• Applied Chemistry for Engineering
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• v.20 no.6
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• pp.622-627
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• 2009

Using an alkali-solution developable photosensitive resin and a carbon black as a conductive filler, photo-patternable pastes for polymer thick film resistor were fabricated and evaluated. A photo solder resist (PSR), which is usually used as protecting layer of printed circuit board (PCB), was used as a photosensitive resin so that ultraviolet exposure and alkali-aqueous solution development of paste were possible. After fabricating the photosensitive polymer resistor paste, the electrical properties of thick film resistors were measured using PCB test boards. Sheet resistance was decreased with increasing amount of carbon black, but the developability was limited in excess loading of carbon black. The sheet resistance was also reduced by re-curing and the change rate was smaller in higher carbon black loading. Moreover, finely patterned meander-type thick film resistors were fabricated using photo-process and large resistance up to several tens of sheet resistance could be obtained in small area by this technique.

• Journal of the Korean Graphic Arts Communication Society
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• v.16 no.3
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• pp.43-60
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• 1998

The photosensitive properties and spectroscopic characteristics in the organic photoconductor(OPC) with carrier generation layer(CGL) of poly(vinylbutyral)(PVB) and polycarbonate(PC) doped with titanyl phthalocyanine(TiOPc) were investigated. The change of crystal structure of TiOPc dispersed with PVB and PC was shown by UV-visible reflective spectrum and FT-IR spectrum and mainly caused by the difference of solubility of solvent and the interaction between TiOPc and binder. The particle size of TiOPc dispersed with PVB measured by SEM was smaller than in PC. The crystal structure of TiOPc dispersed with PVB was amorphous type and in PC was $\alpha$type. It was found that the photosensitive properties of OPC were dependent on the change of absorbance and ionization potential of TiOPc occurred from the difference of crystal structure. In this work, the photosensitivity of OPC of TiOPc dispersed with PVB was better than PC due to the crystal type and the smaller particle size.

• 한국정보디스플레이학회:학술대회논문집
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• 2007.08b
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• pp.1360-1363
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• 2007

The bus electrode is composed of two layers. One is the black matrix(BM) and silver layer is formed on top of black layer. The BM paste is made by mixing $Co_3O_4$ black powder with photosensitive vehicle and rheological additives. In this work we studied the effect of $Co_3O_4$ black powder and glass frit on the rheological property of photosensitive BM paste. We also examined how the size and content of black powder and glass frit affect the transmittance and reflectance of the BM layer after sintering.

• 한국정보디스플레이학회:학술대회논문집
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• 2003.07a
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• pp.381-384
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• 2003

Photosensitive electordes(Ag and Black) are widely used in the patterning of both address and bus electrodes on the rear and front panel of plasma display panel (PDP). As the need for high resolution(>XGA) and large area(>60 inches) PDP is increased, basic understanding of each component of formulation on the photolithographic process of patterning electrodes are required in order to increase the yield in the production of PDP. In this work, the materials and amount of necessary components of photosensitive electrode paste and their effect on the photolithographic process of patterning electrodes were studied.

• Transactions of the Korean Society of Mechanical Engineers A
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• v.33 no.3
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• pp.237-242
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• 2009

MEMS catalytic combustors were fabricated to use in micro-power sources as a heat source. The combustor was fabricated by photolithography and anisotropic wet etching of photosensitive glass wafers. Two different catalyst loading methods were used to complete the fabrication of the combustors. For thin film type, the $Al_2O_3$ was washcoated on the surface of the combustion chamber as a catalyst support, and for packed-bed type, ceramic foam was inserted after Pt was coated. The volume of the combustors was 1.8 $cm^3$ and 16W of heat was generated using the fabricated combustors with hydrogen. The energy density of combustor was about 8.9 W/$cm^3$.

• 한국정보디스플레이학회:학술대회논문집
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• 2002.08a
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• pp.639-642
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• 2002

A new PDP barrier rib formation technique was investigated utilizing transparent soft maid made of silicon resin. Transparent soft mold was fabricated by pouring a silicone resin into the base mold made with photosensitive glass. The photosensitive barrier rib paste was coated on the glass substrate and dried in a 90 $^{\circ}C$ convection oven for 20min. The transparent soft mold was pressed on top of the semi-dry barrier rib layer and then irradiated with a UV lamp to a total dose of $900{\sim}1000mJ/cm^2$ The soft maid was then removed from the pressed barrier rib by winding up and fine pattern of barrier rib was obtained. The photosensitive barrier rib paste makes the demolding easy due to reduced interfacial forces and shrinking of paste materials.

• Journal of the Korean Applied Science and Technology
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• v.14 no.2
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• pp.27-34
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• 1997

Naphthoquinone-1,2-diazide-5-sulfonyl [NDS]derivatives members of Quinone diazide compound that are utilizable as photoresist for printing plate were synthesized, and photoresist were prepared by mixing these derivatives with a matrix resin(PF, CF) at various weight ratios. Photosensitive characteristics of photoresist were studied by Gray scale method, and SEM to analyze if they can be used as photosensitive material in a printing plate. Experimental results showed using IR, UV, NDS derivatives were photoconverted and developer-soluble photoresist were produced. Photoresist in the mixing ratio of 1:4 of NDS[II] and CF resin gave rise to the highest dissolution rate. In addition, photoresist obtained at this condition resulted in the most superior sensitivity.

• 한국정보디스플레이학회:학술대회논문집
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• 2000.01a
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• pp.177-179
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• 2000

Barrier rib for the plasma display panel (PDP) was made by photolithographic process utilizing photosensitive barrier rib paste. The barrier rib paste was prepared by first dissolving poly(MMA-co-MAA) binder polymer in butyl carbitol(BC) solvent at 15 wt% concentration. To this solution were added a mixture of functional monomers , Irgacure 651 photoinitiator, and barrier rib power and then the whole mixture was dispersed in the three roll mill for 2 hour. The effect of component and concentration of photosensitive barrier rib paste was studied. After optimization of the paste formulation and photolithographic process, barrier rib could be obtained with good resolution up to 110-120 ${\mu}m$ height and 80-90 ${\mu}m$ width.

• Journal of the Korean Ceramic Society
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• v.37 no.1
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• pp.82-89
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• 2000

In lithium silicate photosensitive glass-ceramics, the relationship between lithography time and crystallization, and the effect of addition of mineral acid in etching rate and pattern shape were investigated. Irradiation times for micropatterning were less than 5 minutes in which Ce3+ ions in glass were changed rapidly to Ce4+ with ultra violet light. Overexposure to ultra brought about blot of pattern by diffiraction of light. Addition of mineral acid to HF enhanced etching rate as compared with HF solution only. The addition of H2SO4 especially increased the etching rate by 70%. But the mixed solution also increased the etching rate of the noncrystallized portion of the glass and this resulted in heavy etching. Etching with ultrasonic wave showed higher etching rate than that with the static or fluid method.

• Journal of the Korean Institute of Electrical and Electronic Material Engineers
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• v.21 no.5
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• pp.426-433
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• 2008

We first demonstrated simultaneous patterning and passivation of P3HT active layer with photosensitive PVA. The passivation layers were obtained by annealing the organic layers after developing PVA and subsequent over-etching the P3HT layer. The fabricated OTFTs were electrically characterized. The OTFTs exhibited the mobility of ${\sim}5.9{\times}10^{-4}\;cm^2/V{\cdot}s$ and on/off current ratio of ${\sim}10^4$. After passivation, the results showed the extended lifetime of ${\sim}250$ hours with photosensitive PVA layer.