• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
• /
• 1999.11a
• /
• pp.545-548
• /
• 1999

The electro-optical characteristics of photo-aligned vertical-alignment (VA)-liquid crystal display (LCD) with non-polarized ultraviolet (UV) light irradiation of 45\`on homeotropic polyimide (Pl) surface were investigated. LC alignment on photo-aligned VA-LCD is attributed to photo-depolymerized reaction of the polymer with non-polarized UV light irradiation on PI surface. We had good voltage-transmittance (V-T) characteristics of photo-aligned VA-LCD. The response time of photo-aligned VA-LCD was slower than that of the rubbing-aligned VA-LCD. Finally, we suggest that the slow response time of photo-aligned VA-LCD depends on the LC domain.

• Polymer(Korea)
• /
• v.34 no.5
• /
• pp.469-473
• /
• 2010

The curing mechanism and characteristics of UV curable acrylate resins were studied using Photo-DSC, FTIR, and Raman spectroscopy. Effects of chemical structures of acrylate, numbers of functional group, and UV intensity on curing kinetics were investigated with Photo-DSC. FTIR and Raman spectroscopy has been used to understand curing mechanisms and reaction conversion. In order to investigate the effect of oxygen on the photo-curing reaction, the curing process was compared between the acrylate and thiol-ene resins. The reaction conversion was found to be less than 80% for acrylate resins. The photo-curing reaction of the acrylate resin could not proceed to the end because of oxygen which acts as a reaction inhibitor while the thiol-ene resin was hardly affected from oxygen during the curing process.

• Macromolecular Research
• /
• v.17 no.10
• /
• pp.725-728
• /
• 2009

• Applied Chemistry for Engineering
• /
• v.20 no.6
• /
• pp.622-627
• /
• 2009

Using an alkali-solution developable photosensitive resin and a carbon black as a conductive filler, photo-patternable pastes for polymer thick film resistor were fabricated and evaluated. A photo solder resist (PSR), which is usually used as protecting layer of printed circuit board (PCB), was used as a photosensitive resin so that ultraviolet exposure and alkali-aqueous solution development of paste were possible. After fabricating the photosensitive polymer resistor paste, the electrical properties of thick film resistors were measured using PCB test boards. Sheet resistance was decreased with increasing amount of carbon black, but the developability was limited in excess loading of carbon black. The sheet resistance was also reduced by re-curing and the change rate was smaller in higher carbon black loading. Moreover, finely patterned meander-type thick film resistors were fabricated using photo-process and large resistance up to several tens of sheet resistance could be obtained in small area by this technique.

• Journal of the Korean Institute of Electrical and Electronic Material Engineers
• /
• v.14 no.7
• /
• pp.595-599
• /
• 2001

The mechanisms of pretilt angle generation for a nematic liquid cystal (NLC) using a photodimerization method with obliquely polarized UV exposure on the various new photo-crosslinkable polymer were studied. A good thermal stability of all the photo-crosslinkable polymers was obtained by thermogravimetric analysis (TGA) measurement until 450$\^{C}$. High pretilt angle of the NLC was observed by polarized UV exposure on the three kinds of the photo-crosslinkable polymers containing biphenyl(BP), decyl(de), and cholesteryl(chol) group, respectively. However, the low pretilt angle of the NLC was measured by obliquely polarized UV exposure on the two kinds of the photo-crosslinkable polymers containing fluorine and chalcone group. Consequently, the high NLC angle generated is attributable to the biphenyl and alkyl moieties, and photo-dimerized chalcone group of the photopolymer.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
• /
• 2000.07a
• /
• pp.835-838
• /
• 2000

A new photo-alignment material, copoly (PM4Ch-ChMA), copoly (poly (4-methacryloyloxy) chalcone-cholesterol methacrylate) was synthesized and the electro-optical (EO) characteristics for the photo-aligned vertical-aligned (VA)-LC display (LCD) were studied. Good voltage-transmittance (V-T) and response time characteristics for the photo-aligned VA-LCD with polarized UV exposure on the copolymer-1 (2%) surfaces for 1 min. were observed. EO performance for the photo-aligned VA-LCD decreased with increasing UV exposure time on a copolymer surface. Also, excellent V-T and response time characteristics for the photo-aligned VA-LCD with UV exposure on copolymer-2 and copolymer-3 surfaces for 3min. can be achieved.

• Journal of the Optical Society of Korea
• /
• v.5 no.1
• /
• pp.16-19
• /
• 2001

A photopolymer, copoly (M4Ch-ChMA), copoly ((4-methacryloyloxy) chalcone-cholesteryl methacrylate), was synthesized in this study. The electro-optical (EO) characteristics for the photo-aligned vertical-alignment (VA)-liquid crystal display (LCD) were investigated. Excellent voltage-transmittance curves for the VA-LCD photo-aligned by polarized UV exposure on the copoly (M4Ch-ChMA) surface were observed. The response time for the photo-aligned VA-LCD decrease with increasing UV exposure time. consequently, the photo-dimerized chalcone moiety increased with increasing UV exposure time, which then contributed to a low response time for the VA-LCD photo-aligned.

• Proceedings of the IEEK Conference
• /
• 2004.06b
• /
• pp.489-492
• /
• 2004

In this paper, we demonstrate polymer thin-film transistors (TFTs) on a paper-based flexible substrate. As a substrate, commercially available photo-paper is used with Parylene coating. The parylene layer enables conventionally used wet chemical process and vacuum deposition processes for electrodes and gate insulator. As an active channel layer, we used poly-3-hexylthiophene (P3HT) which is solution process. Field effect mobility up to $(0.06 {\pm} 0.02) cm^2/Vs$ and on/off ratio of $10^3 {\~}10^4$ are achieved on a photo-paper.

• Journal of the Korean Institute of Electrical and Electronic Material Engineers
• /
• v.11 no.6
• /
• pp.477-480
• /
• 1998

In this paper, we investigated the liquid crystal(LC) alignment and generation of pretilt angle by using photo-alignment techniques on two kinds of polyimide(PI) surface, It was found that the uniform alignment for nematic(N) LC is obtained in a cell with slanted UV light irradiation on PI surface without side chain. We successfully observed that the pretilt angle of NLC is generated about $3^{\circ}$ with an incident angle of 70 degree on the PI surface without side chain. It is considered that the pretilt angle generation in NLC is attributed to interaction between the LC molecules and the polymer surfaces.

• Journal of the Korean Institute of Electrical and Electronic Material Engineers
• /
• v.14 no.4
• /
• pp.341-344
• /
• 2001

We synthesized a photo-crosslinkable polymide (polymide (PI)-chalcone-biphenyl (BP)) based polymer and control of pretilt angle for a nematic liquid crystal (NLC) using two kinds of the photodimerization methods by polarized UV exposure the photopolymer surfaces was studied. Pretilt angle of the NLCs using a conventional photodimerization method could be varied between 0$^{\circ}$ and 3$^{\circ}$, by controlling the condition of UV exposure. Pretilt angle of the NLCs using the conventional photodimerization method was higher than a in-situ photodimerization method.