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Copper Interconnection and Flip Chip Packaging Laboratory Activity for Microelectronics Manufacturing Engineers

  • Moon, Dae-Ho;Ha, Tae-Min;Kim, Boom-Soo;Han, Seung-Soo;Hong, Sang-Jeen
    • Proceedings of the Korean Vacuum Society Conference
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    • 2012.02a
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    • pp.431-432
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    • 2012
  • In the era of 20 nm scaled semiconductor volume manufacturing, Microelectronics Manufacturing Engineering Education is presented in this paper. The purpose of microelectronic engineering education is to educate engineers to work in the semiconductor industry; it is therefore should be considered even before than technology development. Three Microelectronics Manufacturing Engineering related courses are introduced, and how undergraduate students acquired hands-on experience on Microelectronics fabrication and manufacturing. Conventionally employed wire bonding was recognized as not only an additional parasitic source in high-frequency mobile applications due to the increased inductance caused from the wiring loop, but also a huddle for minimizing IC packaging footprint. To alleviate the concerns, chip bumping technologies such as flip chip bumping and pillar bumping have been suggested as promising chip assembly methods to provide high-density interconnects and lower signal propagation delay [1,2]. Aluminum as metal interconnecting material over the decades in integrated circuits (ICs) manufacturing has been rapidly replaced with copper in majority IC products. A single copper metal layer with various test patterns of lines and vias and $400{\mu}m$ by $400{\mu}m$ interconnected pads are formed. Mask M1 allows metal interconnection patterns on 4" wafers with AZ1512 positive tone photoresist, and Cu/TiN/Ti layers are wet etched in two steps. We employed WPR, a thick patternable negative photoresist, manufactured by JSR Corp., which is specifically developed as dielectric material for multi- chip packaging (MCP) and package-on-package (PoP). Spin-coating at 1,000 rpm, i-line UV exposure, and 1 hour curing at $110^{\circ}C$ allows about $25{\mu}m$ thick passivation layer before performing wafer level soldering. Conventional Si3N4 passivation between Cu and WPR layer using plasma CVD can be an optional. To practice the board level flip chip assembly, individual students draw their own fan-outs of 40 rectangle pads using Eagle CAD, a free PCB artwork EDA. Individuals then transfer the test circuitry on a blank CCFL board followed by Cu etching and solder mask processes. Negative dry film resist (DFR), Accimage$^{(R)}$, manufactured by Kolon Industries, Inc., was used for solder resist for ball grid array (BGA). We demonstrated how Microelectronics Manufacturing Engineering education has been performed by presenting brief intermediate by-product from undergraduate and graduate students. Microelectronics Manufacturing Engineering, once again, is to educating engineers to actively work in the area of semiconductor manufacturing. Through one semester senior level hands-on laboratory course, participating students will have clearer understanding on microelectronics manufacturing and realized the importance of manufacturing yield in practice.

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Cholesterol Improvement Effects of Fermented Defatted Soybean Grits Added to Corchorus olitorius (몰로키아 첨가 탈지대두grit(defatted soybean grit) 발효물의 콜레스테롤 개선 효과)

  • Kim, Hyun-Jeong;Lee, Sung-Gyu;Lee, Sam-Pin;Lee, In-Seon
    • Korean Journal of Food Science and Technology
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    • v.43 no.3
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    • pp.375-380
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    • 2011
  • This study was performed to investigate cholesterol improvement effects of adding fermented defatted soybean grit (FD) and FD added to 5 or 10% Corchorus olitorius (FDC). Cholesterol adsorption in the FD and FDC group was more than 70%. Apolipoprotein AI and CIII improved in HepG2 cells, and a greater improvement effect was shown in FDC than that in FD. We also investigated the effect of FDC on body lipid metabolism and a high-fat diet for 4 weeks. Rats were divided into control (Con), high-fat (HF), HF treated with 20% FD (HF-FD), and HF treated with 20% FDC (HF-FDC) groups. Plasma total cholesterol and low density lipoprotein-cholesterol concentrations, hepatic total cholesterol, and triglyceride contents were significantly lower in the HF-FDC group than those in the HF group. Additionally, fecal total cholesterol and triglyceride contents increased in rats treated with FDC. Hepatic 3-hydroxy-3-methylglutaryl-coenzyme A reductase activities were significantly lower in the HF-FDC group than those in the HF group.

A Comparative Study of the effects of Synthetic and Xenogenic Bone grafts with PRP (Platelet Rich Plasma) technique on Periodontal Regeneration (혈소판 농축 혈장과 혼합된 합성골 및 이종골 이식재가 치주 조직의 재생에 미치는 효과)

  • Kirn, Young-Joo;Lirn, Sung-Bin;Chung, Chin-Hyung
    • Journal of Periodontal and Implant Science
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    • v.31 no.4
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    • pp.737-747
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    • 2001
  • Regeneration of Periodontium with PRP does not only improve regeneration rate and density of bone but have a possibility to estimate faster healing process for soft tissue. And also, synthetic bone and xenogenic bone graft are effective on regeneration of periodontium. The purpose of this study is to evaluate the effectiveness of synthetic bone ($Biogran^{(R)}$) and xenogenic bone ($BBP^{(R)}$) grafts with the PRP technique on regeneration of periodontium. 52 Generally healthy Pt. who had pocket depth 5mm at any of 6 surfaces of the teeth were in the study at Dept. of Perio. in Dankook Dental Hospital. Open Flap was treated for 18 infra-bony pockets as control group, $Biogran^{(R)}$ with PRP was inserted for 25 infrabony pockets as first test group, and $BBP^{(R)}$ with PRP was inserted for 22 infrabony pockets as 2nd test group. Then evaluation was made after 3 and 6 months 1. 6 months after surgery, each difference of average probing pocket depth was $2.61{\pm}0.23$ for control, $3.40{\pm}0.30$ for 1st test, and $3.45{\pm}0.37$ for 2nd test group. 2. 6 months after surgery, each difference of clinical probing attachment level was $1.39{\pm}0.12$ for control, $2.88{\pm}0,24$ for 1st, and $2.86{\pm}0,27$ for 2nd test group. 3. 6 months after surgery, each difference of Maximal probing attachment level was $1.11{\pm}0.16$ for control, $3.28{\pm}0.30$ for 1st, and $3.27{\pm}0.35$ for 2nd test group. 4. There were significant differences for clinical change of each three group which were between average probing pocket depth and clinical attachment level of 3,6 months and minimal and maximal attachment level after 6 months 5. There were significant differences for average probing pocket depth which were only at control group and 2nd test group between 1 and 6months. For clinical attachment level and minimal and maximal proving attachment level, there was a significant difference after 6month of surgery. 6. There was no significant difference between two test groups for average probing depth, clinical attachment level, and minima1 and maximal probing attachment level. As the result, PRP with bone graft is very effective for regeneration of periodontium and there is no difference between xenogenic bone and synthetic bone.

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Vortical Etching Characteristics of SrBi$_2$Ta$_2$O$_9$ thin Films Depending on Ar/Cl$_2$ Ratios and RF/DC Power Densities (SrBi$_2$Ta$_2$O$_9$ 박막에 있어서 Ar/C1$_2$가스의 비율 및 RF/DC Power Density의 변화에 따른 수직 식각의 특성연구)

  • 황광명;이창우;김성일;김용태;권영석;심선일
    • Journal of the Microelectronics and Packaging Society
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    • v.8 no.3
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    • pp.49-53
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    • 2001
  • Vortical etching experiments of ($SrBi_2Ta_2O_9$)/Si thin films have been performed by using the inductively coupled plasma reactive ion etching (ICP-ME) apparatus. The purposes of these experiments are to get the effective area of vertical surface. Because this technology is very important to get good qualities of ferroelectric gate structure, capacitor and the minimum parasitic effects related to the excellent performances of the FRAM (Ferroelectric Random Access Memory) device. The reacting gases were Ar and $Cl_2$gases, and various $Ar/C1_2$flow ratios were used. The etching experiments were carried out at various RF powers such as 700, 700, 500W and at various DC powers such as 200, 150, 100, 50W, respectively. The maximum etch rate of $SrBi_2Ta_2O_9$/Si thin films was 1050 A/min at the $Ar/C1_2$ gas ratio of 20/16, RF power of 700 W and DC power of 200 W. From the SEM (scanning electron microscopy) image of the SBT thin films, the wall angle was as good as about $82^{\circ}$.

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Bioequivalence Evaluation of Lovastatin Tablets (로바스타틴 정제의 생물학적 동등성 평가)

  • Bok, Hae Sook;Kim, Myoung Min;Choi, Kyung Eob
    • Korean Journal of Clinical Pharmacy
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    • v.8 no.2
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    • pp.107-112
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    • 1998
  • Lovastatin is a lipid lowering agent for the treatment of hypercholesterolemia and belongs to a new class of pharmacologic compounds called the 3-hydroxy-3-methylglutaryl coenzyme A (HMG CoA) reductase inhibitors. By competitively inhibiting HMG CoA reductase, lovastatin disrupts the biosynthesis of cholesterol in hepatic and peripheral cells and increases the synthesis of high-density-lipoprotein HDL) receptors. Following oral administration, the lactone ring of lovastatin is hydrolysed to the active inhibitor of HMG CoA reductase, lovastatin acid. Lovastatin is known to have poor oral absorption and wide individual variation. In this study, bioequivalence test of two lovastatin formulations, the test drug ($Lovaload^{TM}$, Chong Kun Dang Pharmaceutical Co.) and the reference drug ($Mevacor^{TM}$, Chung Wae Pharmaceutical Co.) were conducted according to the guidelines of Korea Food and Drug Administration (KFDA). A total of 18 healthy male volunteers, $31.90\pm3.60$ years old and $72.17\;7.88$ kg of body weight in average, were evaluated in a randomized crossover manner with a 2-week washout period. Concentrations of lovastatin acid in plasma were measured upto 12 hours following a single oral administration of eight tablets (20 mg of lovastatin per tablet) by high-performance liquid chromatography with UV detection at 238 nm. The area under the concentration-vs-time curve from 0 to 12 hours $(AUC_{0-12h})$ was calculated by the trapezoidal summation method. The statistical analysis showed that there are no significant differences in $AUC_{0-12h),\;C_{max}\;and\;T_{max}$ between the two formulations ($6.72\%,\;1.52\%,\;and\;0.88\$, respectively). The least significant differences between the formulations at $\alpha$=0.05 were less than $20\%\;(11.65\%,\;19.73\%,\;and\;14.81\%\;for\;AUC_{0-12h},\;C_{max}\;and\;T_{max}$, respectively). The $90\%$ confidence intervals for these parameters were also within $\pm20\%\;(-1.50{\leq}{\delta}{\leq}15.00$, $-12.50{\leq}{\delta}{\leq}15.50,\;and\;-9.64{\leq}{\delta]{\leq}11.40{\leq}\;for\;\;AUC_{0-12h}$ ,$C_{max}\;and\;T_{max}$, respectively). In conclusion, the new generic product $Lovaload^{TM}$ was proven to be bioequivalent with the reference drug.

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A STUDY ON THE RESISTANCE OF WEAR AND CYTOTOXICITY OF THE TITANIUM SURFACE AFTER FILM DEPOSITIONS (박막증착시 티타늄 표면의 마손저항도와 세포독성에 관한 연구)

  • Kim Hyung-Woo;Kim Chang-Whe;Kim Yung-Soo
    • The Journal of Korean Academy of Prosthodontics
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    • v.39 no.1
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    • pp.84-95
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    • 2001
  • Titanium is widely used in dentistry for its low density, high strength, fatigue resistance, corrosion resistance, and biocompatibility. But it has a tendency of surface damage under circumstance of friction and impact for its low hardness of the surface. Coating is one of methods fir increasing surface hardness. Its effect is to improve surface physical characteristics without change of titanium. Diamond-like carbon and titanium nitride are known for its high hardness of the surface. So that this study was aimed at the wear test and the cytotoxicity test of the commercially pure titanium and Ti-6Al-4V alloy which were deposited by diamond-like carbon film or titanium nitride film to acertain improvement of the surface hardness and the biocompatibility. A disk (25mm diameter, 2mm thickness) was made of commercially pure titanium and Ti-6Al-4V alloy and these substrates were deposited by diamond-like carbon film or titanium nitride film. Diamond-like carbon film was deposited by the method of radiofrequency plasma assisted chemical vapor deposition and titanium nitride film was deposited by the method of reactive arc ion plating. Then these substrates were tested about wear characteristics by the pin-on-disk type wear tester in which ruby ball was used as a wear causer under the load of 32N, The fracture cycles were measured by rotating the substrates until their films were fractured. The wear volume was measured after 150 cycles and 3,000 cycles using surface profiler. The cytotoxicity test was peformed by the method of the MTT assay. The results were as follows : 1. In the results of the wear volume test, commercially pure titanium and titanium alloy which were coated by diamond-like carbon film or titanium nitride aim had higher resistance against wear than the substrates which were not coated by any films (P<0.05). 2. In the results of the fracture cycle test and the wear volume test, diamond-like carbon film had higher resistance against wear than titanium nitride film (P<0.05). 3. In both coatings of diamond-like carbon aim and titanium nitride film, Ti-6Al-4V alloy had higher resistance against wear than commercially pure titanium (P<0.05) 4. In the results of the cytotoxicity test, diamond-like carbon film and titanium nitride film had little cytotoxicity as like commercially pure titanium or Ti-6Al-4V alloy (P>0.05).

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Direct Conversion of Cellulose into Polyols over Pt Catalysts Supported on Zeolites (제올라이트에 담지된 백금 촉매를 이용한 셀룰로우스의 폴리올로의 직접 전환)

  • You, Su Jin;Baek, In Gu;Park, Eun Duck
    • Korean Chemical Engineering Research
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    • v.50 no.3
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    • pp.435-441
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    • 2012
  • The direct conversion of cellulose into polyols in $H_2$ was examined over Pt catalysts supported on various zeolites, viz., mordenite, Y, ferrierite, and ${\beta}$. For comparison, Pt catalysts supported on ${\gamma}-Al_2O_3$, $SiO_2-Al_2O_3$, and $SiO_2$ were also tested. The physical properties of the catalysts were probed with $N_2$ physisorption. The surface acidity was measured with temperature programmed desorption of ammonia ($NH_3$-TPD). The Pt content was quantified with inductively coupled plasma-atomic emission spectroscopy (ICP-AES). The Pt dispersion was determined with CO chemisorptions and transmission electron microscopy (TEM). The conversion of cellulose appeared to be mainly dependent on the reaction temperature and reaction time because it depends on the concentration of $H^+$ ions reversibly formed in hot water. Pt/H-mordenite (20) showed the highest yield to polyols among the tested catalysts. Pt/H-zeolite was superior to Pt/Na-zeolite for this reaction. The polyol yield was dependent on the surface acid density and the external surface area.

Ordinary Magnetoresistance of an Individual Single-crystalline Bi Nanowire (자발 성장법으로 성장된 단결정 Bi 단일 나노선의 정상 자기 저항 특성)

  • Shim, Woo-Young;Kim, Do-Hun;Lee, Kyoung-Il;Jeon, Kye-Jin;Lee, Woo-Young;Chang, Joon-Yeon;Han, Suk-Hee;Jeung, Won-Young;Johnson, Mark
    • Journal of the Korean Magnetics Society
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    • v.17 no.4
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    • pp.166-171
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    • 2007
  • We report the magneto-transport properties of an individual single crystalline Bi nanowire grown by a spontaneous growth method. We have successfully fabricated a four-terminal device based on an individual 400-nm-diameter nanowire using plasma etching technique to remove an oxide layer forming on the outer surface of the nanowire. The transverse MR (2496% at 110 K) and longitudinal MR ratios (38% at 2 K) for the Bi nanowire were found to be the largest known values in Bi nanowires. This result demonstrates that the Bi nanowires grown by the spontaneous growth method are the highest-quality single crystalline in the literatures ever reported. We find that temperature dependence of Fermi energy ($E_F$) and band overlap (${\triangle}_0$) leads to the imbalance between electron concentration ($n_e$) and hole concentration ($n_h$) in the Bi nanowire, which is good agreement with the calculated $n_e\;and\;n_h$ from the respective density of states, N(E), for electrons and holes. We also find that the imbalance of $n_e\;and\;n_h$ plays a crucial role in determining magnetoresistance (MR) at T<75 K for $R_T$ and at T<205 K for $R_L$, while mean-free path is responsible for MR at T>75 K for $R_T$ and T>205 K for $R_L$.

Electro-optical Properties of ${Mg_{1-x}}{Zn_x}$O Thin Films Grown by a RF Magnetron Sputtering Method as a Protective Layer for AC PDPs (고주파 마그네트론 스퍼터링 방법으로 증착한 PDP용 ${Mg_{1-x}}{Zn_x}$O 보호막의 전기광학적 특성연구)

  • Jeong, Eun-Yeong;Lee, Sang-Geol;Lee, Do-Gyeong;Lee, Gyo-Jung;Son, Sang-Ho
    • Korean Journal of Materials Research
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    • v.11 no.3
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    • pp.197-202
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    • 2001
  • M $g_{1-x}$ Z $n_{x}$O thin films with various composition x of ZnO were fabricated by a RF magnetron sputtering method, which is expected to improve the electro-optical properties of the conventional MgO protective layer for AC-PDP. Test panels with the $Mg_{1-x}$Z $n_{x}$O protective layer have been fabricated in order to investigate the effects of ZnO doping on the electrical characteristics of devices such as the discharge voltages and the memory gain. Experimental results revealed that test panels with the $Mg_{1-x}$Z $n_{x}$O(x=0.5at%) protective layer show lower firing and sustain voltages than those seen in panels with MgO protective layer by 20V. resulting in an increasement of the memory coefficient. In addition, it was found that test panels with the $Mg_{1-x}$Z $n_{x}$O protective layer show higher discharge intensity, i. e., higher plasma density, compared with panels with MgO protective layer.ve layer.layer.

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Deposition Characteristics of Lead Titanate Films on $RuO_2$ and Pt Substrates Fabricated by Chemical Vapor Deposition ($RuO_2$ 및 Pt 기판에서 $PbTiO_3$박막의 화학기상 증착특성에 관한 연구)

  • Jeong, Su-Ok;Lee, Won-Jong
    • Korean Journal of Materials Research
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    • v.10 no.4
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    • pp.282-289
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    • 2000
  • $PbTiO_3$ films were fabricated by electron cyclotron resonance plasma enhanced chemical vapor deposition(ECR-PECVD). Deposition characteristics of $PbTiO_3$films on $RuO_2$ and Pt substrates were investigated with varying the flow rate of metalorganic source and substrate temperature. The residence time of Pb-oxide molecules in much longer on $RuO_2$ than on Pt substrate, while the perovskite nucleation is more difficult on $RuO_2$ than on Pt substrate. Therefore, the process conditions to obtain the single perovskite $PbTiO_3$ phase are more restricted on $RuO_2$ than on Pt substrates. An introduction of Ti-oxide seed layer increases perovskite nucleation density and thus enlarges the process window to obtain the single perovkite phase. The introduction of Ti-oxide seed layer make the PZT film that Ti-components of $PbTiO_3$ are partially substituted with Zr atoms have single perovskite phase for the wide range of Zr/(Zr+Ti) concentration ratios.

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