• Applied Chemistry for Engineering
• /
• v.35 no.1
• /
• pp.8-15
• /
• 2024

In this study, nitrogen plasma treatment was performed in 5, 10, and 15 minutes to improve the tetracycline adsorption performance of activated carbon. All nitrogen plasma-treated activated carbons showed improved tetracycline adsorption compared to untreated activated carbons. The nitrogen functional groups in activated carbon lead to chemisorption with tetracycline via π-π interactions and hydrogen bonding. In particular, in the nitrogen plasma treatment at 80 W and 50 kHz, the activated carbon treated for 10 minutes had the best adsorption performance. At this time, the nitrogen content on the surface of the activated carbon was 2.03% and the specific surface area increased to 1,483 m²/g. As a result, nitrogen plasma treatment of activated carbon improved its physical and chemical adsorption capabilities. In addition, since the adsorption experimental results were in good agreement with the Langmuir isotherm and pseudo-second order model, it was determined that the adsorption of tetracycline on the nitrogen plasma-treated activated carbon was dominated by chemical adsorption through a monolayer. As a result, nitrogen plasma-treated activated carbon can be used as an adsorbent to efficiently remove tetracycline from water due to the synergistic effect of physical adsorption and proactive chemical adsorption.

• Journal of the Korean Chemical Society
• /
• v.29 no.4
• /
• pp.382-389
• /
• 1985

The effect of plasma operational parameters for the determination of rare earth elements(REE) by means of inductively coupled plasma(ICP) spectrometry was investigated. While the increase in the flow rate of carrier gas argon enhanced the sensitivity and lowered the detection limit, significant ionization interferences were observed. The decrease in RF power increased the signal to background ratio. The observation point showing the lowest ionization interference was slightly higher than the position where the spatial profile of the analyte reached the maximum. The detection limits of the spectral lines commonly used for the determination of REE were measured and the spectral lines relatively free from spectral interferences were chosen.

• Bulletin of the Korean Chemical Society
• /
• v.35 no.10
• /
• pp.2941-2944
• /
• 2014

The electrical and mechanical properties of the plasma polymerized low dielectric constant SiCOH films were investigated. The SiCOH films were produced with tetrakis(trimethylsilyloxy)silane and cyclohexane as precursors by using a plasma enhanced chemical vapor deposition. When the deposition plasma powers were changed from 10 to 50 W, the relative dielectric constant of the SiCOH film increased from 2.09 to 2.76 and their hardness and elastic modulus were changed from 1.6 to 5.6 GPa and from 16 to 44 GPa, respectively. After thermal annealing at $500^{\circ}C$, the annealed SiCOH films showed relative dielectric constants of 1.80-2.97, a hardness of 0.45-0.6 GPa and an elastic modulus of 6-7 GPa. And then, the chemical structures of as-deposited and annealed SiCOH films were analyzed by using Fourier transform infrared spectroscopy.

• Proceedings of the Korean Vacuum Society Conference
• /
• 2011.08a
• /
• pp.236-236
• /
• 2011

Silicon oxynitride (SiON) was deposited for gas barrier film on polyethylene terephthalate (PET) using octamethylycyclodisiloxane (Si4O4C8H24, OMCTS) precursor by plasma enhanced chemical vapor deposition (PECVD) at low temperature. The ion flux and substrate temperature were measured by oscilloscope and thermometer. The chemical bonding structure and barrier property of films were characterized by Fourier transform infrared (FT-IR) spectroscopy and the water vapor transmission rate (WVTR), respectively. The deposition rate of films increases with RF bias and nitrogen dilution due to increase of dissociated precursor and nitrogen ion incident to the substrate. In addition, we confirmed that the increase of nitrogen dilution and RF bias reduced WVTR of films. Because, on the basis of FT-IR analysis, the increase of the nitrogen gas flow rate and RF bias caused the increase of the C=N stretching vibration resulting in the decrease of macro and nano defects.

• Bulletin of the Korean Chemical Society
• /
• v.32 no.11
• /
• pp.3967-3972
• /
• 2011

A whole body physiologically based pharmacokinetic (PBPK) model was applied to investigate absorption, distribution, and physiologic variations on pharmacokinetics of imatinib in human body. Previously published pharmacokinetic data of the drug after intravenous (i.v.) infusion and oral administration were simulated by the PBPK model. Oral dose absorption kinetics were analyzed by adopting a compartmental absorption and transit model in gut section. Tissue/plasma partition coefficients of drug after i.v. infusion were also used for oral administration. Sensitivity analysis of the PBPK model was carried out by taking parameters that were commonly subject to variation in human. Drug concentration in adipose tissue was found to be higher than those in other tissues, suggesting that adipose tissue plays a role as a storage tissue for the drug. Variations of metabolism in liver, body weight, and blood/plasma partition coefficient were found to be important factors affecting the plasma concentration profile of drug in human body.

• Archives of Pharmacal Research
• /
• v.12 no.2
• /
• pp.108-113
• /
• 1989

A new column-switching high performance liquid chromatographic method was developed for the determination of lonazolac in plasma. This method was based on the on-line trace enrichment of lonazolac using a precolumn packed with Amberlite XAD-2. The analysis was complete in 20 min. between injections and the limit of detection was $0.1{\mu}g/ml$ using $100{\mu}l$ of plasma. The method was linear in range of $0.1-10{\mu}g/ml$ with a correlation coefficient of 0.9991. Absolute recovery of lonazolac from the spiked plasma samples ranged from 95.6% to 97.1%. The method was shown to be reproducible over the concentration range studied.

• Proceedings of the Korean Vacuum Society Conference
• /
• 2012.08a
• /
• pp.248-248
• /
• 2012

Synthesis graphene on Cu substrate by plasma-enhanced chemical vapor deposition (PE-CVD) is investigated and its quality's affection factors are discussed in this work. Compared with the graphene synthesized at high temperature in chemical vapor deposition (CVD), the low-temperature graphene film by PE-CVD has relatively low quality with many defects. However, the advantage of low-temperature is also obvious that low melting point materials will be available to synthesize graphene as substrate. In this study, the temperature will be kept constant in $400^{\circ}C$ and the graphene was grown in plasma environment with changing the plasma power, the flow rate of precursors, and the distance between plasma generator coil and substrates. Then, we investigate the effect of temperature and the influence of process variables to graphene film's quality and characterize the film properties with Raman spectroscopy and sheet resistance and optical emission spectroscopy.

• Textile Coloration and Finishing
• /
• v.22 no.4
• /
• pp.300-305
• /
• 2010

Poly(ethylene terephthalate)(PET) tire cord has relatively lower adhesion properties caused by limited reacting sites. In order to improve the adhesion force between PET tire cord and rubber, an additional process to activate surface of PET has been employed. Atmospheric plasma was used to substitute the chemical finishing process of PET tire cord as a green dipping process. Contact angle was measured to confirm surface change of PET after plasma treatment. The treated PET tire cords with/without resorcinol-formaldehyde-latex(RFL) and unvulcanized rubber were vulcanized in a testing mold at $160^{\circ}C$. After atmospheric plasma treatment of PET tire cord, adhesion force was somewhat increased under some conditions.

• Transactions on Electrical and Electronic Materials
• /
• v.8 no.5
• /
• pp.211-214
• /
• 2007

Chemical and morphological changes of phenol formaldehyde-based photoresist after $O_2$ radiofrequency(RF) plasma treatment depending on exposure time and source power were investigated. It was found that etch rate of photoresist sharply increased after discharge turn on and reached a limit with increase in plasma exposure time. Contact angle measurements and X-ray photoelectron spectroscopy(XPS) analysis showed that the surface chemical structure become nearly constant after 15 sec of the treatment. Atomic force microprobe(AFM) measurements were shown that surface roughness was increased with plasma exposure time.

• Applied Science and Convergence Technology
• /
• v.23 no.6
• /
• pp.328-339
• /
• 2014

In this article, plasma monitoring tools and mulivariate analysis techniques were reviewed. Optical emission spectroscopy was reviewed for a chemical composition analysis tool and RF V-I probe for a physical analysis tool for plasma monitoring. Multivariate analysis techniques are discussed to the sensitivity improvement. Principal component analysis (PCA) is one of the widely adopted multivariate analysis techniques and its application to end-point detection of plasma etching process is discussed.