efficiency increased.

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E-beam Lithography using Plasma Processes (플라즈마 공정을 이용한 전자빔 리소그래피)

  • Kim, Sung-O;Lee, Jin;Lee, Kyung-Sup;Lee, Duck-Chool
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 1999.05a
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    • pp.575-577
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    • 1999
  • In this study, the PPPI(Plasma Polymerized Phenyl Isothiocyanate) resist thin film was manufactured in accordance with the plasma polymerization method and after exposing it to an electron beam, a pattern was formed by plasma etching. With the FT-IR(Fourier transform-infrared spectrometry) analysis, it was confirmed that the PI(Phenl Isothiocyanate) monomer was successsfully produced into a thin film by the plasma. The polymerization rate of the thin film was 450~ 1012($\AA$/min) to 100-200(W) discharge power and 120-12($\AA$/min) to 0.1 ~0.4[torr] system pressure.

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Polymer thin film organic transistor characteristics with plasma treatment of interlayers (플라즈마 표면처리에 따른 유기트랜지스터 특성)

  • Lee, Boong-Joo
    • The Journal of the Korea institute of electronic communication sciences
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    • v.8 no.6
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    • pp.797-803
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    • 2013
  • In this paper, we fabricated insulator thin films by plasma polymerization method for organic thin film transistor's insulator layer. For improving the electrical characteristics of organic transistor, we treated the semiconductor thin film with $O_2$ plasma. As results, the surface energy of organic transistor was increased from $38mJ/m^2$ to $72mJ/m^2$ and the mobility of organic transistor was increased $0.057cm^2V^{-1}s^{-1}$, that is increased 29% average ratio. Therefore, we have known that oragnic transistor's mobility can improve with plasma treatment of semiconductor thin film's surface.

Effect of HF and Plasma Treated Glass Surface on Vapor Phase-Polymerized Poly(3,4-ethylenedioxythiophene) Thin Film : Part I

  • Lee, Joonwoo;Kim, Sungsoo
    • Journal of Integrative Natural Science
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    • v.6 no.4
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    • pp.211-214
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    • 2013
  • In this study, in order to investigate how consecutive treatments of glass surface with HF acid and water vapor/Ar plasma affect the quality of 3-aminopropyltriethoxysilane self-assembled monolayer (APS-SAM), poly(3,4-ethylenedioxythiophene) (PEDOT) thin films were vapor phase-polymerized immediately after spin coating of FeCl3 and poly-urethane diol-mixed oxidant solution on the monolayer surfaces prepared at various treatment conditions. For the film characterization, various poweful tools were used, e.g., FE-SEM, an optical microscope, four point probe, and a contact angle analyzer. The characterization revealed that HF treatment is not desirable for the synthesis of a high quality PEDOT thin film via vapor phase polymerization method. Rather, sole treatment with plasma noticeably improved the quality of APS-SAM on glass surface. As a result, a highly dense and smooth PEDOT thin film was grown on uniform oxidant film-coated APS monolayer surface.