• 한국정보디스플레이학회:학술대회논문집
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• 2006.08a
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• pp.910-912
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• 2006

Barrier ribs in plasma display panels (PDPs) function to maintain the discharge space between the glass plates as well as to prevent optical cross-talking. The barrier ribs currently employed are typically $300{\mu}m$ pitch, $110{\sim}120{\mu}m$ in height, with upper and lower widths of $50{\mu}m$ and $80{\mu}m$, respectively. It has been reported that barrier ribs can be fabricated by screen-printing, sand blasting, etching and photolithographic processes. In this study, photosensitive barrier rib pastes were formulated and systematically evaluated in terms of photolithographic process variables such as printing, drying, UV exposure, development and sintering. It was found that the use of UV absorbent, polymerization inhibitor and surfactant were very effective in controlling the width uniformity of barrier ribs in the photolithographic method of barrier rib patterning.

• Macromolecular Research
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• v.12 no.4
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• pp.352-358
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• 2004

For their application as one-component photoresists, we prepared epoxy terpolymers containing oxime-urethane and benzophenone groups by the radical polymerization of glycidyl methacrylate (GMA), metha-cryloxyethyl benzophenoneoxime urethane (MBU), and N-(4-benzoyl)phenylmaleimide (BPMI). The terpolymer composition was optimized to provide the most photosensitive photoresist. The photo-decomposition reaction of the oxime-urethane groups in the terpolymer was monitored by UV absorption spectroscopy, and the photo-crosslinking reaction of the epoxy terpolymer was observed by measuring the normalized thickness. The photosensitivity of the epoxy terpolymer increased as the amount of BPMI and MBU units increased up to 16 and 24 mol%, respectively. Among the terpolymers we prepared, terpolymer T-II(contents of GMA, MBU, BPMI are 75, 19, 6.1 mole%, respectively) exhibited the highest photosensitivity ( $D_{c}$ $^{0.5}$ = 430 mJ/$\textrm{cm}^2$) and had a moderate contrast (${\gamma}$$^{p}$ = 1.23). Negative-tone micropatterns having a line width of ca. 10 ${\mu}{\textrm}{m}$ were obtained by developing the system with chloroform.m.

• Polymer(Korea)
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• v.31 no.5
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• pp.374-378
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• 2007

Water-soluble terpolymer of acrylamide, diacetone acrylamide, and acrylic acid was prepared by redox initiators in aqueous medium. One component photoresist was synthesized by reaction of terpolymer with 4-azidoaniline. By blending the aqueous acrylamide/diacetone acrylamide copolymer solution with bisazide, 4,4'-diazidostilbene -2,2'-disulfuric acid sodium salt, two component photoresist was prepared. The photosensitivity per azido group unit mole of one component photoresist was 4 times higher than that of two component photoresist. The dot-type pattern was successfully achieved with one component photoresist at low exposure energy, which is prospective to be used as black matrix negative photoresist.

• Applied Chemistry for Engineering
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• v.2 no.4
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• pp.348-355
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• 1991

Polysiloxane copolymers were prepared by copolymerizing hexamethylcyclotrisiloxane with tetramethylcyclotetrasiloxane, and then reacted with allyamine. Copolymers containing naphthoquinone-1,2-diazide-5-sulfonyl group were synthesized by reacting naphthoquinone-1,2-diazide-5-sulfonyl chloride with siloxane copolymers having amino group. Thermal decomposition temperatures of copolymers were $360{\sim}450^{\circ}C$, and photosensitive characteristics were dependent on the molecular weights of backbone resins and sensitizers. Sensitivity of copolymers was $50{\sim}120mJ/cm^2$ and contrast(${\gamma}$) was 1.4~2.1.

• Polymer(Korea)
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• v.24 no.6
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• pp.757-762
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• 2000

Vinylbenzyloxystyrylpyridine (VSP) as a photosensitive monomer was synthesized by the reaction of 4-hydroxystyrylpyrydine with 4-vinylbenzyl chloride. Photocrosslinkable polymers containing rosin moiety were then prepared by radically copolymerizing VSP with a methacrylic monomer having rosin moiety. In these copolymerizations, the VSP feed ratios of 5 to 20 mol% were used. The contents of VSP units in the copolymers were determined by UV spectroscopy to be 5.3 to 17.3 mol%. The numberaverage molecular weights of these polymers were in the range of 18000 to 28000 and the polydispersity indexes were about 1.8. The glass transition temperatures were about 15$0^{\circ}C$ and the initial decomposition temperatures were about 34$0^{\circ}C$. The polymers were relatively fast photocrosslinked and the photocrosslinking reaction could be traced by the UV spectroscopy and the residual yield method.

• Macromolecular Research
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• v.12 no.4
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• pp.391-398
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• 2004

Thick-film photolithography is a new technology that combines lithography processes, such as exposure and development, with the conventional thick-film process applied to screen-printing. In this study, we developed a low-temperature cofireable silver paste applicable for thick-film processing to form fine lines using photolitho-graphic technologies. The optimum paste composition for forming fine lines was investigated. The effect of processing parameters, such as the exposing dose, had on the fine-line resolution was also investigated. As the result, we found that the type of polymer and monomer, the silver powder loading, and the amount of photoinitiator were the main factors affecting the resolution of the fine lines. The developed photoimageable silver paste was printed on a low-temperature cofireable green sheet, dried, exposed, developed in an aqueous process, laminated, and then fired. Our results demonstrate that thick-film fine lines having widths < 20 $\mu\textrm{m}$ can be obtained after cofiring.

• Journal of the Korean Chemical Society
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• v.36 no.4
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• pp.496-503
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• 1992

An ISFET urea sensor was fabricated by immobilizing the urease using photosensitive polymer, poly(vinyl alcohol)-SbQ on the H$^+$ sensing $Si_3$$N_4$ thin film of pH-ISFET. The sensor could determine the urea concentration in the range of 1∼50 mg/dl with fast response and good repeatability. For its application to clinical analysis, the interferences of the various materials which cause inhibition in urease catalytic reactions in blood was investigated. The results of the urea measurements in blood plasma using the ISFET urea sensor were compared with these of conventional spectrophotometric method.

• Polymer(Korea)
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• v.33 no.3
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• pp.207-212
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• 2009

The precursor polyimide of the photoreactive polyimides(PI-SP6 and PI-SP12) was prepared from a derivative of 2, 2, 2-trifluoroethane dianhydride and 3,3'-dihydroxy-4,4'-diaminobiphenyl. PI-SP6 and PI-SP12 were then prepared by the polymer reactions of the precursor polyimide with photoreactive 2-styrylpyridine alkylene (hexylene and dodecylene) derivatives, respectively. The photoreactive polymers were soluble in organic solvents. The polymers showed the initial decomposition temperatures around $350^{\circ}C$. The glass transition temperatures of PI-SP6 and PI-SP12 were found to be $130^{\circ}C$ and $85^{\circ}C$, respectively. This result means that the latter polymer is more flexible than the former polymer. Their transmittance in the film state was 90% at $250^{\circ}C$, which indicates that the photosensitive polyimides with thermal stability have high optical transparency even at the high temperature. The respective dichroic ratios of PI-SP6 and PI-SP12 were found to be 0.01 and 0.03 at an exposure energy of $1.5\;J/cm^2$. This result suggests that the latter polymer with larger flexibility compared to the former polymer is more effective for the photoalignment.

• Fibers and Polymers
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• v.2 no.1
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• pp.123-130
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• 2001

Photoresponsive side chain copolymer and homopolymer containing an aminonitroazobenzene were synthesized for studying photoisomerization behavior and photo-induced anisotropy. Trans-to-cis photoisomerization was observed under the exposure of a circularly polarized visible light with UV-Vis absorption spectroscopy. Reorientation of polar azobenzene molecules induced optical anisotropy under a linearly polarized light at 532nm. Polarized absorption spectroscopy was employed to investigate the anisotropy of the polymer film during irradiationg of the excitation light. Layers of two photosensitive polymers were used for aligning liquid crystal(LC) molecules instead of one of the rubbed polyimide layers in the conventional twisted nematic cell. For producing homogeneous alignment of a nematic LC molecule, a linearly polarized light was exposed to the films of two polymers. The stability of the LC alignment upon the linearly polarized light exposure was also studied.

• Macromolecular Research
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• v.9 no.5
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• pp.247-252
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• 2001

Tricyclic aliphatic dianhydride monomer, tricycle[4.2.2.0]dec-9-ene exo, endo-3,4: 7,8-tetra-carboxylicdianhydride (TCDDA), was synthesized by photochemical reaction and poly(amic acid)s from TCDDA and diamines such as 1,4-bis-(4-aminophenoxy)benzene (BAB), 2,2-bis(4-(4-aminophenoxy) phenyl) propane (BAPP), 2,2-bis(4-(4-aminophenoxy)phenyl)hexafluoropropane (BAPHF), bis(4-(4-ami-nophenoxy) phenyl)sulfone (BAPS), and 1,4-bis-(4-aminophenoxy)biphenyl (BABP) were prepared. The inherent viscosities of the poly(amic acid)s were between 0.39 and 0.50 dL/g. The poly(amic acid)s were converted to polyimide films by thermal imidization. The glass transition temperatures (T$\_$g/) of the polyimides were in the range of 201-263$\^{C}$. The thermogravimetric analysis (TGA) thermogram of these polyimides showed the temperatures of 5% weight losses between 375 and 393$\^{C}$ in nitrogen atmosphere. To show their utility for image generation, degradations of these polyimides in UV exposure were investigated by UV spectroscopy.