• 제목/요약/키워드: photosensitivity

검색결과 131건 처리시간 0.03초

광섬유격자 제작을 위한 수소 처리 방법 연구 (The Hydrogen Loading Method for FBG Fabrication)

  • 송정환;이경식
    • 대한전자공학회논문지SD
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    • 제37권7호
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    • pp.29-35
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    • 2000
  • 다양한 수소처리 조건에 의하여 수소 처리된 광섬유에 광섬유 격자를 제작하여, 광섬유 코어 내에 포화된 수소분자 농도와 광섬유 격자의 굴절률 변화폭(photoinduced index modulation)과의 관계를 분석하여 보았다. 실험으로 측정된 광섬유 결자의 굴절률 변화폭은 코어 내에 수소분자 농도가 100ppm 증가함에 따라서 ${\sim}2{\times}10^{-5}$만큼 증가하였다. 그리고 광감도현상에 관여하는 전체결함, 즉 GeE' 센터와 GeH결함은 포화된 수소농도 100ppm 당 대략 $3.8{\times}10^{17}/cm^3$ 만큼 많아지는 것으로 추정된다.

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Resorcinol계 Photoresist의 합성과 그 감광 특성 (Synthesis and Photocharacteristics of Resorcinols Photoresist)

  • 근장현;김승진;박홍수
    • 공업화학
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    • 제5권4호
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    • pp.662-668
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    • 1994
  • Photoresist로의 응용을 위하여 감광성 관능기를 가진 폴리머인 polyresorcinol-formaldehyde glycidyl ether의 cinnamoyl ester(RGEFC)를 제조하였다. RGEFC의 감광 특성은 노광 전후의 유기용매에 대한 용해도 차이로서 결정하였는데, 유리판상에 도포한 각종 시료를 제반조건하에서 노광한 다음, 도포시에 사용한 같은 용매에 담그어 잔막수득량을 계산하였다. 필름의 감도와 밀접한 관계를 가지는 수득량은 수지의 중합도, 증감제의 종류 및 첨가농도에 따라 좌우되었으며, 그 감도는 폴리머의 중합도에 의존되어 중합도가 커질수록 증가되었다. 사용된 증감제 중 RGEFC에 대한 가장 효과적인 증감제는 2, 6-dichloro-4-nitroaniline이었다.

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후막리소그라피를 이용한 세라믹기반의 미세유체소자용 수동형 혼합기의 제조 (Fabrication of Ceramic-based Passive Mixers for Microfluidic Application by Thick Film Lithography)

  • 최재경;윤영준;임종우;김효태;구은회;최윤석;이종흔;김종희
    • 한국세라믹학회지
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    • 제45권11호
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    • pp.739-743
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    • 2008
  • Microfluidic device can be applied in a wide range of chemical and biological technology. In this paper, ceramic-based T-type passive mixers for microfluidic applications were fabricated by LTCC process combined with thick film photolithography. The base ceramic material in thick film was amorphous cordierite $((Mg,Ca)_2Al_4Si_5O_{18})$ and photoimageable polymers were added to give a photosensitivity. Two types of passive mixer, which showed the channel width of 1.0 mm and $200{\mu}m$, respectively, were designed considering mixing efficiency in the channel and their microfluidic properties were discussed in detail.

Diffraction Behaviors of New Photopolymers Containing the Dendritic Molecule

  • Kim Go Woon;Jun Woong Gi;Lee Sang Kyu;Cho Min Ju;Jin Jung-Il;Choi Dong Hoon
    • Macromolecular Research
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    • 제13권6호
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    • pp.477-482
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    • 2005
  • Photopolymers are attractive materials for holographic 3-D data storage because of their high photosensitivity and large refractive index modulation. We synthesized the six-armed dendrimer for fabricating the new photopolymer. It was prepared using the initiating mixture of hexaarylbiimidazole (HABI), mercapto-benzoxazole (MOBZ), and 2,6-bis(4-diethylaminobenzylidene)cyclopentanone (DEAW), which is sensitive to 514 nm wavelength. The holographic gratings were fabricated successfully in these photopolymer samples by conventional optical interference method. We investigated the effect of dendrimer, either as a binder or as a plasticizer in the cellulose acetate butyrate (CAB), on the diffraction behavior. The addition of only 1 wt$\%$ of dendrimer-I into the CAB significantly increased the diffraction efficiency. The sample doped with dendrimer showed around 80-83$\%$ of the diffraction efficiency.

Buffer layer 를 이용한 저온 $\muC-Si/CaF_2$/glass 박막성장연구 (The Study of Low Temperature $\muC-Si/CaF_2$/glass Film Growth using Buffer layer)

  • 김도영;안병재;임동건;이준신
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 1999년도 춘계학술대회 논문집
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    • pp.589-592
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    • 1999
  • This paper describes direct $\mu$C-Si/CaF$_2$/glass thin film growth by RPCVD system in a low temperature for thin film transistor (TFT), photovoltaic devices. and sensor applications. Experimental factors in a low temperature direct $\mu$ c-Si film growth are presented in terms of deposition parameters: SiH$_4$/H$_2$ ratio, chamber total pressure, substrate temperature, rf power, and CaF$_2$ buffer layer. The structural and electrical properties of the deposited films were studied by means of Raman spectroscopy, I-V, L-I-V, X-ray diffraction analysis and SEM. we obtain a crystalline volume fraction of 61%, preferential growth of (111) and (220) direction, and photosensitivity of 124. We achieved the improvement of crystallinity and electrical property by using the buffer layers of CaF$_2$ film.

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New Soluble and Intrinsically Photosensitive Polyimide: Synthesis and Properties of Poly(amide-co-imide) Containing p-Phenylenediacryloyl Moiety

  • Lee, Myong-Hoon;Cheong, Yun-Sang;Gong, Myoung-Seon
    • Macromolecular Research
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    • 제9권6호
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    • pp.327-331
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    • 2001
  • A new soluble photosensitive poly(amide-co-imide) containing p-phenylenediacryloyl moiety was synthesized and its photoreactivity was characterized. The copolymer was synthesized fromp-phenylenediacryloyl chloride, 4,4-(hexafluoroisopropylidene)diphthalic anhydride and two equivalents of bis(4-aminophenyl) ether in NMP with a subsequent chemical imidization of the resulting poly[amide$\xi$ο-(amic acid)] by acetic anhydride and pyridine. The structure and thermal properties of the polymer were characterized by spectroscopic methods and thermal analyses. The polymer was stable up to 350$\^{C}$, showed good solubility in polar aprotic solvents, and became insoluble after UV irradiation due to the[2+2] cycloaddition of phenylenediacryloyl moiety. Photoreactivity of the polymer was investigated in solution or as a film with respect to the various exposure conditions by UV/Vis spectroscopy. The photosensitivity was noticeably increased with the irradiation temperature, especially in the presense of photosensitizer. The reason for the increased sensitivity was speculated based on the flexibilization of main chain at elevated temperature. Exposure characteristic curves were obtained from the gel fraction experiments after UV irradiation. The sensitivity and contrast at 160$\^{C}$ were measured to be 293 mJ/㎠ and 1.64, respectively.

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인쇄 제판용 Photoresist의 잔막수율법에 의한 용해도 비교 (Solubility Comparison by Yield Method of Residual of Photoresist for Printing Plate)

  • 윤철훈;황성규;오세영;최성용;이기창
    • 한국응용과학기술학회지
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    • 제15권1호
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    • pp.25-33
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    • 1998
  • Photoresist is defined as substance that makes chemical changes in its solubility, colouring and hardening by light energy. In this study, photosensitive photoresists of the positive type for a printing plate were studied. PF, o-, m-, p-CF resins as a matrix resin were synthesized at an identical condition. Photoresists were prepared by mixing NDS derivatives with a matrix resin at various mixing ratios. Characteristics of photoresists were studied by yield method of residual using solubility and Optical microscope was also analyzed. Prepared photoresist using NDS derivatives shows excellent photosensitivity and solubility compared with commercial product. The mixing ratio of 1:4(by mass) of NDS derivative[III] and m-CF resin shows the highest dissoultion rate among others. In addition, photoresist was obtained at this condition resulted in the superior sensitivity and contrast.

해바라기에 있어서 파종기 이동이 초장, 엽수, 개화기 및 수량에 미치는 영향 (Effects of Different Planting on Plant Height, Number of Leaves, Flowering and Yield on Sunflower (Helianthus annuus. L.))

  • 강광희;이은웅
    • 한국작물학회지
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    • 제22권2호
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    • pp.98-103
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    • 1977
  • 두 품종 군포재래 및 페레도빅에 대하여 파종기에 따른 생태적 차이를 구명함으로서 우리나라 작부방식 및 간ㆍ혼작에 알맞는 해바라기 재배와 품종선택의 기초자료를 얻고져 1974년 수원에서 4월15일부터 7월25일까지 20일 간격으로 6회에 걸쳐 파종하였다. 1) 페레도빅은 파종기가 빨라지면 발뢰기도 빨라졌으나 군포재래는 파종기를 달리 하여도 일정시기(8월8일) 이후에 발뢰기에 도달하였다. 2) 군포재래는 페레도빅에 비하여 감광성정도가 높게 나타났으며 페레도빅은 감온성 정도가 군포재래 보다 높은 경향이다. 3) 발뢰이후 개화기까지 일수는 파종기에 따라 차이가 인정되지 않고 페레도빅은 25일, 군포재래는 28일이 소요되었다. 4) 페레도빅은 발뢰이후생장이 이전의 생장보다 크며 군포재래는 반대로 나타났다. 5) 두 품종 모두 5월25일 파종에서 초장 및 경의 굵기가 모두 컸으며 품종간의 차리도 현저하게 나타났고 파종기가 지연됨에 따라 품종간 차이가 적어졌다. 6) 페레도빅은 군포재래보다 엽수가 적으며 파종기에 따른 차이가 없고, 군포재래는 엽수가 많으며 5월25일 파종까지는 파종기별 차이가 없어도 6월15일 이후는 파종기 지연에 따라 엽수가 현저하게 줄었다. 7) 5월5일 파종기에서 페레도빅을 종실수량 158kg/10a로 가장 높았으며 7월5일 이후의 파종에서는 현저하게 감수되었다. 군포재래는 파종기 지연에 따라 수량감수정도는 페레도빅보다 적었다.

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한방 변증과 양방 협진에 의한 전신성 홍반성 낭창(Systemic Lupus Erythematosus) 치료 1예 (One Case of Systemic Lupus Erythematosus treated by Integrated Therapy of Western Medicine with Oriental Differential Diagnosis of Symptoms and Signs)

  • 정대영;백동기;황상일;신선호;김동웅;한명아
    • 대한한방내과학회지
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    • 제23권2호
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    • pp.306-312
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    • 2002
  • Systemic Lupus Erythematosus(SLE) is a autoimmune disease characterized by combined symtoms of malar rash, discoid rash, neuropsychiatric disorder, renal disorder, hematologic disorder, photosensitivity immunologic disorder, oral ulcer, anti-nuclear antibody, arthritis, pleuritis and pericarditis, etc. Multiple genetic or environmental causes are supposed to facilitate antiboby production to autoantigen such as ds-DNA, histone, phospholipid, red blood cell, platelet, etc. And defective complementary system fail to remove autoantigen-antibody complex, which deposit in multiple organs and result in inflammatory damages. SLE does not correctly correspond to any specific category of oriental medicine. But, accoring to previous reports, it can be controlled by herb medications used differently patients-to-patients. So we are to report this one SLE case being successfully controlled by classic corticosteroids with herb medications based on oriental diffrential diagnosis of symptoms and signs.

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하대정맥의 혈전증을 동반한 인지질항체 증후군의 수술적 치료 - 1예 보고 - (Inferior Vena Cava Thrombectomy in a Patient with Antiphospholipid Syndrome - A case report -)

  • 장재석;권오춘;이섭;김석
    • Journal of Chest Surgery
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    • 제42권3호
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    • pp.371-374
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    • 2009
  • 36세의 여자환자가 복부통증 및 하지부종소견을 주소로 내원하였다. 과거력상 자연유산의 경험이 있고 광과민성, 수관절 통증을 간헐적으로 호소하였으며, 입원당시 시행한 컴퓨터 단층촬영상 하대정맥에 혈전이 관찰되었으며, 혈액검사상 자가항체의 상승이 동반되어 인지질항체 증후군으로 진단되었다. 헤파린 및 이뇨제등의 약물치료를 유지하는 동안 폐동맥색전증이 관찰되어 혈전제거 술을 시행하였으며 현재 환자는 특별한 재발의 소견 없이 항응고요법을 시행하며 외래에서 추적관찰중이다.