• Bulletin of the Korean Chemical Society
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• 제30권3호
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• pp.595-598
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• 2009

The authors describe an analytical method to determine total chlorine in a sanitizer liquid, incorporating a lab-made He-rf-plasma within a PDMS polymer microchip. Helium was used instead of Ar to produce a plasma to achieve efficient Cl excitation. A quartz tube 1 mm i.d. was embedded in the central channel of the polymer microchip to protect it from damage. Rotational temperature of the He-microchip plasma was in the range 1350-3600 K, as estimated from the spectrum of the OH radical. Chlorine was generated in a volatilization reaction vessel containing potassium permanganate in combination of sulfuric acid and then introduced into the polymer microchip plasma (PMP). Atomic emission lines of Cl at 438.2 nm and 837.7 nm were used for analysis; no emission was observed for Ar plasma. The achieved limit of detection was 0.81 ${\mu}g\;mL^{-1}$ (rf powers of 30-70 W), which was sensitive enough to analyze sanitizers that typically contained 100-200 ${\mu}g\;mL^{-1}$ of free chlorine in chlorinated water. This study demonstrates the usefulness of the devised PMP system in the food sciences and related industries.

• Corrosion Science and Technology
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• 제17권3호
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• pp.91-100
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• 2018

Development of biodegradable implants for treatment of complex bone fractures has recently become one of the priority areas in biomedical materials research. Multifunctional corrosion resistant and bioactive coatings containing hydroxyapatite $Ca_{10}(PO_4)_6(OH)_2$ and magnesium oxide MgO were obtained on Mg-Mn-Ce magnesium alloy by plasma electrolytic oxidation. The phase and elemental composition, morphology, and anticorrosion properties of the coatings were investigated by scanning electron microscopy, energy dispersive spectroscopy, potentiodynamic polarization, and electrochemical impedance spectroscopy. The PEO-layers were post-treated using superdispersed polytetrafluoroethylene powder. The duplex treatment considerably reduced the corrosion rate (>4 orders of magnitude) of the magnesium alloy. The use of composite coatings in inducing bioactivity and controlling the corrosion degradation of resorbable Mg implants are considered promising. We also applied the plasma electrolytic oxidation method for the formation of the composite bioinert coatings on the titanium nickelide surface in order to improve its electrochemical properties and to change the morphological structure. It was shown that formed coatings significantly reduced the quantity of nickel ions released into the organism.

• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 2002년도 하계학술대회 논문집
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• pp.3-6
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• 2002

Plasma processing plays a significant role in semiconductor devices technology. Development of new plasma systems, such as high-density plasma reactors, required development of plasma theory to understand a whole process mechanism and to be able to explain and to predict processing results. A most important task in this way is to establish interconnections between input process parameters (working gas, pressure, flow rate, input power density) and various plasma subsystems (electron gas, volume and heterogeneous gas chemistry, transport), which are closely connected one with other. It will allow select optimal ways for processes optimization.

• 반도체디스플레이기술학회지
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• 제16권2호
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• pp.75-78
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• 2017

We reports improved monitoring performance of Self plasma-optical emission spectroscopy (SP-OES) by augmenting a by-pass tube to a conventional straight (or single) tube type self plasma reactor. SP-OES has been used as a tool for the monitoring of plasma chemistry indirectly in plasma process system. The benefits of SP-OES are low cost and easy installation, but some semiconductor industries who adopted commercialized SP-OES product experiencing less sensitivity and slow sensor response. OH out-gas chemistry monitoring was performed to have a direct comparison of a conventional single type tube and a by-pass type tube, and fluid dynamic simulation on the improved hardware design was also followed. It is observed faster pumping out of OH from the chamber in the by-pass type SP-OES.

• Journal of Industrial and Engineering Chemistry
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• 제67권
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• pp.380-387
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• 2018

Finding poly(amidoxime) (PAO) based adsorbent with better performance in U(VI) extraction from seawater is a hot research topic. By employing plasma treatment, the bi-functionalized adsorbents containing amidoxime and phosphate (labelled as $PO_4/PAO$) were successfully synthesized. The obtained $PO_4/PAO$ was characterized and applied for the potential extraction of U(VI) from aqueous solution. The results show that $-PO_4$ enhanced the hydrophilicity of PAO. $PO_4/PAO$ possesses good selective sorption ability for U(VI) and excellent reusability. The findings is helpful to understand optimizing performance of PAO based adsorbents for uranium extraction from seawater.

• 공업화학
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• 제35권1호
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• pp.8-15
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• 2024

본 연구에서는 활성탄소의 테트라사이클린 흡착성능을 향상시키기 위해 5, 10, 및 15분의 시간에 따른 질소 플라즈마 처리를 실시하였다. 모든 질소 플라즈마 처리된 활성탄소는 미처리 활성탄소와 비교하여 테트라사이클린 흡착성능이 개선되었다. 이는 활성탄소에 도입된 질소 작용기가 테트라사이클린과 π-π 상호작용 및 수소 결합을 통하여 화학흡착을 야기하기 때문이다. 특히, 80 W 및 50 kHz의 질소 플라즈마 처리에서, 10분 동안 처리된 활성탄소가 가장 우수한 흡착성능을 가졌다. 이 때, 활성탄소 표면의 질소 함량은 2.03%이며 비표면적은 1,483 m²/g까지 증가하였다. 이렇게 질소플라즈마 처리에 의해 개선된 활성탄소는 물리 및 화학 흡착성능이 향상되었다. 또한, 흡착 실험 결과가 Langmuir 흡착등온식과 유사 2차 반응속도식에 잘 부합하므로, 질소 플라즈마 처리된 활성탄소의 테트라사이클린 흡착은 단분자층으로 이루어지는 화학 흡착이 주도적으로 일어나는 것으로 판단하였다. 결과적으로, 질소 플라즈마 처리된 활성탄소는 주도적인 화학 흡착과 더불어 물리 흡착의 시너지 효과로 수중에서 테트라사이클린을 효율적으로 제거하는 흡착재로 사용될 수 있다.

• 한국연소학회:학술대회논문집
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• 한국연소학회 2006년도 제32회 KOSCO SYMPOSIUM 논문집
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• pp.144-148
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• 2006

Characteristics of a plasma reactor for partial oxidation of methane, especially focused on the role and effectiveness of plasma chemistry, is investigated. Partial oxidation of methane is investigated using a rotating arc which is a three dimensional version of a typical glidingarc. The rotating arc has both the characteristics of equilibrium and non-equilibrium plasma. Non-equilibrium characteristics of the rotating gliding arc can be increased by rotating an elongated arc string attached at both the tip of inner electrode and the edge of outer electrode. In this way, plasma chemistry can be enhanced and hydrogen selectivity can reach almost 100% that is much higher than thermal equilibrium condition. As a result, the present study enables the strategic approach of the plasma reforming process by means of appropriate reactor design to maximize plasma effect and resulting in maximized reaction efficiency.

• 한국진공학회:학술대회논문집
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• 한국진공학회 2004년도 제27회 학술발표회 초록집
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• pp.226-226
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• 2004

• 공업화학
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• 제33권2호
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• pp.229-233
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• 2022

In this study, a gas-liquid hybrid atmospheric pressure plasma reactor of the dielectric barrier discharge method was fabricated and characterized. The solubility of copper oxide in the organic acid solution was increased when argon having a larger atomic weight than helium was used during plasma discharge. There was no significant effect of mixing organic acid solutions under plasma discharge treatment on the variation of copper oxide's solubility. As the applied voltage for plasma discharge and the concentration of the organic acid solution increased, the dissolution and removal power of the copper oxide layer increased. Solubility of copper oxide was more affected by the concentration in organic acid solution rather than the variation of plasma applied voltage. The usefulness of hybrid plasma reactor for the surface cleaning process was confirmed.

• 한국표면공학회지
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• 제36권1호
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• pp.14-21
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• 2003

Thin films of ZrO$_2$ and TiO$_2$ were deposited on Si(100) substrates using RF magnetron sputtering technique. To study an influence of the sputtering parameters, systematic experiments were carried out in this work. XRD data show that the $ZrO_2$ films were mainly grown in the [111] orientation at the annealing temperature between 800 and $1000^{\circ}C$ while the crystal growth direction was changed to be [012] at above $1000^{\circ}C$. FT-IR spectra show that the oxygen stretching peaks become strong due to $SiO_2$ layer formation between film layers and silicon surface after annealing, and proved that a diffusion caused by either oxygen atoms of $ZrO_2$ layers or air into the interface during annealing. Different crystal growth directions were observed with the various deposition parameters such as annealing temperature, RF power magnitude, and added $O_2$ amounts. The growth rate of $TiO_2$ thin films was increased with RF power magnitude up to 150 watt, and was then decreased due to a sputtering effect. The maximum growth rate observed at 150 watt was 1500 nm/hr. Highly oriented, crack-free, stoichiometric polycrystalline $TiO_2$<110> thin film with Rutile phase was obtained after annealing at $1000^{\circ}C$ for 1 hour.