Etching characteristics of ZnO thin films using inductively coupled $BCl_3$/Ar and $Cl_2$/Ar plasma

Na, S.W. (Dept. of Materials Science and Engineering and Center for Advanced Plasma Surface Technology Sungkyunkwan University) ;
Shin, M.H. (Dept. of Materials Science and Engineering and Center for Advanced Plasma Surface Technology Sungkyunkwan University) ;
Chung, Y.M. (Dept. of Advanced Materials Engineering and Center for Advanced Plasma Surface Technology Sungkyunkwan University) ;
Han, J.G. (Dept. of Advanced Materials Engineering and Center for Advanced Plasma Surface Technology Sungkyunkwan University) ;
Jeung, S.H. (Dept. of Chemistry and Center for Advanced Plasma Surface Technology Sungkyunkwan University) ;
Boo, J.H. (Dept. of Chemistry and Center for Advanced Plasma Surface Technology Sungkyunkwan University) ;
Lee, N.E. (Dept. of Materials Science and Engineering and Center for Advanced Plasma Surface Technology Sungkyunkwan University)