Journal of the Korean Applied Science and Technology (한국응용과학기술학회지)
- Volume 15 Issue 1
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- Pages.25-33
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- 1998
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- 1225-9098(pISSN)
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- 2288-1069(eISSN)
DOI QR Code
Solubility Comparison by Yield Method of Residual of Photoresist for Printing Plate
인쇄 제판용 Photoresist의 잔막수율법에 의한 용해도 비교
- Yoon, Cheol-Hun (Dept. of Chemical Engineering, Myong Ji University) ;
- Hwang, Sung-Kwy (Dept. of Chemical Engineering, Myong Ji University) ;
- Oh, Se-Young (Dept. of Chemical Engineering, Myong Ji University) ;
- Chio, Sung-Yong (Dept. of Chemical Engineering, Myong Ji University) ;
- Lee, Ki-Chang (Dept. of Chemical Engineering, Myong Ji University)
- Published : 1998.03.31
Abstract
Photoresist is defined as substance that makes chemical changes in its solubility, colouring and hardening by light energy. In this study, photosensitive photoresists of the positive type for a printing plate were studied. PF, o-, m-, p-CF resins as a matrix resin were synthesized at an identical condition. Photoresists were prepared by mixing NDS derivatives with a matrix resin at various mixing ratios. Characteristics of photoresists were studied by yield method of residual using solubility and Optical microscope was also analyzed. Prepared photoresist using NDS derivatives shows excellent photosensitivity and solubility compared with commercial product. The mixing ratio of 1:4(by mass) of NDS derivative[III] and m-CF resin shows the highest dissoultion rate among others. In addition, photoresist was obtained at this condition resulted in the superior sensitivity and contrast.
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